Reductive nanometric patterning of graphene oxide paper using electron beam lithography

Detalhes bibliográficos
Autor(a) principal: Gonçalves, Gil
Data de Publicação: 2018
Outros Autores: Borme, Jérôme, Bdkin, Igor, González-Mayorga, Ankor, Irurueta, Gonzalo, Nogueira, Helena I.S., Serrano, María C., Alpuim, P., Marques, Paula A.A.P.
Tipo de documento: Artigo
Idioma: eng
Título da fonte: Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
Texto Completo: http://hdl.handle.net/1822/48558
Resumo: Electron beam lithography (EBL) was used for preparing nanostructured reduced patterns on the GO paper surface, while preserving its mechanical resistance and flexibility. Different EBL parameters, like dose and time of exposure for patterning were tested. SEM analysis showed the consequent increase of contrast of the reduced stripes on the patterned regions due to the increase of electron beam doses. Moreover, surface potential microscopy experiments also exhibited a clear contrast between the patterned and non-patterned regions. Structural analysis of the patterned paper through X-ray diffraction and nanoindentation showed that the interlayer distance between GO sheets decreases after reduction allowing the increase of the Hardness and Young modulus that makes this material able to be manipulated and integrated on different devices. Furthermore, we also observe that exposed areas to electron beam reduction process show an increase in the electrical conductivity up to 3 × 104 times. The developed flexible GO films can have interesting applications such as biosensors or templates for inducing tissue regeneration, by providing a surface with differently patterned cues with contrasting electron mobility. Preliminary in vitro studies with L929 fibroblasts support the cytocompatible nature of this patterned GO paper.
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spelling Reductive nanometric patterning of graphene oxide paper using electron beam lithographygraphene oxidegraphene oxide paperelectron beam lithographyconductivitynanoidentationcytocompatibilityNanoindentationReduction patterningEngenharia e Tecnologia::Engenharia dos MateriaisEngenharia e Tecnologia::NanotecnologiaScience & TechnologyElectron beam lithography (EBL) was used for preparing nanostructured reduced patterns on the GO paper surface, while preserving its mechanical resistance and flexibility. Different EBL parameters, like dose and time of exposure for patterning were tested. SEM analysis showed the consequent increase of contrast of the reduced stripes on the patterned regions due to the increase of electron beam doses. Moreover, surface potential microscopy experiments also exhibited a clear contrast between the patterned and non-patterned regions. Structural analysis of the patterned paper through X-ray diffraction and nanoindentation showed that the interlayer distance between GO sheets decreases after reduction allowing the increase of the Hardness and Young modulus that makes this material able to be manipulated and integrated on different devices. Furthermore, we also observe that exposed areas to electron beam reduction process show an increase in the electrical conductivity up to 3 × 104 times. The developed flexible GO films can have interesting applications such as biosensors or templates for inducing tissue regeneration, by providing a surface with differently patterned cues with contrasting electron mobility. Preliminary in vitro studies with L929 fibroblasts support the cytocompatible nature of this patterned GO paper.Gil Gonçalves thanks the Fundação para a Ciência e a Tecnologia for the PostDoc grant (SFRH/BDP/84419/2012). P.A.A.P.M. acknowledge the FCT/MCTES for a research contract under the Program Investigator 2013 (IF/00917/2013/CP1162/CT0016) and TEMA – Centre for Mechanical Technology and Automation (UID/EMS/00481/2013), financed by national funds through the FCT/MEC. I.B. wish to acknowledge the Portuguese Foundation for Science and Technology for the financial support (grant IF/00582/2015). H·I·S.N. acknowledges CICECO-Aveiro Institute of Materials, POCI-01-0145-FEDER-007679 (FCT Ref. UID/CTM/50011/2013), financed by national funds through the FCT/MEC and when appropriate co-financed by FEDER under the PT2020 Partnership Agreement. The biological studies of this work have been funded by the Ministerio de Economía y Competitividad and the Fondo Europeo de Desarrollo Regional (MAT2016-78857-R, MINECO/FEDER, UE). AGM and MCS acknowledge ISCIII-MINECO-FEDER for respective contracts. Authors would like to thank Dr M. Teresa Portolés from the Biochemistry and Molecular Biology Department at Universidad Complutense de Madrid for the generous supply of L929 fibroblasts. Dr José Ángel Rodríguez and Dr Javier Mazarío from the Service of Microscopy and Image Analysis at the Hospital Nacional de Parapléjicos are acknowledged for assistance with CLSM studies and Dr Enrique Rodríguez from the Servicio Interdepartamental de Investigación at the Universidad Autónoma de Madrid for SEM studies.info:eu-repo/semantics/acceptedVersionElsevierUniversidade do MinhoGonçalves, GilBorme, JérômeBdkin, IgorGonzález-Mayorga, AnkorIrurueta, GonzaloNogueira, Helena I.S.Serrano, María C.Alpuim, P.Marques, Paula A.A.P.20182018-01-01T00:00:00Zinfo:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/articleapplication/pdfhttp://hdl.handle.net/1822/48558eng0008-622310.1016/j.carbon.2017.11.067https://www.sciencedirect.com/science/article/pii/S0008622317311818info:eu-repo/semantics/openAccessreponame:Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)instname:Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informaçãoinstacron:RCAAP2023-07-21T11:54:39Zoai:repositorium.sdum.uminho.pt:1822/48558Portal AgregadorONGhttps://www.rcaap.pt/oai/openaireopendoar:71602024-03-19T18:44:07.822248Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) - Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informaçãofalse
dc.title.none.fl_str_mv Reductive nanometric patterning of graphene oxide paper using electron beam lithography
title Reductive nanometric patterning of graphene oxide paper using electron beam lithography
spellingShingle Reductive nanometric patterning of graphene oxide paper using electron beam lithography
Gonçalves, Gil
graphene oxide
graphene oxide paper
electron beam lithography
conductivity
nanoidentation
cytocompatibility
Nanoindentation
Reduction patterning
Engenharia e Tecnologia::Engenharia dos Materiais
Engenharia e Tecnologia::Nanotecnologia
Science & Technology
title_short Reductive nanometric patterning of graphene oxide paper using electron beam lithography
title_full Reductive nanometric patterning of graphene oxide paper using electron beam lithography
title_fullStr Reductive nanometric patterning of graphene oxide paper using electron beam lithography
title_full_unstemmed Reductive nanometric patterning of graphene oxide paper using electron beam lithography
title_sort Reductive nanometric patterning of graphene oxide paper using electron beam lithography
author Gonçalves, Gil
author_facet Gonçalves, Gil
Borme, Jérôme
Bdkin, Igor
González-Mayorga, Ankor
Irurueta, Gonzalo
Nogueira, Helena I.S.
Serrano, María C.
Alpuim, P.
Marques, Paula A.A.P.
author_role author
author2 Borme, Jérôme
Bdkin, Igor
González-Mayorga, Ankor
Irurueta, Gonzalo
Nogueira, Helena I.S.
Serrano, María C.
Alpuim, P.
Marques, Paula A.A.P.
author2_role author
author
author
author
author
author
author
author
dc.contributor.none.fl_str_mv Universidade do Minho
dc.contributor.author.fl_str_mv Gonçalves, Gil
Borme, Jérôme
Bdkin, Igor
González-Mayorga, Ankor
Irurueta, Gonzalo
Nogueira, Helena I.S.
Serrano, María C.
Alpuim, P.
Marques, Paula A.A.P.
dc.subject.por.fl_str_mv graphene oxide
graphene oxide paper
electron beam lithography
conductivity
nanoidentation
cytocompatibility
Nanoindentation
Reduction patterning
Engenharia e Tecnologia::Engenharia dos Materiais
Engenharia e Tecnologia::Nanotecnologia
Science & Technology
topic graphene oxide
graphene oxide paper
electron beam lithography
conductivity
nanoidentation
cytocompatibility
Nanoindentation
Reduction patterning
Engenharia e Tecnologia::Engenharia dos Materiais
Engenharia e Tecnologia::Nanotecnologia
Science & Technology
description Electron beam lithography (EBL) was used for preparing nanostructured reduced patterns on the GO paper surface, while preserving its mechanical resistance and flexibility. Different EBL parameters, like dose and time of exposure for patterning were tested. SEM analysis showed the consequent increase of contrast of the reduced stripes on the patterned regions due to the increase of electron beam doses. Moreover, surface potential microscopy experiments also exhibited a clear contrast between the patterned and non-patterned regions. Structural analysis of the patterned paper through X-ray diffraction and nanoindentation showed that the interlayer distance between GO sheets decreases after reduction allowing the increase of the Hardness and Young modulus that makes this material able to be manipulated and integrated on different devices. Furthermore, we also observe that exposed areas to electron beam reduction process show an increase in the electrical conductivity up to 3 × 104 times. The developed flexible GO films can have interesting applications such as biosensors or templates for inducing tissue regeneration, by providing a surface with differently patterned cues with contrasting electron mobility. Preliminary in vitro studies with L929 fibroblasts support the cytocompatible nature of this patterned GO paper.
publishDate 2018
dc.date.none.fl_str_mv 2018
2018-01-01T00:00:00Z
dc.type.status.fl_str_mv info:eu-repo/semantics/publishedVersion
dc.type.driver.fl_str_mv info:eu-repo/semantics/article
format article
status_str publishedVersion
dc.identifier.uri.fl_str_mv http://hdl.handle.net/1822/48558
url http://hdl.handle.net/1822/48558
dc.language.iso.fl_str_mv eng
language eng
dc.relation.none.fl_str_mv 0008-6223
10.1016/j.carbon.2017.11.067
https://www.sciencedirect.com/science/article/pii/S0008622317311818
dc.rights.driver.fl_str_mv info:eu-repo/semantics/openAccess
eu_rights_str_mv openAccess
dc.format.none.fl_str_mv application/pdf
dc.publisher.none.fl_str_mv Elsevier
publisher.none.fl_str_mv Elsevier
dc.source.none.fl_str_mv reponame:Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
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collection Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
repository.name.fl_str_mv Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) - Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação
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