Raman and infrared spectroscopy studies of carbon nitride films prepared on Si (100) substrates by ion beam assisted deposition
Autor(a) principal: | |
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Data de Publicação: | 2006 |
Outros Autores: | , , , , , , , |
Tipo de documento: | Artigo |
Idioma: | eng |
Título da fonte: | Journal of the Brazilian Chemical Society (Online) |
Texto Completo: | http://old.scielo.br/scielo.php?script=sci_arttext&pid=S0103-50532006000600014 |
Resumo: | Carbon nitride films prepared by ion beam assisted deposition were studied by Raman and infrared spectroscopy, as a function of nitrogen ion energy (200, 400, and 600 eV) and the ion to atom arrival rate ratio R(I/A) ranging from 0.9 to 2.5. The composition ratio N/C in the film determined by elastic recoil detection analysis was found to be proportional to R(I/A); however, the film growth is possible only if R(I/A) is smaller than a critical value of chemical sputtering yield. This value was found to be 0.21. The maximum value of N/C obtained was 0.9 (47 at.% of nitrogen) for the film deposited with ion energy of 400 eV. In order to understand the effect of nitrogen incorporation on the structure of the films, the parameters were determined from the Raman spectra analysis of the films and found to show strong dependences of the nitrogen content in the films; the behaviors of the G peak position and width, and I D/I G ratio are correlated with the structure changes in the films. |
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Raman and infrared spectroscopy studies of carbon nitride films prepared on Si (100) substrates by ion beam assisted depositioncarbon nitrideRaman spectroscopyinfrared spectroscopyion beam depositionCarbon nitride films prepared by ion beam assisted deposition were studied by Raman and infrared spectroscopy, as a function of nitrogen ion energy (200, 400, and 600 eV) and the ion to atom arrival rate ratio R(I/A) ranging from 0.9 to 2.5. The composition ratio N/C in the film determined by elastic recoil detection analysis was found to be proportional to R(I/A); however, the film growth is possible only if R(I/A) is smaller than a critical value of chemical sputtering yield. This value was found to be 0.21. The maximum value of N/C obtained was 0.9 (47 at.% of nitrogen) for the film deposited with ion energy of 400 eV. In order to understand the effect of nitrogen incorporation on the structure of the films, the parameters were determined from the Raman spectra analysis of the films and found to show strong dependences of the nitrogen content in the films; the behaviors of the G peak position and width, and I D/I G ratio are correlated with the structure changes in the films.Sociedade Brasileira de Química2006-10-01info:eu-repo/semantics/articleinfo:eu-repo/semantics/publishedVersiontext/htmlhttp://old.scielo.br/scielo.php?script=sci_arttext&pid=S0103-50532006000600014Journal of the Brazilian Chemical Society v.17 n.6 2006reponame:Journal of the Brazilian Chemical Society (Online)instname:Sociedade Brasileira de Química (SBQ)instacron:SBQ10.1590/S0103-50532006000600014info:eu-repo/semantics/openAccessSucasaire,WilmerMatsuoka,MasaoLopes,Karina C.Mittani,Juan C. R.Avanci,Luis H.Chubaci,Jose F. D.Added,NemitalaTrava,VladimirCorat,Evaldo J.eng2006-11-29T00:00:00Zoai:scielo:S0103-50532006000600014Revistahttp://jbcs.sbq.org.brONGhttps://old.scielo.br/oai/scielo-oai.php||office@jbcs.sbq.org.br1678-47900103-5053opendoar:2006-11-29T00:00Journal of the Brazilian Chemical Society (Online) - Sociedade Brasileira de Química (SBQ)false |
dc.title.none.fl_str_mv |
Raman and infrared spectroscopy studies of carbon nitride films prepared on Si (100) substrates by ion beam assisted deposition |
title |
Raman and infrared spectroscopy studies of carbon nitride films prepared on Si (100) substrates by ion beam assisted deposition |
spellingShingle |
Raman and infrared spectroscopy studies of carbon nitride films prepared on Si (100) substrates by ion beam assisted deposition Sucasaire,Wilmer carbon nitride Raman spectroscopy infrared spectroscopy ion beam deposition |
title_short |
Raman and infrared spectroscopy studies of carbon nitride films prepared on Si (100) substrates by ion beam assisted deposition |
title_full |
Raman and infrared spectroscopy studies of carbon nitride films prepared on Si (100) substrates by ion beam assisted deposition |
title_fullStr |
Raman and infrared spectroscopy studies of carbon nitride films prepared on Si (100) substrates by ion beam assisted deposition |
title_full_unstemmed |
Raman and infrared spectroscopy studies of carbon nitride films prepared on Si (100) substrates by ion beam assisted deposition |
title_sort |
Raman and infrared spectroscopy studies of carbon nitride films prepared on Si (100) substrates by ion beam assisted deposition |
author |
Sucasaire,Wilmer |
author_facet |
Sucasaire,Wilmer Matsuoka,Masao Lopes,Karina C. Mittani,Juan C. R. Avanci,Luis H. Chubaci,Jose F. D. Added,Nemitala Trava,Vladimir Corat,Evaldo J. |
author_role |
author |
author2 |
Matsuoka,Masao Lopes,Karina C. Mittani,Juan C. R. Avanci,Luis H. Chubaci,Jose F. D. Added,Nemitala Trava,Vladimir Corat,Evaldo J. |
author2_role |
author author author author author author author author |
dc.contributor.author.fl_str_mv |
Sucasaire,Wilmer Matsuoka,Masao Lopes,Karina C. Mittani,Juan C. R. Avanci,Luis H. Chubaci,Jose F. D. Added,Nemitala Trava,Vladimir Corat,Evaldo J. |
dc.subject.por.fl_str_mv |
carbon nitride Raman spectroscopy infrared spectroscopy ion beam deposition |
topic |
carbon nitride Raman spectroscopy infrared spectroscopy ion beam deposition |
description |
Carbon nitride films prepared by ion beam assisted deposition were studied by Raman and infrared spectroscopy, as a function of nitrogen ion energy (200, 400, and 600 eV) and the ion to atom arrival rate ratio R(I/A) ranging from 0.9 to 2.5. The composition ratio N/C in the film determined by elastic recoil detection analysis was found to be proportional to R(I/A); however, the film growth is possible only if R(I/A) is smaller than a critical value of chemical sputtering yield. This value was found to be 0.21. The maximum value of N/C obtained was 0.9 (47 at.% of nitrogen) for the film deposited with ion energy of 400 eV. In order to understand the effect of nitrogen incorporation on the structure of the films, the parameters were determined from the Raman spectra analysis of the films and found to show strong dependences of the nitrogen content in the films; the behaviors of the G peak position and width, and I D/I G ratio are correlated with the structure changes in the films. |
publishDate |
2006 |
dc.date.none.fl_str_mv |
2006-10-01 |
dc.type.driver.fl_str_mv |
info:eu-repo/semantics/article |
dc.type.status.fl_str_mv |
info:eu-repo/semantics/publishedVersion |
format |
article |
status_str |
publishedVersion |
dc.identifier.uri.fl_str_mv |
http://old.scielo.br/scielo.php?script=sci_arttext&pid=S0103-50532006000600014 |
url |
http://old.scielo.br/scielo.php?script=sci_arttext&pid=S0103-50532006000600014 |
dc.language.iso.fl_str_mv |
eng |
language |
eng |
dc.relation.none.fl_str_mv |
10.1590/S0103-50532006000600014 |
dc.rights.driver.fl_str_mv |
info:eu-repo/semantics/openAccess |
eu_rights_str_mv |
openAccess |
dc.format.none.fl_str_mv |
text/html |
dc.publisher.none.fl_str_mv |
Sociedade Brasileira de Química |
publisher.none.fl_str_mv |
Sociedade Brasileira de Química |
dc.source.none.fl_str_mv |
Journal of the Brazilian Chemical Society v.17 n.6 2006 reponame:Journal of the Brazilian Chemical Society (Online) instname:Sociedade Brasileira de Química (SBQ) instacron:SBQ |
instname_str |
Sociedade Brasileira de Química (SBQ) |
instacron_str |
SBQ |
institution |
SBQ |
reponame_str |
Journal of the Brazilian Chemical Society (Online) |
collection |
Journal of the Brazilian Chemical Society (Online) |
repository.name.fl_str_mv |
Journal of the Brazilian Chemical Society (Online) - Sociedade Brasileira de Química (SBQ) |
repository.mail.fl_str_mv |
||office@jbcs.sbq.org.br |
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1750318167389896704 |