Photoelastic and finite element stress analysis reliability for implant-supported system stress investigation

Detalhes bibliográficos
Autor(a) principal: Anna Gabriella Camacho Presotto
Data de Publicação: 2018
Outros Autores: Valentim Adelino Ricardo Barão, Ricardo Armini Caldas, Cláudia Lopes Brilhante Bhering, Rafael Leonardo Xediek Consani, Marcelo Ferraz Mesquita
Tipo de documento: Artigo
Idioma: eng
Título da fonte: Repositório Institucional da UFMG
Texto Completo: https://doi.org/10.20396/bjos.v17i0.8652941
http://hdl.handle.net/1843/45447
Resumo: Aim: To compare the reliability between photoelastic and finite element (FE) analyses by evaluating the effect of different marginal misfit levels on the stresses generated on two different implant-supported systems using conventional and short implants. Methods: Two photoelastic models were obtained: model C with two conventional implants (4.1×11 mm); and model S with a conventional and a short implant (5×6 mm). Three-unit CoCr frameworks were fabricated simulating a superior first pre-molar (P) to first molar (M) fixed dental prosthesis. Different levels of misfit (μm) were selected based on the misfit average of 10 frameworks obtained by the single-screw test protocol: low (<20), medium (>20 and <40) and high (>40). Stress levels and distribution were measured by photoelastic analysis. A similar situation of the in vitro assay was designed and simulated by the in silico analysis. Maximum and minimum principal strain were recorded numerically and color-coded for the models. Von Mises Stress was obtained for the metallic components. Results:Photoelasticity and FE analyses showed similar tendency where the increase of misfit generates higher stress levels despite of the implant design. The short implant showed lower von Mises stress values; however, it presented stresses around its full length for the in vitro and in silico analysis. Also, model S showed higher μstrain values for all simulated misfit levels. The type of implant did not affect the stresses around pillar P. Conclusions:Photoelasticity and FEA are reliable methodologies presenting similarity for the investigation of the biomechanical behavior of implant-supported rehabilitations.
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spelling Photoelastic and finite element stress analysis reliability for implant-supported system stress investigationBiomechanical phenomenaDental ImplantsOptical phenomenaFinite element analysisBiomechanical phenomenaDental ImplantsOptical phenomenaFinite element analysisAim: To compare the reliability between photoelastic and finite element (FE) analyses by evaluating the effect of different marginal misfit levels on the stresses generated on two different implant-supported systems using conventional and short implants. Methods: Two photoelastic models were obtained: model C with two conventional implants (4.1×11 mm); and model S with a conventional and a short implant (5×6 mm). Three-unit CoCr frameworks were fabricated simulating a superior first pre-molar (P) to first molar (M) fixed dental prosthesis. Different levels of misfit (μm) were selected based on the misfit average of 10 frameworks obtained by the single-screw test protocol: low (<20), medium (>20 and <40) and high (>40). Stress levels and distribution were measured by photoelastic analysis. A similar situation of the in vitro assay was designed and simulated by the in silico analysis. Maximum and minimum principal strain were recorded numerically and color-coded for the models. Von Mises Stress was obtained for the metallic components. Results:Photoelasticity and FE analyses showed similar tendency where the increase of misfit generates higher stress levels despite of the implant design. The short implant showed lower von Mises stress values; however, it presented stresses around its full length for the in vitro and in silico analysis. Also, model S showed higher μstrain values for all simulated misfit levels. The type of implant did not affect the stresses around pillar P. Conclusions:Photoelasticity and FEA are reliable methodologies presenting similarity for the investigation of the biomechanical behavior of implant-supported rehabilitations.CAPES - Coordenação de Aperfeiçoamento de Pessoal de Nível SuperiorFAPESP - Fundação de Amparo à Pesquisa do Estado de São PauloUniversidade Federal de Minas GeraisBrasilFAO - DEPARTAMENTO DE ODONTOLOGIA RESTAURADORAUFMG2022-09-24T17:37:43Z2022-09-24T17:37:43Z2018-07-16info:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/articlepdfapplication/pdfhttps://doi.org/10.20396/bjos.v17i0.865294116773225http://hdl.handle.net/1843/45447engBrazilian Journal of Oral SciencesAnna Gabriella Camacho PresottoValentim Adelino Ricardo BarãoRicardo Armini CaldasCláudia Lopes Brilhante BheringRafael Leonardo Xediek ConsaniMarcelo Ferraz Mesquitainfo:eu-repo/semantics/openAccessreponame:Repositório Institucional da UFMGinstname:Universidade Federal de Minas Gerais (UFMG)instacron:UFMG2022-09-24T17:37:44Zoai:repositorio.ufmg.br:1843/45447Repositório InstitucionalPUBhttps://repositorio.ufmg.br/oairepositorio@ufmg.bropendoar:2022-09-24T17:37:44Repositório Institucional da UFMG - Universidade Federal de Minas Gerais (UFMG)false
dc.title.none.fl_str_mv Photoelastic and finite element stress analysis reliability for implant-supported system stress investigation
title Photoelastic and finite element stress analysis reliability for implant-supported system stress investigation
spellingShingle Photoelastic and finite element stress analysis reliability for implant-supported system stress investigation
Anna Gabriella Camacho Presotto
Biomechanical phenomena
Dental Implants
Optical phenomena
Finite element analysis
Biomechanical phenomena
Dental Implants
Optical phenomena
Finite element analysis
title_short Photoelastic and finite element stress analysis reliability for implant-supported system stress investigation
title_full Photoelastic and finite element stress analysis reliability for implant-supported system stress investigation
title_fullStr Photoelastic and finite element stress analysis reliability for implant-supported system stress investigation
title_full_unstemmed Photoelastic and finite element stress analysis reliability for implant-supported system stress investigation
title_sort Photoelastic and finite element stress analysis reliability for implant-supported system stress investigation
author Anna Gabriella Camacho Presotto
author_facet Anna Gabriella Camacho Presotto
Valentim Adelino Ricardo Barão
Ricardo Armini Caldas
Cláudia Lopes Brilhante Bhering
Rafael Leonardo Xediek Consani
Marcelo Ferraz Mesquita
author_role author
author2 Valentim Adelino Ricardo Barão
Ricardo Armini Caldas
Cláudia Lopes Brilhante Bhering
Rafael Leonardo Xediek Consani
Marcelo Ferraz Mesquita
author2_role author
author
author
author
author
dc.contributor.author.fl_str_mv Anna Gabriella Camacho Presotto
Valentim Adelino Ricardo Barão
Ricardo Armini Caldas
Cláudia Lopes Brilhante Bhering
Rafael Leonardo Xediek Consani
Marcelo Ferraz Mesquita
dc.subject.por.fl_str_mv Biomechanical phenomena
Dental Implants
Optical phenomena
Finite element analysis
Biomechanical phenomena
Dental Implants
Optical phenomena
Finite element analysis
topic Biomechanical phenomena
Dental Implants
Optical phenomena
Finite element analysis
Biomechanical phenomena
Dental Implants
Optical phenomena
Finite element analysis
description Aim: To compare the reliability between photoelastic and finite element (FE) analyses by evaluating the effect of different marginal misfit levels on the stresses generated on two different implant-supported systems using conventional and short implants. Methods: Two photoelastic models were obtained: model C with two conventional implants (4.1×11 mm); and model S with a conventional and a short implant (5×6 mm). Three-unit CoCr frameworks were fabricated simulating a superior first pre-molar (P) to first molar (M) fixed dental prosthesis. Different levels of misfit (μm) were selected based on the misfit average of 10 frameworks obtained by the single-screw test protocol: low (<20), medium (>20 and <40) and high (>40). Stress levels and distribution were measured by photoelastic analysis. A similar situation of the in vitro assay was designed and simulated by the in silico analysis. Maximum and minimum principal strain were recorded numerically and color-coded for the models. Von Mises Stress was obtained for the metallic components. Results:Photoelasticity and FE analyses showed similar tendency where the increase of misfit generates higher stress levels despite of the implant design. The short implant showed lower von Mises stress values; however, it presented stresses around its full length for the in vitro and in silico analysis. Also, model S showed higher μstrain values for all simulated misfit levels. The type of implant did not affect the stresses around pillar P. Conclusions:Photoelasticity and FEA are reliable methodologies presenting similarity for the investigation of the biomechanical behavior of implant-supported rehabilitations.
publishDate 2018
dc.date.none.fl_str_mv 2018-07-16
2022-09-24T17:37:43Z
2022-09-24T17:37:43Z
dc.type.status.fl_str_mv info:eu-repo/semantics/publishedVersion
dc.type.driver.fl_str_mv info:eu-repo/semantics/article
format article
status_str publishedVersion
dc.identifier.uri.fl_str_mv https://doi.org/10.20396/bjos.v17i0.8652941
16773225
http://hdl.handle.net/1843/45447
url https://doi.org/10.20396/bjos.v17i0.8652941
http://hdl.handle.net/1843/45447
identifier_str_mv 16773225
dc.language.iso.fl_str_mv eng
language eng
dc.relation.none.fl_str_mv Brazilian Journal of Oral Sciences
dc.rights.driver.fl_str_mv info:eu-repo/semantics/openAccess
eu_rights_str_mv openAccess
dc.format.none.fl_str_mv pdf
application/pdf
dc.publisher.none.fl_str_mv Universidade Federal de Minas Gerais
Brasil
FAO - DEPARTAMENTO DE ODONTOLOGIA RESTAURADORA
UFMG
publisher.none.fl_str_mv Universidade Federal de Minas Gerais
Brasil
FAO - DEPARTAMENTO DE ODONTOLOGIA RESTAURADORA
UFMG
dc.source.none.fl_str_mv reponame:Repositório Institucional da UFMG
instname:Universidade Federal de Minas Gerais (UFMG)
instacron:UFMG
instname_str Universidade Federal de Minas Gerais (UFMG)
instacron_str UFMG
institution UFMG
reponame_str Repositório Institucional da UFMG
collection Repositório Institucional da UFMG
repository.name.fl_str_mv Repositório Institucional da UFMG - Universidade Federal de Minas Gerais (UFMG)
repository.mail.fl_str_mv repositorio@ufmg.br
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