Effect of the admixture of N2to low pressure, low temperature H2-CH4-CO2microwave plasmas used for large area deposition of nanocrystalline diamond films
Autor(a) principal: | |
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Data de Publicação: | 2020 |
Outros Autores: | , , , , , , , |
Tipo de documento: | Artigo |
Idioma: | eng |
Título da fonte: | Repositório Institucional da UNESP |
Texto Completo: | http://dx.doi.org/10.1088/1361-6463/aba7df http://hdl.handle.net/11449/199339 |
Resumo: | In a distributed antenna array reactor, microwave H2-CH4-CO2 plasmas with admixture of N2 used for the low-temperature deposition of nanocrystalline diamond (NCD) films are studied by in situ infrared laser absorption spectroscopy (LAS) and optical emission spectroscopy techniques. The experiments are carried out in order to analyze the dependence of temperatures and species densities as a function of the admixture of nitrogen. The evolution of the concentrations of the methyl radical (CH3), and of five stable molecules (NH3, HCN, CH4, C2H2, and CO), are monitored in the plasma processes by LAS using tunable lead salt diode lasers and external-cavity quantum cascade lasers (EC-QCL) as radiation sources. OES is performed simultaneously to obtain complementary information about (i) the degree of dissociation of H2 precursor gas, (ii) the gas temperature and therefore (iii) the density of atomic hydrogen, a key species in the chemistry of NCD deposition plasmas. The species temperatures are not significantly affected by the nitrogen addition. The concentrations of the various species are in the range between 1011 to 1015 molecules cm-3. HCN and CO are the major products in the plasma besides atomic hydrogen. The analysis of the nitrogen and carbon mass balances of the measured species shows that in addition to NH3 and HCN other nitrogen containing species are produced in the plasma which were not probed. It is shown that the formation of HCN consumes C atoms that can be provided from hydrocarbon species and from the deposition of carbon-containing films on the reactor walls, which results in a decrease of the measured densities of hydrocarbon species. |
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Effect of the admixture of N2to low pressure, low temperature H2-CH4-CO2microwave plasmas used for large area deposition of nanocrystalline diamond filmsinfrared absorption spectroscopymicrowave plasmasplasma chemistryplasma diagnostic techniques and instrumentationplasma for diamond depositionplasma reactionsIn a distributed antenna array reactor, microwave H2-CH4-CO2 plasmas with admixture of N2 used for the low-temperature deposition of nanocrystalline diamond (NCD) films are studied by in situ infrared laser absorption spectroscopy (LAS) and optical emission spectroscopy techniques. The experiments are carried out in order to analyze the dependence of temperatures and species densities as a function of the admixture of nitrogen. The evolution of the concentrations of the methyl radical (CH3), and of five stable molecules (NH3, HCN, CH4, C2H2, and CO), are monitored in the plasma processes by LAS using tunable lead salt diode lasers and external-cavity quantum cascade lasers (EC-QCL) as radiation sources. OES is performed simultaneously to obtain complementary information about (i) the degree of dissociation of H2 precursor gas, (ii) the gas temperature and therefore (iii) the density of atomic hydrogen, a key species in the chemistry of NCD deposition plasmas. The species temperatures are not significantly affected by the nitrogen addition. The concentrations of the various species are in the range between 1011 to 1015 molecules cm-3. HCN and CO are the major products in the plasma besides atomic hydrogen. The analysis of the nitrogen and carbon mass balances of the measured species shows that in addition to NH3 and HCN other nitrogen containing species are produced in the plasma which were not probed. It is shown that the formation of HCN consumes C atoms that can be provided from hydrocarbon species and from the deposition of carbon-containing films on the reactor walls, which results in a decrease of the measured densities of hydrocarbon species.Université Sorbonne Paris Nord LSPM CNRS UPR 3407Leibniz Institute for Plasma Science and Technology (INP), Felix-Hausdorff-Str. 2Faculty of Engineering FEG São Paulo State University (UNESP)Faculty of Engineering FEG São Paulo State University (UNESP)UPR 3407Leibniz Institute for Plasma Science and Technology (INP)Universidade Estadual Paulista (Unesp)Dekkar, D.Puth, A.Bisceglia, E.Moreira, P. W.P. [UNESP]Pipa, A. V.Lombardi, G.Röpcke, J.Van Helden, J. H.Bénédic, F.2020-12-12T01:37:09Z2020-12-12T01:37:09Z2020-11-04info:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/articlehttp://dx.doi.org/10.1088/1361-6463/aba7dfJournal of Physics D: Applied Physics, v. 53, n. 45, 2020.1361-64630022-3727http://hdl.handle.net/11449/19933910.1088/1361-6463/aba7df2-s2.0-85090274171Scopusreponame:Repositório Institucional da UNESPinstname:Universidade Estadual Paulista (UNESP)instacron:UNESPengJournal of Physics D: Applied Physicsinfo:eu-repo/semantics/openAccess2021-10-23T07:21:24Zoai:repositorio.unesp.br:11449/199339Repositório InstitucionalPUBhttp://repositorio.unesp.br/oai/requestopendoar:29462021-10-23T07:21:24Repositório Institucional da UNESP - Universidade Estadual Paulista (UNESP)false |
dc.title.none.fl_str_mv |
Effect of the admixture of N2to low pressure, low temperature H2-CH4-CO2microwave plasmas used for large area deposition of nanocrystalline diamond films |
title |
Effect of the admixture of N2to low pressure, low temperature H2-CH4-CO2microwave plasmas used for large area deposition of nanocrystalline diamond films |
spellingShingle |
Effect of the admixture of N2to low pressure, low temperature H2-CH4-CO2microwave plasmas used for large area deposition of nanocrystalline diamond films Dekkar, D. infrared absorption spectroscopy microwave plasmas plasma chemistry plasma diagnostic techniques and instrumentation plasma for diamond deposition plasma reactions |
title_short |
Effect of the admixture of N2to low pressure, low temperature H2-CH4-CO2microwave plasmas used for large area deposition of nanocrystalline diamond films |
title_full |
Effect of the admixture of N2to low pressure, low temperature H2-CH4-CO2microwave plasmas used for large area deposition of nanocrystalline diamond films |
title_fullStr |
Effect of the admixture of N2to low pressure, low temperature H2-CH4-CO2microwave plasmas used for large area deposition of nanocrystalline diamond films |
title_full_unstemmed |
Effect of the admixture of N2to low pressure, low temperature H2-CH4-CO2microwave plasmas used for large area deposition of nanocrystalline diamond films |
title_sort |
Effect of the admixture of N2to low pressure, low temperature H2-CH4-CO2microwave plasmas used for large area deposition of nanocrystalline diamond films |
author |
Dekkar, D. |
author_facet |
Dekkar, D. Puth, A. Bisceglia, E. Moreira, P. W.P. [UNESP] Pipa, A. V. Lombardi, G. Röpcke, J. Van Helden, J. H. Bénédic, F. |
author_role |
author |
author2 |
Puth, A. Bisceglia, E. Moreira, P. W.P. [UNESP] Pipa, A. V. Lombardi, G. Röpcke, J. Van Helden, J. H. Bénédic, F. |
author2_role |
author author author author author author author author |
dc.contributor.none.fl_str_mv |
UPR 3407 Leibniz Institute for Plasma Science and Technology (INP) Universidade Estadual Paulista (Unesp) |
dc.contributor.author.fl_str_mv |
Dekkar, D. Puth, A. Bisceglia, E. Moreira, P. W.P. [UNESP] Pipa, A. V. Lombardi, G. Röpcke, J. Van Helden, J. H. Bénédic, F. |
dc.subject.por.fl_str_mv |
infrared absorption spectroscopy microwave plasmas plasma chemistry plasma diagnostic techniques and instrumentation plasma for diamond deposition plasma reactions |
topic |
infrared absorption spectroscopy microwave plasmas plasma chemistry plasma diagnostic techniques and instrumentation plasma for diamond deposition plasma reactions |
description |
In a distributed antenna array reactor, microwave H2-CH4-CO2 plasmas with admixture of N2 used for the low-temperature deposition of nanocrystalline diamond (NCD) films are studied by in situ infrared laser absorption spectroscopy (LAS) and optical emission spectroscopy techniques. The experiments are carried out in order to analyze the dependence of temperatures and species densities as a function of the admixture of nitrogen. The evolution of the concentrations of the methyl radical (CH3), and of five stable molecules (NH3, HCN, CH4, C2H2, and CO), are monitored in the plasma processes by LAS using tunable lead salt diode lasers and external-cavity quantum cascade lasers (EC-QCL) as radiation sources. OES is performed simultaneously to obtain complementary information about (i) the degree of dissociation of H2 precursor gas, (ii) the gas temperature and therefore (iii) the density of atomic hydrogen, a key species in the chemistry of NCD deposition plasmas. The species temperatures are not significantly affected by the nitrogen addition. The concentrations of the various species are in the range between 1011 to 1015 molecules cm-3. HCN and CO are the major products in the plasma besides atomic hydrogen. The analysis of the nitrogen and carbon mass balances of the measured species shows that in addition to NH3 and HCN other nitrogen containing species are produced in the plasma which were not probed. It is shown that the formation of HCN consumes C atoms that can be provided from hydrocarbon species and from the deposition of carbon-containing films on the reactor walls, which results in a decrease of the measured densities of hydrocarbon species. |
publishDate |
2020 |
dc.date.none.fl_str_mv |
2020-12-12T01:37:09Z 2020-12-12T01:37:09Z 2020-11-04 |
dc.type.status.fl_str_mv |
info:eu-repo/semantics/publishedVersion |
dc.type.driver.fl_str_mv |
info:eu-repo/semantics/article |
format |
article |
status_str |
publishedVersion |
dc.identifier.uri.fl_str_mv |
http://dx.doi.org/10.1088/1361-6463/aba7df Journal of Physics D: Applied Physics, v. 53, n. 45, 2020. 1361-6463 0022-3727 http://hdl.handle.net/11449/199339 10.1088/1361-6463/aba7df 2-s2.0-85090274171 |
url |
http://dx.doi.org/10.1088/1361-6463/aba7df http://hdl.handle.net/11449/199339 |
identifier_str_mv |
Journal of Physics D: Applied Physics, v. 53, n. 45, 2020. 1361-6463 0022-3727 10.1088/1361-6463/aba7df 2-s2.0-85090274171 |
dc.language.iso.fl_str_mv |
eng |
language |
eng |
dc.relation.none.fl_str_mv |
Journal of Physics D: Applied Physics |
dc.rights.driver.fl_str_mv |
info:eu-repo/semantics/openAccess |
eu_rights_str_mv |
openAccess |
dc.source.none.fl_str_mv |
Scopus reponame:Repositório Institucional da UNESP instname:Universidade Estadual Paulista (UNESP) instacron:UNESP |
instname_str |
Universidade Estadual Paulista (UNESP) |
instacron_str |
UNESP |
institution |
UNESP |
reponame_str |
Repositório Institucional da UNESP |
collection |
Repositório Institucional da UNESP |
repository.name.fl_str_mv |
Repositório Institucional da UNESP - Universidade Estadual Paulista (UNESP) |
repository.mail.fl_str_mv |
|
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1799964671987417088 |