Treatment of electroplating wastewater using NF ph-stable membranes: Characterization and application

Detalhes bibliográficos
Autor(a) principal: Hegoburu, Ignacio
Data de Publicação: 2020
Outros Autores: Zedda, Karina Listiarini, Velizarov, Svetlozar
Tipo de documento: Artigo
Idioma: eng
Título da fonte: Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
Texto Completo: http://hdl.handle.net/10362/116278
Resumo: UID/QUI/50006/2019 World-EM3E-4SW
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spelling Treatment of electroplating wastewater using NF ph-stable membranes: Characterization and applicationAcid recoveryDonnan effectElectroplatingExtreme pHNanofiltrationChemical Engineering (miscellaneous)Process Chemistry and TechnologyFiltration and SeparationUID/QUI/50006/2019 World-EM3E-4SWIndustrial adoption of nanofiltration (NF) for treatment of low-pH wastewater is hindered by the limited membrane lifetime at strongly acidic conditions. In this study, the electroplating wastewater (EPWW) filtration performance of a novel pH-stable NF membrane is compared against a commercial NF membrane and a reverse osmosis (RO) membrane. The presented membrane is relatively hydrophobic and has its isoelectric point (IEP) at pH 4.1, with a high and positive zeta potential of +10 mV at pH 3. A novel method was developed to determine the molecular weight cut-off (MWCO) at a pH of 2, with a finding that the membrane maintains the same MWCO (~500 Da) as under neutral pH operating conditions, whereas the commercial membrane significantly increases it. In crossflow filtration experiments with simulated EPWW, rejections above 75% are observed for all heavy metals (compared to only 30% of the commercial membrane), while keeping the same pH in the feed and permeate. Despite the relatively lower permeance of the prepared membrane (~1 L/(m2·h·bar) versus ~4 L/(m2·h·bar) of the commercial membrane), its high heavy metals rejection coupled with a very low acid rejection makes it suitable for acid recovery applications.DQ - Departamento de QuímicaLAQV@REQUIMTERUNHegoburu, IgnacioZedda, Karina ListiariniVelizarov, Svetlozar2021-04-27T23:14:43Z2020-12-062020-12-06T00:00:00Zinfo:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/article27application/pdfhttp://hdl.handle.net/10362/116278eng0076-6356PURE: 28469225https://doi.org/10.3390/membranes10120399info:eu-repo/semantics/openAccessreponame:Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)instname:Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informaçãoinstacron:RCAAP2024-03-11T04:58:45Zoai:run.unl.pt:10362/116278Portal AgregadorONGhttps://www.rcaap.pt/oai/openaireopendoar:71602024-03-20T03:43:00.746671Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) - Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informaçãofalse
dc.title.none.fl_str_mv Treatment of electroplating wastewater using NF ph-stable membranes: Characterization and application
title Treatment of electroplating wastewater using NF ph-stable membranes: Characterization and application
spellingShingle Treatment of electroplating wastewater using NF ph-stable membranes: Characterization and application
Hegoburu, Ignacio
Acid recovery
Donnan effect
Electroplating
Extreme pH
Nanofiltration
Chemical Engineering (miscellaneous)
Process Chemistry and Technology
Filtration and Separation
title_short Treatment of electroplating wastewater using NF ph-stable membranes: Characterization and application
title_full Treatment of electroplating wastewater using NF ph-stable membranes: Characterization and application
title_fullStr Treatment of electroplating wastewater using NF ph-stable membranes: Characterization and application
title_full_unstemmed Treatment of electroplating wastewater using NF ph-stable membranes: Characterization and application
title_sort Treatment of electroplating wastewater using NF ph-stable membranes: Characterization and application
author Hegoburu, Ignacio
author_facet Hegoburu, Ignacio
Zedda, Karina Listiarini
Velizarov, Svetlozar
author_role author
author2 Zedda, Karina Listiarini
Velizarov, Svetlozar
author2_role author
author
dc.contributor.none.fl_str_mv DQ - Departamento de Química
LAQV@REQUIMTE
RUN
dc.contributor.author.fl_str_mv Hegoburu, Ignacio
Zedda, Karina Listiarini
Velizarov, Svetlozar
dc.subject.por.fl_str_mv Acid recovery
Donnan effect
Electroplating
Extreme pH
Nanofiltration
Chemical Engineering (miscellaneous)
Process Chemistry and Technology
Filtration and Separation
topic Acid recovery
Donnan effect
Electroplating
Extreme pH
Nanofiltration
Chemical Engineering (miscellaneous)
Process Chemistry and Technology
Filtration and Separation
description UID/QUI/50006/2019 World-EM3E-4SW
publishDate 2020
dc.date.none.fl_str_mv 2020-12-06
2020-12-06T00:00:00Z
2021-04-27T23:14:43Z
dc.type.status.fl_str_mv info:eu-repo/semantics/publishedVersion
dc.type.driver.fl_str_mv info:eu-repo/semantics/article
format article
status_str publishedVersion
dc.identifier.uri.fl_str_mv http://hdl.handle.net/10362/116278
url http://hdl.handle.net/10362/116278
dc.language.iso.fl_str_mv eng
language eng
dc.relation.none.fl_str_mv 0076-6356
PURE: 28469225
https://doi.org/10.3390/membranes10120399
dc.rights.driver.fl_str_mv info:eu-repo/semantics/openAccess
eu_rights_str_mv openAccess
dc.format.none.fl_str_mv 27
application/pdf
dc.source.none.fl_str_mv reponame:Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
instname:Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação
instacron:RCAAP
instname_str Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação
instacron_str RCAAP
institution RCAAP
reponame_str Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
collection Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
repository.name.fl_str_mv Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) - Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação
repository.mail.fl_str_mv
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