Deposição de nano-camadas de VO2 por Magnetron Sputtering

• Autor(a) principal: Santos, Claudiosir Roque dos
• Data de Publicação: 2007
• Tipo de documento: Dissertação
• Idioma: por
• Título da fonte: Manancial - Repositório Digital da UFSM
• dARK ID: ark:/26339/001300000rss0
• Texto Completo: http://repositorio.ufsm.br/handle/1/9264
• topic: Nano-camadas deVO2; Magnetron sputtering; Transição metal-isolante; VO2; Magnetron sputtering; Metal-insulator transition; VO2 nanolayers; CNPQ::CIENCIAS EXATAS E DA TERRA::FISICA

The vanadium dioxide (VO2) shows a metal-insulator transition (MIT) near the room temperature with huge changes in its electrical and optical behavior. Both the electrical and optic properties, and even the transition temperature, depend on the morphologic characteristics of the metal. In this work, vanadium oxide nanolayers were deposited onto glass substrate by reactive magnetron sputtering. The aim was to obtain the best deposition parameters, like substrate temperature (Ts) and oxygen partial pressure (PO2), for the VO2M1 phase synthesis. Samples deposited with oxygen partial pressures ranging from 10 to 20% of the total pressure, and Ts=400°C, have shown metal insulator transition when submitted to a 550°C ex-situ thermal treatment. The analysis of the x-ray diffraction spectra has shown that all the samples were formed simultaneously by more than one phase of vanadium oxides. Moreover, we identify a reciprocal correspondence between the 2q = 27,8° peak, corresponding to (011) plan in VO2M1, and the MIT transition. The measured resistance in samples with VO2M1, in the temperature range of 25 to 100°C, showed variations of almost three orders of magnitude. The transition critical temperature took place between 59 and 82°C and the hysteresis loops width ranged between 9 and 13°C