Influence of nitrogen content on the structural, mechanical and electrical properties of TiN thin films
Autor(a) principal: | |
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Data de Publicação: | 2005 |
Outros Autores: | , , , , , , , , , , , |
Tipo de documento: | Artigo |
Idioma: | eng |
Título da fonte: | Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) |
Texto Completo: | http://hdl.handle.net/1822/3170 |
Resumo: | This paper reports on the preparation of TiNx thin films by d.c. reactive magnetron sputtering. The coating thickness ranged from 1.7 to 4.2 Am and the nitrogen content varied between 0 and 55 at.%. X-Ray diffraction showed the development of the hexagonal a-Ti phase, with strong [002] orientation for low nitrogen contents, where the N atoms fit into octahedral sites in the Ti lattice as the amount of nitrogen is increased. For nitrogen contents of 20 and 30 at.%, the q-Ti2N phase appears with [200] orientation. With further increasing the nitrogen content, the y-TiN phase becomes dominant. The electrical resistivity of the different compositions reproduces this phase behavior. The hardness of the samples varied from approximately 8 GPa for pure titanium up to 27 GPa for a nitrogen content of 30 at.%, followed by a slight decrease at the highest contents. A similar increase of stresses with nitrogen is observed. Structure and composition with the consequent changes in crystalline phases and the lattice distortion were found to be crucial in the evolution of the mechanical properties. |
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Influence of nitrogen content on the structural, mechanical and electrical properties of TiN thin filmsTitanium nitrideStructural propertiesSputteringResistivitynitridesScience & TechnologyThis paper reports on the preparation of TiNx thin films by d.c. reactive magnetron sputtering. The coating thickness ranged from 1.7 to 4.2 Am and the nitrogen content varied between 0 and 55 at.%. X-Ray diffraction showed the development of the hexagonal a-Ti phase, with strong [002] orientation for low nitrogen contents, where the N atoms fit into octahedral sites in the Ti lattice as the amount of nitrogen is increased. For nitrogen contents of 20 and 30 at.%, the q-Ti2N phase appears with [200] orientation. With further increasing the nitrogen content, the y-TiN phase becomes dominant. The electrical resistivity of the different compositions reproduces this phase behavior. The hardness of the samples varied from approximately 8 GPa for pure titanium up to 27 GPa for a nitrogen content of 30 at.%, followed by a slight decrease at the highest contents. A similar increase of stresses with nitrogen is observed. Structure and composition with the consequent changes in crystalline phases and the lattice distortion were found to be crucial in the evolution of the mechanical properties.ElsevierUniversidade do MinhoVaz, F.Ferreira, J. A.Ribeiro, E.Rebouta, L.Lanceros-Méndez, S.Mendes, J.Alves, E.Goudeau, Ph.Rivière, J. P.Ribeiro, A. FernandoMoutinho, IvoPischow, K.Rijk, J.2005-022005-02-01T00:00:00Zinfo:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/articleapplication/pdfhttp://hdl.handle.net/1822/3170eng"Surface and coatings technology". ISSN 0257-8972. 191:2-3 (Febr.2005) 317-323.0257-897210.1016/j.surfcoat.2004.01.033info:eu-repo/semantics/openAccessreponame:Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)instname:Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informaçãoinstacron:RCAAP2024-05-11T07:21:59Zoai:repositorium.sdum.uminho.pt:1822/3170Portal AgregadorONGhttps://www.rcaap.pt/oai/openairemluisa.alvim@gmail.comopendoar:71602024-05-11T07:21:59Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) - Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informaçãofalse |
dc.title.none.fl_str_mv |
Influence of nitrogen content on the structural, mechanical and electrical properties of TiN thin films |
title |
Influence of nitrogen content on the structural, mechanical and electrical properties of TiN thin films |
spellingShingle |
Influence of nitrogen content on the structural, mechanical and electrical properties of TiN thin films Vaz, F. Titanium nitride Structural properties Sputtering Resistivity nitrides Science & Technology |
title_short |
Influence of nitrogen content on the structural, mechanical and electrical properties of TiN thin films |
title_full |
Influence of nitrogen content on the structural, mechanical and electrical properties of TiN thin films |
title_fullStr |
Influence of nitrogen content on the structural, mechanical and electrical properties of TiN thin films |
title_full_unstemmed |
Influence of nitrogen content on the structural, mechanical and electrical properties of TiN thin films |
title_sort |
Influence of nitrogen content on the structural, mechanical and electrical properties of TiN thin films |
author |
Vaz, F. |
author_facet |
Vaz, F. Ferreira, J. A. Ribeiro, E. Rebouta, L. Lanceros-Méndez, S. Mendes, J. Alves, E. Goudeau, Ph. Rivière, J. P. Ribeiro, A. Fernando Moutinho, Ivo Pischow, K. Rijk, J. |
author_role |
author |
author2 |
Ferreira, J. A. Ribeiro, E. Rebouta, L. Lanceros-Méndez, S. Mendes, J. Alves, E. Goudeau, Ph. Rivière, J. P. Ribeiro, A. Fernando Moutinho, Ivo Pischow, K. Rijk, J. |
author2_role |
author author author author author author author author author author author author |
dc.contributor.none.fl_str_mv |
Universidade do Minho |
dc.contributor.author.fl_str_mv |
Vaz, F. Ferreira, J. A. Ribeiro, E. Rebouta, L. Lanceros-Méndez, S. Mendes, J. Alves, E. Goudeau, Ph. Rivière, J. P. Ribeiro, A. Fernando Moutinho, Ivo Pischow, K. Rijk, J. |
dc.subject.por.fl_str_mv |
Titanium nitride Structural properties Sputtering Resistivity nitrides Science & Technology |
topic |
Titanium nitride Structural properties Sputtering Resistivity nitrides Science & Technology |
description |
This paper reports on the preparation of TiNx thin films by d.c. reactive magnetron sputtering. The coating thickness ranged from 1.7 to 4.2 Am and the nitrogen content varied between 0 and 55 at.%. X-Ray diffraction showed the development of the hexagonal a-Ti phase, with strong [002] orientation for low nitrogen contents, where the N atoms fit into octahedral sites in the Ti lattice as the amount of nitrogen is increased. For nitrogen contents of 20 and 30 at.%, the q-Ti2N phase appears with [200] orientation. With further increasing the nitrogen content, the y-TiN phase becomes dominant. The electrical resistivity of the different compositions reproduces this phase behavior. The hardness of the samples varied from approximately 8 GPa for pure titanium up to 27 GPa for a nitrogen content of 30 at.%, followed by a slight decrease at the highest contents. A similar increase of stresses with nitrogen is observed. Structure and composition with the consequent changes in crystalline phases and the lattice distortion were found to be crucial in the evolution of the mechanical properties. |
publishDate |
2005 |
dc.date.none.fl_str_mv |
2005-02 2005-02-01T00:00:00Z |
dc.type.status.fl_str_mv |
info:eu-repo/semantics/publishedVersion |
dc.type.driver.fl_str_mv |
info:eu-repo/semantics/article |
format |
article |
status_str |
publishedVersion |
dc.identifier.uri.fl_str_mv |
http://hdl.handle.net/1822/3170 |
url |
http://hdl.handle.net/1822/3170 |
dc.language.iso.fl_str_mv |
eng |
language |
eng |
dc.relation.none.fl_str_mv |
"Surface and coatings technology". ISSN 0257-8972. 191:2-3 (Febr.2005) 317-323. 0257-8972 10.1016/j.surfcoat.2004.01.033 |
dc.rights.driver.fl_str_mv |
info:eu-repo/semantics/openAccess |
eu_rights_str_mv |
openAccess |
dc.format.none.fl_str_mv |
application/pdf |
dc.publisher.none.fl_str_mv |
Elsevier |
publisher.none.fl_str_mv |
Elsevier |
dc.source.none.fl_str_mv |
reponame:Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) instname:Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação instacron:RCAAP |
instname_str |
Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação |
instacron_str |
RCAAP |
institution |
RCAAP |
reponame_str |
Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) |
collection |
Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) |
repository.name.fl_str_mv |
Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) - Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação |
repository.mail.fl_str_mv |
mluisa.alvim@gmail.com |
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1817545290807246848 |