A study of TiAlN coatings prepared by rf co-sputtering

• Autor(a) principal: García-González,L.
• Data de Publicação: 2007
• Outros Autores: Garnica-Romo,M. G., Hernández-Torres,J., Espinoza-Beltrán,F. J.
• Tipo de documento: Artigo
• Idioma: eng
• Título da fonte: Brazilian Journal of Chemical Engineering
• Texto Completo: http://old.scielo.br/scielo.php?script=sci_arttext&pid=S0104-66322007000200009
• topic: Amorphous films; Reactive sputtering; TiAlN

Using the reactive magnetron rf co-sputtering technique and a Ti target partially covered with a small Al plate, TiAlN coatings were made on c-Si in a reactive atmosphere of nitrogen and argon. Coatings were deposited on substrates at 22°C and at 150°C. The substrate temperature notably affected the thickness, crystalline grain size, and hardness of the coatings. We analyzed the dependence of both structure and crystalline grain sizes on substrate temperature and the chemical composition of the coatings. The structural properties and the chemical composition were obtained by means of XRD and EDS techniques. High aluminum content was found in the coatings for the samples grown at the lower substrate temperature when samples were measured by electron dispersive spectroscopy technique. Atomic force microscopy measurements showed a surface morphology dependent on the nitrogen content. Scanning electron microscopy measurements showed a clear pyramidal microstructure of TiAlN coatings grown at 22°C, while the microstructure of those grown at a substrate temperature of 150°C were not well defined.