Sol-Gel Erbium-Doped Silica-Hafnia Planar and Channel Waveguides
Autor(a) principal: | |
---|---|
Data de Publicação: | 2003 |
Outros Autores: | , , , , , , , , , , , , , , , |
Tipo de documento: | Artigo de conferência |
Idioma: | eng |
Título da fonte: | Repositório Institucional da UNESP |
Texto Completo: | http://dx.doi.org/10.1117/12.478340 http://hdl.handle.net/11449/67477 |
Resumo: | Erbium activated SiO2 -HfO2 planar waveguides, doped with Er3+ concentrations ranging from 0.01 to 4 mol%, were prepared by sol-gel method. The films were deposited on v-SiO2 and silica-on-silicon substrates using dip-coating technique. The waveguides show high densification degree, effective intermingling of the two film components, and uniform surface morphology. The waveguide deposited on silica-on-silicon substrates shows one single propagation mode at 1.5μm, with a confinement coefficient of 0.81 and an attenuation coefficient of 0.8 dB/cm at 632.8nm. Emission in the C-telecommunication band was observed at room temperature for all the samples upon continuouswave excitation at 980 nm or 514.5 nm. The shape of the emission band corresponding to the 4I13/2 → 4I15/2 transition is found to be almost independent both on erbium content and excitation wavelength, with a FWHM between 44 and 48 nm. The 4I13/2 level decay curves presented a single-exponential profile, with a lifetime ranging between 1.1 - 6.6 ms, depending on the erbium concentration. Infrared to visible upconversion luminescence upon continuous-wave excitation at 980 nm was observed for all the samples. Channel waveguide in rib configuration was obtained by etching the active film in order to have a well confined mode at 1.5 μm. |
id |
UNSP_f24fea7445a38d6215f7ffc4f68734ec |
---|---|
oai_identifier_str |
oai:repositorio.unesp.br:11449/67477 |
network_acronym_str |
UNSP |
network_name_str |
Repositório Institucional da UNESP |
repository_id_str |
2946 |
spelling |
Sol-Gel Erbium-Doped Silica-Hafnia Planar and Channel WaveguidesChannel waveguidesErbiumLuminescenceSilica-hafniaSol-gel planar waveguidesDepositionEtchingMorphologySemiconductor dopingSilicon wafersSol-gelsSubstratesWavelength division multiplexingPlanar waveguidesOptical waveguidesErbium activated SiO2 -HfO2 planar waveguides, doped with Er3+ concentrations ranging from 0.01 to 4 mol%, were prepared by sol-gel method. The films were deposited on v-SiO2 and silica-on-silicon substrates using dip-coating technique. The waveguides show high densification degree, effective intermingling of the two film components, and uniform surface morphology. The waveguide deposited on silica-on-silicon substrates shows one single propagation mode at 1.5μm, with a confinement coefficient of 0.81 and an attenuation coefficient of 0.8 dB/cm at 632.8nm. Emission in the C-telecommunication band was observed at room temperature for all the samples upon continuouswave excitation at 980 nm or 514.5 nm. The shape of the emission band corresponding to the 4I13/2 → 4I15/2 transition is found to be almost independent both on erbium content and excitation wavelength, with a FWHM between 44 and 48 nm. The 4I13/2 level decay curves presented a single-exponential profile, with a lifetime ranging between 1.1 - 6.6 ms, depending on the erbium concentration. Infrared to visible upconversion luminescence upon continuous-wave excitation at 980 nm was observed for all the samples. Channel waveguide in rib configuration was obtained by etching the active film in order to have a well confined mode at 1.5 μm.Dipto. di Ingegneria dei Materiali Università di Trento, Via Mesiano 77, 1-38050 TrentoCNR-IFN Ist. di Fotonica e Nanotecnologie, via Sommarive 14, 1-38050 Povo, TrentoDipartimento di Fisica INFM Università di Trento, via Sommarive 14, 1-38050 Povo, TrentoCNR-IFAC Ist. di Fis. Applicata Nello Carrara, via Panciatichi 64, 1-50127 FirenzeInstitute of Chemistry UNESP, P.O.Box 355, 14801-970 Araraquara, SPCNR Ist. di Fotonica e Nanotecnologie MEMS Group, Via Cineto Romano 42, I-00156 RomaDipartimento di Fisica INFM Università di Padova, via Marzolo 8, 1-35131 PadovaInstitute of Chemistry UNESP, P.O.Box 355, 14801-970 Araraquara, SPUniversità di TrentoIst. di Fotonica e NanotecnologieIst. di Fis. Applicata Nello CarraraUniversidade Estadual Paulista (Unesp)MEMS GroupUniversità di PadovaGonçalves, Rogéria R.Carturan, GiovanniZampedri, LucaFerrari, MaurizioArmellini, CristinaChiasera, AlessandroMattarelli, M.Moser, EnricoMontagna, MaurizioRighini, Giancarlo C.Pelli, StefanoNunzi Conti, GualtieroRibeiro, Sidney J.L. [UNESP]Messaddeq, Younes [UNESP]Minotti, AntonioFoglietti, VittorioPortales, Hervè2014-05-27T11:20:56Z2014-05-27T11:20:56Z2003-11-27info:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/conferenceObject111-120http://dx.doi.org/10.1117/12.478340Proceedings of SPIE - The International Society for Optical Engineering, v. 4990, p. 111-120.0277-786Xhttp://hdl.handle.net/11449/6747710.1117/12.4783402-s2.0-02426932842998503841917815Scopusreponame:Repositório Institucional da UNESPinstname:Universidade Estadual Paulista (UNESP)instacron:UNESPengProceedings of SPIE - The International Society for Optical Engineeringinfo:eu-repo/semantics/openAccess2021-10-23T21:41:25Zoai:repositorio.unesp.br:11449/67477Repositório InstitucionalPUBhttp://repositorio.unesp.br/oai/requestopendoar:29462024-08-05T22:42:53.842702Repositório Institucional da UNESP - Universidade Estadual Paulista (UNESP)false |
dc.title.none.fl_str_mv |
Sol-Gel Erbium-Doped Silica-Hafnia Planar and Channel Waveguides |
title |
Sol-Gel Erbium-Doped Silica-Hafnia Planar and Channel Waveguides |
spellingShingle |
Sol-Gel Erbium-Doped Silica-Hafnia Planar and Channel Waveguides Gonçalves, Rogéria R. Channel waveguides Erbium Luminescence Silica-hafnia Sol-gel planar waveguides Deposition Etching Morphology Semiconductor doping Silicon wafers Sol-gels Substrates Wavelength division multiplexing Planar waveguides Optical waveguides |
title_short |
Sol-Gel Erbium-Doped Silica-Hafnia Planar and Channel Waveguides |
title_full |
Sol-Gel Erbium-Doped Silica-Hafnia Planar and Channel Waveguides |
title_fullStr |
Sol-Gel Erbium-Doped Silica-Hafnia Planar and Channel Waveguides |
title_full_unstemmed |
Sol-Gel Erbium-Doped Silica-Hafnia Planar and Channel Waveguides |
title_sort |
Sol-Gel Erbium-Doped Silica-Hafnia Planar and Channel Waveguides |
author |
Gonçalves, Rogéria R. |
author_facet |
Gonçalves, Rogéria R. Carturan, Giovanni Zampedri, Luca Ferrari, Maurizio Armellini, Cristina Chiasera, Alessandro Mattarelli, M. Moser, Enrico Montagna, Maurizio Righini, Giancarlo C. Pelli, Stefano Nunzi Conti, Gualtiero Ribeiro, Sidney J.L. [UNESP] Messaddeq, Younes [UNESP] Minotti, Antonio Foglietti, Vittorio Portales, Hervè |
author_role |
author |
author2 |
Carturan, Giovanni Zampedri, Luca Ferrari, Maurizio Armellini, Cristina Chiasera, Alessandro Mattarelli, M. Moser, Enrico Montagna, Maurizio Righini, Giancarlo C. Pelli, Stefano Nunzi Conti, Gualtiero Ribeiro, Sidney J.L. [UNESP] Messaddeq, Younes [UNESP] Minotti, Antonio Foglietti, Vittorio Portales, Hervè |
author2_role |
author author author author author author author author author author author author author author author author |
dc.contributor.none.fl_str_mv |
Università di Trento Ist. di Fotonica e Nanotecnologie Ist. di Fis. Applicata Nello Carrara Universidade Estadual Paulista (Unesp) MEMS Group Università di Padova |
dc.contributor.author.fl_str_mv |
Gonçalves, Rogéria R. Carturan, Giovanni Zampedri, Luca Ferrari, Maurizio Armellini, Cristina Chiasera, Alessandro Mattarelli, M. Moser, Enrico Montagna, Maurizio Righini, Giancarlo C. Pelli, Stefano Nunzi Conti, Gualtiero Ribeiro, Sidney J.L. [UNESP] Messaddeq, Younes [UNESP] Minotti, Antonio Foglietti, Vittorio Portales, Hervè |
dc.subject.por.fl_str_mv |
Channel waveguides Erbium Luminescence Silica-hafnia Sol-gel planar waveguides Deposition Etching Morphology Semiconductor doping Silicon wafers Sol-gels Substrates Wavelength division multiplexing Planar waveguides Optical waveguides |
topic |
Channel waveguides Erbium Luminescence Silica-hafnia Sol-gel planar waveguides Deposition Etching Morphology Semiconductor doping Silicon wafers Sol-gels Substrates Wavelength division multiplexing Planar waveguides Optical waveguides |
description |
Erbium activated SiO2 -HfO2 planar waveguides, doped with Er3+ concentrations ranging from 0.01 to 4 mol%, were prepared by sol-gel method. The films were deposited on v-SiO2 and silica-on-silicon substrates using dip-coating technique. The waveguides show high densification degree, effective intermingling of the two film components, and uniform surface morphology. The waveguide deposited on silica-on-silicon substrates shows one single propagation mode at 1.5μm, with a confinement coefficient of 0.81 and an attenuation coefficient of 0.8 dB/cm at 632.8nm. Emission in the C-telecommunication band was observed at room temperature for all the samples upon continuouswave excitation at 980 nm or 514.5 nm. The shape of the emission band corresponding to the 4I13/2 → 4I15/2 transition is found to be almost independent both on erbium content and excitation wavelength, with a FWHM between 44 and 48 nm. The 4I13/2 level decay curves presented a single-exponential profile, with a lifetime ranging between 1.1 - 6.6 ms, depending on the erbium concentration. Infrared to visible upconversion luminescence upon continuous-wave excitation at 980 nm was observed for all the samples. Channel waveguide in rib configuration was obtained by etching the active film in order to have a well confined mode at 1.5 μm. |
publishDate |
2003 |
dc.date.none.fl_str_mv |
2003-11-27 2014-05-27T11:20:56Z 2014-05-27T11:20:56Z |
dc.type.status.fl_str_mv |
info:eu-repo/semantics/publishedVersion |
dc.type.driver.fl_str_mv |
info:eu-repo/semantics/conferenceObject |
format |
conferenceObject |
status_str |
publishedVersion |
dc.identifier.uri.fl_str_mv |
http://dx.doi.org/10.1117/12.478340 Proceedings of SPIE - The International Society for Optical Engineering, v. 4990, p. 111-120. 0277-786X http://hdl.handle.net/11449/67477 10.1117/12.478340 2-s2.0-0242693284 2998503841917815 |
url |
http://dx.doi.org/10.1117/12.478340 http://hdl.handle.net/11449/67477 |
identifier_str_mv |
Proceedings of SPIE - The International Society for Optical Engineering, v. 4990, p. 111-120. 0277-786X 10.1117/12.478340 2-s2.0-0242693284 2998503841917815 |
dc.language.iso.fl_str_mv |
eng |
language |
eng |
dc.relation.none.fl_str_mv |
Proceedings of SPIE - The International Society for Optical Engineering |
dc.rights.driver.fl_str_mv |
info:eu-repo/semantics/openAccess |
eu_rights_str_mv |
openAccess |
dc.format.none.fl_str_mv |
111-120 |
dc.source.none.fl_str_mv |
Scopus reponame:Repositório Institucional da UNESP instname:Universidade Estadual Paulista (UNESP) instacron:UNESP |
instname_str |
Universidade Estadual Paulista (UNESP) |
instacron_str |
UNESP |
institution |
UNESP |
reponame_str |
Repositório Institucional da UNESP |
collection |
Repositório Institucional da UNESP |
repository.name.fl_str_mv |
Repositório Institucional da UNESP - Universidade Estadual Paulista (UNESP) |
repository.mail.fl_str_mv |
|
_version_ |
1808129453811826688 |