Sn3O4 exfoliation process investigated by density functional theory and modern scotch-tape experiment

Detalhes bibliográficos
Autor(a) principal: Freire, Rafael L. H. [UNESP]
Data de Publicação: 2019
Outros Autores: Masteghin, Mateus G. [UNESP], Da Silva, Juarez L. F., Orlandi, Marcelo O. [UNESP]
Tipo de documento: Artigo
Idioma: eng
Título da fonte: Repositório Institucional da UNESP
Texto Completo: http://dx.doi.org/10.1016/j.commatsci.2019.109160
http://hdl.handle.net/11449/196345
Resumo: Van der Waals (vdW) layered materials have been receiving a great deal of attention, especially after the scotch-tape experiment using graphite and the unique properties of graphene. Sn3O4, which also presents a layered structure, has been widely employed in a variety of technologies, but without further understanding of its bulk properties. For the first time, a modern Scotch-tape nanomanipulation experiment carried on a Dual Beam Microscope is combined with Density Functional Theory to investigate the Sn3O4 bulk properties. Theoretically, we have shown that the interaction energy between Sn3O4 layers are in the same order of graphene layers (21 meV angstrom(-2)), indicating its vdW interaction nature, whereas for SnO is slightly stronger (26 meV angstrom(-2)). Then, the Dual Beam Microscope nanomanipulation of the Sn3O4 nanobelts revealed the weak layer-layer interactions along their stacking direction (plane (010)). Comparatively, when probing SnO and SnO2 nanobelts, no exfoliation could be seen. The study of Sn3O4 electronic structure properties also presents the important role of the interfacial region to the valence and conduction band and, consequently, to the material band-gap. The outcome of this study will help improving some applications, e.g., knowing the total and local density of states can help understanding surface band bending following gases adsorption. To the best of our knowledge, this is the first study to show, combining experimental and theoretical techniques, Sn3O4 as a promising 2D material.
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spelling Sn3O4 exfoliation process investigated by density functional theory and modern scotch-tape experimentSemiconductorsSn3O4density functional theoryAb initio simulationsFIBVan der Waals (vdW) layered materials have been receiving a great deal of attention, especially after the scotch-tape experiment using graphite and the unique properties of graphene. Sn3O4, which also presents a layered structure, has been widely employed in a variety of technologies, but without further understanding of its bulk properties. For the first time, a modern Scotch-tape nanomanipulation experiment carried on a Dual Beam Microscope is combined with Density Functional Theory to investigate the Sn3O4 bulk properties. Theoretically, we have shown that the interaction energy between Sn3O4 layers are in the same order of graphene layers (21 meV angstrom(-2)), indicating its vdW interaction nature, whereas for SnO is slightly stronger (26 meV angstrom(-2)). Then, the Dual Beam Microscope nanomanipulation of the Sn3O4 nanobelts revealed the weak layer-layer interactions along their stacking direction (plane (010)). Comparatively, when probing SnO and SnO2 nanobelts, no exfoliation could be seen. The study of Sn3O4 electronic structure properties also presents the important role of the interfacial region to the valence and conduction band and, consequently, to the material band-gap. The outcome of this study will help improving some applications, e.g., knowing the total and local density of states can help understanding surface band bending following gases adsorption. To the best of our knowledge, this is the first study to show, combining experimental and theoretical techniques, Sn3O4 as a promising 2D material.Fundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP)ShellANP (Brazil's National Oil, Natural Gas and Biofuels Agency) through the R&D levy regulationConselho Nacional de Desenvolvimento Científico e Tecnológico (CNPq)Beijing Computat Sci Res Ctr, Beijing 100193, Peoples R ChinaSao Paulo State Univ, Inst Chem, Dept Phys Chem, BR-14800060 Araraquara, SP, BrazilUniv Surrey, Adv Technol Inst, Guildford GU2 7XH, Surrey, EnglandUniv Sao Paulo, Sao Carlos Inst Chem, POB 780, BR-13560970 Sao Carlos, SP, BrazilSao Paulo State Univ, Inst Chem, Dept Phys Chem, BR-14800060 Araraquara, SP, BrazilFAPESP: 2017/11631-2FAPESP: 2017/26219-0CNPq: 443138/2016-8CNPq: 303542/2015-2Elsevier B.V.Beijing Computat Sci Res CtrUniversidade Estadual Paulista (Unesp)Univ SurreyUniversidade de São Paulo (USP)Freire, Rafael L. H. [UNESP]Masteghin, Mateus G. [UNESP]Da Silva, Juarez L. F.Orlandi, Marcelo O. [UNESP]2020-12-10T19:41:41Z2020-12-10T19:41:41Z2019-12-01info:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/article7http://dx.doi.org/10.1016/j.commatsci.2019.109160Computational Materials Science. Amsterdam: Elsevier, v. 170, 7 p., 2019.0927-0256http://hdl.handle.net/11449/19634510.1016/j.commatsci.2019.109160WOS:000498062100022Web of Sciencereponame:Repositório Institucional da UNESPinstname:Universidade Estadual Paulista (UNESP)instacron:UNESPengComputational Materials Scienceinfo:eu-repo/semantics/openAccess2021-10-23T07:14:38Zoai:repositorio.unesp.br:11449/196345Repositório InstitucionalPUBhttp://repositorio.unesp.br/oai/requestopendoar:29462024-08-05T16:17:40.272299Repositório Institucional da UNESP - Universidade Estadual Paulista (UNESP)false
dc.title.none.fl_str_mv Sn3O4 exfoliation process investigated by density functional theory and modern scotch-tape experiment
title Sn3O4 exfoliation process investigated by density functional theory and modern scotch-tape experiment
spellingShingle Sn3O4 exfoliation process investigated by density functional theory and modern scotch-tape experiment
Freire, Rafael L. H. [UNESP]
Semiconductors
Sn3O4
density functional theory
Ab initio simulations
FIB
title_short Sn3O4 exfoliation process investigated by density functional theory and modern scotch-tape experiment
title_full Sn3O4 exfoliation process investigated by density functional theory and modern scotch-tape experiment
title_fullStr Sn3O4 exfoliation process investigated by density functional theory and modern scotch-tape experiment
title_full_unstemmed Sn3O4 exfoliation process investigated by density functional theory and modern scotch-tape experiment
title_sort Sn3O4 exfoliation process investigated by density functional theory and modern scotch-tape experiment
author Freire, Rafael L. H. [UNESP]
author_facet Freire, Rafael L. H. [UNESP]
Masteghin, Mateus G. [UNESP]
Da Silva, Juarez L. F.
Orlandi, Marcelo O. [UNESP]
author_role author
author2 Masteghin, Mateus G. [UNESP]
Da Silva, Juarez L. F.
Orlandi, Marcelo O. [UNESP]
author2_role author
author
author
dc.contributor.none.fl_str_mv Beijing Computat Sci Res Ctr
Universidade Estadual Paulista (Unesp)
Univ Surrey
Universidade de São Paulo (USP)
dc.contributor.author.fl_str_mv Freire, Rafael L. H. [UNESP]
Masteghin, Mateus G. [UNESP]
Da Silva, Juarez L. F.
Orlandi, Marcelo O. [UNESP]
dc.subject.por.fl_str_mv Semiconductors
Sn3O4
density functional theory
Ab initio simulations
FIB
topic Semiconductors
Sn3O4
density functional theory
Ab initio simulations
FIB
description Van der Waals (vdW) layered materials have been receiving a great deal of attention, especially after the scotch-tape experiment using graphite and the unique properties of graphene. Sn3O4, which also presents a layered structure, has been widely employed in a variety of technologies, but without further understanding of its bulk properties. For the first time, a modern Scotch-tape nanomanipulation experiment carried on a Dual Beam Microscope is combined with Density Functional Theory to investigate the Sn3O4 bulk properties. Theoretically, we have shown that the interaction energy between Sn3O4 layers are in the same order of graphene layers (21 meV angstrom(-2)), indicating its vdW interaction nature, whereas for SnO is slightly stronger (26 meV angstrom(-2)). Then, the Dual Beam Microscope nanomanipulation of the Sn3O4 nanobelts revealed the weak layer-layer interactions along their stacking direction (plane (010)). Comparatively, when probing SnO and SnO2 nanobelts, no exfoliation could be seen. The study of Sn3O4 electronic structure properties also presents the important role of the interfacial region to the valence and conduction band and, consequently, to the material band-gap. The outcome of this study will help improving some applications, e.g., knowing the total and local density of states can help understanding surface band bending following gases adsorption. To the best of our knowledge, this is the first study to show, combining experimental and theoretical techniques, Sn3O4 as a promising 2D material.
publishDate 2019
dc.date.none.fl_str_mv 2019-12-01
2020-12-10T19:41:41Z
2020-12-10T19:41:41Z
dc.type.status.fl_str_mv info:eu-repo/semantics/publishedVersion
dc.type.driver.fl_str_mv info:eu-repo/semantics/article
format article
status_str publishedVersion
dc.identifier.uri.fl_str_mv http://dx.doi.org/10.1016/j.commatsci.2019.109160
Computational Materials Science. Amsterdam: Elsevier, v. 170, 7 p., 2019.
0927-0256
http://hdl.handle.net/11449/196345
10.1016/j.commatsci.2019.109160
WOS:000498062100022
url http://dx.doi.org/10.1016/j.commatsci.2019.109160
http://hdl.handle.net/11449/196345
identifier_str_mv Computational Materials Science. Amsterdam: Elsevier, v. 170, 7 p., 2019.
0927-0256
10.1016/j.commatsci.2019.109160
WOS:000498062100022
dc.language.iso.fl_str_mv eng
language eng
dc.relation.none.fl_str_mv Computational Materials Science
dc.rights.driver.fl_str_mv info:eu-repo/semantics/openAccess
eu_rights_str_mv openAccess
dc.format.none.fl_str_mv 7
dc.publisher.none.fl_str_mv Elsevier B.V.
publisher.none.fl_str_mv Elsevier B.V.
dc.source.none.fl_str_mv Web of Science
reponame:Repositório Institucional da UNESP
instname:Universidade Estadual Paulista (UNESP)
instacron:UNESP
instname_str Universidade Estadual Paulista (UNESP)
instacron_str UNESP
institution UNESP
reponame_str Repositório Institucional da UNESP
collection Repositório Institucional da UNESP
repository.name.fl_str_mv Repositório Institucional da UNESP - Universidade Estadual Paulista (UNESP)
repository.mail.fl_str_mv
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