Height distribution of equipotential lines in a region confined by a rough conducting boundary
Autor(a) principal: | |
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Data de Publicação: | 2014 |
Outros Autores: | , , |
Tipo de documento: | Artigo |
Idioma: | eng |
Título da fonte: | Repositório Institucional da UFBA |
Texto Completo: | http://repositorio.ufba.br/ri/handle/ri/17368 |
Resumo: | Texto completo: acesso restrito. p.1-8 |
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Castro, C. P. deAssis, Thiago Albuquerque deCastilho, Caio Mário Castro deAndrade, Roberto Fernandes SilvaCastro, C. P. deAssis, Thiago Albuquerque deCastilho, Caio Mário Castro deAndrade, Roberto Fernandes Silva2015-04-08T18:39:42Z20140953-8984http://repositorio.ufba.br/ri/handle/ri/17368v. 26, n. 44Texto completo: acesso restrito. p.1-8This work considers the behavior of the height distributions of the equipotential lines in a region confined by two interfaces: a cathode with an irregular interface and a distant flat anode. Both boundaries, which are maintained at distinct and constant potential values, are assumed to be conductors. The morphology of the cathode interface results from the deposit of 2 × 104 monolayers that are produced using a single competitive growth model based on the rules of the Restricted Solid on Solid and Ballistic Deposition models, both of which belong to the Kadar–Parisi–Zhang (KPZ) universality class. At each time step, these rules are selected with probability p and q = 1 − p. For several irregular profiles that depend on p, a family of equipotential lines is evaluated. The lines are characterized by the skewness and kurtosis of the height distribution. The results indicate that the skewness of the equipotential line increases when they approach the flat anode and this increase has a non-trivial convergence to a delta distribution that characterizes the equipotential line in a uniform electric field. The morphology of the equipotential lines is discussed; the discussion emphasizes their features for different ranges of p that correspond to positive, null and negative values of the coefficient of the non-linear term in the KPZ equation.Submitted by Edileide Reis (leyde-landy@hotmail.com) on 2015-03-25T15:11:32Z No. of bitstreams: 1 C. P. de Castro.pdf: 556153 bytes, checksum: c564ea425534d329ec978f2a353e61a0 (MD5)Approved for entry into archive by Alda Lima da Silva (sivalda@ufba.br) on 2015-04-08T18:39:42Z (GMT) No. of bitstreams: 1 C. P. de Castro.pdf: 556153 bytes, checksum: c564ea425534d329ec978f2a353e61a0 (MD5)Made available in DSpace on 2015-04-08T18:39:42Z (GMT). No. of bitstreams: 1 C. P. de Castro.pdf: 556153 bytes, checksum: c564ea425534d329ec978f2a353e61a0 (MD5) Previous issue date: 2014http://dx.doi.org/10.1088/0953-8984/26/44/445007reponame:Repositório Institucional da UFBAinstname:Universidade Federal da Bahia (UFBA)instacron:UFBAFilmsInterfaces and solidsElectric potentialCold field emissionHeight distribution of equipotential lines in a region confined by a rough conducting boundaryJournal of Physics: Condensed Matterinfo:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/article10000-01-01Brasilinfo:eu-repo/semantics/openAccessengORIGINALC. P. de Castro.pdfC. 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dc.title.pt_BR.fl_str_mv |
Height distribution of equipotential lines in a region confined by a rough conducting boundary |
dc.title.alternative.pt_BR.fl_str_mv |
Journal of Physics: Condensed Matter |
title |
Height distribution of equipotential lines in a region confined by a rough conducting boundary |
spellingShingle |
Height distribution of equipotential lines in a region confined by a rough conducting boundary Castro, C. P. de Films Interfaces and solids Electric potential Cold field emission |
title_short |
Height distribution of equipotential lines in a region confined by a rough conducting boundary |
title_full |
Height distribution of equipotential lines in a region confined by a rough conducting boundary |
title_fullStr |
Height distribution of equipotential lines in a region confined by a rough conducting boundary |
title_full_unstemmed |
Height distribution of equipotential lines in a region confined by a rough conducting boundary |
title_sort |
Height distribution of equipotential lines in a region confined by a rough conducting boundary |
author |
Castro, C. P. de |
author_facet |
Castro, C. P. de Assis, Thiago Albuquerque de Castilho, Caio Mário Castro de Andrade, Roberto Fernandes Silva |
author_role |
author |
author2 |
Assis, Thiago Albuquerque de Castilho, Caio Mário Castro de Andrade, Roberto Fernandes Silva |
author2_role |
author author author |
dc.contributor.author.fl_str_mv |
Castro, C. P. de Assis, Thiago Albuquerque de Castilho, Caio Mário Castro de Andrade, Roberto Fernandes Silva Castro, C. P. de Assis, Thiago Albuquerque de Castilho, Caio Mário Castro de Andrade, Roberto Fernandes Silva |
dc.subject.por.fl_str_mv |
Films Interfaces and solids Electric potential Cold field emission |
topic |
Films Interfaces and solids Electric potential Cold field emission |
description |
Texto completo: acesso restrito. p.1-8 |
publishDate |
2014 |
dc.date.issued.fl_str_mv |
2014 |
dc.date.accessioned.fl_str_mv |
2015-04-08T18:39:42Z |
dc.type.status.fl_str_mv |
info:eu-repo/semantics/publishedVersion |
dc.type.driver.fl_str_mv |
info:eu-repo/semantics/article |
format |
article |
status_str |
publishedVersion |
dc.identifier.uri.fl_str_mv |
http://repositorio.ufba.br/ri/handle/ri/17368 |
dc.identifier.issn.none.fl_str_mv |
0953-8984 |
dc.identifier.number.pt_BR.fl_str_mv |
v. 26, n. 44 |
identifier_str_mv |
0953-8984 v. 26, n. 44 |
url |
http://repositorio.ufba.br/ri/handle/ri/17368 |
dc.language.iso.fl_str_mv |
eng |
language |
eng |
dc.rights.driver.fl_str_mv |
info:eu-repo/semantics/openAccess |
eu_rights_str_mv |
openAccess |
dc.publisher.country.fl_str_mv |
Brasil |
dc.source.pt_BR.fl_str_mv |
http://dx.doi.org/10.1088/0953-8984/26/44/445007 |
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reponame:Repositório Institucional da UFBA instname:Universidade Federal da Bahia (UFBA) instacron:UFBA |
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Universidade Federal da Bahia (UFBA) |
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UFBA |
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Repositório Institucional da UFBA |
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