Synthesis and Microstructural Characterization of SnO2:F Thin Films Deposited by AACVD
Autor(a) principal: | |
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Data de Publicação: | 2016 |
Outros Autores: | , , , , |
Tipo de documento: | Artigo |
Idioma: | eng |
Título da fonte: | Materials research (São Carlos. Online) |
Texto Completo: | http://old.scielo.br/scielo.php?script=sci_arttext&pid=S1516-14392016000700097 |
Resumo: | In this work, we report the synthesis and microstructural characterization of Tin oxide thin films doped with fluorine for applications such as transparent conductive oxides. Tin oxide doped with fluorine thin films were deposited by aerosol assisted chemical vapor deposition technique onto a borosilicate glass substrate, using a precursor solution of stannic chloride in ethanol and ammonium fluoride as the dopant. Deposition temperature was varied between 623-773 K. Also, other deposition parameters such as concentration of the precursor solution and gas carrier flux were fixed at 0.1 mol∙dm-3 and 5 L min-1 respectively. Results indicate the presence of only the cassiterite phase of Tin oxide in all samples. Thin films obtained were characterized by X-Ray Diffraction. Surface morphology and microstructure were studied by field emission scanning electron microscopy, optical properties of samples were analyzed by total transmittance and reflectance spectra. The resistivity value of the films was measured by the sheet resistance. |
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Materials research (São Carlos. Online) |
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Synthesis and Microstructural Characterization of SnO2:F Thin Films Deposited by AACVDTin oxide filmsSnO2:F (FTO)Solar CellsAACVDIn this work, we report the synthesis and microstructural characterization of Tin oxide thin films doped with fluorine for applications such as transparent conductive oxides. Tin oxide doped with fluorine thin films were deposited by aerosol assisted chemical vapor deposition technique onto a borosilicate glass substrate, using a precursor solution of stannic chloride in ethanol and ammonium fluoride as the dopant. Deposition temperature was varied between 623-773 K. Also, other deposition parameters such as concentration of the precursor solution and gas carrier flux were fixed at 0.1 mol∙dm-3 and 5 L min-1 respectively. Results indicate the presence of only the cassiterite phase of Tin oxide in all samples. Thin films obtained were characterized by X-Ray Diffraction. Surface morphology and microstructure were studied by field emission scanning electron microscopy, optical properties of samples were analyzed by total transmittance and reflectance spectra. The resistivity value of the films was measured by the sheet resistance.ABM, ABC, ABPol2016-12-01info:eu-repo/semantics/articleinfo:eu-repo/semantics/publishedVersiontext/htmlhttp://old.scielo.br/scielo.php?script=sci_arttext&pid=S1516-14392016000700097Materials Research v.19 suppl.1 2016reponame:Materials research (São Carlos. Online)instname:Universidade Federal de São Carlos (UFSCAR)instacron:ABM ABC ABPOL10.1590/1980-5373-mr-2016-0350info:eu-repo/semantics/openAccessChavarría-Castillo,Karen AlejandraAmézaga-Madrid,PatriciaEsquivel-Pereyra,OswaldoAntúnez-Flores,WilberPizá Ruiz,PedroMiki-Yoshida,Marioeng2017-03-30T00:00:00Zoai:scielo:S1516-14392016000700097Revistahttp://www.scielo.br/mrPUBhttps://old.scielo.br/oai/scielo-oai.phpdedz@power.ufscar.br1980-53731516-1439opendoar:2017-03-30T00:00Materials research (São Carlos. Online) - Universidade Federal de São Carlos (UFSCAR)false |
dc.title.none.fl_str_mv |
Synthesis and Microstructural Characterization of SnO2:F Thin Films Deposited by AACVD |
title |
Synthesis and Microstructural Characterization of SnO2:F Thin Films Deposited by AACVD |
spellingShingle |
Synthesis and Microstructural Characterization of SnO2:F Thin Films Deposited by AACVD Chavarría-Castillo,Karen Alejandra Tin oxide films SnO2:F (FTO) Solar Cells AACVD |
title_short |
Synthesis and Microstructural Characterization of SnO2:F Thin Films Deposited by AACVD |
title_full |
Synthesis and Microstructural Characterization of SnO2:F Thin Films Deposited by AACVD |
title_fullStr |
Synthesis and Microstructural Characterization of SnO2:F Thin Films Deposited by AACVD |
title_full_unstemmed |
Synthesis and Microstructural Characterization of SnO2:F Thin Films Deposited by AACVD |
title_sort |
Synthesis and Microstructural Characterization of SnO2:F Thin Films Deposited by AACVD |
author |
Chavarría-Castillo,Karen Alejandra |
author_facet |
Chavarría-Castillo,Karen Alejandra Amézaga-Madrid,Patricia Esquivel-Pereyra,Oswaldo Antúnez-Flores,Wilber Pizá Ruiz,Pedro Miki-Yoshida,Mario |
author_role |
author |
author2 |
Amézaga-Madrid,Patricia Esquivel-Pereyra,Oswaldo Antúnez-Flores,Wilber Pizá Ruiz,Pedro Miki-Yoshida,Mario |
author2_role |
author author author author author |
dc.contributor.author.fl_str_mv |
Chavarría-Castillo,Karen Alejandra Amézaga-Madrid,Patricia Esquivel-Pereyra,Oswaldo Antúnez-Flores,Wilber Pizá Ruiz,Pedro Miki-Yoshida,Mario |
dc.subject.por.fl_str_mv |
Tin oxide films SnO2:F (FTO) Solar Cells AACVD |
topic |
Tin oxide films SnO2:F (FTO) Solar Cells AACVD |
description |
In this work, we report the synthesis and microstructural characterization of Tin oxide thin films doped with fluorine for applications such as transparent conductive oxides. Tin oxide doped with fluorine thin films were deposited by aerosol assisted chemical vapor deposition technique onto a borosilicate glass substrate, using a precursor solution of stannic chloride in ethanol and ammonium fluoride as the dopant. Deposition temperature was varied between 623-773 K. Also, other deposition parameters such as concentration of the precursor solution and gas carrier flux were fixed at 0.1 mol∙dm-3 and 5 L min-1 respectively. Results indicate the presence of only the cassiterite phase of Tin oxide in all samples. Thin films obtained were characterized by X-Ray Diffraction. Surface morphology and microstructure were studied by field emission scanning electron microscopy, optical properties of samples were analyzed by total transmittance and reflectance spectra. The resistivity value of the films was measured by the sheet resistance. |
publishDate |
2016 |
dc.date.none.fl_str_mv |
2016-12-01 |
dc.type.driver.fl_str_mv |
info:eu-repo/semantics/article |
dc.type.status.fl_str_mv |
info:eu-repo/semantics/publishedVersion |
format |
article |
status_str |
publishedVersion |
dc.identifier.uri.fl_str_mv |
http://old.scielo.br/scielo.php?script=sci_arttext&pid=S1516-14392016000700097 |
url |
http://old.scielo.br/scielo.php?script=sci_arttext&pid=S1516-14392016000700097 |
dc.language.iso.fl_str_mv |
eng |
language |
eng |
dc.relation.none.fl_str_mv |
10.1590/1980-5373-mr-2016-0350 |
dc.rights.driver.fl_str_mv |
info:eu-repo/semantics/openAccess |
eu_rights_str_mv |
openAccess |
dc.format.none.fl_str_mv |
text/html |
dc.publisher.none.fl_str_mv |
ABM, ABC, ABPol |
publisher.none.fl_str_mv |
ABM, ABC, ABPol |
dc.source.none.fl_str_mv |
Materials Research v.19 suppl.1 2016 reponame:Materials research (São Carlos. Online) instname:Universidade Federal de São Carlos (UFSCAR) instacron:ABM ABC ABPOL |
instname_str |
Universidade Federal de São Carlos (UFSCAR) |
instacron_str |
ABM ABC ABPOL |
institution |
ABM ABC ABPOL |
reponame_str |
Materials research (São Carlos. Online) |
collection |
Materials research (São Carlos. Online) |
repository.name.fl_str_mv |
Materials research (São Carlos. Online) - Universidade Federal de São Carlos (UFSCAR) |
repository.mail.fl_str_mv |
dedz@power.ufscar.br |
_version_ |
1754212668733915136 |