Films deposited from reactive sputtering of aluminum acetylacetonate under low energy ion bombardment

Detalhes bibliográficos
Autor(a) principal: Battaglin, Felipe Augusto Darriba [UNESP]
Data de Publicação: 2017
Outros Autores: Prado, Eduardo Silva [UNESP], Caseli, Luciano, Da Silva, Tiago Fiorini, Tabacniks, Manfredo Harri, Da Cruz, Nilson Cristino [UNESP], Rangel, Elidiane Cipriano [UNESP]
Tipo de documento: Artigo
Idioma: eng
Título da fonte: Repositório Institucional da UNESP
Texto Completo: http://dx.doi.org/10.1590/1980-5373-MR-2016-0647
http://hdl.handle.net/11449/179174
Resumo: Films were deposited from aluminum acetylacetonate (Al(acac)3) using a methodology involving reactive sputtering and low energy ion bombardment. The plasma was generated by the application of radiofrequency power to the powder containing electrode and simultaneously, negative pulses were supplied to the electrode where the substrates were attached. It was investigated the effect of the duty cycle of the pulses (Δ) on the properties of the coatings. Association of ion bombardment to the deposition process increased film thickness, structure reticulation and organic content. Ions from the deposition environment were implanted at the film-air interface or underneath it. Morphology and topography were altered depending on Δ. Considering the enhancement of Δ, it affected the flux of ions reaching the depositing interface and then the deposition rate, H content, crosslinking degree and surface microstructure. Alumina groups were detected in the infrared spectra, whereas the precipitation of amorphous alumina was confirmed by X-ray diffraction.
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spelling Films deposited from reactive sputtering of aluminum acetylacetonate under low energy ion bombardmentAluminum acetylacetonateDuty cycleIon bombardmentFilms were deposited from aluminum acetylacetonate (Al(acac)3) using a methodology involving reactive sputtering and low energy ion bombardment. The plasma was generated by the application of radiofrequency power to the powder containing electrode and simultaneously, negative pulses were supplied to the electrode where the substrates were attached. It was investigated the effect of the duty cycle of the pulses (Δ) on the properties of the coatings. Association of ion bombardment to the deposition process increased film thickness, structure reticulation and organic content. Ions from the deposition environment were implanted at the film-air interface or underneath it. Morphology and topography were altered depending on Δ. Considering the enhancement of Δ, it affected the flux of ions reaching the depositing interface and then the deposition rate, H content, crosslinking degree and surface microstructure. Alumina groups were detected in the infrared spectra, whereas the precipitation of amorphous alumina was confirmed by X-ray diffraction.Technological Plasmas Laboratory Universidade Estadual Paulista - UNESP Institute of Science and Technology of Sorocaba - ICTS, Av. Três de Março, 211Institute of Environmental Chemical and Pharmaceutical Sciences Universidade Federal de São Paulo - UNIFESP, Rua São Nicolau, 210Institute of Physics Universidade de São Paulo - USP Cidade Universitária, Rua do Matão, 1371Technological Plasmas Laboratory Universidade Estadual Paulista - UNESP Institute of Science and Technology of Sorocaba - ICTS, Av. Três de Março, 211Universidade Estadual Paulista (Unesp)Universidade Federal de São Paulo (UNIFESP)Universidade de São Paulo (USP)Battaglin, Felipe Augusto Darriba [UNESP]Prado, Eduardo Silva [UNESP]Caseli, LucianoDa Silva, Tiago FioriniTabacniks, Manfredo HarriDa Cruz, Nilson Cristino [UNESP]Rangel, Elidiane Cipriano [UNESP]2018-12-11T17:34:05Z2018-12-11T17:34:05Z2017-07-01info:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/article926-936application/pdfhttp://dx.doi.org/10.1590/1980-5373-MR-2016-0647Materials Research, v. 20, n. 4, p. 926-936, 2017.1516-1439http://hdl.handle.net/11449/17917410.1590/1980-5373-MR-2016-0647S1516-143920170004009262-s2.0-85029474543S1516-14392017000400926.pdfScopusreponame:Repositório Institucional da UNESPinstname:Universidade Estadual Paulista (UNESP)instacron:UNESPengMaterials Research0,398info:eu-repo/semantics/openAccess2023-11-28T06:10:57Zoai:repositorio.unesp.br:11449/179174Repositório InstitucionalPUBhttp://repositorio.unesp.br/oai/requestopendoar:29462024-08-05T18:54:42.329195Repositório Institucional da UNESP - Universidade Estadual Paulista (UNESP)false
dc.title.none.fl_str_mv Films deposited from reactive sputtering of aluminum acetylacetonate under low energy ion bombardment
title Films deposited from reactive sputtering of aluminum acetylacetonate under low energy ion bombardment
spellingShingle Films deposited from reactive sputtering of aluminum acetylacetonate under low energy ion bombardment
Battaglin, Felipe Augusto Darriba [UNESP]
Aluminum acetylacetonate
Duty cycle
Ion bombardment
title_short Films deposited from reactive sputtering of aluminum acetylacetonate under low energy ion bombardment
title_full Films deposited from reactive sputtering of aluminum acetylacetonate under low energy ion bombardment
title_fullStr Films deposited from reactive sputtering of aluminum acetylacetonate under low energy ion bombardment
title_full_unstemmed Films deposited from reactive sputtering of aluminum acetylacetonate under low energy ion bombardment
title_sort Films deposited from reactive sputtering of aluminum acetylacetonate under low energy ion bombardment
author Battaglin, Felipe Augusto Darriba [UNESP]
author_facet Battaglin, Felipe Augusto Darriba [UNESP]
Prado, Eduardo Silva [UNESP]
Caseli, Luciano
Da Silva, Tiago Fiorini
Tabacniks, Manfredo Harri
Da Cruz, Nilson Cristino [UNESP]
Rangel, Elidiane Cipriano [UNESP]
author_role author
author2 Prado, Eduardo Silva [UNESP]
Caseli, Luciano
Da Silva, Tiago Fiorini
Tabacniks, Manfredo Harri
Da Cruz, Nilson Cristino [UNESP]
Rangel, Elidiane Cipriano [UNESP]
author2_role author
author
author
author
author
author
dc.contributor.none.fl_str_mv Universidade Estadual Paulista (Unesp)
Universidade Federal de São Paulo (UNIFESP)
Universidade de São Paulo (USP)
dc.contributor.author.fl_str_mv Battaglin, Felipe Augusto Darriba [UNESP]
Prado, Eduardo Silva [UNESP]
Caseli, Luciano
Da Silva, Tiago Fiorini
Tabacniks, Manfredo Harri
Da Cruz, Nilson Cristino [UNESP]
Rangel, Elidiane Cipriano [UNESP]
dc.subject.por.fl_str_mv Aluminum acetylacetonate
Duty cycle
Ion bombardment
topic Aluminum acetylacetonate
Duty cycle
Ion bombardment
description Films were deposited from aluminum acetylacetonate (Al(acac)3) using a methodology involving reactive sputtering and low energy ion bombardment. The plasma was generated by the application of radiofrequency power to the powder containing electrode and simultaneously, negative pulses were supplied to the electrode where the substrates were attached. It was investigated the effect of the duty cycle of the pulses (Δ) on the properties of the coatings. Association of ion bombardment to the deposition process increased film thickness, structure reticulation and organic content. Ions from the deposition environment were implanted at the film-air interface or underneath it. Morphology and topography were altered depending on Δ. Considering the enhancement of Δ, it affected the flux of ions reaching the depositing interface and then the deposition rate, H content, crosslinking degree and surface microstructure. Alumina groups were detected in the infrared spectra, whereas the precipitation of amorphous alumina was confirmed by X-ray diffraction.
publishDate 2017
dc.date.none.fl_str_mv 2017-07-01
2018-12-11T17:34:05Z
2018-12-11T17:34:05Z
dc.type.status.fl_str_mv info:eu-repo/semantics/publishedVersion
dc.type.driver.fl_str_mv info:eu-repo/semantics/article
format article
status_str publishedVersion
dc.identifier.uri.fl_str_mv http://dx.doi.org/10.1590/1980-5373-MR-2016-0647
Materials Research, v. 20, n. 4, p. 926-936, 2017.
1516-1439
http://hdl.handle.net/11449/179174
10.1590/1980-5373-MR-2016-0647
S1516-14392017000400926
2-s2.0-85029474543
S1516-14392017000400926.pdf
url http://dx.doi.org/10.1590/1980-5373-MR-2016-0647
http://hdl.handle.net/11449/179174
identifier_str_mv Materials Research, v. 20, n. 4, p. 926-936, 2017.
1516-1439
10.1590/1980-5373-MR-2016-0647
S1516-14392017000400926
2-s2.0-85029474543
S1516-14392017000400926.pdf
dc.language.iso.fl_str_mv eng
language eng
dc.relation.none.fl_str_mv Materials Research
0,398
dc.rights.driver.fl_str_mv info:eu-repo/semantics/openAccess
eu_rights_str_mv openAccess
dc.format.none.fl_str_mv 926-936
application/pdf
dc.source.none.fl_str_mv Scopus
reponame:Repositório Institucional da UNESP
instname:Universidade Estadual Paulista (UNESP)
instacron:UNESP
instname_str Universidade Estadual Paulista (UNESP)
instacron_str UNESP
institution UNESP
reponame_str Repositório Institucional da UNESP
collection Repositório Institucional da UNESP
repository.name.fl_str_mv Repositório Institucional da UNESP - Universidade Estadual Paulista (UNESP)
repository.mail.fl_str_mv
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