Structural and corrosion behaviour of stoichiometric and substoichiometric TiN thin films

Detalhes bibliográficos
Autor(a) principal: Rocha, L. A.
Data de Publicação: 2004
Outros Autores: Ariza, E., Ferreira, J. A., Vaz, F., Ribeiro, E., Rebouta, L., Alves, E., Ramos, A. R., Goudeau, Ph., Rivière, J. P.
Tipo de documento: Artigo
Idioma: eng
Título da fonte: Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
Texto Completo: http://hdl.handle.net/1822/1514
Resumo: This paper reports the structural and electrochemical behaviour of TiN thin films prepared by d.c. reactive magnetron sputtering. x X-Ray diffraction showed the development of the hexagonal a-Ti phase, with strong w002x orientation, for low nitrogen contents. For nitrogen contents of 20 and 30 at.%, the ´-Ti N phase appears with w200x orientation. With further increasing the nitrogen 2 content, the d-TiN phase becomes dominant. Composition and the resulting changes in microstructure (crystalline phases and the lattice distortion induced by the growth conditions) are the two main parameters that seem to rule coating properties. Results of potentiodynamic polarisation tests showed that all films have a high corrosion resistance reflected by corrosion current densities below 0.7 mAycm . Also, electrochemical impedance spectroscopy tests corroborated the results obtained in the polarisation tests, 2 showing that films containing low percentages of nitrogen (less than 8%) reveal the best corrosion resistance. Further increases in nitrogen content lead to a decrease in the corrosion resistance. An exception to this behaviour was found for the film with 30 at.% N. This sample presents an excellent corrosion resistance, which in fact, increases with the immersion time. Higher nitrogen contents (52 and 55 at.%) promote a relative increase in the corrosion resistance when compared with 50 at.% films. This behaviour might be explained by the particular microstructural characteristics of the films.
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spelling Structural and corrosion behaviour of stoichiometric and substoichiometric TiN thin filmsTitanium nitrideStructural propertiesSputteringEISCorrosion resistanceScience & TechnologyThis paper reports the structural and electrochemical behaviour of TiN thin films prepared by d.c. reactive magnetron sputtering. x X-Ray diffraction showed the development of the hexagonal a-Ti phase, with strong w002x orientation, for low nitrogen contents. For nitrogen contents of 20 and 30 at.%, the ´-Ti N phase appears with w200x orientation. With further increasing the nitrogen 2 content, the d-TiN phase becomes dominant. Composition and the resulting changes in microstructure (crystalline phases and the lattice distortion induced by the growth conditions) are the two main parameters that seem to rule coating properties. Results of potentiodynamic polarisation tests showed that all films have a high corrosion resistance reflected by corrosion current densities below 0.7 mAycm . Also, electrochemical impedance spectroscopy tests corroborated the results obtained in the polarisation tests, 2 showing that films containing low percentages of nitrogen (less than 8%) reveal the best corrosion resistance. Further increases in nitrogen content lead to a decrease in the corrosion resistance. An exception to this behaviour was found for the film with 30 at.% N. This sample presents an excellent corrosion resistance, which in fact, increases with the immersion time. Higher nitrogen contents (52 and 55 at.%) promote a relative increase in the corrosion resistance when compared with 50 at.% films. This behaviour might be explained by the particular microstructural characteristics of the films.ElsevierUniversidade do MinhoRocha, L. A.Ariza, E.Ferreira, J. A.Vaz, F.Ribeiro, E.Rebouta, L.Alves, E.Ramos, A. R.Goudeau, Ph.Rivière, J. P.20042004-01-01T00:00:00Zinfo:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/articleapplication/pdfhttp://hdl.handle.net/1822/1514eng"Surface and coatings technology." ISSN 0257-8972. 180 -181 (2004) 158-163.0257-897210.1016/j.surfcoat.2003.10.059http://www.sciencedirect.com/science/journal/02578972info:eu-repo/semantics/openAccessreponame:Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)instname:Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informaçãoinstacron:RCAAP2023-07-21T12:54:05Zoai:repositorium.sdum.uminho.pt:1822/1514Portal AgregadorONGhttps://www.rcaap.pt/oai/openaireopendoar:71602024-03-19T19:53:36.953019Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) - Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informaçãofalse
dc.title.none.fl_str_mv Structural and corrosion behaviour of stoichiometric and substoichiometric TiN thin films
title Structural and corrosion behaviour of stoichiometric and substoichiometric TiN thin films
spellingShingle Structural and corrosion behaviour of stoichiometric and substoichiometric TiN thin films
Rocha, L. A.
Titanium nitride
Structural properties
Sputtering
EIS
Corrosion resistance
Science & Technology
title_short Structural and corrosion behaviour of stoichiometric and substoichiometric TiN thin films
title_full Structural and corrosion behaviour of stoichiometric and substoichiometric TiN thin films
title_fullStr Structural and corrosion behaviour of stoichiometric and substoichiometric TiN thin films
title_full_unstemmed Structural and corrosion behaviour of stoichiometric and substoichiometric TiN thin films
title_sort Structural and corrosion behaviour of stoichiometric and substoichiometric TiN thin films
author Rocha, L. A.
author_facet Rocha, L. A.
Ariza, E.
Ferreira, J. A.
Vaz, F.
Ribeiro, E.
Rebouta, L.
Alves, E.
Ramos, A. R.
Goudeau, Ph.
Rivière, J. P.
author_role author
author2 Ariza, E.
Ferreira, J. A.
Vaz, F.
Ribeiro, E.
Rebouta, L.
Alves, E.
Ramos, A. R.
Goudeau, Ph.
Rivière, J. P.
author2_role author
author
author
author
author
author
author
author
author
dc.contributor.none.fl_str_mv Universidade do Minho
dc.contributor.author.fl_str_mv Rocha, L. A.
Ariza, E.
Ferreira, J. A.
Vaz, F.
Ribeiro, E.
Rebouta, L.
Alves, E.
Ramos, A. R.
Goudeau, Ph.
Rivière, J. P.
dc.subject.por.fl_str_mv Titanium nitride
Structural properties
Sputtering
EIS
Corrosion resistance
Science & Technology
topic Titanium nitride
Structural properties
Sputtering
EIS
Corrosion resistance
Science & Technology
description This paper reports the structural and electrochemical behaviour of TiN thin films prepared by d.c. reactive magnetron sputtering. x X-Ray diffraction showed the development of the hexagonal a-Ti phase, with strong w002x orientation, for low nitrogen contents. For nitrogen contents of 20 and 30 at.%, the ´-Ti N phase appears with w200x orientation. With further increasing the nitrogen 2 content, the d-TiN phase becomes dominant. Composition and the resulting changes in microstructure (crystalline phases and the lattice distortion induced by the growth conditions) are the two main parameters that seem to rule coating properties. Results of potentiodynamic polarisation tests showed that all films have a high corrosion resistance reflected by corrosion current densities below 0.7 mAycm . Also, electrochemical impedance spectroscopy tests corroborated the results obtained in the polarisation tests, 2 showing that films containing low percentages of nitrogen (less than 8%) reveal the best corrosion resistance. Further increases in nitrogen content lead to a decrease in the corrosion resistance. An exception to this behaviour was found for the film with 30 at.% N. This sample presents an excellent corrosion resistance, which in fact, increases with the immersion time. Higher nitrogen contents (52 and 55 at.%) promote a relative increase in the corrosion resistance when compared with 50 at.% films. This behaviour might be explained by the particular microstructural characteristics of the films.
publishDate 2004
dc.date.none.fl_str_mv 2004
2004-01-01T00:00:00Z
dc.type.status.fl_str_mv info:eu-repo/semantics/publishedVersion
dc.type.driver.fl_str_mv info:eu-repo/semantics/article
format article
status_str publishedVersion
dc.identifier.uri.fl_str_mv http://hdl.handle.net/1822/1514
url http://hdl.handle.net/1822/1514
dc.language.iso.fl_str_mv eng
language eng
dc.relation.none.fl_str_mv "Surface and coatings technology." ISSN 0257-8972. 180 -181 (2004) 158-163.
0257-8972
10.1016/j.surfcoat.2003.10.059
http://www.sciencedirect.com/science/journal/02578972
dc.rights.driver.fl_str_mv info:eu-repo/semantics/openAccess
eu_rights_str_mv openAccess
dc.format.none.fl_str_mv application/pdf
dc.publisher.none.fl_str_mv Elsevier
publisher.none.fl_str_mv Elsevier
dc.source.none.fl_str_mv reponame:Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
instname:Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação
instacron:RCAAP
instname_str Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação
instacron_str RCAAP
institution RCAAP
reponame_str Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
collection Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
repository.name.fl_str_mv Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) - Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação
repository.mail.fl_str_mv
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