Low cost MFC control unit using microcontoller

Detalhes bibliográficos
Autor(a) principal: Espindola, Paulo R
Data de Publicação: 2017
Outros Autores: Aquino, Mariana L, Cena, Cicero R, Alves, Diego C B, Reis, Diogo D, Goncalves, Alem-Mar B
Tipo de documento: Artigo
Idioma: por
Título da fonte: Revista Brasileira de Física Tecnológica Aplicada
Texto Completo: https://periodicos.utfpr.edu.br/rbfta/article/view/5581
Resumo: In this paper we present a compact and low cost solution to set up and to monitor an electronic Mass Flow Controller (MFC) using an Arduino microcontroller. Usually, MFCs can find a great demand at materials science laboratories, mainly in techniques which requires  a precise gas flow control, such as synthesis of thin films by Chemical Vapor Deposition (CVD). The control unit produced is presented in details by using schematic diagrams of the circuit and a detailed configuration for connect the controller to the MFC are presented. The control unit is also capable to work with two Mass Flow Controllers (MFCs) simultaneously at manual and remote (via computer software) regime. The source code is quite simple and allows the user easily modify parameters as type of gas and flux capacity of the controllers. Although the low resolution of ADC (Analog-to-Digital Converter) (10 bits) and DAC (Digital-to-Analog Converter) (using PWM - “Pulse Width Modulation”, 8 bits), the flux can be adjusted in steps of 0.4 % and 1.5 % of the total flux, respectively, which is very satisfactory for practical purposes. Finally, the operation tests were taken by using Argon (Ar) gas, and great accordance between the set point flow and the MFC measured flow was found.
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spelling Low cost MFC control unit using microcontollerFísica, Física Aplicada, InstrumentaçãoMFC; Low cost control; microcontroller; Arduino; gas flux.In this paper we present a compact and low cost solution to set up and to monitor an electronic Mass Flow Controller (MFC) using an Arduino microcontroller. Usually, MFCs can find a great demand at materials science laboratories, mainly in techniques which requires  a precise gas flow control, such as synthesis of thin films by Chemical Vapor Deposition (CVD). The control unit produced is presented in details by using schematic diagrams of the circuit and a detailed configuration for connect the controller to the MFC are presented. The control unit is also capable to work with two Mass Flow Controllers (MFCs) simultaneously at manual and remote (via computer software) regime. The source code is quite simple and allows the user easily modify parameters as type of gas and flux capacity of the controllers. Although the low resolution of ADC (Analog-to-Digital Converter) (10 bits) and DAC (Digital-to-Analog Converter) (using PWM - “Pulse Width Modulation”, 8 bits), the flux can be adjusted in steps of 0.4 % and 1.5 % of the total flux, respectively, which is very satisfactory for practical purposes. Finally, the operation tests were taken by using Argon (Ar) gas, and great accordance between the set point flow and the MFC measured flow was found.Universidade Tecnológica Federal do Paraná (UTFPR)CNPqEspindola, Paulo RAquino, Mariana LCena, Cicero RAlves, Diego C BReis, Diogo DGoncalves, Alem-Mar B2017-12-01info:eu-repo/semantics/articleinfo:eu-repo/semantics/publishedVersionapplication/pdfhttps://periodicos.utfpr.edu.br/rbfta/article/view/558110.3895/rbfta.v4n2.5581Revista Brasileira de Física Tecnológica Aplicada; v. 4, n. 2 (2017)2358-008910.3895/rbfta.v4n2reponame:Revista Brasileira de Física Tecnológica Aplicadainstname:Universidade Tecnológica Federal do Paraná (UTFPR)instacron:UTFPRporhttps://periodicos.utfpr.edu.br/rbfta/article/view/5581/4620Direitos autorais 2017 CC-BYhttp://creativecommons.org/licenses/by/4.0info:eu-repo/semantics/openAccess2019-12-02T13:21:05Zoai:periodicos.utfpr:article/5581Revistahttps://periodicos.utfpr.edu.br/rbftaPUBhttps://periodicos.utfpr.edu.br/rbfta/oai||rbfta-pg@utfpr.edu.br2358-00892358-0089opendoar:2019-12-02T13:21:05Revista Brasileira de Física Tecnológica Aplicada - Universidade Tecnológica Federal do Paraná (UTFPR)false
dc.title.none.fl_str_mv Low cost MFC control unit using microcontoller
title Low cost MFC control unit using microcontoller
spellingShingle Low cost MFC control unit using microcontoller
Espindola, Paulo R
Física, Física Aplicada, Instrumentação
MFC; Low cost control; microcontroller; Arduino; gas flux.
title_short Low cost MFC control unit using microcontoller
title_full Low cost MFC control unit using microcontoller
title_fullStr Low cost MFC control unit using microcontoller
title_full_unstemmed Low cost MFC control unit using microcontoller
title_sort Low cost MFC control unit using microcontoller
author Espindola, Paulo R
author_facet Espindola, Paulo R
Aquino, Mariana L
Cena, Cicero R
Alves, Diego C B
Reis, Diogo D
Goncalves, Alem-Mar B
author_role author
author2 Aquino, Mariana L
Cena, Cicero R
Alves, Diego C B
Reis, Diogo D
Goncalves, Alem-Mar B
author2_role author
author
author
author
author
dc.contributor.none.fl_str_mv CNPq
dc.contributor.author.fl_str_mv Espindola, Paulo R
Aquino, Mariana L
Cena, Cicero R
Alves, Diego C B
Reis, Diogo D
Goncalves, Alem-Mar B
dc.subject.por.fl_str_mv Física, Física Aplicada, Instrumentação
MFC; Low cost control; microcontroller; Arduino; gas flux.
topic Física, Física Aplicada, Instrumentação
MFC; Low cost control; microcontroller; Arduino; gas flux.
description In this paper we present a compact and low cost solution to set up and to monitor an electronic Mass Flow Controller (MFC) using an Arduino microcontroller. Usually, MFCs can find a great demand at materials science laboratories, mainly in techniques which requires  a precise gas flow control, such as synthesis of thin films by Chemical Vapor Deposition (CVD). The control unit produced is presented in details by using schematic diagrams of the circuit and a detailed configuration for connect the controller to the MFC are presented. The control unit is also capable to work with two Mass Flow Controllers (MFCs) simultaneously at manual and remote (via computer software) regime. The source code is quite simple and allows the user easily modify parameters as type of gas and flux capacity of the controllers. Although the low resolution of ADC (Analog-to-Digital Converter) (10 bits) and DAC (Digital-to-Analog Converter) (using PWM - “Pulse Width Modulation”, 8 bits), the flux can be adjusted in steps of 0.4 % and 1.5 % of the total flux, respectively, which is very satisfactory for practical purposes. Finally, the operation tests were taken by using Argon (Ar) gas, and great accordance between the set point flow and the MFC measured flow was found.
publishDate 2017
dc.date.none.fl_str_mv 2017-12-01
dc.type.none.fl_str_mv
dc.type.driver.fl_str_mv info:eu-repo/semantics/article
info:eu-repo/semantics/publishedVersion
format article
status_str publishedVersion
dc.identifier.uri.fl_str_mv https://periodicos.utfpr.edu.br/rbfta/article/view/5581
10.3895/rbfta.v4n2.5581
url https://periodicos.utfpr.edu.br/rbfta/article/view/5581
identifier_str_mv 10.3895/rbfta.v4n2.5581
dc.language.iso.fl_str_mv por
language por
dc.relation.none.fl_str_mv https://periodicos.utfpr.edu.br/rbfta/article/view/5581/4620
dc.rights.driver.fl_str_mv Direitos autorais 2017 CC-BY
http://creativecommons.org/licenses/by/4.0
info:eu-repo/semantics/openAccess
rights_invalid_str_mv Direitos autorais 2017 CC-BY
http://creativecommons.org/licenses/by/4.0
eu_rights_str_mv openAccess
dc.format.none.fl_str_mv application/pdf
dc.publisher.none.fl_str_mv Universidade Tecnológica Federal do Paraná (UTFPR)
publisher.none.fl_str_mv Universidade Tecnológica Federal do Paraná (UTFPR)
dc.source.none.fl_str_mv Revista Brasileira de Física Tecnológica Aplicada; v. 4, n. 2 (2017)
2358-0089
10.3895/rbfta.v4n2
reponame:Revista Brasileira de Física Tecnológica Aplicada
instname:Universidade Tecnológica Federal do Paraná (UTFPR)
instacron:UTFPR
instname_str Universidade Tecnológica Federal do Paraná (UTFPR)
instacron_str UTFPR
institution UTFPR
reponame_str Revista Brasileira de Física Tecnológica Aplicada
collection Revista Brasileira de Física Tecnológica Aplicada
repository.name.fl_str_mv Revista Brasileira de Física Tecnológica Aplicada - Universidade Tecnológica Federal do Paraná (UTFPR)
repository.mail.fl_str_mv ||rbfta-pg@utfpr.edu.br
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