Spray Deposited Nanostructured CuO Thin Films: Influence of Substrate Temperature and Annealing Process
Autor(a) principal: | |
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Data de Publicação: | 2018 |
Outros Autores: | |
Tipo de documento: | Artigo |
Idioma: | eng |
Título da fonte: | Materials research (São Carlos. Online) |
Texto Completo: | http://old.scielo.br/scielo.php?script=sci_arttext&pid=S1516-14392018000202107 |
Resumo: | In this study, CuO thin films were deposited on glass substrates at a wide range of temperatures from 450ºC to 550ºC with steps of 25ºC by chemical spray pyrolysis technique. Aiming to investigate the effect of annealing process, one of the resulting films was annealed at 450ºC for 3 hours under ambient air. Based on X-ray diffraction, all the resulting films are monoclinic with two prominent peaks at ~36º and ~39º. The crystallite size of the CuO film deposited at 450ºC was found to be the largest in comparison with the others. As the substrate temperature increased, a gradual change was observed for the CuO thin film surface morphology and in the case of annealed film, the grains and their boundaries became indistinguishable. The resistivity of the films was reduced by virtue of increasing the substrate temperature and also, both the mobility and carrier concentration of the annealed film were improved drastically after annealing. As expected, the CuO thin films absorption was considerable in the visible region and gradually declined after 800nm. The estimated band gap value of the CuO film deposited at 450ºC were fairly close to the optimum band gap for solar applications. |
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Spray Deposited Nanostructured CuO Thin Films: Influence of Substrate Temperature and Annealing ProcessCuO thin filmspray pyrolysis techniquesubstrate temperatureannealing processIn this study, CuO thin films were deposited on glass substrates at a wide range of temperatures from 450ºC to 550ºC with steps of 25ºC by chemical spray pyrolysis technique. Aiming to investigate the effect of annealing process, one of the resulting films was annealed at 450ºC for 3 hours under ambient air. Based on X-ray diffraction, all the resulting films are monoclinic with two prominent peaks at ~36º and ~39º. The crystallite size of the CuO film deposited at 450ºC was found to be the largest in comparison with the others. As the substrate temperature increased, a gradual change was observed for the CuO thin film surface morphology and in the case of annealed film, the grains and their boundaries became indistinguishable. The resistivity of the films was reduced by virtue of increasing the substrate temperature and also, both the mobility and carrier concentration of the annealed film were improved drastically after annealing. As expected, the CuO thin films absorption was considerable in the visible region and gradually declined after 800nm. The estimated band gap value of the CuO film deposited at 450ºC were fairly close to the optimum band gap for solar applications.ABM, ABC, ABPol2018-01-01info:eu-repo/semantics/articleinfo:eu-repo/semantics/publishedVersiontext/htmlhttp://old.scielo.br/scielo.php?script=sci_arttext&pid=S1516-14392018000202107Materials Research v.21 n.2 2018reponame:Materials research (São Carlos. Online)instname:Universidade Federal de São Carlos (UFSCAR)instacron:ABM ABC ABPOL10.1590/1980-5373-mr-2017-0754info:eu-repo/semantics/openAccessZare Asl,HassanMohammad Rozati,Seyedeng2018-05-15T00:00:00Zoai:scielo:S1516-14392018000202107Revistahttp://www.scielo.br/mrPUBhttps://old.scielo.br/oai/scielo-oai.phpdedz@power.ufscar.br1980-53731516-1439opendoar:2018-05-15T00:00Materials research (São Carlos. Online) - Universidade Federal de São Carlos (UFSCAR)false |
dc.title.none.fl_str_mv |
Spray Deposited Nanostructured CuO Thin Films: Influence of Substrate Temperature and Annealing Process |
title |
Spray Deposited Nanostructured CuO Thin Films: Influence of Substrate Temperature and Annealing Process |
spellingShingle |
Spray Deposited Nanostructured CuO Thin Films: Influence of Substrate Temperature and Annealing Process Zare Asl,Hassan CuO thin film spray pyrolysis technique substrate temperature annealing process |
title_short |
Spray Deposited Nanostructured CuO Thin Films: Influence of Substrate Temperature and Annealing Process |
title_full |
Spray Deposited Nanostructured CuO Thin Films: Influence of Substrate Temperature and Annealing Process |
title_fullStr |
Spray Deposited Nanostructured CuO Thin Films: Influence of Substrate Temperature and Annealing Process |
title_full_unstemmed |
Spray Deposited Nanostructured CuO Thin Films: Influence of Substrate Temperature and Annealing Process |
title_sort |
Spray Deposited Nanostructured CuO Thin Films: Influence of Substrate Temperature and Annealing Process |
author |
Zare Asl,Hassan |
author_facet |
Zare Asl,Hassan Mohammad Rozati,Seyed |
author_role |
author |
author2 |
Mohammad Rozati,Seyed |
author2_role |
author |
dc.contributor.author.fl_str_mv |
Zare Asl,Hassan Mohammad Rozati,Seyed |
dc.subject.por.fl_str_mv |
CuO thin film spray pyrolysis technique substrate temperature annealing process |
topic |
CuO thin film spray pyrolysis technique substrate temperature annealing process |
description |
In this study, CuO thin films were deposited on glass substrates at a wide range of temperatures from 450ºC to 550ºC with steps of 25ºC by chemical spray pyrolysis technique. Aiming to investigate the effect of annealing process, one of the resulting films was annealed at 450ºC for 3 hours under ambient air. Based on X-ray diffraction, all the resulting films are monoclinic with two prominent peaks at ~36º and ~39º. The crystallite size of the CuO film deposited at 450ºC was found to be the largest in comparison with the others. As the substrate temperature increased, a gradual change was observed for the CuO thin film surface morphology and in the case of annealed film, the grains and their boundaries became indistinguishable. The resistivity of the films was reduced by virtue of increasing the substrate temperature and also, both the mobility and carrier concentration of the annealed film were improved drastically after annealing. As expected, the CuO thin films absorption was considerable in the visible region and gradually declined after 800nm. The estimated band gap value of the CuO film deposited at 450ºC were fairly close to the optimum band gap for solar applications. |
publishDate |
2018 |
dc.date.none.fl_str_mv |
2018-01-01 |
dc.type.driver.fl_str_mv |
info:eu-repo/semantics/article |
dc.type.status.fl_str_mv |
info:eu-repo/semantics/publishedVersion |
format |
article |
status_str |
publishedVersion |
dc.identifier.uri.fl_str_mv |
http://old.scielo.br/scielo.php?script=sci_arttext&pid=S1516-14392018000202107 |
url |
http://old.scielo.br/scielo.php?script=sci_arttext&pid=S1516-14392018000202107 |
dc.language.iso.fl_str_mv |
eng |
language |
eng |
dc.relation.none.fl_str_mv |
10.1590/1980-5373-mr-2017-0754 |
dc.rights.driver.fl_str_mv |
info:eu-repo/semantics/openAccess |
eu_rights_str_mv |
openAccess |
dc.format.none.fl_str_mv |
text/html |
dc.publisher.none.fl_str_mv |
ABM, ABC, ABPol |
publisher.none.fl_str_mv |
ABM, ABC, ABPol |
dc.source.none.fl_str_mv |
Materials Research v.21 n.2 2018 reponame:Materials research (São Carlos. Online) instname:Universidade Federal de São Carlos (UFSCAR) instacron:ABM ABC ABPOL |
instname_str |
Universidade Federal de São Carlos (UFSCAR) |
instacron_str |
ABM ABC ABPOL |
institution |
ABM ABC ABPOL |
reponame_str |
Materials research (São Carlos. Online) |
collection |
Materials research (São Carlos. Online) |
repository.name.fl_str_mv |
Materials research (São Carlos. Online) - Universidade Federal de São Carlos (UFSCAR) |
repository.mail.fl_str_mv |
dedz@power.ufscar.br |
_version_ |
1754212673713602560 |