Boosting Electrical Performance of High-κ Nanomultilayer Dielectrics and Electronic Devices by Combining Solution Combustion Synthesis and UV Irradiation
Autor(a) principal: | |
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Data de Publicação: | 2017 |
Outros Autores: | , , , , , |
Tipo de documento: | Artigo |
Idioma: | eng |
Título da fonte: | Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) |
Texto Completo: | https://doi.org/10.1021/acsami.7b11752 |
Resumo: | Grant SFRH/BPD/99136/2013 Grant SFRH/BD/122286/2016 Grant SFRH/BD/116047/2016 IDS-FunMat-INNO project FPA2016/EIT/EIT RawMaterials Grant Agreement 15015. |
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Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) |
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7160 |
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Boosting Electrical Performance of High-κ Nanomultilayer Dielectrics and Electronic Devices by Combining Solution Combustion Synthesis and UV IrradiationDUV irradiationlow operating voltage TFTslow temperaturenanomultilayer dielectric oxides (AlO and HfO)solution combustion synthesisMaterials Science(all)Grant SFRH/BPD/99136/2013 Grant SFRH/BD/122286/2016 Grant SFRH/BD/116047/2016 IDS-FunMat-INNO project FPA2016/EIT/EIT RawMaterials Grant Agreement 15015.In the past decade, solution-based dielectric oxides have been widely studied in electronic applications enabling the use of low-cost processing technologies and device improvement. The most promising are the high-κ dielectrics, like aluminum (AlOx) and hafnium oxide (HfOx), that allow an easier trap filling in the semiconductor and the use of low operation voltage. However, in the case of HfOx, a high temperature usually is needed to induce a uniform and condensed film, which limits its applications in flexible electronics. This paper describes how to obtain HfOx dielectric thin films and the effect of their implementation in multilayer dielectrics (MLD) at low temperatures (150 °C) to apply in thin film transistors (TFTs) using the combination of solution combustion synthesis (SCS) and ultraviolet (UV) treatment. The single layers and multilayers did not show any trace of residual organics and exhibited a small surface roughness (<1.2 nm) and a high breakdown voltage (>2.7 MV·cm-1). The resulting TFTs presented a high performance at a low operation voltage (<3 V), with high saturation mobility (43.9 ± 1.1 cm2·V-1·s-1), a small subthreshold slope (0.066 ± 0.010 V·dec-1), current ratio of 1 × 106 and a good idle shelf life stability after 2 months. To our knowledge, the results achieved surpass the actual state-of-the-art. Finally, we demonstrated a low-voltage diode-connected inverter using MLD/IGZO TFTs working with a maximum gain of 1 at 2 V.UNINOVA-Instituto de Desenvolvimento de Novas TecnologiasCENIMAT-i3N - Centro de Investigação de Materiais (Lab. Associado I3N)DCM - Departamento de Ciência dos MateriaisRUNCarlos, EmanuelBranquinho, RitaKiazadeh, AsalMartins, JorgeBarquinha, PedroMartins, RodrigoFortunato, Elvira2019-06-04T22:21:04Z2017-11-222017-11-22T00:00:00Zinfo:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/article10application/pdfhttps://doi.org/10.1021/acsami.7b11752eng1944-8244PURE: 3801567http://www.scopus.com/inward/record.url?scp=85035075814&partnerID=8YFLogxKhttps://doi.org/10.1021/acsami.7b11752info:eu-repo/semantics/openAccessreponame:Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)instname:Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informaçãoinstacron:RCAAP2024-03-11T04:33:41Zoai:run.unl.pt:10362/71733Portal AgregadorONGhttps://www.rcaap.pt/oai/openaireopendoar:71602024-03-20T03:35:13.053766Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) - Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informaçãofalse |
dc.title.none.fl_str_mv |
Boosting Electrical Performance of High-κ Nanomultilayer Dielectrics and Electronic Devices by Combining Solution Combustion Synthesis and UV Irradiation |
title |
Boosting Electrical Performance of High-κ Nanomultilayer Dielectrics and Electronic Devices by Combining Solution Combustion Synthesis and UV Irradiation |
spellingShingle |
Boosting Electrical Performance of High-κ Nanomultilayer Dielectrics and Electronic Devices by Combining Solution Combustion Synthesis and UV Irradiation Carlos, Emanuel DUV irradiation low operating voltage TFTs low temperature nanomultilayer dielectric oxides (AlO and HfO) solution combustion synthesis Materials Science(all) |
title_short |
Boosting Electrical Performance of High-κ Nanomultilayer Dielectrics and Electronic Devices by Combining Solution Combustion Synthesis and UV Irradiation |
title_full |
Boosting Electrical Performance of High-κ Nanomultilayer Dielectrics and Electronic Devices by Combining Solution Combustion Synthesis and UV Irradiation |
title_fullStr |
Boosting Electrical Performance of High-κ Nanomultilayer Dielectrics and Electronic Devices by Combining Solution Combustion Synthesis and UV Irradiation |
title_full_unstemmed |
Boosting Electrical Performance of High-κ Nanomultilayer Dielectrics and Electronic Devices by Combining Solution Combustion Synthesis and UV Irradiation |
title_sort |
Boosting Electrical Performance of High-κ Nanomultilayer Dielectrics and Electronic Devices by Combining Solution Combustion Synthesis and UV Irradiation |
author |
Carlos, Emanuel |
author_facet |
Carlos, Emanuel Branquinho, Rita Kiazadeh, Asal Martins, Jorge Barquinha, Pedro Martins, Rodrigo Fortunato, Elvira |
author_role |
author |
author2 |
Branquinho, Rita Kiazadeh, Asal Martins, Jorge Barquinha, Pedro Martins, Rodrigo Fortunato, Elvira |
author2_role |
author author author author author author |
dc.contributor.none.fl_str_mv |
UNINOVA-Instituto de Desenvolvimento de Novas Tecnologias CENIMAT-i3N - Centro de Investigação de Materiais (Lab. Associado I3N) DCM - Departamento de Ciência dos Materiais RUN |
dc.contributor.author.fl_str_mv |
Carlos, Emanuel Branquinho, Rita Kiazadeh, Asal Martins, Jorge Barquinha, Pedro Martins, Rodrigo Fortunato, Elvira |
dc.subject.por.fl_str_mv |
DUV irradiation low operating voltage TFTs low temperature nanomultilayer dielectric oxides (AlO and HfO) solution combustion synthesis Materials Science(all) |
topic |
DUV irradiation low operating voltage TFTs low temperature nanomultilayer dielectric oxides (AlO and HfO) solution combustion synthesis Materials Science(all) |
description |
Grant SFRH/BPD/99136/2013 Grant SFRH/BD/122286/2016 Grant SFRH/BD/116047/2016 IDS-FunMat-INNO project FPA2016/EIT/EIT RawMaterials Grant Agreement 15015. |
publishDate |
2017 |
dc.date.none.fl_str_mv |
2017-11-22 2017-11-22T00:00:00Z 2019-06-04T22:21:04Z |
dc.type.status.fl_str_mv |
info:eu-repo/semantics/publishedVersion |
dc.type.driver.fl_str_mv |
info:eu-repo/semantics/article |
format |
article |
status_str |
publishedVersion |
dc.identifier.uri.fl_str_mv |
https://doi.org/10.1021/acsami.7b11752 |
url |
https://doi.org/10.1021/acsami.7b11752 |
dc.language.iso.fl_str_mv |
eng |
language |
eng |
dc.relation.none.fl_str_mv |
1944-8244 PURE: 3801567 http://www.scopus.com/inward/record.url?scp=85035075814&partnerID=8YFLogxK https://doi.org/10.1021/acsami.7b11752 |
dc.rights.driver.fl_str_mv |
info:eu-repo/semantics/openAccess |
eu_rights_str_mv |
openAccess |
dc.format.none.fl_str_mv |
10 application/pdf |
dc.source.none.fl_str_mv |
reponame:Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) instname:Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação instacron:RCAAP |
instname_str |
Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação |
instacron_str |
RCAAP |
institution |
RCAAP |
reponame_str |
Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) |
collection |
Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) |
repository.name.fl_str_mv |
Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) - Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação |
repository.mail.fl_str_mv |
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1799137973285945344 |