Physical and mechanical properties of Ti1 - xSixN films

• Autor(a) principal: Vaz, F.
• Data de Publicação: 1998
• Outros Autores: Rebouta, L., Ramos, S., Cavaleiro, A., Silva, M. F. da, Soares, J. C.
• Tipo de documento: Artigo
• Idioma: eng
• Título da fonte: Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
• Texto Completo: http://hdl.handle.net/10316/4327
• topic: Rutherford back-scattering spectrometry; Silicon; Titanium; X-ray diffraction

Ti1 - xSixN coatings with 0 <- x <- 0.30 and thicknesses ranging from 1.2 to 3.3 [mu]m, were deposited on to polished high-speed steel substrates by r.f. reactive magnetron sputtering. The atomic composition of the samples was measured by Rutherford backscatering spectrometry (RBS), and the texture was determined by X-ray diffraction (XRD). Great improvements in hardness and adhesion behaviour were obtained when compared to TiN. Hardness results and adhesion behaviour as a function of the Si content will be shown and discussed. The Ti0.85Si0.15N sample presented the best results with a hardness value of about 36 GPa and a critical load for total failure around 70 N.