Reductive nanometric patterning of graphene oxide paper using electron beam lithography
Autor(a) principal: | |
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Data de Publicação: | 2018 |
Outros Autores: | , , , , , , , |
Tipo de documento: | Artigo |
Idioma: | eng |
Título da fonte: | Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) |
Texto Completo: | http://hdl.handle.net/1822/48558 |
Resumo: | Electron beam lithography (EBL) was used for preparing nanostructured reduced patterns on the GO paper surface, while preserving its mechanical resistance and flexibility. Different EBL parameters, like dose and time of exposure for patterning were tested. SEM analysis showed the consequent increase of contrast of the reduced stripes on the patterned regions due to the increase of electron beam doses. Moreover, surface potential microscopy experiments also exhibited a clear contrast between the patterned and non-patterned regions. Structural analysis of the patterned paper through X-ray diffraction and nanoindentation showed that the interlayer distance between GO sheets decreases after reduction allowing the increase of the Hardness and Young modulus that makes this material able to be manipulated and integrated on different devices. Furthermore, we also observe that exposed areas to electron beam reduction process show an increase in the electrical conductivity up to 3 × 104 times. The developed flexible GO films can have interesting applications such as biosensors or templates for inducing tissue regeneration, by providing a surface with differently patterned cues with contrasting electron mobility. Preliminary in vitro studies with L929 fibroblasts support the cytocompatible nature of this patterned GO paper. |
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Reductive nanometric patterning of graphene oxide paper using electron beam lithographygraphene oxidegraphene oxide paperelectron beam lithographyconductivitynanoidentationcytocompatibilityNanoindentationReduction patterningEngenharia e Tecnologia::Engenharia dos MateriaisEngenharia e Tecnologia::NanotecnologiaScience & TechnologyElectron beam lithography (EBL) was used for preparing nanostructured reduced patterns on the GO paper surface, while preserving its mechanical resistance and flexibility. Different EBL parameters, like dose and time of exposure for patterning were tested. SEM analysis showed the consequent increase of contrast of the reduced stripes on the patterned regions due to the increase of electron beam doses. Moreover, surface potential microscopy experiments also exhibited a clear contrast between the patterned and non-patterned regions. Structural analysis of the patterned paper through X-ray diffraction and nanoindentation showed that the interlayer distance between GO sheets decreases after reduction allowing the increase of the Hardness and Young modulus that makes this material able to be manipulated and integrated on different devices. Furthermore, we also observe that exposed areas to electron beam reduction process show an increase in the electrical conductivity up to 3 × 104 times. The developed flexible GO films can have interesting applications such as biosensors or templates for inducing tissue regeneration, by providing a surface with differently patterned cues with contrasting electron mobility. Preliminary in vitro studies with L929 fibroblasts support the cytocompatible nature of this patterned GO paper.Gil Gonçalves thanks the Fundação para a Ciência e a Tecnologia for the PostDoc grant (SFRH/BDP/84419/2012). P.A.A.P.M. acknowledge the FCT/MCTES for a research contract under the Program Investigator 2013 (IF/00917/2013/CP1162/CT0016) and TEMA – Centre for Mechanical Technology and Automation (UID/EMS/00481/2013), financed by national funds through the FCT/MEC. I.B. wish to acknowledge the Portuguese Foundation for Science and Technology for the financial support (grant IF/00582/2015). H·I·S.N. acknowledges CICECO-Aveiro Institute of Materials, POCI-01-0145-FEDER-007679 (FCT Ref. UID/CTM/50011/2013), financed by national funds through the FCT/MEC and when appropriate co-financed by FEDER under the PT2020 Partnership Agreement. The biological studies of this work have been funded by the Ministerio de Economía y Competitividad and the Fondo Europeo de Desarrollo Regional (MAT2016-78857-R, MINECO/FEDER, UE). AGM and MCS acknowledge ISCIII-MINECO-FEDER for respective contracts. Authors would like to thank Dr M. Teresa Portolés from the Biochemistry and Molecular Biology Department at Universidad Complutense de Madrid for the generous supply of L929 fibroblasts. Dr José Ángel Rodríguez and Dr Javier Mazarío from the Service of Microscopy and Image Analysis at the Hospital Nacional de Parapléjicos are acknowledged for assistance with CLSM studies and Dr Enrique Rodríguez from the Servicio Interdepartamental de Investigación at the Universidad Autónoma de Madrid for SEM studies.info:eu-repo/semantics/acceptedVersionElsevierUniversidade do MinhoGonçalves, GilBorme, JérômeBdkin, IgorGonzález-Mayorga, AnkorIrurueta, GonzaloNogueira, Helena I.S.Serrano, María C.Alpuim, P.Marques, Paula A.A.P.20182018-01-01T00:00:00Zinfo:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/articleapplication/pdfhttp://hdl.handle.net/1822/48558eng0008-622310.1016/j.carbon.2017.11.067https://www.sciencedirect.com/science/article/pii/S0008622317311818info:eu-repo/semantics/openAccessreponame:Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)instname:Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informaçãoinstacron:RCAAP2023-07-21T11:54:39Zoai:repositorium.sdum.uminho.pt:1822/48558Portal AgregadorONGhttps://www.rcaap.pt/oai/openaireopendoar:71602024-03-19T18:44:07.822248Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) - Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informaçãofalse |
dc.title.none.fl_str_mv |
Reductive nanometric patterning of graphene oxide paper using electron beam lithography |
title |
Reductive nanometric patterning of graphene oxide paper using electron beam lithography |
spellingShingle |
Reductive nanometric patterning of graphene oxide paper using electron beam lithography Gonçalves, Gil graphene oxide graphene oxide paper electron beam lithography conductivity nanoidentation cytocompatibility Nanoindentation Reduction patterning Engenharia e Tecnologia::Engenharia dos Materiais Engenharia e Tecnologia::Nanotecnologia Science & Technology |
title_short |
Reductive nanometric patterning of graphene oxide paper using electron beam lithography |
title_full |
Reductive nanometric patterning of graphene oxide paper using electron beam lithography |
title_fullStr |
Reductive nanometric patterning of graphene oxide paper using electron beam lithography |
title_full_unstemmed |
Reductive nanometric patterning of graphene oxide paper using electron beam lithography |
title_sort |
Reductive nanometric patterning of graphene oxide paper using electron beam lithography |
author |
Gonçalves, Gil |
author_facet |
Gonçalves, Gil Borme, Jérôme Bdkin, Igor González-Mayorga, Ankor Irurueta, Gonzalo Nogueira, Helena I.S. Serrano, María C. Alpuim, P. Marques, Paula A.A.P. |
author_role |
author |
author2 |
Borme, Jérôme Bdkin, Igor González-Mayorga, Ankor Irurueta, Gonzalo Nogueira, Helena I.S. Serrano, María C. Alpuim, P. Marques, Paula A.A.P. |
author2_role |
author author author author author author author author |
dc.contributor.none.fl_str_mv |
Universidade do Minho |
dc.contributor.author.fl_str_mv |
Gonçalves, Gil Borme, Jérôme Bdkin, Igor González-Mayorga, Ankor Irurueta, Gonzalo Nogueira, Helena I.S. Serrano, María C. Alpuim, P. Marques, Paula A.A.P. |
dc.subject.por.fl_str_mv |
graphene oxide graphene oxide paper electron beam lithography conductivity nanoidentation cytocompatibility Nanoindentation Reduction patterning Engenharia e Tecnologia::Engenharia dos Materiais Engenharia e Tecnologia::Nanotecnologia Science & Technology |
topic |
graphene oxide graphene oxide paper electron beam lithography conductivity nanoidentation cytocompatibility Nanoindentation Reduction patterning Engenharia e Tecnologia::Engenharia dos Materiais Engenharia e Tecnologia::Nanotecnologia Science & Technology |
description |
Electron beam lithography (EBL) was used for preparing nanostructured reduced patterns on the GO paper surface, while preserving its mechanical resistance and flexibility. Different EBL parameters, like dose and time of exposure for patterning were tested. SEM analysis showed the consequent increase of contrast of the reduced stripes on the patterned regions due to the increase of electron beam doses. Moreover, surface potential microscopy experiments also exhibited a clear contrast between the patterned and non-patterned regions. Structural analysis of the patterned paper through X-ray diffraction and nanoindentation showed that the interlayer distance between GO sheets decreases after reduction allowing the increase of the Hardness and Young modulus that makes this material able to be manipulated and integrated on different devices. Furthermore, we also observe that exposed areas to electron beam reduction process show an increase in the electrical conductivity up to 3 × 104 times. The developed flexible GO films can have interesting applications such as biosensors or templates for inducing tissue regeneration, by providing a surface with differently patterned cues with contrasting electron mobility. Preliminary in vitro studies with L929 fibroblasts support the cytocompatible nature of this patterned GO paper. |
publishDate |
2018 |
dc.date.none.fl_str_mv |
2018 2018-01-01T00:00:00Z |
dc.type.status.fl_str_mv |
info:eu-repo/semantics/publishedVersion |
dc.type.driver.fl_str_mv |
info:eu-repo/semantics/article |
format |
article |
status_str |
publishedVersion |
dc.identifier.uri.fl_str_mv |
http://hdl.handle.net/1822/48558 |
url |
http://hdl.handle.net/1822/48558 |
dc.language.iso.fl_str_mv |
eng |
language |
eng |
dc.relation.none.fl_str_mv |
0008-6223 10.1016/j.carbon.2017.11.067 https://www.sciencedirect.com/science/article/pii/S0008622317311818 |
dc.rights.driver.fl_str_mv |
info:eu-repo/semantics/openAccess |
eu_rights_str_mv |
openAccess |
dc.format.none.fl_str_mv |
application/pdf |
dc.publisher.none.fl_str_mv |
Elsevier |
publisher.none.fl_str_mv |
Elsevier |
dc.source.none.fl_str_mv |
reponame:Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) instname:Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação instacron:RCAAP |
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Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação |
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RCAAP |
institution |
RCAAP |
reponame_str |
Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) |
collection |
Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) |
repository.name.fl_str_mv |
Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) - Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação |
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