Nanostructured Titanium Film Deposited by Pulsed Plasma Magnetron Sputtering (Pdms) on a High Voltage Ceramic Insulator for Outdoor Use

• Autor(a) principal: Portella,Kleber Franke
• Data de Publicação: 2015
• Outros Autores: Mengarda,Priscilla, Bragança,Mariana d'Orey Gaivão Portella, Ribeiro Júnior,Sebastião, Melo,Jose Sergio Santos de, Cerqueira,Dailton Pedreira, Pianaro,Sidnei Antonio, Mazur,Maurício Marlon
• Tipo de documento: Artigo
• Idioma: eng
• Título da fonte: Materials research (São Carlos. Online)
• Texto Completo: http://old.scielo.br/scielo.php?script=sci_arttext&pid=S1516-14392015000400853
• topic: nanometric coating; electrical insulator; hydrophobicity; cold plasma; titanium

In this study, the cold plasma technique was used to produce nanometric titanium films with hydrophobic and anti-fouling properties. The films where deposited on porcelain electrical insulators surfaces to minimize the effects of leakage current. The magnetron sputtering technique was used with a target of pure titanium sheet, and argon as the ionization gas. The deposited films present an average thickness of 58 to 350 nm. After coating the insulators, the assays performed indicated a greater degree of hydrophobicity and maintenance of leakage current after exposure to salt spray. Lower leakage current values were observed in both natural and saline environments compared with the uncoated device.