Shoot and root responses of Trifolium vesiculosum to boron fertilization in an acidic Brazilian soil

• Autor(a) principal: Favaretto,Nerilde
• Data de Publicação: 2007
• Outros Autores: Motta,Antônio Carlos Vargas, Barcik,Cristina, Lustosa,Sebastião Brasil Campos, Comin,Jucinei José
• Tipo de documento: Artigo
• Idioma: eng
• Título da fonte: Brazilian Archives of Biology and Technology
• Texto Completo: http://old.scielo.br/scielo.php?script=sci_arttext&pid=S1516-89132007000400005
• topic: Root and shoot growth; boron; aluminum; acidic soil

To analyze the influence of boron fertilization on shoot and root growth of Trifolium vesiculosum (arrowleaf clover), an acid soil profile (60 cm depth with 67% Al saturation) was recreated in a column (three layers of 20 cm each). Lime and fertilizer (P and K) were incorporated into the top 20 cm. The treatments consisted of six boron rates where boric acid was mixed throughout the profile. Addition of boron to soil with low pH and high Al increased the root and shoot growth, independent of the rate applied. Boron inhibited Al toxicity, but no effect was observed in the root length when Al was not present in the soil. It was also observed that there was more root growth below the plow layer (0-20 cm,) suggesting better root distribution in the soil profile which could be important for the plant growth, especially under drought conditions.