Numerical analysis of pulsing regimes near static borders of optically injected semiconductor lasers
Autor(a) principal: | |
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Data de Publicação: | 2022 |
Outros Autores: | , , |
Tipo de documento: | Artigo |
Idioma: | eng |
Título da fonte: | Repositório Institucional da UNESP |
Texto Completo: | http://dx.doi.org/10.1364/AO.452938 http://hdl.handle.net/11449/223720 |
Resumo: | It is well known that semiconductor lasers under optical injection present rich, dynamic behavior. In this paper, we focus on pulsing regimes, which can be either exploited in a broad variety of applications or lead to undesired instabilities. In particular, we develop a multi-metric method to automatically identify pulsing regimes in the parameter space.We apply this method to extensive numerical simulations to show that these regimes occur in the vicinity of the static synchronization boundary. Furthermore, analyzing these pulsing regimes, we identify pulsations with repetition rates ranging from several megahertz up to more than 1 GHz. Finally, we analyze the effect of the linewidth enhancement factor and the slave-laser bias current, revealing that a linewidth enhancement factor of 3 and a higher bias current lead to broader regions of pulsation regimes. |
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Repositório Institucional da UNESP |
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spelling |
Numerical analysis of pulsing regimes near static borders of optically injected semiconductor lasersIt is well known that semiconductor lasers under optical injection present rich, dynamic behavior. In this paper, we focus on pulsing regimes, which can be either exploited in a broad variety of applications or lead to undesired instabilities. In particular, we develop a multi-metric method to automatically identify pulsing regimes in the parameter space.We apply this method to extensive numerical simulations to show that these regimes occur in the vicinity of the static synchronization boundary. Furthermore, analyzing these pulsing regimes, we identify pulsations with repetition rates ranging from several megahertz up to more than 1 GHz. Finally, we analyze the effect of the linewidth enhancement factor and the slave-laser bias current, revealing that a linewidth enhancement factor of 3 and a higher bias current lead to broader regions of pulsation regimes.School of Engineering and Sciences Tecnologico de Monterrey, E. Garza Sada 2501 Sur, Nuevo LeonCenter for Advanced and Sustainable Technologies Sao Paulo State University (UNESP), Sao Joao da Boa Vista, SPCenter for Advanced and Sustainable Technologies Sao Paulo State University (UNESP), Sao Joao da Boa Vista, SPTecnologico de MonterreyUniversidade Estadual Paulista (UNESP)Rodriguez, SergioCampuzano, GabrielAldaya, Ivan [UNESP]Castañón, Gerardo2022-04-28T19:52:42Z2022-04-28T19:52:42Z2022-04-01info:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/article2634-2642http://dx.doi.org/10.1364/AO.452938Applied Optics, v. 61, n. 10, p. 2634-2642, 2022.2155-31651559-128Xhttp://hdl.handle.net/11449/22372010.1364/AO.4529382-s2.0-85127164152Scopusreponame:Repositório Institucional da UNESPinstname:Universidade Estadual Paulista (UNESP)instacron:UNESPengApplied Opticsinfo:eu-repo/semantics/openAccess2022-04-28T19:52:42Zoai:repositorio.unesp.br:11449/223720Repositório InstitucionalPUBhttp://repositorio.unesp.br/oai/requestopendoar:29462024-05-23T21:09:53.563056Repositório Institucional da UNESP - Universidade Estadual Paulista (UNESP)false |
dc.title.none.fl_str_mv |
Numerical analysis of pulsing regimes near static borders of optically injected semiconductor lasers |
title |
Numerical analysis of pulsing regimes near static borders of optically injected semiconductor lasers |
spellingShingle |
Numerical analysis of pulsing regimes near static borders of optically injected semiconductor lasers Rodriguez, Sergio |
title_short |
Numerical analysis of pulsing regimes near static borders of optically injected semiconductor lasers |
title_full |
Numerical analysis of pulsing regimes near static borders of optically injected semiconductor lasers |
title_fullStr |
Numerical analysis of pulsing regimes near static borders of optically injected semiconductor lasers |
title_full_unstemmed |
Numerical analysis of pulsing regimes near static borders of optically injected semiconductor lasers |
title_sort |
Numerical analysis of pulsing regimes near static borders of optically injected semiconductor lasers |
author |
Rodriguez, Sergio |
author_facet |
Rodriguez, Sergio Campuzano, Gabriel Aldaya, Ivan [UNESP] Castañón, Gerardo |
author_role |
author |
author2 |
Campuzano, Gabriel Aldaya, Ivan [UNESP] Castañón, Gerardo |
author2_role |
author author author |
dc.contributor.none.fl_str_mv |
Tecnologico de Monterrey Universidade Estadual Paulista (UNESP) |
dc.contributor.author.fl_str_mv |
Rodriguez, Sergio Campuzano, Gabriel Aldaya, Ivan [UNESP] Castañón, Gerardo |
description |
It is well known that semiconductor lasers under optical injection present rich, dynamic behavior. In this paper, we focus on pulsing regimes, which can be either exploited in a broad variety of applications or lead to undesired instabilities. In particular, we develop a multi-metric method to automatically identify pulsing regimes in the parameter space.We apply this method to extensive numerical simulations to show that these regimes occur in the vicinity of the static synchronization boundary. Furthermore, analyzing these pulsing regimes, we identify pulsations with repetition rates ranging from several megahertz up to more than 1 GHz. Finally, we analyze the effect of the linewidth enhancement factor and the slave-laser bias current, revealing that a linewidth enhancement factor of 3 and a higher bias current lead to broader regions of pulsation regimes. |
publishDate |
2022 |
dc.date.none.fl_str_mv |
2022-04-28T19:52:42Z 2022-04-28T19:52:42Z 2022-04-01 |
dc.type.status.fl_str_mv |
info:eu-repo/semantics/publishedVersion |
dc.type.driver.fl_str_mv |
info:eu-repo/semantics/article |
format |
article |
status_str |
publishedVersion |
dc.identifier.uri.fl_str_mv |
http://dx.doi.org/10.1364/AO.452938 Applied Optics, v. 61, n. 10, p. 2634-2642, 2022. 2155-3165 1559-128X http://hdl.handle.net/11449/223720 10.1364/AO.452938 2-s2.0-85127164152 |
url |
http://dx.doi.org/10.1364/AO.452938 http://hdl.handle.net/11449/223720 |
identifier_str_mv |
Applied Optics, v. 61, n. 10, p. 2634-2642, 2022. 2155-3165 1559-128X 10.1364/AO.452938 2-s2.0-85127164152 |
dc.language.iso.fl_str_mv |
eng |
language |
eng |
dc.relation.none.fl_str_mv |
Applied Optics |
dc.rights.driver.fl_str_mv |
info:eu-repo/semantics/openAccess |
eu_rights_str_mv |
openAccess |
dc.format.none.fl_str_mv |
2634-2642 |
dc.source.none.fl_str_mv |
Scopus reponame:Repositório Institucional da UNESP instname:Universidade Estadual Paulista (UNESP) instacron:UNESP |
instname_str |
Universidade Estadual Paulista (UNESP) |
instacron_str |
UNESP |
institution |
UNESP |
reponame_str |
Repositório Institucional da UNESP |
collection |
Repositório Institucional da UNESP |
repository.name.fl_str_mv |
Repositório Institucional da UNESP - Universidade Estadual Paulista (UNESP) |
repository.mail.fl_str_mv |
|
_version_ |
1803045722684129280 |