Effects of annealing on electrical and optical properties of a multilayer InAs/GaAs quantum dots system
Autor(a) principal: | |
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Data de Publicação: | 2004 |
Outros Autores: | , , , , |
Tipo de documento: | Artigo |
Idioma: | eng |
Título da fonte: | Materials research (São Carlos. Online) |
Texto Completo: | http://old.scielo.br/scielo.php?script=sci_arttext&pid=S1516-14392004000300014 |
Resumo: | A systematic investigation of the properties of the InAs/GaAs self-assembled quantum dots (SAQDs) system subjected to a post-growth annealing using capacitance-voltage, Raman scattering and photoluminescence measurements is presented. The application of both electrical and optical methods allowed us to obtain reliable information on the microscopic structural evolution of this system. The single layer and the multilayer quantum dots were found to respond differently to the annealing process, due to the differences in strain that occur in both systems. The diffusion activated by strain provoked the appearance of an InGaAs alloy layer in substitution to the quantum dots layers; this change occurred at the annealing temperature T = 600 ºC in the multilayer system. A single dot layer, however, was observed even after the annealing at T = 700 ºC. Moreover, the low temperature annealing was found to improve the homogeneity of the multilayer system and to decrease the electrical interlayer coupling. |
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Effects of annealing on electrical and optical properties of a multilayer InAs/GaAs quantum dots systemInAs/GaAs quantum dotscapacitanceraman scatteringA systematic investigation of the properties of the InAs/GaAs self-assembled quantum dots (SAQDs) system subjected to a post-growth annealing using capacitance-voltage, Raman scattering and photoluminescence measurements is presented. The application of both electrical and optical methods allowed us to obtain reliable information on the microscopic structural evolution of this system. The single layer and the multilayer quantum dots were found to respond differently to the annealing process, due to the differences in strain that occur in both systems. The diffusion activated by strain provoked the appearance of an InGaAs alloy layer in substitution to the quantum dots layers; this change occurred at the annealing temperature T = 600 ºC in the multilayer system. A single dot layer, however, was observed even after the annealing at T = 700 ºC. Moreover, the low temperature annealing was found to improve the homogeneity of the multilayer system and to decrease the electrical interlayer coupling.ABM, ABC, ABPol2004-09-01info:eu-repo/semantics/articleinfo:eu-repo/semantics/publishedVersiontext/htmlhttp://old.scielo.br/scielo.php?script=sci_arttext&pid=S1516-14392004000300014Materials Research v.7 n.3 2004reponame:Materials research (São Carlos. Online)instname:Universidade Federal de São Carlos (UFSCAR)instacron:ABM ABC ABPOL10.1590/S1516-14392004000300014info:eu-repo/semantics/openAccessChiquito,Adenilson JoséPusep,Yuri AlexanderMergulhão,SérgioGobato,Yara GalvãoGalzerani,José CláudioMoshegov,Nicolaieng2004-08-13T00:00:00Zoai:scielo:S1516-14392004000300014Revistahttp://www.scielo.br/mrPUBhttps://old.scielo.br/oai/scielo-oai.phpdedz@power.ufscar.br1980-53731516-1439opendoar:2004-08-13T00:00Materials research (São Carlos. Online) - Universidade Federal de São Carlos (UFSCAR)false |
dc.title.none.fl_str_mv |
Effects of annealing on electrical and optical properties of a multilayer InAs/GaAs quantum dots system |
title |
Effects of annealing on electrical and optical properties of a multilayer InAs/GaAs quantum dots system |
spellingShingle |
Effects of annealing on electrical and optical properties of a multilayer InAs/GaAs quantum dots system Chiquito,Adenilson José InAs/GaAs quantum dots capacitance raman scattering |
title_short |
Effects of annealing on electrical and optical properties of a multilayer InAs/GaAs quantum dots system |
title_full |
Effects of annealing on electrical and optical properties of a multilayer InAs/GaAs quantum dots system |
title_fullStr |
Effects of annealing on electrical and optical properties of a multilayer InAs/GaAs quantum dots system |
title_full_unstemmed |
Effects of annealing on electrical and optical properties of a multilayer InAs/GaAs quantum dots system |
title_sort |
Effects of annealing on electrical and optical properties of a multilayer InAs/GaAs quantum dots system |
author |
Chiquito,Adenilson José |
author_facet |
Chiquito,Adenilson José Pusep,Yuri Alexander Mergulhão,Sérgio Gobato,Yara Galvão Galzerani,José Cláudio Moshegov,Nicolai |
author_role |
author |
author2 |
Pusep,Yuri Alexander Mergulhão,Sérgio Gobato,Yara Galvão Galzerani,José Cláudio Moshegov,Nicolai |
author2_role |
author author author author author |
dc.contributor.author.fl_str_mv |
Chiquito,Adenilson José Pusep,Yuri Alexander Mergulhão,Sérgio Gobato,Yara Galvão Galzerani,José Cláudio Moshegov,Nicolai |
dc.subject.por.fl_str_mv |
InAs/GaAs quantum dots capacitance raman scattering |
topic |
InAs/GaAs quantum dots capacitance raman scattering |
description |
A systematic investigation of the properties of the InAs/GaAs self-assembled quantum dots (SAQDs) system subjected to a post-growth annealing using capacitance-voltage, Raman scattering and photoluminescence measurements is presented. The application of both electrical and optical methods allowed us to obtain reliable information on the microscopic structural evolution of this system. The single layer and the multilayer quantum dots were found to respond differently to the annealing process, due to the differences in strain that occur in both systems. The diffusion activated by strain provoked the appearance of an InGaAs alloy layer in substitution to the quantum dots layers; this change occurred at the annealing temperature T = 600 ºC in the multilayer system. A single dot layer, however, was observed even after the annealing at T = 700 ºC. Moreover, the low temperature annealing was found to improve the homogeneity of the multilayer system and to decrease the electrical interlayer coupling. |
publishDate |
2004 |
dc.date.none.fl_str_mv |
2004-09-01 |
dc.type.driver.fl_str_mv |
info:eu-repo/semantics/article |
dc.type.status.fl_str_mv |
info:eu-repo/semantics/publishedVersion |
format |
article |
status_str |
publishedVersion |
dc.identifier.uri.fl_str_mv |
http://old.scielo.br/scielo.php?script=sci_arttext&pid=S1516-14392004000300014 |
url |
http://old.scielo.br/scielo.php?script=sci_arttext&pid=S1516-14392004000300014 |
dc.language.iso.fl_str_mv |
eng |
language |
eng |
dc.relation.none.fl_str_mv |
10.1590/S1516-14392004000300014 |
dc.rights.driver.fl_str_mv |
info:eu-repo/semantics/openAccess |
eu_rights_str_mv |
openAccess |
dc.format.none.fl_str_mv |
text/html |
dc.publisher.none.fl_str_mv |
ABM, ABC, ABPol |
publisher.none.fl_str_mv |
ABM, ABC, ABPol |
dc.source.none.fl_str_mv |
Materials Research v.7 n.3 2004 reponame:Materials research (São Carlos. Online) instname:Universidade Federal de São Carlos (UFSCAR) instacron:ABM ABC ABPOL |
instname_str |
Universidade Federal de São Carlos (UFSCAR) |
instacron_str |
ABM ABC ABPOL |
institution |
ABM ABC ABPOL |
reponame_str |
Materials research (São Carlos. Online) |
collection |
Materials research (São Carlos. Online) |
repository.name.fl_str_mv |
Materials research (São Carlos. Online) - Universidade Federal de São Carlos (UFSCAR) |
repository.mail.fl_str_mv |
dedz@power.ufscar.br |
_version_ |
1754212657743790080 |