Solution-based deposition of bare Au nanostructures onto H-terminated Si and wet-etching of Si wafers for optoelectronics

Detalhes bibliográficos
Autor(a) principal: Bruno, Dinis Pinto Rosa
Data de Publicação: 2022
Tipo de documento: Dissertação
Idioma: eng
Título da fonte: Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
Texto Completo: http://hdl.handle.net/10773/38804
Resumo: In this work, we fabricated and studied wet chemically thinned Hterminated silicon substrates decorated with plasmonic AuNPs. The goal of this research was to pursue a deposition method that consistently generated AuNP submonolayer structures on an H-terminated silicon surface. Drop-casting, spin-coating and dip-coating deposition methods of AuNPs on both pristine and thinned silicon substrates were employed and compared. Thinned silicon substrates were produced via wet chemical (KOH) etching to thicknesses down to 50 m. The AuNPs were produced via pulsed laser ablation in liquid (PLAL) and span in the <50 nm range. The dip-coating method yielded the most consistent and reproducible AuNP submonolayer formations. Both H₂O and THF were used and studied as solvents for the AuNP depositions. THF-based solutions produced spread out and uniform depositions. Dip-coating depositions using a THF-based solution synthesised under PLAL for 90 minutes yielded the highest surface coverage (38%) of all the deposition methods studied.
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spelling Solution-based deposition of bare Au nanostructures onto H-terminated Si and wet-etching of Si wafers for optoelectronicsWet chemical etchingH-terminationPLALGold nanoparticlePlasmonicsIn this work, we fabricated and studied wet chemically thinned Hterminated silicon substrates decorated with plasmonic AuNPs. The goal of this research was to pursue a deposition method that consistently generated AuNP submonolayer structures on an H-terminated silicon surface. Drop-casting, spin-coating and dip-coating deposition methods of AuNPs on both pristine and thinned silicon substrates were employed and compared. Thinned silicon substrates were produced via wet chemical (KOH) etching to thicknesses down to 50 m. The AuNPs were produced via pulsed laser ablation in liquid (PLAL) and span in the <50 nm range. The dip-coating method yielded the most consistent and reproducible AuNP submonolayer formations. Both H₂O and THF were used and studied as solvents for the AuNP depositions. THF-based solutions produced spread out and uniform depositions. Dip-coating depositions using a THF-based solution synthesised under PLAL for 90 minutes yielded the highest surface coverage (38%) of all the deposition methods studied.No presente trabalho, fabricamos e estudamos substratos de Si quimicamente causticados com terminação de hidrogénio decorados com nanopartículas de ouro plasmónicas. O objetivo desta investigação é perseguir um método de deposição que crie consistentemente estruturas sub-monocamada de nanopartículas de ouro numa superfície de Si terminada com hidrogénio. Foram empregues e comparados os métodos de drop-casting, spin-coating e dip-coating em substratos de Si não processados e quimicamente causticados. Substratos quimicamente causticados foram produzidos pelo método de ataque químico por KOH, produzindo substratos com espessuras inferiores a 50 m. As nanopartículas de ouro foram produzidas via pulsed ablation in liquid (PLAL) e têm dimensões na gama de <20 nm. O método de dipcoating produziu as estruturas sub-monocamada de nanopartículas de ouro mais consistentes e reprodutíveis. H₂O e THF foram usados e estudados enquanto solventes para as deposições de nanopartículas de ouro. As deposições por dip-coating com THF enquanto solvente sintetizadas por PLAL durante 90 minutos produziram a maior cobertura de superfície (38%) de todos os métodos estudados.2023-07-19T09:53:33Z2022-12-14T00:00:00Z2022-12-14info:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/masterThesisapplication/pdfhttp://hdl.handle.net/10773/38804engBruno, Dinis Pinto Rosainfo:eu-repo/semantics/openAccessreponame:Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)instname:Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informaçãoinstacron:RCAAP2024-02-22T12:15:42Zoai:ria.ua.pt:10773/38804Portal AgregadorONGhttps://www.rcaap.pt/oai/openaireopendoar:71602024-03-20T03:09:06.585884Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) - Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informaçãofalse
dc.title.none.fl_str_mv Solution-based deposition of bare Au nanostructures onto H-terminated Si and wet-etching of Si wafers for optoelectronics
title Solution-based deposition of bare Au nanostructures onto H-terminated Si and wet-etching of Si wafers for optoelectronics
spellingShingle Solution-based deposition of bare Au nanostructures onto H-terminated Si and wet-etching of Si wafers for optoelectronics
Bruno, Dinis Pinto Rosa
Wet chemical etching
H-termination
PLAL
Gold nanoparticle
Plasmonics
title_short Solution-based deposition of bare Au nanostructures onto H-terminated Si and wet-etching of Si wafers for optoelectronics
title_full Solution-based deposition of bare Au nanostructures onto H-terminated Si and wet-etching of Si wafers for optoelectronics
title_fullStr Solution-based deposition of bare Au nanostructures onto H-terminated Si and wet-etching of Si wafers for optoelectronics
title_full_unstemmed Solution-based deposition of bare Au nanostructures onto H-terminated Si and wet-etching of Si wafers for optoelectronics
title_sort Solution-based deposition of bare Au nanostructures onto H-terminated Si and wet-etching of Si wafers for optoelectronics
author Bruno, Dinis Pinto Rosa
author_facet Bruno, Dinis Pinto Rosa
author_role author
dc.contributor.author.fl_str_mv Bruno, Dinis Pinto Rosa
dc.subject.por.fl_str_mv Wet chemical etching
H-termination
PLAL
Gold nanoparticle
Plasmonics
topic Wet chemical etching
H-termination
PLAL
Gold nanoparticle
Plasmonics
description In this work, we fabricated and studied wet chemically thinned Hterminated silicon substrates decorated with plasmonic AuNPs. The goal of this research was to pursue a deposition method that consistently generated AuNP submonolayer structures on an H-terminated silicon surface. Drop-casting, spin-coating and dip-coating deposition methods of AuNPs on both pristine and thinned silicon substrates were employed and compared. Thinned silicon substrates were produced via wet chemical (KOH) etching to thicknesses down to 50 m. The AuNPs were produced via pulsed laser ablation in liquid (PLAL) and span in the <50 nm range. The dip-coating method yielded the most consistent and reproducible AuNP submonolayer formations. Both H₂O and THF were used and studied as solvents for the AuNP depositions. THF-based solutions produced spread out and uniform depositions. Dip-coating depositions using a THF-based solution synthesised under PLAL for 90 minutes yielded the highest surface coverage (38%) of all the deposition methods studied.
publishDate 2022
dc.date.none.fl_str_mv 2022-12-14T00:00:00Z
2022-12-14
2023-07-19T09:53:33Z
dc.type.status.fl_str_mv info:eu-repo/semantics/publishedVersion
dc.type.driver.fl_str_mv info:eu-repo/semantics/masterThesis
format masterThesis
status_str publishedVersion
dc.identifier.uri.fl_str_mv http://hdl.handle.net/10773/38804
url http://hdl.handle.net/10773/38804
dc.language.iso.fl_str_mv eng
language eng
dc.rights.driver.fl_str_mv info:eu-repo/semantics/openAccess
eu_rights_str_mv openAccess
dc.format.none.fl_str_mv application/pdf
dc.source.none.fl_str_mv reponame:Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
instname:Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação
instacron:RCAAP
instname_str Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação
instacron_str RCAAP
institution RCAAP
reponame_str Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
collection Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
repository.name.fl_str_mv Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) - Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação
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