Low cost MFC control unit using microcontoller
Autor(a) principal: | |
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Data de Publicação: | 2017 |
Outros Autores: | , , , , |
Tipo de documento: | Artigo |
Idioma: | por |
Título da fonte: | Revista Brasileira de Física Tecnológica Aplicada |
Texto Completo: | https://periodicos.utfpr.edu.br/rbfta/article/view/5581 |
Resumo: | In this paper we present a compact and low cost solution to set up and to monitor an electronic Mass Flow Controller (MFC) using an Arduino microcontroller. Usually, MFCs can find a great demand at materials science laboratories, mainly in techniques which requires a precise gas flow control, such as synthesis of thin films by Chemical Vapor Deposition (CVD). The control unit produced is presented in details by using schematic diagrams of the circuit and a detailed configuration for connect the controller to the MFC are presented. The control unit is also capable to work with two Mass Flow Controllers (MFCs) simultaneously at manual and remote (via computer software) regime. The source code is quite simple and allows the user easily modify parameters as type of gas and flux capacity of the controllers. Although the low resolution of ADC (Analog-to-Digital Converter) (10 bits) and DAC (Digital-to-Analog Converter) (using PWM - “Pulse Width Modulation”, 8 bits), the flux can be adjusted in steps of 0.4 % and 1.5 % of the total flux, respectively, which is very satisfactory for practical purposes. Finally, the operation tests were taken by using Argon (Ar) gas, and great accordance between the set point flow and the MFC measured flow was found. |
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Revista Brasileira de Física Tecnológica Aplicada |
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Low cost MFC control unit using microcontollerFísica, Física Aplicada, InstrumentaçãoMFC; Low cost control; microcontroller; Arduino; gas flux.In this paper we present a compact and low cost solution to set up and to monitor an electronic Mass Flow Controller (MFC) using an Arduino microcontroller. Usually, MFCs can find a great demand at materials science laboratories, mainly in techniques which requires a precise gas flow control, such as synthesis of thin films by Chemical Vapor Deposition (CVD). The control unit produced is presented in details by using schematic diagrams of the circuit and a detailed configuration for connect the controller to the MFC are presented. The control unit is also capable to work with two Mass Flow Controllers (MFCs) simultaneously at manual and remote (via computer software) regime. The source code is quite simple and allows the user easily modify parameters as type of gas and flux capacity of the controllers. Although the low resolution of ADC (Analog-to-Digital Converter) (10 bits) and DAC (Digital-to-Analog Converter) (using PWM - “Pulse Width Modulation”, 8 bits), the flux can be adjusted in steps of 0.4 % and 1.5 % of the total flux, respectively, which is very satisfactory for practical purposes. Finally, the operation tests were taken by using Argon (Ar) gas, and great accordance between the set point flow and the MFC measured flow was found.Universidade Tecnológica Federal do Paraná (UTFPR)CNPqEspindola, Paulo RAquino, Mariana LCena, Cicero RAlves, Diego C BReis, Diogo DGoncalves, Alem-Mar B2017-12-01info:eu-repo/semantics/articleinfo:eu-repo/semantics/publishedVersionapplication/pdfhttps://periodicos.utfpr.edu.br/rbfta/article/view/558110.3895/rbfta.v4n2.5581Revista Brasileira de Física Tecnológica Aplicada; v. 4, n. 2 (2017)2358-008910.3895/rbfta.v4n2reponame:Revista Brasileira de Física Tecnológica Aplicadainstname:Universidade Tecnológica Federal do Paraná (UTFPR)instacron:UTFPRporhttps://periodicos.utfpr.edu.br/rbfta/article/view/5581/4620Direitos autorais 2017 CC-BYhttp://creativecommons.org/licenses/by/4.0info:eu-repo/semantics/openAccess2019-12-02T13:21:05Zoai:periodicos.utfpr:article/5581Revistahttps://periodicos.utfpr.edu.br/rbftaPUBhttps://periodicos.utfpr.edu.br/rbfta/oai||rbfta-pg@utfpr.edu.br2358-00892358-0089opendoar:2019-12-02T13:21:05Revista Brasileira de Física Tecnológica Aplicada - Universidade Tecnológica Federal do Paraná (UTFPR)false |
dc.title.none.fl_str_mv |
Low cost MFC control unit using microcontoller |
title |
Low cost MFC control unit using microcontoller |
spellingShingle |
Low cost MFC control unit using microcontoller Espindola, Paulo R Física, Física Aplicada, Instrumentação MFC; Low cost control; microcontroller; Arduino; gas flux. |
title_short |
Low cost MFC control unit using microcontoller |
title_full |
Low cost MFC control unit using microcontoller |
title_fullStr |
Low cost MFC control unit using microcontoller |
title_full_unstemmed |
Low cost MFC control unit using microcontoller |
title_sort |
Low cost MFC control unit using microcontoller |
author |
Espindola, Paulo R |
author_facet |
Espindola, Paulo R Aquino, Mariana L Cena, Cicero R Alves, Diego C B Reis, Diogo D Goncalves, Alem-Mar B |
author_role |
author |
author2 |
Aquino, Mariana L Cena, Cicero R Alves, Diego C B Reis, Diogo D Goncalves, Alem-Mar B |
author2_role |
author author author author author |
dc.contributor.none.fl_str_mv |
CNPq |
dc.contributor.author.fl_str_mv |
Espindola, Paulo R Aquino, Mariana L Cena, Cicero R Alves, Diego C B Reis, Diogo D Goncalves, Alem-Mar B |
dc.subject.por.fl_str_mv |
Física, Física Aplicada, Instrumentação MFC; Low cost control; microcontroller; Arduino; gas flux. |
topic |
Física, Física Aplicada, Instrumentação MFC; Low cost control; microcontroller; Arduino; gas flux. |
description |
In this paper we present a compact and low cost solution to set up and to monitor an electronic Mass Flow Controller (MFC) using an Arduino microcontroller. Usually, MFCs can find a great demand at materials science laboratories, mainly in techniques which requires a precise gas flow control, such as synthesis of thin films by Chemical Vapor Deposition (CVD). The control unit produced is presented in details by using schematic diagrams of the circuit and a detailed configuration for connect the controller to the MFC are presented. The control unit is also capable to work with two Mass Flow Controllers (MFCs) simultaneously at manual and remote (via computer software) regime. The source code is quite simple and allows the user easily modify parameters as type of gas and flux capacity of the controllers. Although the low resolution of ADC (Analog-to-Digital Converter) (10 bits) and DAC (Digital-to-Analog Converter) (using PWM - “Pulse Width Modulation”, 8 bits), the flux can be adjusted in steps of 0.4 % and 1.5 % of the total flux, respectively, which is very satisfactory for practical purposes. Finally, the operation tests were taken by using Argon (Ar) gas, and great accordance between the set point flow and the MFC measured flow was found. |
publishDate |
2017 |
dc.date.none.fl_str_mv |
2017-12-01 |
dc.type.none.fl_str_mv |
|
dc.type.driver.fl_str_mv |
info:eu-repo/semantics/article info:eu-repo/semantics/publishedVersion |
format |
article |
status_str |
publishedVersion |
dc.identifier.uri.fl_str_mv |
https://periodicos.utfpr.edu.br/rbfta/article/view/5581 10.3895/rbfta.v4n2.5581 |
url |
https://periodicos.utfpr.edu.br/rbfta/article/view/5581 |
identifier_str_mv |
10.3895/rbfta.v4n2.5581 |
dc.language.iso.fl_str_mv |
por |
language |
por |
dc.relation.none.fl_str_mv |
https://periodicos.utfpr.edu.br/rbfta/article/view/5581/4620 |
dc.rights.driver.fl_str_mv |
Direitos autorais 2017 CC-BY http://creativecommons.org/licenses/by/4.0 info:eu-repo/semantics/openAccess |
rights_invalid_str_mv |
Direitos autorais 2017 CC-BY http://creativecommons.org/licenses/by/4.0 |
eu_rights_str_mv |
openAccess |
dc.format.none.fl_str_mv |
application/pdf |
dc.publisher.none.fl_str_mv |
Universidade Tecnológica Federal do Paraná (UTFPR) |
publisher.none.fl_str_mv |
Universidade Tecnológica Federal do Paraná (UTFPR) |
dc.source.none.fl_str_mv |
Revista Brasileira de Física Tecnológica Aplicada; v. 4, n. 2 (2017) 2358-0089 10.3895/rbfta.v4n2 reponame:Revista Brasileira de Física Tecnológica Aplicada instname:Universidade Tecnológica Federal do Paraná (UTFPR) instacron:UTFPR |
instname_str |
Universidade Tecnológica Federal do Paraná (UTFPR) |
instacron_str |
UTFPR |
institution |
UTFPR |
reponame_str |
Revista Brasileira de Física Tecnológica Aplicada |
collection |
Revista Brasileira de Física Tecnológica Aplicada |
repository.name.fl_str_mv |
Revista Brasileira de Física Tecnológica Aplicada - Universidade Tecnológica Federal do Paraná (UTFPR) |
repository.mail.fl_str_mv |
||rbfta-pg@utfpr.edu.br |
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1811722803697680384 |