Anodização processada por corrente contínua e pulsada de uma liga al-si 6,75% tratada termicamente

Detalhes bibliográficos
Autor(a) principal: Regone, Natal Nerímio [UNESP]
Data de Publicação: 2010
Outros Autores: Freire, Célia Marina Alvarenga, Ballester, Margarita
Tipo de documento: Artigo de conferência
Idioma: por
Título da fonte: Repositório Institucional da UNESP
Texto Completo: http://hdl.handle.net/11449/220046
Resumo: The purpose of this work was to find a heat treatment process to Al-6.75% Si alloy that makes the dispersion of Si element in order to overcome the difficulties in the anodizing process. Samples were put in an oven at 540°C during 12 hours, and afterwards immersed in boiling water. After heat treatment, the thermally formed oxide was removed with sandpaper. The alloys were anodized during 30 minutes using pulsed and direct current in H2SO 4(6% volume) and H2C2O4 (5% weight) solution at 22°C. The film thickness and uniformity of anodic oxide film were observed in cross section by optical microscopy. Without heat treatment of the Al-Si alloy, the anodic film formed by direct or pulsed current has non-uniform thickness. It was found that heat treatment leads to dispersion of silicon particles in Al matrix. And that the formed anodic film is more uniform film. The film uniformity is even better when pulsed current is used. Copyright © (2010) by Associação Brasileira de Metalurgia Materiais e Mineração (ABM).
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spelling Anodização processada por corrente contínua e pulsada de uma liga al-si 6,75% tratada termicamenteAnodizing processed by direct and pulsed current of al-si alloy 6.5% heat treatedAl-Si alloysAnodizingHeat treatmentThe purpose of this work was to find a heat treatment process to Al-6.75% Si alloy that makes the dispersion of Si element in order to overcome the difficulties in the anodizing process. Samples were put in an oven at 540°C during 12 hours, and afterwards immersed in boiling water. After heat treatment, the thermally formed oxide was removed with sandpaper. The alloys were anodized during 30 minutes using pulsed and direct current in H2SO 4(6% volume) and H2C2O4 (5% weight) solution at 22°C. The film thickness and uniformity of anodic oxide film were observed in cross section by optical microscopy. Without heat treatment of the Al-Si alloy, the anodic film formed by direct or pulsed current has non-uniform thickness. It was found that heat treatment leads to dispersion of silicon particles in Al matrix. And that the formed anodic film is more uniform film. The film uniformity is even better when pulsed current is used. Copyright © (2010) by Associação Brasileira de Metalurgia Materiais e Mineração (ABM).Engenheiro Metalúrgico UNESPEngenheira Química UNICAMPFísica UNICAMPEngenheiro Metalúrgico UNESPUniversidade Estadual Paulista (UNESP)Universidade Estadual de Campinas (UNICAMP)Regone, Natal Nerímio [UNESP]Freire, Célia Marina AlvarengaBallester, Margarita2022-04-28T18:59:19Z2022-04-28T18:59:19Z2010-12-01info:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/conferenceObject3687-369365th ABM International Congress, 18th IFHTSE Congress and 1st TMS/ABM International Materials Congress 2010, v. 5, p. 3687-3693.http://hdl.handle.net/11449/2200462-s2.0-84893224124Scopusreponame:Repositório Institucional da UNESPinstname:Universidade Estadual Paulista (UNESP)instacron:UNESPpor65th ABM International Congress, 18th IFHTSE Congress and 1st TMS/ABM International Materials Congress 2010info:eu-repo/semantics/openAccess2022-04-28T18:59:19Zoai:repositorio.unesp.br:11449/220046Repositório InstitucionalPUBhttp://repositorio.unesp.br/oai/requestopendoar:29462024-08-05T19:17:29.314046Repositório Institucional da UNESP - Universidade Estadual Paulista (UNESP)false
dc.title.none.fl_str_mv Anodização processada por corrente contínua e pulsada de uma liga al-si 6,75% tratada termicamente
Anodizing processed by direct and pulsed current of al-si alloy 6.5% heat treated
title Anodização processada por corrente contínua e pulsada de uma liga al-si 6,75% tratada termicamente
spellingShingle Anodização processada por corrente contínua e pulsada de uma liga al-si 6,75% tratada termicamente
Regone, Natal Nerímio [UNESP]
Al-Si alloys
Anodizing
Heat treatment
title_short Anodização processada por corrente contínua e pulsada de uma liga al-si 6,75% tratada termicamente
title_full Anodização processada por corrente contínua e pulsada de uma liga al-si 6,75% tratada termicamente
title_fullStr Anodização processada por corrente contínua e pulsada de uma liga al-si 6,75% tratada termicamente
title_full_unstemmed Anodização processada por corrente contínua e pulsada de uma liga al-si 6,75% tratada termicamente
title_sort Anodização processada por corrente contínua e pulsada de uma liga al-si 6,75% tratada termicamente
author Regone, Natal Nerímio [UNESP]
author_facet Regone, Natal Nerímio [UNESP]
Freire, Célia Marina Alvarenga
Ballester, Margarita
author_role author
author2 Freire, Célia Marina Alvarenga
Ballester, Margarita
author2_role author
author
dc.contributor.none.fl_str_mv Universidade Estadual Paulista (UNESP)
Universidade Estadual de Campinas (UNICAMP)
dc.contributor.author.fl_str_mv Regone, Natal Nerímio [UNESP]
Freire, Célia Marina Alvarenga
Ballester, Margarita
dc.subject.por.fl_str_mv Al-Si alloys
Anodizing
Heat treatment
topic Al-Si alloys
Anodizing
Heat treatment
description The purpose of this work was to find a heat treatment process to Al-6.75% Si alloy that makes the dispersion of Si element in order to overcome the difficulties in the anodizing process. Samples were put in an oven at 540°C during 12 hours, and afterwards immersed in boiling water. After heat treatment, the thermally formed oxide was removed with sandpaper. The alloys were anodized during 30 minutes using pulsed and direct current in H2SO 4(6% volume) and H2C2O4 (5% weight) solution at 22°C. The film thickness and uniformity of anodic oxide film were observed in cross section by optical microscopy. Without heat treatment of the Al-Si alloy, the anodic film formed by direct or pulsed current has non-uniform thickness. It was found that heat treatment leads to dispersion of silicon particles in Al matrix. And that the formed anodic film is more uniform film. The film uniformity is even better when pulsed current is used. Copyright © (2010) by Associação Brasileira de Metalurgia Materiais e Mineração (ABM).
publishDate 2010
dc.date.none.fl_str_mv 2010-12-01
2022-04-28T18:59:19Z
2022-04-28T18:59:19Z
dc.type.status.fl_str_mv info:eu-repo/semantics/publishedVersion
dc.type.driver.fl_str_mv info:eu-repo/semantics/conferenceObject
format conferenceObject
status_str publishedVersion
dc.identifier.uri.fl_str_mv 65th ABM International Congress, 18th IFHTSE Congress and 1st TMS/ABM International Materials Congress 2010, v. 5, p. 3687-3693.
http://hdl.handle.net/11449/220046
2-s2.0-84893224124
identifier_str_mv 65th ABM International Congress, 18th IFHTSE Congress and 1st TMS/ABM International Materials Congress 2010, v. 5, p. 3687-3693.
2-s2.0-84893224124
url http://hdl.handle.net/11449/220046
dc.language.iso.fl_str_mv por
language por
dc.relation.none.fl_str_mv 65th ABM International Congress, 18th IFHTSE Congress and 1st TMS/ABM International Materials Congress 2010
dc.rights.driver.fl_str_mv info:eu-repo/semantics/openAccess
eu_rights_str_mv openAccess
dc.format.none.fl_str_mv 3687-3693
dc.source.none.fl_str_mv Scopus
reponame:Repositório Institucional da UNESP
instname:Universidade Estadual Paulista (UNESP)
instacron:UNESP
instname_str Universidade Estadual Paulista (UNESP)
instacron_str UNESP
institution UNESP
reponame_str Repositório Institucional da UNESP
collection Repositório Institucional da UNESP
repository.name.fl_str_mv Repositório Institucional da UNESP - Universidade Estadual Paulista (UNESP)
repository.mail.fl_str_mv
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