Retention of copper(II) metal ions in a silicon-glass microfluidic device

• Autor(a) principal: Silva,José A. Fracassi da
• Data de Publicação: 2007
• Outros Autores: Lago,Claudimir L. do, Furlan,Rogerio
• Tipo de documento: Artigo
• Idioma: eng
• Título da fonte: Journal of the Brazilian Chemical Society (Online)
• Texto Completo: http://old.scielo.br/scielo.php?script=sci_arttext&pid=S0103-50532007000800013
• topic: microchip; sample treatment; copper ions; amperometric detection; silicon

This work describes the construction of a silicon microchip for retention of copper(II) metal ions. Conventional photolithographic process was applied to transfer the generated pattern to silicon wafers. Using Reactive Ion Etching (RIE), SF6 based, channels 50 µm wide and 10 µm deep were produced. The channels were sealed with borosilicate glass using anodic bonding process. The surface of the channels were modified with N-(beta-aminoethyl)-gamma-aminopropyltrimetoxysilane through a silanization reaction to promote the adsorption of copper(II) ions. An amperometric detector was placed at the microchip outlet and copper(II) ions were detected by a gold electrode at 0 V (against Ag/AgCl(KCl sat.) reference electrode). Copper(II) ions were retained and eluted with HCl 50 µmol L-1 in a micro-flow system at a flow rate about 100 µL min-1. Reproducibility in the peak area and height were about 4.6 % and 10 %, respectively, for three consecutive injections of 600 µL of 10 µmol L-1 copper(II) sample.