Size effects on the growth mode and roughness of sub-micron structures grown by selective area epitaxy

Detalhes bibliográficos
Autor(a) principal: Gutiérrez,H.R.
Data de Publicação: 1999
Outros Autores: Cotta,M.A., Nakaema,W.M., Carvalho,M.M.G.de, Gobbi,A.L.
Tipo de documento: Artigo
Idioma: eng
Título da fonte: Brazilian Journal of Physics
Texto Completo: http://old.scielo.br/scielo.php?script=sci_arttext&pid=S0103-97331999000400031
Resumo: We have observed changes in the morphology of InP films grown in epi-ready substrates and on patterns created by photo and plow-mode AFM lithography. These changes are attributed to different levels of contamination of the surface, which favor nucleation of clusters over a two-dimensional film for the lithography-processed surface. The area of nucleation is smaller than the dimensions of the patterns created by lithography, so no size effects due to the presence of the pattern could be observed. The film morphologies exhibited well defined exponents for system sizes smaller than 0.2 mum but no defined growth exponent.
id SBF-2_7875a817c9232af5195b35d3203702e0
oai_identifier_str oai:scielo:S0103-97331999000400031
network_acronym_str SBF-2
network_name_str Brazilian Journal of Physics
repository_id_str
spelling Size effects on the growth mode and roughness of sub-micron structures grown by selective area epitaxyWe have observed changes in the morphology of InP films grown in epi-ready substrates and on patterns created by photo and plow-mode AFM lithography. These changes are attributed to different levels of contamination of the surface, which favor nucleation of clusters over a two-dimensional film for the lithography-processed surface. The area of nucleation is smaller than the dimensions of the patterns created by lithography, so no size effects due to the presence of the pattern could be observed. The film morphologies exhibited well defined exponents for system sizes smaller than 0.2 mum but no defined growth exponent.Sociedade Brasileira de Física1999-12-01info:eu-repo/semantics/articleinfo:eu-repo/semantics/publishedVersiontext/htmlhttp://old.scielo.br/scielo.php?script=sci_arttext&pid=S0103-97331999000400031Brazilian Journal of Physics v.29 n.4 1999reponame:Brazilian Journal of Physicsinstname:Sociedade Brasileira de Física (SBF)instacron:SBF10.1590/S0103-97331999000400031info:eu-repo/semantics/openAccessGutiérrez,H.R.Cotta,M.A.Nakaema,W.M.Carvalho,M.M.G.deGobbi,A.L.eng2001-02-23T00:00:00Zoai:scielo:S0103-97331999000400031Revistahttp://www.sbfisica.org.br/v1/home/index.php/pt/ONGhttps://old.scielo.br/oai/scielo-oai.phpsbfisica@sbfisica.org.br||sbfisica@sbfisica.org.br1678-44480103-9733opendoar:2001-02-23T00:00Brazilian Journal of Physics - Sociedade Brasileira de Física (SBF)false
dc.title.none.fl_str_mv Size effects on the growth mode and roughness of sub-micron structures grown by selective area epitaxy
title Size effects on the growth mode and roughness of sub-micron structures grown by selective area epitaxy
spellingShingle Size effects on the growth mode and roughness of sub-micron structures grown by selective area epitaxy
Gutiérrez,H.R.
title_short Size effects on the growth mode and roughness of sub-micron structures grown by selective area epitaxy
title_full Size effects on the growth mode and roughness of sub-micron structures grown by selective area epitaxy
title_fullStr Size effects on the growth mode and roughness of sub-micron structures grown by selective area epitaxy
title_full_unstemmed Size effects on the growth mode and roughness of sub-micron structures grown by selective area epitaxy
title_sort Size effects on the growth mode and roughness of sub-micron structures grown by selective area epitaxy
author Gutiérrez,H.R.
author_facet Gutiérrez,H.R.
Cotta,M.A.
Nakaema,W.M.
Carvalho,M.M.G.de
Gobbi,A.L.
author_role author
author2 Cotta,M.A.
Nakaema,W.M.
Carvalho,M.M.G.de
Gobbi,A.L.
author2_role author
author
author
author
dc.contributor.author.fl_str_mv Gutiérrez,H.R.
Cotta,M.A.
Nakaema,W.M.
Carvalho,M.M.G.de
Gobbi,A.L.
description We have observed changes in the morphology of InP films grown in epi-ready substrates and on patterns created by photo and plow-mode AFM lithography. These changes are attributed to different levels of contamination of the surface, which favor nucleation of clusters over a two-dimensional film for the lithography-processed surface. The area of nucleation is smaller than the dimensions of the patterns created by lithography, so no size effects due to the presence of the pattern could be observed. The film morphologies exhibited well defined exponents for system sizes smaller than 0.2 mum but no defined growth exponent.
publishDate 1999
dc.date.none.fl_str_mv 1999-12-01
dc.type.driver.fl_str_mv info:eu-repo/semantics/article
dc.type.status.fl_str_mv info:eu-repo/semantics/publishedVersion
format article
status_str publishedVersion
dc.identifier.uri.fl_str_mv http://old.scielo.br/scielo.php?script=sci_arttext&pid=S0103-97331999000400031
url http://old.scielo.br/scielo.php?script=sci_arttext&pid=S0103-97331999000400031
dc.language.iso.fl_str_mv eng
language eng
dc.relation.none.fl_str_mv 10.1590/S0103-97331999000400031
dc.rights.driver.fl_str_mv info:eu-repo/semantics/openAccess
eu_rights_str_mv openAccess
dc.format.none.fl_str_mv text/html
dc.publisher.none.fl_str_mv Sociedade Brasileira de Física
publisher.none.fl_str_mv Sociedade Brasileira de Física
dc.source.none.fl_str_mv Brazilian Journal of Physics v.29 n.4 1999
reponame:Brazilian Journal of Physics
instname:Sociedade Brasileira de Física (SBF)
instacron:SBF
instname_str Sociedade Brasileira de Física (SBF)
instacron_str SBF
institution SBF
reponame_str Brazilian Journal of Physics
collection Brazilian Journal of Physics
repository.name.fl_str_mv Brazilian Journal of Physics - Sociedade Brasileira de Física (SBF)
repository.mail.fl_str_mv sbfisica@sbfisica.org.br||sbfisica@sbfisica.org.br
_version_ 1754734858819600384

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