Improving light capture on crystalline silicon wafers

Detalhes bibliográficos
Autor(a) principal: Costa, Ivo
Data de Publicação: 2020
Outros Autores: Pera, David, Silva, José
Tipo de documento: Artigo
Idioma: eng
Título da fonte: Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
Texto Completo: http://hdl.handle.net/10451/51487
Resumo: In this article the optimization of a method to increase the photon capture efficiency of crystalline silicon (c-Si) wafers is presented. The method is based on metal assisted chemical etching (MACE) using hydrogen peroxide (H2O2) and hydrofluoric acid (HF) as etchants and silver atoms to catalyze the reaction. Ptype monocrystalline silicon wafers were used, and different etching times and etchants’ concentrations were tested. Results proved the capability of MACE to reduce silicon’s effective reflectance to as low as 3.9%. A strong correlation of the etchants’ molar ratio with the obtained structures morphology and reflectance was also observed.
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spelling Improving light capture on crystalline silicon wafersSemiconductorsOptical materials and propertiesSolar energy materialsIn this article the optimization of a method to increase the photon capture efficiency of crystalline silicon (c-Si) wafers is presented. The method is based on metal assisted chemical etching (MACE) using hydrogen peroxide (H2O2) and hydrofluoric acid (HF) as etchants and silver atoms to catalyze the reaction. Ptype monocrystalline silicon wafers were used, and different etching times and etchants’ concentrations were tested. Results proved the capability of MACE to reduce silicon’s effective reflectance to as low as 3.9%. A strong correlation of the etchants’ molar ratio with the obtained structures morphology and reflectance was also observed.ElsevierRepositório da Universidade de LisboaCosta, IvoPera, DavidSilva, José2022-08-01T00:31:05Z2020-08-012020-08-01T00:00:00Zinfo:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/articleapplication/pdfhttp://hdl.handle.net/10451/51487engI. Costa, D. Pera, J. A. Silva. "Improving light capture on crystalline silicon wafers." Materials Letters 272 (2020): 127825.https://doi.org/10.1016/j.matlet.2020.127825info:eu-repo/semantics/openAccessreponame:Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)instname:Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informaçãoinstacron:RCAAP2024-11-20T18:12:09Zoai:repositorio.ul.pt:10451/51487Portal AgregadorONGhttps://www.rcaap.pt/oai/openairemluisa.alvim@gmail.comopendoar:71602024-11-20T18:12:09Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) - Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informaçãofalse
dc.title.none.fl_str_mv Improving light capture on crystalline silicon wafers
title Improving light capture on crystalline silicon wafers
spellingShingle Improving light capture on crystalline silicon wafers
Costa, Ivo
Semiconductors
Optical materials and properties
Solar energy materials
title_short Improving light capture on crystalline silicon wafers
title_full Improving light capture on crystalline silicon wafers
title_fullStr Improving light capture on crystalline silicon wafers
title_full_unstemmed Improving light capture on crystalline silicon wafers
title_sort Improving light capture on crystalline silicon wafers
author Costa, Ivo
author_facet Costa, Ivo
Pera, David
Silva, José
author_role author
author2 Pera, David
Silva, José
author2_role author
author
dc.contributor.none.fl_str_mv Repositório da Universidade de Lisboa
dc.contributor.author.fl_str_mv Costa, Ivo
Pera, David
Silva, José
dc.subject.por.fl_str_mv Semiconductors
Optical materials and properties
Solar energy materials
topic Semiconductors
Optical materials and properties
Solar energy materials
description In this article the optimization of a method to increase the photon capture efficiency of crystalline silicon (c-Si) wafers is presented. The method is based on metal assisted chemical etching (MACE) using hydrogen peroxide (H2O2) and hydrofluoric acid (HF) as etchants and silver atoms to catalyze the reaction. Ptype monocrystalline silicon wafers were used, and different etching times and etchants’ concentrations were tested. Results proved the capability of MACE to reduce silicon’s effective reflectance to as low as 3.9%. A strong correlation of the etchants’ molar ratio with the obtained structures morphology and reflectance was also observed.
publishDate 2020
dc.date.none.fl_str_mv 2020-08-01
2020-08-01T00:00:00Z
2022-08-01T00:31:05Z
dc.type.status.fl_str_mv info:eu-repo/semantics/publishedVersion
dc.type.driver.fl_str_mv info:eu-repo/semantics/article
format article
status_str publishedVersion
dc.identifier.uri.fl_str_mv http://hdl.handle.net/10451/51487
url http://hdl.handle.net/10451/51487
dc.language.iso.fl_str_mv eng
language eng
dc.relation.none.fl_str_mv I. Costa, D. Pera, J. A. Silva. "Improving light capture on crystalline silicon wafers." Materials Letters 272 (2020): 127825.
https://doi.org/10.1016/j.matlet.2020.127825
dc.rights.driver.fl_str_mv info:eu-repo/semantics/openAccess
eu_rights_str_mv openAccess
dc.format.none.fl_str_mv application/pdf
dc.publisher.none.fl_str_mv Elsevier
publisher.none.fl_str_mv Elsevier
dc.source.none.fl_str_mv reponame:Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
instname:Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação
instacron:RCAAP
instname_str Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação
instacron_str RCAAP
institution RCAAP
reponame_str Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
collection Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
repository.name.fl_str_mv Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) - Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação
repository.mail.fl_str_mv mluisa.alvim@gmail.com
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