Neutralization and wake effects on the Coulomb explosion of swift H2+ ions traversing thin films

Detalhes bibliográficos
Autor(a) principal: Rosa, Lucio Flavio dos Santos
Data de Publicação: 2015
Outros Autores: Grande, Pedro Luis, Dias, Johnny Ferraz, Fadanelli Filho, Raul Carlos, Vos, Maarten
Tipo de documento: Artigo
Idioma: eng
Título da fonte: Repositório Institucional da UFRGS
Texto Completo: http://hdl.handle.net/10183/118051
Resumo: The Coulomb explosion of small cluster beams can be used to measure the dwell time of fragments traversing amorphous films. Therefore, the thickness of thin films can be obtainedwith the so-called Coulomb depth profiling technique using relatively high cluster energies where the fragments are fully ionized after breakup. Here we demonstrate the applicability of Coulomb depth profiling technique at lower cluster energies where neutralization and wake effects come into play. To that end, we investigated 50–200 keV/u H2 + molecular ions impinging on a 10 nm TiO2 film and measured the energy of the backscattered H+ fragments with high-energy resolution. The effect of the neutralization of the H+ fragments along the incoming trajectory before the backscattering collision is clearly observed at lower energies through the decrease of the energy broadening due to the Coulomb explosion. The reduced values of the Coulomb explosion combined with full Monte Carlo simulations provide compatible results with those obtained at higher cluster energies where neutralization is less important. The results are corroborated by electron microscopy measurements.
id UFRGS-2_a1c495788058a23c2d2fe41e9beee07a
oai_identifier_str oai:www.lume.ufrgs.br:10183/118051
network_acronym_str UFRGS-2
network_name_str Repositório Institucional da UFRGS
repository_id_str
spelling Rosa, Lucio Flavio dos SantosGrande, Pedro LuisDias, Johnny FerrazFadanelli Filho, Raul CarlosVos, Maarten2015-06-20T02:01:29Z20151050-2947http://hdl.handle.net/10183/118051000968850The Coulomb explosion of small cluster beams can be used to measure the dwell time of fragments traversing amorphous films. Therefore, the thickness of thin films can be obtainedwith the so-called Coulomb depth profiling technique using relatively high cluster energies where the fragments are fully ionized after breakup. Here we demonstrate the applicability of Coulomb depth profiling technique at lower cluster energies where neutralization and wake effects come into play. To that end, we investigated 50–200 keV/u H2 + molecular ions impinging on a 10 nm TiO2 film and measured the energy of the backscattered H+ fragments with high-energy resolution. The effect of the neutralization of the H+ fragments along the incoming trajectory before the backscattering collision is clearly observed at lower energies through the decrease of the energy broadening due to the Coulomb explosion. The reduced values of the Coulomb explosion combined with full Monte Carlo simulations provide compatible results with those obtained at higher cluster energies where neutralization is less important. The results are corroborated by electron microscopy measurements.application/pdfengPhysical review. A, Atomic, molecular, and optical physics. New York. Vol. 91, no. 4 (Apr. 2015), 042704, 9 p.Estado amorfoMétodo de Monte CarloPotencial de ionizaçãoÍons positivosFilmes finosMicroscopia eletrônica de transmissãoRetroespalhamento rutherfordCompostos de titânioNeutralization and wake effects on the Coulomb explosion of swift H2+ ions traversing thin filmsEstrangeiroinfo:eu-repo/semantics/articleinfo:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/openAccessreponame:Repositório Institucional da UFRGSinstname:Universidade Federal do Rio Grande do Sul (UFRGS)instacron:UFRGSORIGINAL000968850.pdf000968850.pdfTexto completo (inglês)application/pdf862136http://www.lume.ufrgs.br/bitstream/10183/118051/1/000968850.pdfb730b47f0efe6e80c24d7544fd6e475dMD51TEXT000968850.pdf.txt000968850.pdf.txtExtracted Texttext/plain43074http://www.lume.ufrgs.br/bitstream/10183/118051/2/000968850.pdf.txt9e39d86ea6d787bb7e47fff6f413baceMD52THUMBNAIL000968850.pdf.jpg000968850.pdf.jpgGenerated Thumbnailimage/jpeg2046http://www.lume.ufrgs.br/bitstream/10183/118051/3/000968850.pdf.jpgc14b34389fce5029d243af3a5ab8d8a2MD5310183/1180512023-08-19 03:32:43.404871oai:www.lume.ufrgs.br:10183/118051Repositório de PublicaçõesPUBhttps://lume.ufrgs.br/oai/requestopendoar:2023-08-19T06:32:43Repositório Institucional da UFRGS - Universidade Federal do Rio Grande do Sul (UFRGS)false
dc.title.pt_BR.fl_str_mv Neutralization and wake effects on the Coulomb explosion of swift H2+ ions traversing thin films
title Neutralization and wake effects on the Coulomb explosion of swift H2+ ions traversing thin films
spellingShingle Neutralization and wake effects on the Coulomb explosion of swift H2+ ions traversing thin films
Rosa, Lucio Flavio dos Santos
Estado amorfo
Método de Monte Carlo
Potencial de ionização
Íons positivos
Filmes finos
Microscopia eletrônica de transmissão
Retroespalhamento rutherford
Compostos de titânio
title_short Neutralization and wake effects on the Coulomb explosion of swift H2+ ions traversing thin films
title_full Neutralization and wake effects on the Coulomb explosion of swift H2+ ions traversing thin films
title_fullStr Neutralization and wake effects on the Coulomb explosion of swift H2+ ions traversing thin films
title_full_unstemmed Neutralization and wake effects on the Coulomb explosion of swift H2+ ions traversing thin films
title_sort Neutralization and wake effects on the Coulomb explosion of swift H2+ ions traversing thin films
author Rosa, Lucio Flavio dos Santos
author_facet Rosa, Lucio Flavio dos Santos
Grande, Pedro Luis
Dias, Johnny Ferraz
Fadanelli Filho, Raul Carlos
Vos, Maarten
author_role author
author2 Grande, Pedro Luis
Dias, Johnny Ferraz
Fadanelli Filho, Raul Carlos
Vos, Maarten
author2_role author
author
author
author
dc.contributor.author.fl_str_mv Rosa, Lucio Flavio dos Santos
Grande, Pedro Luis
Dias, Johnny Ferraz
Fadanelli Filho, Raul Carlos
Vos, Maarten
dc.subject.por.fl_str_mv Estado amorfo
Método de Monte Carlo
Potencial de ionização
Íons positivos
Filmes finos
Microscopia eletrônica de transmissão
Retroespalhamento rutherford
Compostos de titânio
topic Estado amorfo
Método de Monte Carlo
Potencial de ionização
Íons positivos
Filmes finos
Microscopia eletrônica de transmissão
Retroespalhamento rutherford
Compostos de titânio
description The Coulomb explosion of small cluster beams can be used to measure the dwell time of fragments traversing amorphous films. Therefore, the thickness of thin films can be obtainedwith the so-called Coulomb depth profiling technique using relatively high cluster energies where the fragments are fully ionized after breakup. Here we demonstrate the applicability of Coulomb depth profiling technique at lower cluster energies where neutralization and wake effects come into play. To that end, we investigated 50–200 keV/u H2 + molecular ions impinging on a 10 nm TiO2 film and measured the energy of the backscattered H+ fragments with high-energy resolution. The effect of the neutralization of the H+ fragments along the incoming trajectory before the backscattering collision is clearly observed at lower energies through the decrease of the energy broadening due to the Coulomb explosion. The reduced values of the Coulomb explosion combined with full Monte Carlo simulations provide compatible results with those obtained at higher cluster energies where neutralization is less important. The results are corroborated by electron microscopy measurements.
publishDate 2015
dc.date.accessioned.fl_str_mv 2015-06-20T02:01:29Z
dc.date.issued.fl_str_mv 2015
dc.type.driver.fl_str_mv Estrangeiro
info:eu-repo/semantics/article
dc.type.status.fl_str_mv info:eu-repo/semantics/publishedVersion
format article
status_str publishedVersion
dc.identifier.uri.fl_str_mv http://hdl.handle.net/10183/118051
dc.identifier.issn.pt_BR.fl_str_mv 1050-2947
dc.identifier.nrb.pt_BR.fl_str_mv 000968850
identifier_str_mv 1050-2947
000968850
url http://hdl.handle.net/10183/118051
dc.language.iso.fl_str_mv eng
language eng
dc.relation.ispartof.pt_BR.fl_str_mv Physical review. A, Atomic, molecular, and optical physics. New York. Vol. 91, no. 4 (Apr. 2015), 042704, 9 p.
dc.rights.driver.fl_str_mv info:eu-repo/semantics/openAccess
eu_rights_str_mv openAccess
dc.format.none.fl_str_mv application/pdf
dc.source.none.fl_str_mv reponame:Repositório Institucional da UFRGS
instname:Universidade Federal do Rio Grande do Sul (UFRGS)
instacron:UFRGS
instname_str Universidade Federal do Rio Grande do Sul (UFRGS)
instacron_str UFRGS
institution UFRGS
reponame_str Repositório Institucional da UFRGS
collection Repositório Institucional da UFRGS
bitstream.url.fl_str_mv http://www.lume.ufrgs.br/bitstream/10183/118051/1/000968850.pdf
http://www.lume.ufrgs.br/bitstream/10183/118051/2/000968850.pdf.txt
http://www.lume.ufrgs.br/bitstream/10183/118051/3/000968850.pdf.jpg
bitstream.checksum.fl_str_mv b730b47f0efe6e80c24d7544fd6e475d
9e39d86ea6d787bb7e47fff6f413bace
c14b34389fce5029d243af3a5ab8d8a2
bitstream.checksumAlgorithm.fl_str_mv MD5
MD5
MD5
repository.name.fl_str_mv Repositório Institucional da UFRGS - Universidade Federal do Rio Grande do Sul (UFRGS)
repository.mail.fl_str_mv
_version_ 1801224873599565824