Development of dark Ti(C,O,N) coatings prepared by reactive sputtering

Detalhes bibliográficos
Autor(a) principal: Chappé, J. M.
Data de Publicação: 2008
Outros Autores: Vaz, F., Cunha, L., Moura, C., Marco de Lucas, M. C., Imhoff, L., Bourgeois, S., Pierson, J. F.
Tipo de documento: Artigo
Idioma: eng
Título da fonte: Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
Texto Completo: http://hdl.handle.net/1822/13840
Resumo: Accepted manuscript
id RCAP_1bdb910001365b9785bd29c8a1c18863
oai_identifier_str oai:repositorium.sdum.uminho.pt:1822/13840
network_acronym_str RCAP
network_name_str Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
repository_id_str 7160
spelling Development of dark Ti(C,O,N) coatings prepared by reactive sputteringReactive sputteringTitanium oxycarbonitrideStructureDecorative propertiesScience & TechnologyAccepted manuscriptDirect current reactive magnetron sputtering was implemented to successfully deposit dark Ti(C,O,N) thin films on silicon substrates. A titanium target was sputtered while a mixture of oxygen and nitrogen was injected into the deposition chamber, independently from an acetylene source. The deposition parameters were chosen as a function of pre-existing knowledge about sputtered Ti–O–N and Ti–C–O films. Tuning the oxygen/(nitrogen+carbon) ratio allowed obtaining a large spectrum of properties. In particular, the colour of the films was characterized by spectral reflectance spectroscopy, and expressed in the CIE 1976 L*a*b* colour space. An accurate control of the reactive gas mixture flow rate allowed obtaining intrinsic, stable and attractive dark colour for decorative applications. Surprisingly, the coatings with the lowest content of carbon and the highest content of oxygen presented the darkest tones. Composition analysis by electron probe microanalysis was done to quantify the titanium and metalloid concentrations in the films. X-ray diffraction experiments revealed the evolution of the film structure from a fcc structure for the lowest (O2+N2) flow rates to an amorphous one for the highest flow rates.Fundação para a Ciência e Tecnologia (FCT) - SFRH/BPD/27114/2006 and PTDC/CTM/69362/2006. CRUP (Acção Integrada Luso-francesa No. F-2307). GRICES/CNRS collaboration (Proc. 4.1.1 França)ElsevierUniversidade do MinhoChappé, J. M.Vaz, F.Cunha, L.Moura, C.Marco de Lucas, M. C.Imhoff, L.Bourgeois, S.Pierson, J. F.2008-06-302008-06-30T00:00:00Zinfo:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/articleapplication/pdfhttp://hdl.handle.net/1822/13840eng0257-897210.1016/j.surfcoat.2008.05.039http://www.sciencedirect.com/science/article/pii/S0257897208004118info:eu-repo/semantics/openAccessreponame:Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)instname:Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informaçãoinstacron:RCAAP2023-07-21T12:20:12Zoai:repositorium.sdum.uminho.pt:1822/13840Portal AgregadorONGhttps://www.rcaap.pt/oai/openaireopendoar:71602024-03-19T19:13:17.038833Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) - Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informaçãofalse
dc.title.none.fl_str_mv Development of dark Ti(C,O,N) coatings prepared by reactive sputtering
title Development of dark Ti(C,O,N) coatings prepared by reactive sputtering
spellingShingle Development of dark Ti(C,O,N) coatings prepared by reactive sputtering
Chappé, J. M.
Reactive sputtering
Titanium oxycarbonitride
Structure
Decorative properties
Science & Technology
title_short Development of dark Ti(C,O,N) coatings prepared by reactive sputtering
title_full Development of dark Ti(C,O,N) coatings prepared by reactive sputtering
title_fullStr Development of dark Ti(C,O,N) coatings prepared by reactive sputtering
title_full_unstemmed Development of dark Ti(C,O,N) coatings prepared by reactive sputtering
title_sort Development of dark Ti(C,O,N) coatings prepared by reactive sputtering
author Chappé, J. M.
author_facet Chappé, J. M.
Vaz, F.
Cunha, L.
Moura, C.
Marco de Lucas, M. C.
Imhoff, L.
Bourgeois, S.
Pierson, J. F.
author_role author
author2 Vaz, F.
Cunha, L.
Moura, C.
Marco de Lucas, M. C.
Imhoff, L.
Bourgeois, S.
Pierson, J. F.
author2_role author
author
author
author
author
author
author
dc.contributor.none.fl_str_mv Universidade do Minho
dc.contributor.author.fl_str_mv Chappé, J. M.
Vaz, F.
Cunha, L.
Moura, C.
Marco de Lucas, M. C.
Imhoff, L.
Bourgeois, S.
Pierson, J. F.
dc.subject.por.fl_str_mv Reactive sputtering
Titanium oxycarbonitride
Structure
Decorative properties
Science & Technology
topic Reactive sputtering
Titanium oxycarbonitride
Structure
Decorative properties
Science & Technology
description Accepted manuscript
publishDate 2008
dc.date.none.fl_str_mv 2008-06-30
2008-06-30T00:00:00Z
dc.type.status.fl_str_mv info:eu-repo/semantics/publishedVersion
dc.type.driver.fl_str_mv info:eu-repo/semantics/article
format article
status_str publishedVersion
dc.identifier.uri.fl_str_mv http://hdl.handle.net/1822/13840
url http://hdl.handle.net/1822/13840
dc.language.iso.fl_str_mv eng
language eng
dc.relation.none.fl_str_mv 0257-8972
10.1016/j.surfcoat.2008.05.039
http://www.sciencedirect.com/science/article/pii/S0257897208004118
dc.rights.driver.fl_str_mv info:eu-repo/semantics/openAccess
eu_rights_str_mv openAccess
dc.format.none.fl_str_mv application/pdf
dc.publisher.none.fl_str_mv Elsevier
publisher.none.fl_str_mv Elsevier
dc.source.none.fl_str_mv reponame:Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
instname:Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação
instacron:RCAAP
instname_str Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação
instacron_str RCAAP
institution RCAAP
reponame_str Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
collection Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
repository.name.fl_str_mv Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) - Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação
repository.mail.fl_str_mv
_version_ 1799132570619740160

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