Photoluminescence of nc-Si:Er thin films obtained by physical and chemical vapour deposition techniques: The effects os microstructure and chemical composition

Detalhes bibliográficos
Autor(a) principal: Cerqueira, M. F.
Data de Publicação: 2009
Outros Autores: Losurdo, M., Stepikhova, M., Alpuim, P., Andrês, G., Kozanecki, A., Soares, Manuel Jorge, Peres, M.
Tipo de documento: Artigo
Idioma: eng
Título da fonte: Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
Texto Completo: http://hdl.handle.net/1822/13773
Resumo: Erbium doped nanocrystalline silicon (nc-Si:Er) thin films were produced by reactive magnetron rf sputtering and by Er ion implantation into chemical vapor deposited Si films. The structure and chemical composition of films obtained by the two approaches were studied by micro-Raman scattering, spectroscopic ellipsometry and Rutherford backscattering techniques. Variation of deposition parameters was used to deposit films with different crystalline fraction and crystallite size. Photoluminescence measurements revealed a correlation between film microstructure and the Er3+ photoluminescence efficiency.
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spelling Photoluminescence of nc-Si:Er thin films obtained by physical and chemical vapour deposition techniques: The effects os microstructure and chemical compositionErbiumNanocrystalline siliconPhotoluminescenceScience & TechnologyErbium doped nanocrystalline silicon (nc-Si:Er) thin films were produced by reactive magnetron rf sputtering and by Er ion implantation into chemical vapor deposited Si films. The structure and chemical composition of films obtained by the two approaches were studied by micro-Raman scattering, spectroscopic ellipsometry and Rutherford backscattering techniques. Variation of deposition parameters was used to deposit films with different crystalline fraction and crystallite size. Photoluminescence measurements revealed a correlation between film microstructure and the Er3+ photoluminescence efficiency.FCT Project POCTI/CTM/39395/2001INTAS Project #03-51-6486ElsevierUniversidade do MinhoCerqueira, M. F.Losurdo, M.Stepikhova, M.Alpuim, P.Andrês, G.Kozanecki, A.Soares, Manuel JorgePeres, M.20092009-01-01T00:00:00Zinfo:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/articleapplication/pdfhttp://hdl.handle.net/1822/13773eng0040-609010.1016/j.tsf.2009.02.146http://www.sciencedirect.com/science/article/pii/S0040609009004441info:eu-repo/semantics/openAccessreponame:Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)instname:Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informaçãoinstacron:RCAAP2023-07-21T12:00:59ZPortal AgregadorONG
dc.title.none.fl_str_mv Photoluminescence of nc-Si:Er thin films obtained by physical and chemical vapour deposition techniques: The effects os microstructure and chemical composition
title Photoluminescence of nc-Si:Er thin films obtained by physical and chemical vapour deposition techniques: The effects os microstructure and chemical composition
spellingShingle Photoluminescence of nc-Si:Er thin films obtained by physical and chemical vapour deposition techniques: The effects os microstructure and chemical composition
Cerqueira, M. F.
Erbium
Nanocrystalline silicon
Photoluminescence
Science & Technology
title_short Photoluminescence of nc-Si:Er thin films obtained by physical and chemical vapour deposition techniques: The effects os microstructure and chemical composition
title_full Photoluminescence of nc-Si:Er thin films obtained by physical and chemical vapour deposition techniques: The effects os microstructure and chemical composition
title_fullStr Photoluminescence of nc-Si:Er thin films obtained by physical and chemical vapour deposition techniques: The effects os microstructure and chemical composition
title_full_unstemmed Photoluminescence of nc-Si:Er thin films obtained by physical and chemical vapour deposition techniques: The effects os microstructure and chemical composition
title_sort Photoluminescence of nc-Si:Er thin films obtained by physical and chemical vapour deposition techniques: The effects os microstructure and chemical composition
author Cerqueira, M. F.
author_facet Cerqueira, M. F.
Losurdo, M.
Stepikhova, M.
Alpuim, P.
Andrês, G.
Kozanecki, A.
Soares, Manuel Jorge
Peres, M.
author_role author
author2 Losurdo, M.
Stepikhova, M.
Alpuim, P.
Andrês, G.
Kozanecki, A.
Soares, Manuel Jorge
Peres, M.
author2_role author
author
author
author
author
author
author
dc.contributor.none.fl_str_mv Universidade do Minho
dc.contributor.author.fl_str_mv Cerqueira, M. F.
Losurdo, M.
Stepikhova, M.
Alpuim, P.
Andrês, G.
Kozanecki, A.
Soares, Manuel Jorge
Peres, M.
dc.subject.por.fl_str_mv Erbium
Nanocrystalline silicon
Photoluminescence
Science & Technology
topic Erbium
Nanocrystalline silicon
Photoluminescence
Science & Technology
description Erbium doped nanocrystalline silicon (nc-Si:Er) thin films were produced by reactive magnetron rf sputtering and by Er ion implantation into chemical vapor deposited Si films. The structure and chemical composition of films obtained by the two approaches were studied by micro-Raman scattering, spectroscopic ellipsometry and Rutherford backscattering techniques. Variation of deposition parameters was used to deposit films with different crystalline fraction and crystallite size. Photoluminescence measurements revealed a correlation between film microstructure and the Er3+ photoluminescence efficiency.
publishDate 2009
dc.date.none.fl_str_mv 2009
2009-01-01T00:00:00Z
dc.type.status.fl_str_mv info:eu-repo/semantics/publishedVersion
dc.type.driver.fl_str_mv info:eu-repo/semantics/article
format article
status_str publishedVersion
dc.identifier.uri.fl_str_mv http://hdl.handle.net/1822/13773
url http://hdl.handle.net/1822/13773
dc.language.iso.fl_str_mv eng
language eng
dc.relation.none.fl_str_mv 0040-6090
10.1016/j.tsf.2009.02.146
http://www.sciencedirect.com/science/article/pii/S0040609009004441
dc.rights.driver.fl_str_mv info:eu-repo/semantics/openAccess
eu_rights_str_mv openAccess
dc.format.none.fl_str_mv application/pdf
dc.publisher.none.fl_str_mv Elsevier
publisher.none.fl_str_mv Elsevier
dc.source.none.fl_str_mv reponame:Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
instname:Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação
instacron:RCAAP
instname_str Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação
instacron_str RCAAP
institution RCAAP
reponame_str Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
collection Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
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repository.mail.fl_str_mv
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