Height distribution of equipotential lines in a region confined by a rough conducting boundary

Detalhes bibliográficos
Autor(a) principal: Castro, C. P. de
Data de Publicação: 2014
Outros Autores: Assis, Thiago Albuquerque de, Castilho, Caio Mário Castro de, Andrade, Roberto Fernandes Silva
Tipo de documento: Artigo
Idioma: eng
Título da fonte: Repositório Institucional da UFBA
Texto Completo: http://repositorio.ufba.br/ri/handle/ri/17368
Resumo: Texto completo: acesso restrito. p.1-8
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spelling Castro, C. P. deAssis, Thiago Albuquerque deCastilho, Caio Mário Castro deAndrade, Roberto Fernandes SilvaCastro, C. P. deAssis, Thiago Albuquerque deCastilho, Caio Mário Castro deAndrade, Roberto Fernandes Silva2015-04-08T18:39:42Z20140953-8984http://repositorio.ufba.br/ri/handle/ri/17368v. 26, n. 44Texto completo: acesso restrito. p.1-8This work considers the behavior of the height distributions of the equipotential lines in a region confined by two interfaces: a cathode with an irregular interface and a distant flat anode. Both boundaries, which are maintained at distinct and constant potential values, are assumed to be conductors. The morphology of the cathode interface results from the deposit of 2 × 104 monolayers that are produced using a single competitive growth model based on the rules of the Restricted Solid on Solid and Ballistic Deposition models, both of which belong to the Kadar–Parisi–Zhang (KPZ) universality class. At each time step, these rules are selected with probability p and q = 1 − p. For several irregular profiles that depend on p, a family of equipotential lines is evaluated. The lines are characterized by the skewness and kurtosis of the height distribution. The results indicate that the skewness of the equipotential line increases when they approach the flat anode and this increase has a non-trivial convergence to a delta distribution that characterizes the equipotential line in a uniform electric field. The morphology of the equipotential lines is discussed; the discussion emphasizes their features for different ranges of p that correspond to positive, null and negative values of the coefficient of the non-linear term in the KPZ equation.Submitted by Edileide Reis (leyde-landy@hotmail.com) on 2015-03-25T15:11:32Z No. of bitstreams: 1 C. P. de Castro.pdf: 556153 bytes, checksum: c564ea425534d329ec978f2a353e61a0 (MD5)Approved for entry into archive by Alda Lima da Silva (sivalda@ufba.br) on 2015-04-08T18:39:42Z (GMT) No. of bitstreams: 1 C. P. de Castro.pdf: 556153 bytes, checksum: c564ea425534d329ec978f2a353e61a0 (MD5)Made available in DSpace on 2015-04-08T18:39:42Z (GMT). No. of bitstreams: 1 C. P. de Castro.pdf: 556153 bytes, checksum: c564ea425534d329ec978f2a353e61a0 (MD5) Previous issue date: 2014http://dx.doi.org/10.1088/0953-8984/26/44/445007reponame:Repositório Institucional da UFBAinstname:Universidade Federal da Bahia (UFBA)instacron:UFBAFilmsInterfaces and solidsElectric potentialCold field emissionHeight distribution of equipotential lines in a region confined by a rough conducting boundaryJournal of Physics: Condensed Matterinfo:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/article10000-01-01Brasilinfo:eu-repo/semantics/openAccessengORIGINALC. P. de Castro.pdfC. 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dc.title.pt_BR.fl_str_mv Height distribution of equipotential lines in a region confined by a rough conducting boundary
dc.title.alternative.pt_BR.fl_str_mv Journal of Physics: Condensed Matter
title Height distribution of equipotential lines in a region confined by a rough conducting boundary
spellingShingle Height distribution of equipotential lines in a region confined by a rough conducting boundary
Castro, C. P. de
Films
Interfaces and solids
Electric potential
Cold field emission
title_short Height distribution of equipotential lines in a region confined by a rough conducting boundary
title_full Height distribution of equipotential lines in a region confined by a rough conducting boundary
title_fullStr Height distribution of equipotential lines in a region confined by a rough conducting boundary
title_full_unstemmed Height distribution of equipotential lines in a region confined by a rough conducting boundary
title_sort Height distribution of equipotential lines in a region confined by a rough conducting boundary
author Castro, C. P. de
author_facet Castro, C. P. de
Assis, Thiago Albuquerque de
Castilho, Caio Mário Castro de
Andrade, Roberto Fernandes Silva
author_role author
author2 Assis, Thiago Albuquerque de
Castilho, Caio Mário Castro de
Andrade, Roberto Fernandes Silva
author2_role author
author
author
dc.contributor.author.fl_str_mv Castro, C. P. de
Assis, Thiago Albuquerque de
Castilho, Caio Mário Castro de
Andrade, Roberto Fernandes Silva
Castro, C. P. de
Assis, Thiago Albuquerque de
Castilho, Caio Mário Castro de
Andrade, Roberto Fernandes Silva
dc.subject.por.fl_str_mv Films
Interfaces and solids
Electric potential
Cold field emission
topic Films
Interfaces and solids
Electric potential
Cold field emission
description Texto completo: acesso restrito. p.1-8
publishDate 2014
dc.date.issued.fl_str_mv 2014
dc.date.accessioned.fl_str_mv 2015-04-08T18:39:42Z
dc.type.status.fl_str_mv info:eu-repo/semantics/publishedVersion
dc.type.driver.fl_str_mv info:eu-repo/semantics/article
format article
status_str publishedVersion
dc.identifier.uri.fl_str_mv http://repositorio.ufba.br/ri/handle/ri/17368
dc.identifier.issn.none.fl_str_mv 0953-8984
dc.identifier.number.pt_BR.fl_str_mv v. 26, n. 44
identifier_str_mv 0953-8984
v. 26, n. 44
url http://repositorio.ufba.br/ri/handle/ri/17368
dc.language.iso.fl_str_mv eng
language eng
dc.rights.driver.fl_str_mv info:eu-repo/semantics/openAccess
eu_rights_str_mv openAccess
dc.publisher.country.fl_str_mv Brasil
dc.source.pt_BR.fl_str_mv http://dx.doi.org/10.1088/0953-8984/26/44/445007
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