In-Depth X-Ray Photoelectron Spectroscopy of Resistive Switching Devices

Detalhes bibliográficos
Autor(a) principal: Narciso, Gonçalo Filipe Fernandes
Data de Publicação: 2019
Tipo de documento: Dissertação
Idioma: eng
Título da fonte: Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
Texto Completo: http://hdl.handle.net/10362/99347
Resumo: This work has explored the possibility of using x-ray photoelectron spectroscopy (XPS), for studying the chemical properties (i.e. atomic ratios and oxidation states) of several metal-insulator-metal (MIM) structures. This thesis aims to better understand the operation mechanism that imposes a reversible change in the resistance state of the studied devices. Three different configurations (ITO/ZTO*/Pt, Pt/ZTO/Ti-Au, ITO/GIO*/Au) were fabricated following a physical vapour deposition methodology and patterned using shadow masks, specifically designed for this purpose. An electrical characterization was performed first, to evaluate the uniformity between the devices through the study of their pristine state and second, to change the resistance state, applying a high voltage signal, followed by an in-depth XPS analysis. The XPS argon cluster depth profiling of the produced MIM structures showed that the resistive switching mechanism of the Pt/ZTO/Ti-Au device was not ionic, since no change of cation ratios and oxidation states were observed throughout the depth of the device, comparing pristine state and the low resistive state (LRS). The ITO/GIO/Au device exhibited area-dependent electroforming, which led to an irreversible change in the forward direction. Remarkably, the diode was free of any hysteresis after electroforming. The XPS depth profile revealed an increased indium concentration within the bulk region near the ITO after electroforming, compared to the pristine state of the device. Hence, despite being irreversible, the resistance change of the device is clearly related to an ionic mechanism. *ZTO: zinc-tin oxide; GIO: gallium-indium oxide
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spelling In-Depth X-Ray Photoelectron Spectroscopy of Resistive Switching DevicesX-rap photoelectron spectroscopyresistive switchingdepth profilingdiodeDomínio/Área Científica::Engenharia e Tecnologia::NanotecnologiaThis work has explored the possibility of using x-ray photoelectron spectroscopy (XPS), for studying the chemical properties (i.e. atomic ratios and oxidation states) of several metal-insulator-metal (MIM) structures. This thesis aims to better understand the operation mechanism that imposes a reversible change in the resistance state of the studied devices. Three different configurations (ITO/ZTO*/Pt, Pt/ZTO/Ti-Au, ITO/GIO*/Au) were fabricated following a physical vapour deposition methodology and patterned using shadow masks, specifically designed for this purpose. An electrical characterization was performed first, to evaluate the uniformity between the devices through the study of their pristine state and second, to change the resistance state, applying a high voltage signal, followed by an in-depth XPS analysis. The XPS argon cluster depth profiling of the produced MIM structures showed that the resistive switching mechanism of the Pt/ZTO/Ti-Au device was not ionic, since no change of cation ratios and oxidation states were observed throughout the depth of the device, comparing pristine state and the low resistive state (LRS). The ITO/GIO/Au device exhibited area-dependent electroforming, which led to an irreversible change in the forward direction. Remarkably, the diode was free of any hysteresis after electroforming. The XPS depth profile revealed an increased indium concentration within the bulk region near the ITO after electroforming, compared to the pristine state of the device. Hence, despite being irreversible, the resistance change of the device is clearly related to an ionic mechanism. *ZTO: zinc-tin oxide; GIO: gallium-indium oxideDeuermeier, JonasKiazadeh, AsalRUNNarciso, Gonçalo Filipe Fernandes2020-06-15T15:46:41Z2019-1020192019-10-01T00:00:00Zinfo:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/masterThesisapplication/pdfhttp://hdl.handle.net/10362/99347enginfo:eu-repo/semantics/openAccessreponame:Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)instname:Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informaçãoinstacron:RCAAP2024-03-11T04:46:00Zoai:run.unl.pt:10362/99347Portal AgregadorONGhttps://www.rcaap.pt/oai/openaireopendoar:71602024-03-20T03:39:03.777517Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) - Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informaçãofalse
dc.title.none.fl_str_mv In-Depth X-Ray Photoelectron Spectroscopy of Resistive Switching Devices
title In-Depth X-Ray Photoelectron Spectroscopy of Resistive Switching Devices
spellingShingle In-Depth X-Ray Photoelectron Spectroscopy of Resistive Switching Devices
Narciso, Gonçalo Filipe Fernandes
X-rap photoelectron spectroscopy
resistive switching
depth profiling
diode
Domínio/Área Científica::Engenharia e Tecnologia::Nanotecnologia
title_short In-Depth X-Ray Photoelectron Spectroscopy of Resistive Switching Devices
title_full In-Depth X-Ray Photoelectron Spectroscopy of Resistive Switching Devices
title_fullStr In-Depth X-Ray Photoelectron Spectroscopy of Resistive Switching Devices
title_full_unstemmed In-Depth X-Ray Photoelectron Spectroscopy of Resistive Switching Devices
title_sort In-Depth X-Ray Photoelectron Spectroscopy of Resistive Switching Devices
author Narciso, Gonçalo Filipe Fernandes
author_facet Narciso, Gonçalo Filipe Fernandes
author_role author
dc.contributor.none.fl_str_mv Deuermeier, Jonas
Kiazadeh, Asal
RUN
dc.contributor.author.fl_str_mv Narciso, Gonçalo Filipe Fernandes
dc.subject.por.fl_str_mv X-rap photoelectron spectroscopy
resistive switching
depth profiling
diode
Domínio/Área Científica::Engenharia e Tecnologia::Nanotecnologia
topic X-rap photoelectron spectroscopy
resistive switching
depth profiling
diode
Domínio/Área Científica::Engenharia e Tecnologia::Nanotecnologia
description This work has explored the possibility of using x-ray photoelectron spectroscopy (XPS), for studying the chemical properties (i.e. atomic ratios and oxidation states) of several metal-insulator-metal (MIM) structures. This thesis aims to better understand the operation mechanism that imposes a reversible change in the resistance state of the studied devices. Three different configurations (ITO/ZTO*/Pt, Pt/ZTO/Ti-Au, ITO/GIO*/Au) were fabricated following a physical vapour deposition methodology and patterned using shadow masks, specifically designed for this purpose. An electrical characterization was performed first, to evaluate the uniformity between the devices through the study of their pristine state and second, to change the resistance state, applying a high voltage signal, followed by an in-depth XPS analysis. The XPS argon cluster depth profiling of the produced MIM structures showed that the resistive switching mechanism of the Pt/ZTO/Ti-Au device was not ionic, since no change of cation ratios and oxidation states were observed throughout the depth of the device, comparing pristine state and the low resistive state (LRS). The ITO/GIO/Au device exhibited area-dependent electroforming, which led to an irreversible change in the forward direction. Remarkably, the diode was free of any hysteresis after electroforming. The XPS depth profile revealed an increased indium concentration within the bulk region near the ITO after electroforming, compared to the pristine state of the device. Hence, despite being irreversible, the resistance change of the device is clearly related to an ionic mechanism. *ZTO: zinc-tin oxide; GIO: gallium-indium oxide
publishDate 2019
dc.date.none.fl_str_mv 2019-10
2019
2019-10-01T00:00:00Z
2020-06-15T15:46:41Z
dc.type.status.fl_str_mv info:eu-repo/semantics/publishedVersion
dc.type.driver.fl_str_mv info:eu-repo/semantics/masterThesis
format masterThesis
status_str publishedVersion
dc.identifier.uri.fl_str_mv http://hdl.handle.net/10362/99347
url http://hdl.handle.net/10362/99347
dc.language.iso.fl_str_mv eng
language eng
dc.rights.driver.fl_str_mv info:eu-repo/semantics/openAccess
eu_rights_str_mv openAccess
dc.format.none.fl_str_mv application/pdf
dc.source.none.fl_str_mv reponame:Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
instname:Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação
instacron:RCAAP
instname_str Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação
instacron_str RCAAP
institution RCAAP
reponame_str Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
collection Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
repository.name.fl_str_mv Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) - Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação
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