Dynamic Action of Mouthwashes Affects the Electrochemical Behavior of Ti6Al4V Alloy
Autor(a) principal: | |
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Data de Publicação: | 2021 |
Outros Autores: | , , , , |
Tipo de documento: | Artigo |
Idioma: | eng |
Título da fonte: | Repositório Institucional da UNESP |
Texto Completo: | http://dx.doi.org/10.1007/s40735-021-00591-8 http://hdl.handle.net/11449/229731 |
Resumo: | This study investigated the electrochemical behavior of the Ti6Al4V alloy under the influence of dynamic action of mouthwashes. Ti6Al4V alloy disks (n = 5) were dynamically exposed to mouthwashes (0.12% chlorhexidine digluconate [CHX], cetylpyridinium chloride [CC], and hydrogen peroxide [HP]) by immersion 3 times a day for 1 min. Artificial saliva [AS] is a control solution. The electrochemical behavior of the Ti6Al4V (n = 5) was tested at the baseline, and after 7 and 14 days of mouthwashes dynamic action. Surfaces characteristics were investigated using scanning electron microscopy (SEM), energy-dispersive spectroscopy, surface roughness, and Vickers microhardness. CC had the highest values of polarization resistance (Rp), and CHX reduced the capacitance values (Q) compared to the other groups (p < 0.05). HP generated the lowest Rp values in all periods, and the highest Q values after 14 days immersion (p < 0.05). CC and CHX did not alter the alloy potentiodynamic curves when compared to AS. HP increased the corrosion and passivation current densities, and the corrosion rate in relation to the other groups (p < 0.05). SEM micrographs showed minors surface changes with the presence of pitting corrosion for HP. No differences were found for roughness and microhardness after all immersion periods (p > 0.05). Dynamic mouthwash simulation with HP impairs the corrosion stability of Ti6Al4V alloy, and CC presents the greatest electrochemical stability over time. Our data shed light on how the dynamic action of mouthwashes affects the Ti electrochemical behavior aiming at ensuring a safer indication for patients receiving dental implant. |
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Dynamic Action of Mouthwashes Affects the Electrochemical Behavior of Ti6Al4V AlloyCorrosionDental ImplantsMouthwashesTitaniumThis study investigated the electrochemical behavior of the Ti6Al4V alloy under the influence of dynamic action of mouthwashes. Ti6Al4V alloy disks (n = 5) were dynamically exposed to mouthwashes (0.12% chlorhexidine digluconate [CHX], cetylpyridinium chloride [CC], and hydrogen peroxide [HP]) by immersion 3 times a day for 1 min. Artificial saliva [AS] is a control solution. The electrochemical behavior of the Ti6Al4V (n = 5) was tested at the baseline, and after 7 and 14 days of mouthwashes dynamic action. Surfaces characteristics were investigated using scanning electron microscopy (SEM), energy-dispersive spectroscopy, surface roughness, and Vickers microhardness. CC had the highest values of polarization resistance (Rp), and CHX reduced the capacitance values (Q) compared to the other groups (p < 0.05). HP generated the lowest Rp values in all periods, and the highest Q values after 14 days immersion (p < 0.05). CC and CHX did not alter the alloy potentiodynamic curves when compared to AS. HP increased the corrosion and passivation current densities, and the corrosion rate in relation to the other groups (p < 0.05). SEM micrographs showed minors surface changes with the presence of pitting corrosion for HP. No differences were found for roughness and microhardness after all immersion periods (p > 0.05). Dynamic mouthwash simulation with HP impairs the corrosion stability of Ti6Al4V alloy, and CC presents the greatest electrochemical stability over time. Our data shed light on how the dynamic action of mouthwashes affects the Ti electrochemical behavior aiming at ensuring a safer indication for patients receiving dental implant.Department of Dental Materials and Prosthesis São Paulo State University (UNESP) School of Dentistry, José Bonifacio Street n: 1193, AraçatubaDepartment of Prosthodontics and Periodontology University of Campinas (UNICAMP) Piracicaba Dental School, PiracicabaDepartment of Dental Materials and Prosthesis University of São Paulo (USP) School of Dentistry of Ribeirão Preto, Ribeirão PretoDepartment of Surgery and Integrated Clinic São Paulo State University (UNESP) School of Dentistry, AraçatubaDepartment of Dental Materials and Prosthesis São Paulo State University (UNESP) School of Dentistry, José Bonifacio Street n: 1193, AraçatubaDepartment of Surgery and Integrated Clinic São Paulo State University (UNESP) School of Dentistry, AraçatubaUniversidade Estadual Paulista (UNESP)Universidade Estadual de Campinas (UNICAMP)Universidade de São Paulo (USP)Sousa, Cecília A. [UNESP]Cordeiro, Jairo M.Silva, Allan O.Barão, Valentim A. R.Faverani, Leonardo P. [UNESP]Assunção, Wirley G. [UNESP]2022-04-29T08:35:32Z2022-04-29T08:35:32Z2021-12-01info:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/articlehttp://dx.doi.org/10.1007/s40735-021-00591-8Journal of Bio- and Tribo-Corrosion, v. 7, n. 4, 2021.2198-42392198-4220http://hdl.handle.net/11449/22973110.1007/s40735-021-00591-82-s2.0-85117302843Scopusreponame:Repositório Institucional da UNESPinstname:Universidade Estadual Paulista (UNESP)instacron:UNESPengJournal of Bio- and Tribo-Corrosioninfo:eu-repo/semantics/openAccess2024-09-19T14:50:48Zoai:repositorio.unesp.br:11449/229731Repositório InstitucionalPUBhttp://repositorio.unesp.br/oai/requestrepositoriounesp@unesp.bropendoar:29462024-09-19T14:50:48Repositório Institucional da UNESP - Universidade Estadual Paulista (UNESP)false |
dc.title.none.fl_str_mv |
Dynamic Action of Mouthwashes Affects the Electrochemical Behavior of Ti6Al4V Alloy |
title |
Dynamic Action of Mouthwashes Affects the Electrochemical Behavior of Ti6Al4V Alloy |
spellingShingle |
Dynamic Action of Mouthwashes Affects the Electrochemical Behavior of Ti6Al4V Alloy Sousa, Cecília A. [UNESP] Corrosion Dental Implants Mouthwashes Titanium |
title_short |
Dynamic Action of Mouthwashes Affects the Electrochemical Behavior of Ti6Al4V Alloy |
title_full |
Dynamic Action of Mouthwashes Affects the Electrochemical Behavior of Ti6Al4V Alloy |
title_fullStr |
Dynamic Action of Mouthwashes Affects the Electrochemical Behavior of Ti6Al4V Alloy |
title_full_unstemmed |
Dynamic Action of Mouthwashes Affects the Electrochemical Behavior of Ti6Al4V Alloy |
title_sort |
Dynamic Action of Mouthwashes Affects the Electrochemical Behavior of Ti6Al4V Alloy |
author |
Sousa, Cecília A. [UNESP] |
author_facet |
Sousa, Cecília A. [UNESP] Cordeiro, Jairo M. Silva, Allan O. Barão, Valentim A. R. Faverani, Leonardo P. [UNESP] Assunção, Wirley G. [UNESP] |
author_role |
author |
author2 |
Cordeiro, Jairo M. Silva, Allan O. Barão, Valentim A. R. Faverani, Leonardo P. [UNESP] Assunção, Wirley G. [UNESP] |
author2_role |
author author author author author |
dc.contributor.none.fl_str_mv |
Universidade Estadual Paulista (UNESP) Universidade Estadual de Campinas (UNICAMP) Universidade de São Paulo (USP) |
dc.contributor.author.fl_str_mv |
Sousa, Cecília A. [UNESP] Cordeiro, Jairo M. Silva, Allan O. Barão, Valentim A. R. Faverani, Leonardo P. [UNESP] Assunção, Wirley G. [UNESP] |
dc.subject.por.fl_str_mv |
Corrosion Dental Implants Mouthwashes Titanium |
topic |
Corrosion Dental Implants Mouthwashes Titanium |
description |
This study investigated the electrochemical behavior of the Ti6Al4V alloy under the influence of dynamic action of mouthwashes. Ti6Al4V alloy disks (n = 5) were dynamically exposed to mouthwashes (0.12% chlorhexidine digluconate [CHX], cetylpyridinium chloride [CC], and hydrogen peroxide [HP]) by immersion 3 times a day for 1 min. Artificial saliva [AS] is a control solution. The electrochemical behavior of the Ti6Al4V (n = 5) was tested at the baseline, and after 7 and 14 days of mouthwashes dynamic action. Surfaces characteristics were investigated using scanning electron microscopy (SEM), energy-dispersive spectroscopy, surface roughness, and Vickers microhardness. CC had the highest values of polarization resistance (Rp), and CHX reduced the capacitance values (Q) compared to the other groups (p < 0.05). HP generated the lowest Rp values in all periods, and the highest Q values after 14 days immersion (p < 0.05). CC and CHX did not alter the alloy potentiodynamic curves when compared to AS. HP increased the corrosion and passivation current densities, and the corrosion rate in relation to the other groups (p < 0.05). SEM micrographs showed minors surface changes with the presence of pitting corrosion for HP. No differences were found for roughness and microhardness after all immersion periods (p > 0.05). Dynamic mouthwash simulation with HP impairs the corrosion stability of Ti6Al4V alloy, and CC presents the greatest electrochemical stability over time. Our data shed light on how the dynamic action of mouthwashes affects the Ti electrochemical behavior aiming at ensuring a safer indication for patients receiving dental implant. |
publishDate |
2021 |
dc.date.none.fl_str_mv |
2021-12-01 2022-04-29T08:35:32Z 2022-04-29T08:35:32Z |
dc.type.status.fl_str_mv |
info:eu-repo/semantics/publishedVersion |
dc.type.driver.fl_str_mv |
info:eu-repo/semantics/article |
format |
article |
status_str |
publishedVersion |
dc.identifier.uri.fl_str_mv |
http://dx.doi.org/10.1007/s40735-021-00591-8 Journal of Bio- and Tribo-Corrosion, v. 7, n. 4, 2021. 2198-4239 2198-4220 http://hdl.handle.net/11449/229731 10.1007/s40735-021-00591-8 2-s2.0-85117302843 |
url |
http://dx.doi.org/10.1007/s40735-021-00591-8 http://hdl.handle.net/11449/229731 |
identifier_str_mv |
Journal of Bio- and Tribo-Corrosion, v. 7, n. 4, 2021. 2198-4239 2198-4220 10.1007/s40735-021-00591-8 2-s2.0-85117302843 |
dc.language.iso.fl_str_mv |
eng |
language |
eng |
dc.relation.none.fl_str_mv |
Journal of Bio- and Tribo-Corrosion |
dc.rights.driver.fl_str_mv |
info:eu-repo/semantics/openAccess |
eu_rights_str_mv |
openAccess |
dc.source.none.fl_str_mv |
Scopus reponame:Repositório Institucional da UNESP instname:Universidade Estadual Paulista (UNESP) instacron:UNESP |
instname_str |
Universidade Estadual Paulista (UNESP) |
instacron_str |
UNESP |
institution |
UNESP |
reponame_str |
Repositório Institucional da UNESP |
collection |
Repositório Institucional da UNESP |
repository.name.fl_str_mv |
Repositório Institucional da UNESP - Universidade Estadual Paulista (UNESP) |
repository.mail.fl_str_mv |
repositoriounesp@unesp.br |
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1813546397199237120 |