Annealing effects on the structural and optical properties of vanadium oxide film obtained by the hot-filament metal oxide deposition technique (HFMOD)

Detalhes bibliográficos
Autor(a) principal: Scarminio,Jair
Data de Publicação: 2017
Outros Autores: Silva,Paulo Rogério Catarini da, Gelamo,Rogério Valentim, Moraes,Mário Antonio Bica de
Tipo de documento: Artigo
Idioma: eng
Título da fonte: Matéria (Rio de Janeiro. Online)
Texto Completo: http://old.scielo.br/scielo.php?script=sci_arttext&pid=S1517-70762017000100431
Resumo: ABSTRACT Vanadium oxide films amorphous, nonstoichiometric and highly absorbing in the optical region were deposited on ITO-coated glass and on silicon substrates, by the hot-filament metal oxide deposition technique (HFMOD) and oxidized by ex-situ annealing in a furnace at 200, 300, 400 and 500 ºC, under an atmosphere of argon and rarefied oxygen. X-ray diffraction, Raman and Rutherford backscattering spectroscopy as well as optical transmission were employed to characterize the amorphous and annealed films. When annealed at 200 and 300 ºC the as-deposited opaque films become transparent but still amorphous. Under treatments at 400 and 500 ºC a crystalline nonstoichiometric V2O5 structure is formed. All the annealed films became semiconducting, with their optical absorption coefficients changing with the annealing temperature. An optical gap of 2.25 eV was measured for the films annealed at 400 and 500 ºC. The annealing in rarefied oxygen atmosphere proved to be a useful and simple ex-situ method to modulate the structural and optical properties of vanadium oxide films deposited by HFMOD technique. This technique could be applied to other amorphous and non-absorbing oxide films, replacing the conventional and sometimes expensive method of modulate desirable film properties by controlling the film deposition parameters. Even more, the HFMOD technique can be an inexpensive alternative to deposit metal oxide films.
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spelling Annealing effects on the structural and optical properties of vanadium oxide film obtained by the hot-filament metal oxide deposition technique (HFMOD)vanadium oxide filmHFMOD techniqueannealingcrystalline structureoptical absorptionABSTRACT Vanadium oxide films amorphous, nonstoichiometric and highly absorbing in the optical region were deposited on ITO-coated glass and on silicon substrates, by the hot-filament metal oxide deposition technique (HFMOD) and oxidized by ex-situ annealing in a furnace at 200, 300, 400 and 500 ºC, under an atmosphere of argon and rarefied oxygen. X-ray diffraction, Raman and Rutherford backscattering spectroscopy as well as optical transmission were employed to characterize the amorphous and annealed films. When annealed at 200 and 300 ºC the as-deposited opaque films become transparent but still amorphous. Under treatments at 400 and 500 ºC a crystalline nonstoichiometric V2O5 structure is formed. All the annealed films became semiconducting, with their optical absorption coefficients changing with the annealing temperature. An optical gap of 2.25 eV was measured for the films annealed at 400 and 500 ºC. The annealing in rarefied oxygen atmosphere proved to be a useful and simple ex-situ method to modulate the structural and optical properties of vanadium oxide films deposited by HFMOD technique. This technique could be applied to other amorphous and non-absorbing oxide films, replacing the conventional and sometimes expensive method of modulate desirable film properties by controlling the film deposition parameters. Even more, the HFMOD technique can be an inexpensive alternative to deposit metal oxide films.Laboratório de Hidrogênio, Coppe - Universidade Federal do Rio de Janeiroem cooperação com a Associação Brasileira do Hidrogênio, ABH22017-01-01info:eu-repo/semantics/articleinfo:eu-repo/semantics/publishedVersiontext/htmlhttp://old.scielo.br/scielo.php?script=sci_arttext&pid=S1517-70762017000100431Matéria (Rio de Janeiro) v.22 n.1 2017reponame:Matéria (Rio de Janeiro. Online)instname:Matéria (Rio de Janeiro. Online)instacron:RLAM10.1590/s1517-707620170001.0113info:eu-repo/semantics/openAccessScarminio,JairSilva,Paulo Rogério Catarini daGelamo,Rogério ValentimMoraes,Mário Antonio Bica deeng2017-05-08T00:00:00Zoai:scielo:S1517-70762017000100431Revistahttp://www.materia.coppe.ufrj.br/https://old.scielo.br/oai/scielo-oai.php||materia@labh2.coppe.ufrj.br1517-70761517-7076opendoar:2017-05-08T00:00Matéria (Rio de Janeiro. Online) - Matéria (Rio de Janeiro. Online)false
dc.title.none.fl_str_mv Annealing effects on the structural and optical properties of vanadium oxide film obtained by the hot-filament metal oxide deposition technique (HFMOD)
title Annealing effects on the structural and optical properties of vanadium oxide film obtained by the hot-filament metal oxide deposition technique (HFMOD)
spellingShingle Annealing effects on the structural and optical properties of vanadium oxide film obtained by the hot-filament metal oxide deposition technique (HFMOD)
Scarminio,Jair
vanadium oxide film
HFMOD technique
annealing
crystalline structure
optical absorption
title_short Annealing effects on the structural and optical properties of vanadium oxide film obtained by the hot-filament metal oxide deposition technique (HFMOD)
title_full Annealing effects on the structural and optical properties of vanadium oxide film obtained by the hot-filament metal oxide deposition technique (HFMOD)
title_fullStr Annealing effects on the structural and optical properties of vanadium oxide film obtained by the hot-filament metal oxide deposition technique (HFMOD)
title_full_unstemmed Annealing effects on the structural and optical properties of vanadium oxide film obtained by the hot-filament metal oxide deposition technique (HFMOD)
title_sort Annealing effects on the structural and optical properties of vanadium oxide film obtained by the hot-filament metal oxide deposition technique (HFMOD)
author Scarminio,Jair
author_facet Scarminio,Jair
Silva,Paulo Rogério Catarini da
Gelamo,Rogério Valentim
Moraes,Mário Antonio Bica de
author_role author
author2 Silva,Paulo Rogério Catarini da
Gelamo,Rogério Valentim
Moraes,Mário Antonio Bica de
author2_role author
author
author
dc.contributor.author.fl_str_mv Scarminio,Jair
Silva,Paulo Rogério Catarini da
Gelamo,Rogério Valentim
Moraes,Mário Antonio Bica de
dc.subject.por.fl_str_mv vanadium oxide film
HFMOD technique
annealing
crystalline structure
optical absorption
topic vanadium oxide film
HFMOD technique
annealing
crystalline structure
optical absorption
description ABSTRACT Vanadium oxide films amorphous, nonstoichiometric and highly absorbing in the optical region were deposited on ITO-coated glass and on silicon substrates, by the hot-filament metal oxide deposition technique (HFMOD) and oxidized by ex-situ annealing in a furnace at 200, 300, 400 and 500 ºC, under an atmosphere of argon and rarefied oxygen. X-ray diffraction, Raman and Rutherford backscattering spectroscopy as well as optical transmission were employed to characterize the amorphous and annealed films. When annealed at 200 and 300 ºC the as-deposited opaque films become transparent but still amorphous. Under treatments at 400 and 500 ºC a crystalline nonstoichiometric V2O5 structure is formed. All the annealed films became semiconducting, with their optical absorption coefficients changing with the annealing temperature. An optical gap of 2.25 eV was measured for the films annealed at 400 and 500 ºC. The annealing in rarefied oxygen atmosphere proved to be a useful and simple ex-situ method to modulate the structural and optical properties of vanadium oxide films deposited by HFMOD technique. This technique could be applied to other amorphous and non-absorbing oxide films, replacing the conventional and sometimes expensive method of modulate desirable film properties by controlling the film deposition parameters. Even more, the HFMOD technique can be an inexpensive alternative to deposit metal oxide films.
publishDate 2017
dc.date.none.fl_str_mv 2017-01-01
dc.type.driver.fl_str_mv info:eu-repo/semantics/article
dc.type.status.fl_str_mv info:eu-repo/semantics/publishedVersion
format article
status_str publishedVersion
dc.identifier.uri.fl_str_mv http://old.scielo.br/scielo.php?script=sci_arttext&pid=S1517-70762017000100431
url http://old.scielo.br/scielo.php?script=sci_arttext&pid=S1517-70762017000100431
dc.language.iso.fl_str_mv eng
language eng
dc.relation.none.fl_str_mv 10.1590/s1517-707620170001.0113
dc.rights.driver.fl_str_mv info:eu-repo/semantics/openAccess
eu_rights_str_mv openAccess
dc.format.none.fl_str_mv text/html
dc.publisher.none.fl_str_mv Laboratório de Hidrogênio, Coppe - Universidade Federal do Rio de Janeiro
em cooperação com a Associação Brasileira do Hidrogênio, ABH2
publisher.none.fl_str_mv Laboratório de Hidrogênio, Coppe - Universidade Federal do Rio de Janeiro
em cooperação com a Associação Brasileira do Hidrogênio, ABH2
dc.source.none.fl_str_mv Matéria (Rio de Janeiro) v.22 n.1 2017
reponame:Matéria (Rio de Janeiro. Online)
instname:Matéria (Rio de Janeiro. Online)
instacron:RLAM
instname_str Matéria (Rio de Janeiro. Online)
instacron_str RLAM
institution RLAM
reponame_str Matéria (Rio de Janeiro. Online)
collection Matéria (Rio de Janeiro. Online)
repository.name.fl_str_mv Matéria (Rio de Janeiro. Online) - Matéria (Rio de Janeiro. Online)
repository.mail.fl_str_mv ||materia@labh2.coppe.ufrj.br
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