Burning Graphene Layer-by-Layer
Autor(a) principal: | |
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Data de Publicação: | 2015 |
Outros Autores: | , , , , , , |
Tipo de documento: | Artigo |
Idioma: | eng |
Título da fonte: | Repositório Institucional da UNESP |
Texto Completo: | http://www.nature.com/articles/srep11546 http://hdl.handle.net/11449/129039 |
Resumo: | Graphene, in single layer or multi-layer forms, holds great promise for future electronics and high-temperature applications. Resistance to oxidation, an important property for high-temperature applications, has not yet been extensively investigated. Controlled thinning of multi-layer graphene (MLG), e.g., by plasma or laser processing is another challenge, since the existing methods produce non-uniform thinning or introduce undesirable defects in the basal plane. We report here that heating to extremely high temperatures (exceeding 2000 K) and controllable layer-by-layer burning (thinning) can be achieved by low-power laser processing of suspended high-quality MLG in air in "cold-wall" reactor configuration. In contrast, localized laser heating of supported samples results in non-uniform graphene burning at much higher rates. Fully atomistic molecular dynamics simulations were also performed to reveal details of oxidation mechanisms leading to uniform layer-by-layer graphene gasification. The extraordinary resistance of MLG to oxidation paves the way to novel high-temperature applications as continuum light source or scaffolding material. |
id |
UNSP_f04e6d543981e5513c9efff49577a654 |
---|---|
oai_identifier_str |
oai:repositorio.unesp.br:11449/129039 |
network_acronym_str |
UNSP |
network_name_str |
Repositório Institucional da UNESP |
repository_id_str |
2946 |
spelling |
Burning Graphene Layer-by-LayerGraphene, in single layer or multi-layer forms, holds great promise for future electronics and high-temperature applications. Resistance to oxidation, an important property for high-temperature applications, has not yet been extensively investigated. Controlled thinning of multi-layer graphene (MLG), e.g., by plasma or laser processing is another challenge, since the existing methods produce non-uniform thinning or introduce undesirable defects in the basal plane. We report here that heating to extremely high temperatures (exceeding 2000 K) and controllable layer-by-layer burning (thinning) can be achieved by low-power laser processing of suspended high-quality MLG in air in "cold-wall" reactor configuration. In contrast, localized laser heating of supported samples results in non-uniform graphene burning at much higher rates. Fully atomistic molecular dynamics simulations were also performed to reveal details of oxidation mechanisms leading to uniform layer-by-layer graphene gasification. The extraordinary resistance of MLG to oxidation paves the way to novel high-temperature applications as continuum light source or scaffolding material.Univ Estadual Campinas, Ctr Semicond Components, BR-13083870 Campinas, SP, BrazilUniv Estadual Campinas, Inst Fis Gleb Wataghin, BR-13083970 Campinas, SP, BrazilUNESP, Univ Estadual Paulista, Dept Fis, IGCE, BR-13506900 Rio Claro, SP, BrazilUNESP, Univ Estadual Paulista, Dept Fis, IGCE, BR-13506900 Rio Claro, SP, BrazilNature Publishing GroupUniversidade Estadual de Campinas (UNICAMP)Universidade Estadual Paulista (Unesp)Ermakov, Victor A.Alaferdov, Andrei V.Vaz, Alfredo R.Perim, EricAutreto, Pedro A. S.Paupitz, Ricardo [UNESP]Galvao, Douglas S.Moshkalev, Stanislav A.2015-10-21T20:15:17Z2015-10-21T20:15:17Z2015-06-23info:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/article9application/pdfhttp://www.nature.com/articles/srep11546Scientific Reports. London: Nature Publishing Group, v. 5, 9 p., 2015.2045-2322http://hdl.handle.net/11449/12903910.1038/srep11546WOS:000356663700001WOS000356663700001.pdfWeb of Sciencereponame:Repositório Institucional da UNESPinstname:Universidade Estadual Paulista (UNESP)instacron:UNESPengScientific Reports4.1221,533info:eu-repo/semantics/openAccess2024-01-07T06:29:30Zoai:repositorio.unesp.br:11449/129039Repositório InstitucionalPUBhttp://repositorio.unesp.br/oai/requestopendoar:29462024-08-05T22:22:06.439801Repositório Institucional da UNESP - Universidade Estadual Paulista (UNESP)false |
dc.title.none.fl_str_mv |
Burning Graphene Layer-by-Layer |
title |
Burning Graphene Layer-by-Layer |
spellingShingle |
Burning Graphene Layer-by-Layer Ermakov, Victor A. |
title_short |
Burning Graphene Layer-by-Layer |
title_full |
Burning Graphene Layer-by-Layer |
title_fullStr |
Burning Graphene Layer-by-Layer |
title_full_unstemmed |
Burning Graphene Layer-by-Layer |
title_sort |
Burning Graphene Layer-by-Layer |
author |
Ermakov, Victor A. |
author_facet |
Ermakov, Victor A. Alaferdov, Andrei V. Vaz, Alfredo R. Perim, Eric Autreto, Pedro A. S. Paupitz, Ricardo [UNESP] Galvao, Douglas S. Moshkalev, Stanislav A. |
author_role |
author |
author2 |
Alaferdov, Andrei V. Vaz, Alfredo R. Perim, Eric Autreto, Pedro A. S. Paupitz, Ricardo [UNESP] Galvao, Douglas S. Moshkalev, Stanislav A. |
author2_role |
author author author author author author author |
dc.contributor.none.fl_str_mv |
Universidade Estadual de Campinas (UNICAMP) Universidade Estadual Paulista (Unesp) |
dc.contributor.author.fl_str_mv |
Ermakov, Victor A. Alaferdov, Andrei V. Vaz, Alfredo R. Perim, Eric Autreto, Pedro A. S. Paupitz, Ricardo [UNESP] Galvao, Douglas S. Moshkalev, Stanislav A. |
description |
Graphene, in single layer or multi-layer forms, holds great promise for future electronics and high-temperature applications. Resistance to oxidation, an important property for high-temperature applications, has not yet been extensively investigated. Controlled thinning of multi-layer graphene (MLG), e.g., by plasma or laser processing is another challenge, since the existing methods produce non-uniform thinning or introduce undesirable defects in the basal plane. We report here that heating to extremely high temperatures (exceeding 2000 K) and controllable layer-by-layer burning (thinning) can be achieved by low-power laser processing of suspended high-quality MLG in air in "cold-wall" reactor configuration. In contrast, localized laser heating of supported samples results in non-uniform graphene burning at much higher rates. Fully atomistic molecular dynamics simulations were also performed to reveal details of oxidation mechanisms leading to uniform layer-by-layer graphene gasification. The extraordinary resistance of MLG to oxidation paves the way to novel high-temperature applications as continuum light source or scaffolding material. |
publishDate |
2015 |
dc.date.none.fl_str_mv |
2015-10-21T20:15:17Z 2015-10-21T20:15:17Z 2015-06-23 |
dc.type.status.fl_str_mv |
info:eu-repo/semantics/publishedVersion |
dc.type.driver.fl_str_mv |
info:eu-repo/semantics/article |
format |
article |
status_str |
publishedVersion |
dc.identifier.uri.fl_str_mv |
http://www.nature.com/articles/srep11546 Scientific Reports. London: Nature Publishing Group, v. 5, 9 p., 2015. 2045-2322 http://hdl.handle.net/11449/129039 10.1038/srep11546 WOS:000356663700001 WOS000356663700001.pdf |
url |
http://www.nature.com/articles/srep11546 http://hdl.handle.net/11449/129039 |
identifier_str_mv |
Scientific Reports. London: Nature Publishing Group, v. 5, 9 p., 2015. 2045-2322 10.1038/srep11546 WOS:000356663700001 WOS000356663700001.pdf |
dc.language.iso.fl_str_mv |
eng |
language |
eng |
dc.relation.none.fl_str_mv |
Scientific Reports 4.122 1,533 |
dc.rights.driver.fl_str_mv |
info:eu-repo/semantics/openAccess |
eu_rights_str_mv |
openAccess |
dc.format.none.fl_str_mv |
9 application/pdf |
dc.publisher.none.fl_str_mv |
Nature Publishing Group |
publisher.none.fl_str_mv |
Nature Publishing Group |
dc.source.none.fl_str_mv |
Web of Science reponame:Repositório Institucional da UNESP instname:Universidade Estadual Paulista (UNESP) instacron:UNESP |
instname_str |
Universidade Estadual Paulista (UNESP) |
instacron_str |
UNESP |
institution |
UNESP |
reponame_str |
Repositório Institucional da UNESP |
collection |
Repositório Institucional da UNESP |
repository.name.fl_str_mv |
Repositório Institucional da UNESP - Universidade Estadual Paulista (UNESP) |
repository.mail.fl_str_mv |
|
_version_ |
1808129420557287424 |