Effect of the admixture of N2to low pressure, low temperature H2-CH4-CO2microwave plasmas used for large area deposition of nanocrystalline diamond films

Detalhes bibliográficos
Autor(a) principal: Dekkar, D.
Data de Publicação: 2020
Outros Autores: Puth, A., Bisceglia, E., Moreira, P. W.P. [UNESP], Pipa, A. V., Lombardi, G., Röpcke, J., Van Helden, J. H., Bénédic, F.
Tipo de documento: Artigo
Idioma: eng
Título da fonte: Repositório Institucional da UNESP
Texto Completo: http://dx.doi.org/10.1088/1361-6463/aba7df
http://hdl.handle.net/11449/199339
Resumo: In a distributed antenna array reactor, microwave H2-CH4-CO2 plasmas with admixture of N2 used for the low-temperature deposition of nanocrystalline diamond (NCD) films are studied by in situ infrared laser absorption spectroscopy (LAS) and optical emission spectroscopy techniques. The experiments are carried out in order to analyze the dependence of temperatures and species densities as a function of the admixture of nitrogen. The evolution of the concentrations of the methyl radical (CH3), and of five stable molecules (NH3, HCN, CH4, C2H2, and CO), are monitored in the plasma processes by LAS using tunable lead salt diode lasers and external-cavity quantum cascade lasers (EC-QCL) as radiation sources. OES is performed simultaneously to obtain complementary information about (i) the degree of dissociation of H2 precursor gas, (ii) the gas temperature and therefore (iii) the density of atomic hydrogen, a key species in the chemistry of NCD deposition plasmas. The species temperatures are not significantly affected by the nitrogen addition. The concentrations of the various species are in the range between 1011 to 1015 molecules cm-3. HCN and CO are the major products in the plasma besides atomic hydrogen. The analysis of the nitrogen and carbon mass balances of the measured species shows that in addition to NH3 and HCN other nitrogen containing species are produced in the plasma which were not probed. It is shown that the formation of HCN consumes C atoms that can be provided from hydrocarbon species and from the deposition of carbon-containing films on the reactor walls, which results in a decrease of the measured densities of hydrocarbon species.
id UNSP_94f10bd29e5781b78e5f851dc34a97cf
oai_identifier_str oai:repositorio.unesp.br:11449/199339
network_acronym_str UNSP
network_name_str Repositório Institucional da UNESP
repository_id_str 2946
spelling Effect of the admixture of N2to low pressure, low temperature H2-CH4-CO2microwave plasmas used for large area deposition of nanocrystalline diamond filmsinfrared absorption spectroscopymicrowave plasmasplasma chemistryplasma diagnostic techniques and instrumentationplasma for diamond depositionplasma reactionsIn a distributed antenna array reactor, microwave H2-CH4-CO2 plasmas with admixture of N2 used for the low-temperature deposition of nanocrystalline diamond (NCD) films are studied by in situ infrared laser absorption spectroscopy (LAS) and optical emission spectroscopy techniques. The experiments are carried out in order to analyze the dependence of temperatures and species densities as a function of the admixture of nitrogen. The evolution of the concentrations of the methyl radical (CH3), and of five stable molecules (NH3, HCN, CH4, C2H2, and CO), are monitored in the plasma processes by LAS using tunable lead salt diode lasers and external-cavity quantum cascade lasers (EC-QCL) as radiation sources. OES is performed simultaneously to obtain complementary information about (i) the degree of dissociation of H2 precursor gas, (ii) the gas temperature and therefore (iii) the density of atomic hydrogen, a key species in the chemistry of NCD deposition plasmas. The species temperatures are not significantly affected by the nitrogen addition. The concentrations of the various species are in the range between 1011 to 1015 molecules cm-3. HCN and CO are the major products in the plasma besides atomic hydrogen. The analysis of the nitrogen and carbon mass balances of the measured species shows that in addition to NH3 and HCN other nitrogen containing species are produced in the plasma which were not probed. It is shown that the formation of HCN consumes C atoms that can be provided from hydrocarbon species and from the deposition of carbon-containing films on the reactor walls, which results in a decrease of the measured densities of hydrocarbon species.Université Sorbonne Paris Nord LSPM CNRS UPR 3407Leibniz Institute for Plasma Science and Technology (INP), Felix-Hausdorff-Str. 2Faculty of Engineering FEG São Paulo State University (UNESP)Faculty of Engineering FEG São Paulo State University (UNESP)UPR 3407Leibniz Institute for Plasma Science and Technology (INP)Universidade Estadual Paulista (Unesp)Dekkar, D.Puth, A.Bisceglia, E.Moreira, P. W.P. [UNESP]Pipa, A. V.Lombardi, G.Röpcke, J.Van Helden, J. H.Bénédic, F.2020-12-12T01:37:09Z2020-12-12T01:37:09Z2020-11-04info:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/articlehttp://dx.doi.org/10.1088/1361-6463/aba7dfJournal of Physics D: Applied Physics, v. 53, n. 45, 2020.1361-64630022-3727http://hdl.handle.net/11449/19933910.1088/1361-6463/aba7df2-s2.0-85090274171Scopusreponame:Repositório Institucional da UNESPinstname:Universidade Estadual Paulista (UNESP)instacron:UNESPengJournal of Physics D: Applied Physicsinfo:eu-repo/semantics/openAccess2021-10-23T07:21:24Zoai:repositorio.unesp.br:11449/199339Repositório InstitucionalPUBhttp://repositorio.unesp.br/oai/requestopendoar:29462021-10-23T07:21:24Repositório Institucional da UNESP - Universidade Estadual Paulista (UNESP)false
dc.title.none.fl_str_mv Effect of the admixture of N2to low pressure, low temperature H2-CH4-CO2microwave plasmas used for large area deposition of nanocrystalline diamond films
title Effect of the admixture of N2to low pressure, low temperature H2-CH4-CO2microwave plasmas used for large area deposition of nanocrystalline diamond films
spellingShingle Effect of the admixture of N2to low pressure, low temperature H2-CH4-CO2microwave plasmas used for large area deposition of nanocrystalline diamond films
Dekkar, D.
infrared absorption spectroscopy
microwave plasmas
plasma chemistry
plasma diagnostic techniques and instrumentation
plasma for diamond deposition
plasma reactions
title_short Effect of the admixture of N2to low pressure, low temperature H2-CH4-CO2microwave plasmas used for large area deposition of nanocrystalline diamond films
title_full Effect of the admixture of N2to low pressure, low temperature H2-CH4-CO2microwave plasmas used for large area deposition of nanocrystalline diamond films
title_fullStr Effect of the admixture of N2to low pressure, low temperature H2-CH4-CO2microwave plasmas used for large area deposition of nanocrystalline diamond films
title_full_unstemmed Effect of the admixture of N2to low pressure, low temperature H2-CH4-CO2microwave plasmas used for large area deposition of nanocrystalline diamond films
title_sort Effect of the admixture of N2to low pressure, low temperature H2-CH4-CO2microwave plasmas used for large area deposition of nanocrystalline diamond films
author Dekkar, D.
author_facet Dekkar, D.
Puth, A.
Bisceglia, E.
Moreira, P. W.P. [UNESP]
Pipa, A. V.
Lombardi, G.
Röpcke, J.
Van Helden, J. H.
Bénédic, F.
author_role author
author2 Puth, A.
Bisceglia, E.
Moreira, P. W.P. [UNESP]
Pipa, A. V.
Lombardi, G.
Röpcke, J.
Van Helden, J. H.
Bénédic, F.
author2_role author
author
author
author
author
author
author
author
dc.contributor.none.fl_str_mv UPR 3407
Leibniz Institute for Plasma Science and Technology (INP)
Universidade Estadual Paulista (Unesp)
dc.contributor.author.fl_str_mv Dekkar, D.
Puth, A.
Bisceglia, E.
Moreira, P. W.P. [UNESP]
Pipa, A. V.
Lombardi, G.
Röpcke, J.
Van Helden, J. H.
Bénédic, F.
dc.subject.por.fl_str_mv infrared absorption spectroscopy
microwave plasmas
plasma chemistry
plasma diagnostic techniques and instrumentation
plasma for diamond deposition
plasma reactions
topic infrared absorption spectroscopy
microwave plasmas
plasma chemistry
plasma diagnostic techniques and instrumentation
plasma for diamond deposition
plasma reactions
description In a distributed antenna array reactor, microwave H2-CH4-CO2 plasmas with admixture of N2 used for the low-temperature deposition of nanocrystalline diamond (NCD) films are studied by in situ infrared laser absorption spectroscopy (LAS) and optical emission spectroscopy techniques. The experiments are carried out in order to analyze the dependence of temperatures and species densities as a function of the admixture of nitrogen. The evolution of the concentrations of the methyl radical (CH3), and of five stable molecules (NH3, HCN, CH4, C2H2, and CO), are monitored in the plasma processes by LAS using tunable lead salt diode lasers and external-cavity quantum cascade lasers (EC-QCL) as radiation sources. OES is performed simultaneously to obtain complementary information about (i) the degree of dissociation of H2 precursor gas, (ii) the gas temperature and therefore (iii) the density of atomic hydrogen, a key species in the chemistry of NCD deposition plasmas. The species temperatures are not significantly affected by the nitrogen addition. The concentrations of the various species are in the range between 1011 to 1015 molecules cm-3. HCN and CO are the major products in the plasma besides atomic hydrogen. The analysis of the nitrogen and carbon mass balances of the measured species shows that in addition to NH3 and HCN other nitrogen containing species are produced in the plasma which were not probed. It is shown that the formation of HCN consumes C atoms that can be provided from hydrocarbon species and from the deposition of carbon-containing films on the reactor walls, which results in a decrease of the measured densities of hydrocarbon species.
publishDate 2020
dc.date.none.fl_str_mv 2020-12-12T01:37:09Z
2020-12-12T01:37:09Z
2020-11-04
dc.type.status.fl_str_mv info:eu-repo/semantics/publishedVersion
dc.type.driver.fl_str_mv info:eu-repo/semantics/article
format article
status_str publishedVersion
dc.identifier.uri.fl_str_mv http://dx.doi.org/10.1088/1361-6463/aba7df
Journal of Physics D: Applied Physics, v. 53, n. 45, 2020.
1361-6463
0022-3727
http://hdl.handle.net/11449/199339
10.1088/1361-6463/aba7df
2-s2.0-85090274171
url http://dx.doi.org/10.1088/1361-6463/aba7df
http://hdl.handle.net/11449/199339
identifier_str_mv Journal of Physics D: Applied Physics, v. 53, n. 45, 2020.
1361-6463
0022-3727
10.1088/1361-6463/aba7df
2-s2.0-85090274171
dc.language.iso.fl_str_mv eng
language eng
dc.relation.none.fl_str_mv Journal of Physics D: Applied Physics
dc.rights.driver.fl_str_mv info:eu-repo/semantics/openAccess
eu_rights_str_mv openAccess
dc.source.none.fl_str_mv Scopus
reponame:Repositório Institucional da UNESP
instname:Universidade Estadual Paulista (UNESP)
instacron:UNESP
instname_str Universidade Estadual Paulista (UNESP)
instacron_str UNESP
institution UNESP
reponame_str Repositório Institucional da UNESP
collection Repositório Institucional da UNESP
repository.name.fl_str_mv Repositório Institucional da UNESP - Universidade Estadual Paulista (UNESP)
repository.mail.fl_str_mv
_version_ 1799964671987417088