Sputtering of silicon nanopowders by an argon cluster ion beam

Detalhes bibliográficos
Autor(a) principal: Zeng, Xiaomei
Data de Publicação: 2019
Outros Autores: Pelenovich, Vasiliy, Wang, Zhenguo, Zuo, Wenbin, Belykh, Sergey, Tolstogouzov, Alexander, Fu, Dejun, Xiao, Xiangheng
Tipo de documento: Artigo
Idioma: eng
Título da fonte: Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
Texto Completo: https://doi.org/10.3762/bjnano.10.13
Resumo: This study was supported by Wuhan Municipal Science and Technology Bureau grant No. 2017030209020250 and Shenzhen Municipal Committee on Science and Technology Innovation grant No. JCYJ20170818112901473, and partly by the Ministry of Education and Science of the Russian Federation within the framework of project no. 8.2810.2017.
id RCAP_c8a9334b16c63c982b29ce0dfd4f4c55
oai_identifier_str oai:run.unl.pt:10362/81689
network_acronym_str RCAP
network_name_str Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
repository_id_str 7160
spelling Sputtering of silicon nanopowders by an argon cluster ion beamFinite size effectGas cluster ion beamSilicon nanoparticlesSmoothing effectSputteringMaterials Science(all)Physics and Astronomy(all)Electrical and Electronic EngineeringThis study was supported by Wuhan Municipal Science and Technology Bureau grant No. 2017030209020250 and Shenzhen Municipal Committee on Science and Technology Innovation grant No. JCYJ20170818112901473, and partly by the Ministry of Education and Science of the Russian Federation within the framework of project no. 8.2810.2017.In this work an Ar + cluster ion beam with energy in the range of 10-70 keV and dose of 7.2 × 10 14 -2.3 × 10 16 cluster/cm 2 was used to irradiate pressed Si nanopowder targets consisting of particles with a mean diameter of 60 nm. The influence of the target density and the cluster ion beam parameters (energy and dose) on the sputtering depth and sputtering yield was studied. The sputtering yield was found to decrease with increasing dose and target density. The energy dependence demonstrated an unusual non-monotonic behavior. At 17.3 keV a maximum of the sputtering yield was observed, which was more than forty times higher than that of the bulk Si. The surface roughness at low energy demonstrates a similar energy dependence with a maximum near 17 keV. The dose and energy dependence of the sputtering yield was explained by the competition of the finite size effect and the effect of debris formation.CeFITec – Centro de Física e Investigação TecnológicaDF – Departamento de FísicaRUNZeng, XiaomeiPelenovich, VasiliyWang, ZhenguoZuo, WenbinBelykh, SergeyTolstogouzov, AlexanderFu, DejunXiao, Xiangheng2019-09-18T22:46:31Z2019-01-012019-01-01T00:00:00Zinfo:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/article8application/pdfhttps://doi.org/10.3762/bjnano.10.13eng2190-4286PURE: 13379978http://www.scopus.com/inward/record.url?scp=85060154337&partnerID=8YFLogxKhttps://doi.org/10.3762/bjnano.10.13info:eu-repo/semantics/openAccessreponame:Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)instname:Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informaçãoinstacron:RCAAP2024-03-11T04:36:24Zoai:run.unl.pt:10362/81689Portal AgregadorONGhttps://www.rcaap.pt/oai/openaireopendoar:71602024-03-20T03:36:07.618357Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) - Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informaçãofalse
dc.title.none.fl_str_mv Sputtering of silicon nanopowders by an argon cluster ion beam
title Sputtering of silicon nanopowders by an argon cluster ion beam
spellingShingle Sputtering of silicon nanopowders by an argon cluster ion beam
Zeng, Xiaomei
Finite size effect
Gas cluster ion beam
Silicon nanoparticles
Smoothing effect
Sputtering
Materials Science(all)
Physics and Astronomy(all)
Electrical and Electronic Engineering
title_short Sputtering of silicon nanopowders by an argon cluster ion beam
title_full Sputtering of silicon nanopowders by an argon cluster ion beam
title_fullStr Sputtering of silicon nanopowders by an argon cluster ion beam
title_full_unstemmed Sputtering of silicon nanopowders by an argon cluster ion beam
title_sort Sputtering of silicon nanopowders by an argon cluster ion beam
author Zeng, Xiaomei
author_facet Zeng, Xiaomei
Pelenovich, Vasiliy
Wang, Zhenguo
Zuo, Wenbin
Belykh, Sergey
Tolstogouzov, Alexander
Fu, Dejun
Xiao, Xiangheng
author_role author
author2 Pelenovich, Vasiliy
Wang, Zhenguo
Zuo, Wenbin
Belykh, Sergey
Tolstogouzov, Alexander
Fu, Dejun
Xiao, Xiangheng
author2_role author
author
author
author
author
author
author
dc.contributor.none.fl_str_mv CeFITec – Centro de Física e Investigação Tecnológica
DF – Departamento de Física
RUN
dc.contributor.author.fl_str_mv Zeng, Xiaomei
Pelenovich, Vasiliy
Wang, Zhenguo
Zuo, Wenbin
Belykh, Sergey
Tolstogouzov, Alexander
Fu, Dejun
Xiao, Xiangheng
dc.subject.por.fl_str_mv Finite size effect
Gas cluster ion beam
Silicon nanoparticles
Smoothing effect
Sputtering
Materials Science(all)
Physics and Astronomy(all)
Electrical and Electronic Engineering
topic Finite size effect
Gas cluster ion beam
Silicon nanoparticles
Smoothing effect
Sputtering
Materials Science(all)
Physics and Astronomy(all)
Electrical and Electronic Engineering
description This study was supported by Wuhan Municipal Science and Technology Bureau grant No. 2017030209020250 and Shenzhen Municipal Committee on Science and Technology Innovation grant No. JCYJ20170818112901473, and partly by the Ministry of Education and Science of the Russian Federation within the framework of project no. 8.2810.2017.
publishDate 2019
dc.date.none.fl_str_mv 2019-09-18T22:46:31Z
2019-01-01
2019-01-01T00:00:00Z
dc.type.status.fl_str_mv info:eu-repo/semantics/publishedVersion
dc.type.driver.fl_str_mv info:eu-repo/semantics/article
format article
status_str publishedVersion
dc.identifier.uri.fl_str_mv https://doi.org/10.3762/bjnano.10.13
url https://doi.org/10.3762/bjnano.10.13
dc.language.iso.fl_str_mv eng
language eng
dc.relation.none.fl_str_mv 2190-4286
PURE: 13379978
http://www.scopus.com/inward/record.url?scp=85060154337&partnerID=8YFLogxK
https://doi.org/10.3762/bjnano.10.13
dc.rights.driver.fl_str_mv info:eu-repo/semantics/openAccess
eu_rights_str_mv openAccess
dc.format.none.fl_str_mv 8
application/pdf
dc.source.none.fl_str_mv reponame:Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
instname:Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação
instacron:RCAAP
instname_str Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação
instacron_str RCAAP
institution RCAAP
reponame_str Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
collection Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
repository.name.fl_str_mv Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) - Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação
repository.mail.fl_str_mv
_version_ 1799137980628074496

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