Sol-Gel Erbium-Doped Silica-Hafnia Planar and Channel Waveguides

Detalhes bibliográficos
Autor(a) principal: Gonçalves, Rogéria R.
Data de Publicação: 2003
Outros Autores: Carturan, Giovanni, Zampedri, Luca, Ferrari, Maurizio, Armellini, Cristina, Chiasera, Alessandro, Mattarelli, M., Moser, Enrico, Montagna, Maurizio, Righini, Giancarlo C., Pelli, Stefano, Nunzi Conti, Gualtiero, Ribeiro, Sidney J.L. [UNESP], Messaddeq, Younes [UNESP], Minotti, Antonio, Foglietti, Vittorio, Portales, Hervè
Tipo de documento: Artigo de conferência
Idioma: eng
Título da fonte: Repositório Institucional da UNESP
Texto Completo: http://dx.doi.org/10.1117/12.478340
http://hdl.handle.net/11449/67477
Resumo: Erbium activated SiO2 -HfO2 planar waveguides, doped with Er3+ concentrations ranging from 0.01 to 4 mol%, were prepared by sol-gel method. The films were deposited on v-SiO2 and silica-on-silicon substrates using dip-coating technique. The waveguides show high densification degree, effective intermingling of the two film components, and uniform surface morphology. The waveguide deposited on silica-on-silicon substrates shows one single propagation mode at 1.5μm, with a confinement coefficient of 0.81 and an attenuation coefficient of 0.8 dB/cm at 632.8nm. Emission in the C-telecommunication band was observed at room temperature for all the samples upon continuouswave excitation at 980 nm or 514.5 nm. The shape of the emission band corresponding to the 4I13/2 → 4I15/2 transition is found to be almost independent both on erbium content and excitation wavelength, with a FWHM between 44 and 48 nm. The 4I13/2 level decay curves presented a single-exponential profile, with a lifetime ranging between 1.1 - 6.6 ms, depending on the erbium concentration. Infrared to visible upconversion luminescence upon continuous-wave excitation at 980 nm was observed for all the samples. Channel waveguide in rib configuration was obtained by etching the active film in order to have a well confined mode at 1.5 μm.
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spelling Sol-Gel Erbium-Doped Silica-Hafnia Planar and Channel WaveguidesChannel waveguidesErbiumLuminescenceSilica-hafniaSol-gel planar waveguidesDepositionEtchingMorphologySemiconductor dopingSilicon wafersSol-gelsSubstratesWavelength division multiplexingPlanar waveguidesOptical waveguidesErbium activated SiO2 -HfO2 planar waveguides, doped with Er3+ concentrations ranging from 0.01 to 4 mol%, were prepared by sol-gel method. The films were deposited on v-SiO2 and silica-on-silicon substrates using dip-coating technique. The waveguides show high densification degree, effective intermingling of the two film components, and uniform surface morphology. The waveguide deposited on silica-on-silicon substrates shows one single propagation mode at 1.5μm, with a confinement coefficient of 0.81 and an attenuation coefficient of 0.8 dB/cm at 632.8nm. Emission in the C-telecommunication band was observed at room temperature for all the samples upon continuouswave excitation at 980 nm or 514.5 nm. The shape of the emission band corresponding to the 4I13/2 → 4I15/2 transition is found to be almost independent both on erbium content and excitation wavelength, with a FWHM between 44 and 48 nm. The 4I13/2 level decay curves presented a single-exponential profile, with a lifetime ranging between 1.1 - 6.6 ms, depending on the erbium concentration. Infrared to visible upconversion luminescence upon continuous-wave excitation at 980 nm was observed for all the samples. Channel waveguide in rib configuration was obtained by etching the active film in order to have a well confined mode at 1.5 μm.Dipto. di Ingegneria dei Materiali Università di Trento, Via Mesiano 77, 1-38050 TrentoCNR-IFN Ist. di Fotonica e Nanotecnologie, via Sommarive 14, 1-38050 Povo, TrentoDipartimento di Fisica INFM Università di Trento, via Sommarive 14, 1-38050 Povo, TrentoCNR-IFAC Ist. di Fis. Applicata Nello Carrara, via Panciatichi 64, 1-50127 FirenzeInstitute of Chemistry UNESP, P.O.Box 355, 14801-970 Araraquara, SPCNR Ist. di Fotonica e Nanotecnologie MEMS Group, Via Cineto Romano 42, I-00156 RomaDipartimento di Fisica INFM Università di Padova, via Marzolo 8, 1-35131 PadovaInstitute of Chemistry UNESP, P.O.Box 355, 14801-970 Araraquara, SPUniversità di TrentoIst. di Fotonica e NanotecnologieIst. di Fis. Applicata Nello CarraraUniversidade Estadual Paulista (Unesp)MEMS GroupUniversità di PadovaGonçalves, Rogéria R.Carturan, GiovanniZampedri, LucaFerrari, MaurizioArmellini, CristinaChiasera, AlessandroMattarelli, M.Moser, EnricoMontagna, MaurizioRighini, Giancarlo C.Pelli, StefanoNunzi Conti, GualtieroRibeiro, Sidney J.L. [UNESP]Messaddeq, Younes [UNESP]Minotti, AntonioFoglietti, VittorioPortales, Hervè2014-05-27T11:20:56Z2014-05-27T11:20:56Z2003-11-27info:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/conferenceObject111-120http://dx.doi.org/10.1117/12.478340Proceedings of SPIE - The International Society for Optical Engineering, v. 4990, p. 111-120.0277-786Xhttp://hdl.handle.net/11449/6747710.1117/12.4783402-s2.0-02426932842998503841917815Scopusreponame:Repositório Institucional da UNESPinstname:Universidade Estadual Paulista (UNESP)instacron:UNESPengProceedings of SPIE - The International Society for Optical Engineeringinfo:eu-repo/semantics/openAccess2021-10-23T21:41:25Zoai:repositorio.unesp.br:11449/67477Repositório InstitucionalPUBhttp://repositorio.unesp.br/oai/requestopendoar:29462024-08-05T22:42:53.842702Repositório Institucional da UNESP - Universidade Estadual Paulista (UNESP)false
dc.title.none.fl_str_mv Sol-Gel Erbium-Doped Silica-Hafnia Planar and Channel Waveguides
title Sol-Gel Erbium-Doped Silica-Hafnia Planar and Channel Waveguides
spellingShingle Sol-Gel Erbium-Doped Silica-Hafnia Planar and Channel Waveguides
Gonçalves, Rogéria R.
Channel waveguides
Erbium
Luminescence
Silica-hafnia
Sol-gel planar waveguides
Deposition
Etching
Morphology
Semiconductor doping
Silicon wafers
Sol-gels
Substrates
Wavelength division multiplexing
Planar waveguides
Optical waveguides
title_short Sol-Gel Erbium-Doped Silica-Hafnia Planar and Channel Waveguides
title_full Sol-Gel Erbium-Doped Silica-Hafnia Planar and Channel Waveguides
title_fullStr Sol-Gel Erbium-Doped Silica-Hafnia Planar and Channel Waveguides
title_full_unstemmed Sol-Gel Erbium-Doped Silica-Hafnia Planar and Channel Waveguides
title_sort Sol-Gel Erbium-Doped Silica-Hafnia Planar and Channel Waveguides
author Gonçalves, Rogéria R.
author_facet Gonçalves, Rogéria R.
Carturan, Giovanni
Zampedri, Luca
Ferrari, Maurizio
Armellini, Cristina
Chiasera, Alessandro
Mattarelli, M.
Moser, Enrico
Montagna, Maurizio
Righini, Giancarlo C.
Pelli, Stefano
Nunzi Conti, Gualtiero
Ribeiro, Sidney J.L. [UNESP]
Messaddeq, Younes [UNESP]
Minotti, Antonio
Foglietti, Vittorio
Portales, Hervè
author_role author
author2 Carturan, Giovanni
Zampedri, Luca
Ferrari, Maurizio
Armellini, Cristina
Chiasera, Alessandro
Mattarelli, M.
Moser, Enrico
Montagna, Maurizio
Righini, Giancarlo C.
Pelli, Stefano
Nunzi Conti, Gualtiero
Ribeiro, Sidney J.L. [UNESP]
Messaddeq, Younes [UNESP]
Minotti, Antonio
Foglietti, Vittorio
Portales, Hervè
author2_role author
author
author
author
author
author
author
author
author
author
author
author
author
author
author
author
dc.contributor.none.fl_str_mv Università di Trento
Ist. di Fotonica e Nanotecnologie
Ist. di Fis. Applicata Nello Carrara
Universidade Estadual Paulista (Unesp)
MEMS Group
Università di Padova
dc.contributor.author.fl_str_mv Gonçalves, Rogéria R.
Carturan, Giovanni
Zampedri, Luca
Ferrari, Maurizio
Armellini, Cristina
Chiasera, Alessandro
Mattarelli, M.
Moser, Enrico
Montagna, Maurizio
Righini, Giancarlo C.
Pelli, Stefano
Nunzi Conti, Gualtiero
Ribeiro, Sidney J.L. [UNESP]
Messaddeq, Younes [UNESP]
Minotti, Antonio
Foglietti, Vittorio
Portales, Hervè
dc.subject.por.fl_str_mv Channel waveguides
Erbium
Luminescence
Silica-hafnia
Sol-gel planar waveguides
Deposition
Etching
Morphology
Semiconductor doping
Silicon wafers
Sol-gels
Substrates
Wavelength division multiplexing
Planar waveguides
Optical waveguides
topic Channel waveguides
Erbium
Luminescence
Silica-hafnia
Sol-gel planar waveguides
Deposition
Etching
Morphology
Semiconductor doping
Silicon wafers
Sol-gels
Substrates
Wavelength division multiplexing
Planar waveguides
Optical waveguides
description Erbium activated SiO2 -HfO2 planar waveguides, doped with Er3+ concentrations ranging from 0.01 to 4 mol%, were prepared by sol-gel method. The films were deposited on v-SiO2 and silica-on-silicon substrates using dip-coating technique. The waveguides show high densification degree, effective intermingling of the two film components, and uniform surface morphology. The waveguide deposited on silica-on-silicon substrates shows one single propagation mode at 1.5μm, with a confinement coefficient of 0.81 and an attenuation coefficient of 0.8 dB/cm at 632.8nm. Emission in the C-telecommunication band was observed at room temperature for all the samples upon continuouswave excitation at 980 nm or 514.5 nm. The shape of the emission band corresponding to the 4I13/2 → 4I15/2 transition is found to be almost independent both on erbium content and excitation wavelength, with a FWHM between 44 and 48 nm. The 4I13/2 level decay curves presented a single-exponential profile, with a lifetime ranging between 1.1 - 6.6 ms, depending on the erbium concentration. Infrared to visible upconversion luminescence upon continuous-wave excitation at 980 nm was observed for all the samples. Channel waveguide in rib configuration was obtained by etching the active film in order to have a well confined mode at 1.5 μm.
publishDate 2003
dc.date.none.fl_str_mv 2003-11-27
2014-05-27T11:20:56Z
2014-05-27T11:20:56Z
dc.type.status.fl_str_mv info:eu-repo/semantics/publishedVersion
dc.type.driver.fl_str_mv info:eu-repo/semantics/conferenceObject
format conferenceObject
status_str publishedVersion
dc.identifier.uri.fl_str_mv http://dx.doi.org/10.1117/12.478340
Proceedings of SPIE - The International Society for Optical Engineering, v. 4990, p. 111-120.
0277-786X
http://hdl.handle.net/11449/67477
10.1117/12.478340
2-s2.0-0242693284
2998503841917815
url http://dx.doi.org/10.1117/12.478340
http://hdl.handle.net/11449/67477
identifier_str_mv Proceedings of SPIE - The International Society for Optical Engineering, v. 4990, p. 111-120.
0277-786X
10.1117/12.478340
2-s2.0-0242693284
2998503841917815
dc.language.iso.fl_str_mv eng
language eng
dc.relation.none.fl_str_mv Proceedings of SPIE - The International Society for Optical Engineering
dc.rights.driver.fl_str_mv info:eu-repo/semantics/openAccess
eu_rights_str_mv openAccess
dc.format.none.fl_str_mv 111-120
dc.source.none.fl_str_mv Scopus
reponame:Repositório Institucional da UNESP
instname:Universidade Estadual Paulista (UNESP)
instacron:UNESP
instname_str Universidade Estadual Paulista (UNESP)
instacron_str UNESP
institution UNESP
reponame_str Repositório Institucional da UNESP
collection Repositório Institucional da UNESP
repository.name.fl_str_mv Repositório Institucional da UNESP - Universidade Estadual Paulista (UNESP)
repository.mail.fl_str_mv
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