Fabrication of Spin Coater Device using Hematocrit Centrifuge with Vacuum Substrate Holder for Thin Film Deposition

Detalhes bibliográficos
Autor(a) principal: Hameed,Ammar S.
Data de Publicação: 2022
Outros Autores: Madlool,Rajaa A., Ridha,Noor J., Hussein,Basheer M., Alosfur,Firas K. Mohamad, Tahir,Khawla J.
Tipo de documento: Artigo
Idioma: eng
Título da fonte: Materials research (São Carlos. Online)
Texto Completo: http://old.scielo.br/scielo.php?script=sci_arttext&pid=S1516-14392022000100274
Resumo: Abstract One of the most important thin film deposition techniques on a silicon, quartz or sapphire substrate in the world is the spin coating method. Hematocrit centrifuge was used to elaborately manufacture the spin coating machine from affordable materials without vibrations. The vacuum holder substrate in this system is used for substrate adhesion. This method provides a dimensionally free substrate with appropriate adhesion for sedimentation upon high-speed spinning. A platinum thin film was deposited on a fluorine-doped tin oxide glass (FTO) substrate with a specific concentration of hexa-chloro-platinic acid. Platinum thin films were investigated by Field Emission Scanning Electron Microscope (FESEM) and UV-Vis spectroscopy. FESEM displays successfully produced platinum thin films. The results showed a platinum film transmittance decrement with increasing of hexachloro-platinic acid content. Therefore, the suggested spin coater in this work can deposit platinum thin films with high transmittance up to (98 a.u.).
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spelling Fabrication of Spin Coater Device using Hematocrit Centrifuge with Vacuum Substrate Holder for Thin Film DepositionSpin coatervacuum holder substratePlatinum thin filmsAbstract One of the most important thin film deposition techniques on a silicon, quartz or sapphire substrate in the world is the spin coating method. Hematocrit centrifuge was used to elaborately manufacture the spin coating machine from affordable materials without vibrations. The vacuum holder substrate in this system is used for substrate adhesion. This method provides a dimensionally free substrate with appropriate adhesion for sedimentation upon high-speed spinning. A platinum thin film was deposited on a fluorine-doped tin oxide glass (FTO) substrate with a specific concentration of hexa-chloro-platinic acid. Platinum thin films were investigated by Field Emission Scanning Electron Microscope (FESEM) and UV-Vis spectroscopy. FESEM displays successfully produced platinum thin films. The results showed a platinum film transmittance decrement with increasing of hexachloro-platinic acid content. Therefore, the suggested spin coater in this work can deposit platinum thin films with high transmittance up to (98 a.u.).ABM, ABC, ABPol2022-01-01info:eu-repo/semantics/articleinfo:eu-repo/semantics/publishedVersiontext/htmlhttp://old.scielo.br/scielo.php?script=sci_arttext&pid=S1516-14392022000100274Materials Research v.25 2022reponame:Materials research (São Carlos. Online)instname:Universidade Federal de São Carlos (UFSCAR)instacron:ABM ABC ABPOL10.1590/1980-5373-mr-2021-0496info:eu-repo/semantics/openAccessHameed,Ammar S.Madlool,Rajaa A.Ridha,Noor J.Hussein,Basheer M.Alosfur,Firas K. MohamadTahir,Khawla J.eng2022-02-18T00:00:00Zoai:scielo:S1516-14392022000100274Revistahttp://www.scielo.br/mrPUBhttps://old.scielo.br/oai/scielo-oai.phpdedz@power.ufscar.br1980-53731516-1439opendoar:2022-02-18T00:00Materials research (São Carlos. Online) - Universidade Federal de São Carlos (UFSCAR)false
dc.title.none.fl_str_mv Fabrication of Spin Coater Device using Hematocrit Centrifuge with Vacuum Substrate Holder for Thin Film Deposition
title Fabrication of Spin Coater Device using Hematocrit Centrifuge with Vacuum Substrate Holder for Thin Film Deposition
spellingShingle Fabrication of Spin Coater Device using Hematocrit Centrifuge with Vacuum Substrate Holder for Thin Film Deposition
Hameed,Ammar S.
Spin coater
vacuum holder substrate
Platinum thin films
title_short Fabrication of Spin Coater Device using Hematocrit Centrifuge with Vacuum Substrate Holder for Thin Film Deposition
title_full Fabrication of Spin Coater Device using Hematocrit Centrifuge with Vacuum Substrate Holder for Thin Film Deposition
title_fullStr Fabrication of Spin Coater Device using Hematocrit Centrifuge with Vacuum Substrate Holder for Thin Film Deposition
title_full_unstemmed Fabrication of Spin Coater Device using Hematocrit Centrifuge with Vacuum Substrate Holder for Thin Film Deposition
title_sort Fabrication of Spin Coater Device using Hematocrit Centrifuge with Vacuum Substrate Holder for Thin Film Deposition
author Hameed,Ammar S.
author_facet Hameed,Ammar S.
Madlool,Rajaa A.
Ridha,Noor J.
Hussein,Basheer M.
Alosfur,Firas K. Mohamad
Tahir,Khawla J.
author_role author
author2 Madlool,Rajaa A.
Ridha,Noor J.
Hussein,Basheer M.
Alosfur,Firas K. Mohamad
Tahir,Khawla J.
author2_role author
author
author
author
author
dc.contributor.author.fl_str_mv Hameed,Ammar S.
Madlool,Rajaa A.
Ridha,Noor J.
Hussein,Basheer M.
Alosfur,Firas K. Mohamad
Tahir,Khawla J.
dc.subject.por.fl_str_mv Spin coater
vacuum holder substrate
Platinum thin films
topic Spin coater
vacuum holder substrate
Platinum thin films
description Abstract One of the most important thin film deposition techniques on a silicon, quartz or sapphire substrate in the world is the spin coating method. Hematocrit centrifuge was used to elaborately manufacture the spin coating machine from affordable materials without vibrations. The vacuum holder substrate in this system is used for substrate adhesion. This method provides a dimensionally free substrate with appropriate adhesion for sedimentation upon high-speed spinning. A platinum thin film was deposited on a fluorine-doped tin oxide glass (FTO) substrate with a specific concentration of hexa-chloro-platinic acid. Platinum thin films were investigated by Field Emission Scanning Electron Microscope (FESEM) and UV-Vis spectroscopy. FESEM displays successfully produced platinum thin films. The results showed a platinum film transmittance decrement with increasing of hexachloro-platinic acid content. Therefore, the suggested spin coater in this work can deposit platinum thin films with high transmittance up to (98 a.u.).
publishDate 2022
dc.date.none.fl_str_mv 2022-01-01
dc.type.driver.fl_str_mv info:eu-repo/semantics/article
dc.type.status.fl_str_mv info:eu-repo/semantics/publishedVersion
format article
status_str publishedVersion
dc.identifier.uri.fl_str_mv http://old.scielo.br/scielo.php?script=sci_arttext&pid=S1516-14392022000100274
url http://old.scielo.br/scielo.php?script=sci_arttext&pid=S1516-14392022000100274
dc.language.iso.fl_str_mv eng
language eng
dc.relation.none.fl_str_mv 10.1590/1980-5373-mr-2021-0496
dc.rights.driver.fl_str_mv info:eu-repo/semantics/openAccess
eu_rights_str_mv openAccess
dc.format.none.fl_str_mv text/html
dc.publisher.none.fl_str_mv ABM, ABC, ABPol
publisher.none.fl_str_mv ABM, ABC, ABPol
dc.source.none.fl_str_mv Materials Research v.25 2022
reponame:Materials research (São Carlos. Online)
instname:Universidade Federal de São Carlos (UFSCAR)
instacron:ABM ABC ABPOL
instname_str Universidade Federal de São Carlos (UFSCAR)
instacron_str ABM ABC ABPOL
institution ABM ABC ABPOL
reponame_str Materials research (São Carlos. Online)
collection Materials research (São Carlos. Online)
repository.name.fl_str_mv Materials research (São Carlos. Online) - Universidade Federal de São Carlos (UFSCAR)
repository.mail.fl_str_mv dedz@power.ufscar.br
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