In situ electrical resistivity of thin-film beta-nial under ar irradiation at 77 k

Detalhes bibliográficos
Autor(a) principal: Costa, Jose Antonio Trindade Borges da
Data de Publicação: 1992
Outros Autores: Vasconcellos, Marcos Antonio Zen, Teixeira, Sergio Ribeiro, Scherer, Claudio, Baibich, Mario Norberto
Tipo de documento: Artigo
Idioma: eng
Título da fonte: Repositório Institucional da UFRGS
Texto Completo: http://hdl.handle.net/10183/103619
Resumo: We report on the dose dependence of the in sítu electrical resistivity of a thin-film NiAl alloy under 120-keV-Ar-ion irradiation at 77 K. The results show two different behaviors. First, the values of resistivity increase, exhibiting a maximum, and then, for higher doses, the electrical resistivity decreases down to saturation. Our results are interpreted in terms of simple composite models that assume local transformation of the solid by successive ion impacts.
id UFRGS-2_4b4c7ab58b95bdb45cb026fd7b8e6aec
oai_identifier_str oai:www.lume.ufrgs.br:10183/103619
network_acronym_str UFRGS-2
network_name_str Repositório Institucional da UFRGS
repository_id_str
spelling Costa, Jose Antonio Trindade Borges daVasconcellos, Marcos Antonio ZenTeixeira, Sergio RibeiroScherer, ClaudioBaibich, Mario Norberto2014-09-23T02:12:23Z19920163-1829http://hdl.handle.net/10183/103619000055738We report on the dose dependence of the in sítu electrical resistivity of a thin-film NiAl alloy under 120-keV-Ar-ion irradiation at 77 K. The results show two different behaviors. First, the values of resistivity increase, exhibiting a maximum, and then, for higher doses, the electrical resistivity decreases down to saturation. Our results are interpreted in terms of simple composite models that assume local transformation of the solid by successive ion impacts.application/pdfengPhysical review. B, Condensed matter. New York. Vol. 45, no. 17 (May 1992), p. 9626-9628Implantacao ionicaFilmes finosCondutividadeRadiacao ionicaIntermetalicosMistura por bombardeamento ionicoIn situ electrical resistivity of thin-film beta-nial under ar irradiation at 77 kEstrangeiroinfo:eu-repo/semantics/articleinfo:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/openAccessreponame:Repositório Institucional da UFRGSinstname:Universidade Federal do Rio Grande do Sul (UFRGS)instacron:UFRGSORIGINAL000055738.pdf000055738.pdfTexto completo (inglês)application/pdf425137http://www.lume.ufrgs.br/bitstream/10183/103619/1/000055738.pdf593c029db4988cfe6da0ae01c42f9e13MD51TEXT000055738.pdf.txt000055738.pdf.txtExtracted Texttext/plain14672http://www.lume.ufrgs.br/bitstream/10183/103619/2/000055738.pdf.txt7f0ce0cd5b03bb4dff702bff6d3e39c2MD52THUMBNAIL000055738.pdf.jpg000055738.pdf.jpgGenerated Thumbnailimage/jpeg2065http://www.lume.ufrgs.br/bitstream/10183/103619/3/000055738.pdf.jpg01b58e875b8d6f4f0dee9f2f2eaf306bMD5310183/1036192023-07-21 03:29:54.847703oai:www.lume.ufrgs.br:10183/103619Repositório de PublicaçõesPUBhttps://lume.ufrgs.br/oai/requestopendoar:2023-07-21T06:29:54Repositório Institucional da UFRGS - Universidade Federal do Rio Grande do Sul (UFRGS)false
dc.title.pt_BR.fl_str_mv In situ electrical resistivity of thin-film beta-nial under ar irradiation at 77 k
title In situ electrical resistivity of thin-film beta-nial under ar irradiation at 77 k
spellingShingle In situ electrical resistivity of thin-film beta-nial under ar irradiation at 77 k
Costa, Jose Antonio Trindade Borges da
Implantacao ionica
Filmes finos
Condutividade
Radiacao ionica
Intermetalicos
Mistura por bombardeamento ionico
title_short In situ electrical resistivity of thin-film beta-nial under ar irradiation at 77 k
title_full In situ electrical resistivity of thin-film beta-nial under ar irradiation at 77 k
title_fullStr In situ electrical resistivity of thin-film beta-nial under ar irradiation at 77 k
title_full_unstemmed In situ electrical resistivity of thin-film beta-nial under ar irradiation at 77 k
title_sort In situ electrical resistivity of thin-film beta-nial under ar irradiation at 77 k
author Costa, Jose Antonio Trindade Borges da
author_facet Costa, Jose Antonio Trindade Borges da
Vasconcellos, Marcos Antonio Zen
Teixeira, Sergio Ribeiro
Scherer, Claudio
Baibich, Mario Norberto
author_role author
author2 Vasconcellos, Marcos Antonio Zen
Teixeira, Sergio Ribeiro
Scherer, Claudio
Baibich, Mario Norberto
author2_role author
author
author
author
dc.contributor.author.fl_str_mv Costa, Jose Antonio Trindade Borges da
Vasconcellos, Marcos Antonio Zen
Teixeira, Sergio Ribeiro
Scherer, Claudio
Baibich, Mario Norberto
dc.subject.por.fl_str_mv Implantacao ionica
Filmes finos
Condutividade
Radiacao ionica
Intermetalicos
Mistura por bombardeamento ionico
topic Implantacao ionica
Filmes finos
Condutividade
Radiacao ionica
Intermetalicos
Mistura por bombardeamento ionico
description We report on the dose dependence of the in sítu electrical resistivity of a thin-film NiAl alloy under 120-keV-Ar-ion irradiation at 77 K. The results show two different behaviors. First, the values of resistivity increase, exhibiting a maximum, and then, for higher doses, the electrical resistivity decreases down to saturation. Our results are interpreted in terms of simple composite models that assume local transformation of the solid by successive ion impacts.
publishDate 1992
dc.date.issued.fl_str_mv 1992
dc.date.accessioned.fl_str_mv 2014-09-23T02:12:23Z
dc.type.driver.fl_str_mv Estrangeiro
info:eu-repo/semantics/article
dc.type.status.fl_str_mv info:eu-repo/semantics/publishedVersion
format article
status_str publishedVersion
dc.identifier.uri.fl_str_mv http://hdl.handle.net/10183/103619
dc.identifier.issn.pt_BR.fl_str_mv 0163-1829
dc.identifier.nrb.pt_BR.fl_str_mv 000055738
identifier_str_mv 0163-1829
000055738
url http://hdl.handle.net/10183/103619
dc.language.iso.fl_str_mv eng
language eng
dc.relation.ispartof.pt_BR.fl_str_mv Physical review. B, Condensed matter. New York. Vol. 45, no. 17 (May 1992), p. 9626-9628
dc.rights.driver.fl_str_mv info:eu-repo/semantics/openAccess
eu_rights_str_mv openAccess
dc.format.none.fl_str_mv application/pdf
dc.source.none.fl_str_mv reponame:Repositório Institucional da UFRGS
instname:Universidade Federal do Rio Grande do Sul (UFRGS)
instacron:UFRGS
instname_str Universidade Federal do Rio Grande do Sul (UFRGS)
instacron_str UFRGS
institution UFRGS
reponame_str Repositório Institucional da UFRGS
collection Repositório Institucional da UFRGS
bitstream.url.fl_str_mv http://www.lume.ufrgs.br/bitstream/10183/103619/1/000055738.pdf
http://www.lume.ufrgs.br/bitstream/10183/103619/2/000055738.pdf.txt
http://www.lume.ufrgs.br/bitstream/10183/103619/3/000055738.pdf.jpg
bitstream.checksum.fl_str_mv 593c029db4988cfe6da0ae01c42f9e13
7f0ce0cd5b03bb4dff702bff6d3e39c2
01b58e875b8d6f4f0dee9f2f2eaf306b
bitstream.checksumAlgorithm.fl_str_mv MD5
MD5
MD5
repository.name.fl_str_mv Repositório Institucional da UFRGS - Universidade Federal do Rio Grande do Sul (UFRGS)
repository.mail.fl_str_mv
_version_ 1815447560295284736

Registros relacionados