Preparation and characterization of CrNxOy thin films: The effect of composition and structural features on the electrical behavior
Autor(a) principal: | |
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Data de Publicação: | 2011 |
Outros Autores: | , , , , , , |
Tipo de documento: | Artigo |
Idioma: | eng |
Título da fonte: | Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) |
Texto Completo: | http://hdl.handle.net/1822/13254 |
Resumo: | Metallic oxynitrides have attracted the attention of several researchers in the last decade due to their versatile properties. Through the addition of a small amount of oxygen into a transition metal nitride film, the material’s bonding states between ionic and covalent types can be tailored, thus opening a wide range of electrical, optical, mechanical and tribological responses. Among the oxynitrides, chromium oxynitride (CrN x O y ) has many interesting applications in different technological fields. In the present work the electrical behavior of CrN x O y thin films, deposited by DC reactive magnetron sputtering, were investigated and correlated with their compositional and structural properties. The reactive gas flow, gas pressure, and target potential were monitored during the deposition in order to control the chemical composition, which depend strongly on reactive sputtering process. Depending on the particular deposition parameters that were selected, it was possible to identify three types of films with different growth conditions and physical properties. The electrical resistivity of the films, measured at room temperature, was found to depend strongly on the chemical composition of the samples. |
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Preparation and characterization of CrNxOy thin films: The effect of composition and structural features on the electrical behaviorMagnetron sputteringElectrical resistivityChromium oxynitrideScience & TechnologyMetallic oxynitrides have attracted the attention of several researchers in the last decade due to their versatile properties. Through the addition of a small amount of oxygen into a transition metal nitride film, the material’s bonding states between ionic and covalent types can be tailored, thus opening a wide range of electrical, optical, mechanical and tribological responses. Among the oxynitrides, chromium oxynitride (CrN x O y ) has many interesting applications in different technological fields. In the present work the electrical behavior of CrN x O y thin films, deposited by DC reactive magnetron sputtering, were investigated and correlated with their compositional and structural properties. The reactive gas flow, gas pressure, and target potential were monitored during the deposition in order to control the chemical composition, which depend strongly on reactive sputtering process. Depending on the particular deposition parameters that were selected, it was possible to identify three types of films with different growth conditions and physical properties. The electrical resistivity of the films, measured at room temperature, was found to depend strongly on the chemical composition of the samples.ElsevierUniversidade do MinhoArvinte, R.Borges, Joel Nuno PintoSousa, R. E.Munteanu, Florentina-DanielaBarradas, N. P.Alves, E.Vaz, F.Marques, L.20112011-01-01T00:00:00Zinfo:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/articleapplication/pdfhttp://hdl.handle.net/1822/13254eng0169-433210.1016/j.apsusc.2011.05.109http://www.sciencedirect.com/info:eu-repo/semantics/openAccessreponame:Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)instname:Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informaçãoinstacron:RCAAP2023-07-21T12:40:20Zoai:repositorium.sdum.uminho.pt:1822/13254Portal AgregadorONGhttps://www.rcaap.pt/oai/openaireopendoar:71602024-03-19T19:37:06.954579Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) - Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informaçãofalse |
dc.title.none.fl_str_mv |
Preparation and characterization of CrNxOy thin films: The effect of composition and structural features on the electrical behavior |
title |
Preparation and characterization of CrNxOy thin films: The effect of composition and structural features on the electrical behavior |
spellingShingle |
Preparation and characterization of CrNxOy thin films: The effect of composition and structural features on the electrical behavior Arvinte, R. Magnetron sputtering Electrical resistivity Chromium oxynitride Science & Technology |
title_short |
Preparation and characterization of CrNxOy thin films: The effect of composition and structural features on the electrical behavior |
title_full |
Preparation and characterization of CrNxOy thin films: The effect of composition and structural features on the electrical behavior |
title_fullStr |
Preparation and characterization of CrNxOy thin films: The effect of composition and structural features on the electrical behavior |
title_full_unstemmed |
Preparation and characterization of CrNxOy thin films: The effect of composition and structural features on the electrical behavior |
title_sort |
Preparation and characterization of CrNxOy thin films: The effect of composition and structural features on the electrical behavior |
author |
Arvinte, R. |
author_facet |
Arvinte, R. Borges, Joel Nuno Pinto Sousa, R. E. Munteanu, Florentina-Daniela Barradas, N. P. Alves, E. Vaz, F. Marques, L. |
author_role |
author |
author2 |
Borges, Joel Nuno Pinto Sousa, R. E. Munteanu, Florentina-Daniela Barradas, N. P. Alves, E. Vaz, F. Marques, L. |
author2_role |
author author author author author author author |
dc.contributor.none.fl_str_mv |
Universidade do Minho |
dc.contributor.author.fl_str_mv |
Arvinte, R. Borges, Joel Nuno Pinto Sousa, R. E. Munteanu, Florentina-Daniela Barradas, N. P. Alves, E. Vaz, F. Marques, L. |
dc.subject.por.fl_str_mv |
Magnetron sputtering Electrical resistivity Chromium oxynitride Science & Technology |
topic |
Magnetron sputtering Electrical resistivity Chromium oxynitride Science & Technology |
description |
Metallic oxynitrides have attracted the attention of several researchers in the last decade due to their versatile properties. Through the addition of a small amount of oxygen into a transition metal nitride film, the material’s bonding states between ionic and covalent types can be tailored, thus opening a wide range of electrical, optical, mechanical and tribological responses. Among the oxynitrides, chromium oxynitride (CrN x O y ) has many interesting applications in different technological fields. In the present work the electrical behavior of CrN x O y thin films, deposited by DC reactive magnetron sputtering, were investigated and correlated with their compositional and structural properties. The reactive gas flow, gas pressure, and target potential were monitored during the deposition in order to control the chemical composition, which depend strongly on reactive sputtering process. Depending on the particular deposition parameters that were selected, it was possible to identify three types of films with different growth conditions and physical properties. The electrical resistivity of the films, measured at room temperature, was found to depend strongly on the chemical composition of the samples. |
publishDate |
2011 |
dc.date.none.fl_str_mv |
2011 2011-01-01T00:00:00Z |
dc.type.status.fl_str_mv |
info:eu-repo/semantics/publishedVersion |
dc.type.driver.fl_str_mv |
info:eu-repo/semantics/article |
format |
article |
status_str |
publishedVersion |
dc.identifier.uri.fl_str_mv |
http://hdl.handle.net/1822/13254 |
url |
http://hdl.handle.net/1822/13254 |
dc.language.iso.fl_str_mv |
eng |
language |
eng |
dc.relation.none.fl_str_mv |
0169-4332 10.1016/j.apsusc.2011.05.109 http://www.sciencedirect.com/ |
dc.rights.driver.fl_str_mv |
info:eu-repo/semantics/openAccess |
eu_rights_str_mv |
openAccess |
dc.format.none.fl_str_mv |
application/pdf |
dc.publisher.none.fl_str_mv |
Elsevier |
publisher.none.fl_str_mv |
Elsevier |
dc.source.none.fl_str_mv |
reponame:Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) instname:Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação instacron:RCAAP |
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Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação |
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RCAAP |
institution |
RCAAP |
reponame_str |
Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) |
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Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) |
repository.name.fl_str_mv |
Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) - Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação |
repository.mail.fl_str_mv |
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1799132903597146112 |