Ion implantation in β-Ga2O3 : Physics and technology
Autor(a) principal: | |
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Data de Publicação: | 2021 |
Outros Autores: | , , , , , , , , , , , , , |
Tipo de documento: | Artigo |
Idioma: | eng |
Título da fonte: | Repositório Institucional da UFRGS |
Texto Completo: | http://hdl.handle.net/10183/241125 |
Resumo: | Gallium oxide, and in particular its thermodynamically stable β-Ga2O3 phase, is within the most exciting materials in research and technology nowadays due to its unique properties. The very high breakdown electric field and the figure of merit rivaled only by diamond have tremendous potential for the next generation “green” electronics enabling efficient distribution, use, and conversion of electrical energy. Ion implantation is a traditional technological method used in these fields, and its well-known advantages can contribute greatly to the rapid development of physics and technology of Ga2O3-based materials and devices. Here, the status of ion implantation in β-Ga2O3 nowadays is reviewed. Attention is mainly paid to the results of experimental study of damage under ion irradiation and the properties of Ga2O3 layers doped by ion implantation. The results of ab initio theoretical calculations of the impurities and defect parameters are briefly presented, and the physical principles of a number of analytical methods used to study implanted gallium oxide layers are highlighted. The use of ion implantation in the development of Ga2O3-based devices, such as metal oxide field-effect transistors, Schottky barrier diodes, and solar-blind UV detectors, is described together with systematical analysis of the achieved values of their characteristics. Finally, the most important challenges to be overcome in this field of science and technology are discussed. |
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Nikolskaya, AlenaOkulich, EvgeniaKorolev, DmitryStepanov, Anton V.Nikolichev, DmitryMikhaylov, AlexeyTetelbaum, DavidAlmaev, AlekseiBolzan, Charles AirtonBuaczick Júnior, AntônioGiulian, RaquelGrande, Pedro LuisKumar, AshokKumar, MaheshGogova, Daniela2022-06-25T05:06:34Z20210734-2101http://hdl.handle.net/10183/241125001143314Gallium oxide, and in particular its thermodynamically stable β-Ga2O3 phase, is within the most exciting materials in research and technology nowadays due to its unique properties. The very high breakdown electric field and the figure of merit rivaled only by diamond have tremendous potential for the next generation “green” electronics enabling efficient distribution, use, and conversion of electrical energy. Ion implantation is a traditional technological method used in these fields, and its well-known advantages can contribute greatly to the rapid development of physics and technology of Ga2O3-based materials and devices. Here, the status of ion implantation in β-Ga2O3 nowadays is reviewed. Attention is mainly paid to the results of experimental study of damage under ion irradiation and the properties of Ga2O3 layers doped by ion implantation. The results of ab initio theoretical calculations of the impurities and defect parameters are briefly presented, and the physical principles of a number of analytical methods used to study implanted gallium oxide layers are highlighted. The use of ion implantation in the development of Ga2O3-based devices, such as metal oxide field-effect transistors, Schottky barrier diodes, and solar-blind UV detectors, is described together with systematical analysis of the achieved values of their characteristics. Finally, the most important challenges to be overcome in this field of science and technology are discussed.application/pdfengJournal of Vacuum Science & Technology a : Vacuum, Surfaces and Films. New York. Vol. 39, no. 3 (May 2021), 030802, 39 p.Óxido de gálioImplantacao ionicaMicroscopia eletrônica de transmissãoDifração de raios XRetroespalhamento rutherfordMicroscopia eletrônica de transmissãoIon implantation in β-Ga2O3 : Physics and technologyEstrangeiroinfo:eu-repo/semantics/articleinfo:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/openAccessreponame:Repositório Institucional da UFRGSinstname:Universidade Federal do Rio Grande do Sul (UFRGS)instacron:UFRGSTEXT001143314.pdf.txt001143314.pdf.txtExtracted Texttext/plain134442http://www.lume.ufrgs.br/bitstream/10183/241125/2/001143314.pdf.txtc4df477f56d2e5b3c3cfe6a2bc4d919bMD52ORIGINAL001143314.pdfTexto completo (inglês)application/pdf4784024http://www.lume.ufrgs.br/bitstream/10183/241125/1/001143314.pdf3ed3d2cf582c050abd92b7ad18dbcf9fMD5110183/2411252023-07-12 03:34:59.063193oai:www.lume.ufrgs.br:10183/241125Repositório de PublicaçõesPUBhttps://lume.ufrgs.br/oai/requestopendoar:2023-07-12T06:34:59Repositório Institucional da UFRGS - Universidade Federal do Rio Grande do Sul (UFRGS)false |
dc.title.pt_BR.fl_str_mv |
Ion implantation in β-Ga2O3 : Physics and technology |
title |
Ion implantation in β-Ga2O3 : Physics and technology |
spellingShingle |
Ion implantation in β-Ga2O3 : Physics and technology Nikolskaya, Alena Óxido de gálio Implantacao ionica Microscopia eletrônica de transmissão Difração de raios X Retroespalhamento rutherford Microscopia eletrônica de transmissão |
title_short |
Ion implantation in β-Ga2O3 : Physics and technology |
title_full |
Ion implantation in β-Ga2O3 : Physics and technology |
title_fullStr |
Ion implantation in β-Ga2O3 : Physics and technology |
title_full_unstemmed |
Ion implantation in β-Ga2O3 : Physics and technology |
title_sort |
Ion implantation in β-Ga2O3 : Physics and technology |
author |
Nikolskaya, Alena |
author_facet |
Nikolskaya, Alena Okulich, Evgenia Korolev, Dmitry Stepanov, Anton V. Nikolichev, Dmitry Mikhaylov, Alexey Tetelbaum, David Almaev, Aleksei Bolzan, Charles Airton Buaczick Júnior, Antônio Giulian, Raquel Grande, Pedro Luis Kumar, Ashok Kumar, Mahesh Gogova, Daniela |
author_role |
author |
author2 |
Okulich, Evgenia Korolev, Dmitry Stepanov, Anton V. Nikolichev, Dmitry Mikhaylov, Alexey Tetelbaum, David Almaev, Aleksei Bolzan, Charles Airton Buaczick Júnior, Antônio Giulian, Raquel Grande, Pedro Luis Kumar, Ashok Kumar, Mahesh Gogova, Daniela |
author2_role |
author author author author author author author author author author author author author author |
dc.contributor.author.fl_str_mv |
Nikolskaya, Alena Okulich, Evgenia Korolev, Dmitry Stepanov, Anton V. Nikolichev, Dmitry Mikhaylov, Alexey Tetelbaum, David Almaev, Aleksei Bolzan, Charles Airton Buaczick Júnior, Antônio Giulian, Raquel Grande, Pedro Luis Kumar, Ashok Kumar, Mahesh Gogova, Daniela |
dc.subject.por.fl_str_mv |
Óxido de gálio Implantacao ionica Microscopia eletrônica de transmissão Difração de raios X Retroespalhamento rutherford Microscopia eletrônica de transmissão |
topic |
Óxido de gálio Implantacao ionica Microscopia eletrônica de transmissão Difração de raios X Retroespalhamento rutherford Microscopia eletrônica de transmissão |
description |
Gallium oxide, and in particular its thermodynamically stable β-Ga2O3 phase, is within the most exciting materials in research and technology nowadays due to its unique properties. The very high breakdown electric field and the figure of merit rivaled only by diamond have tremendous potential for the next generation “green” electronics enabling efficient distribution, use, and conversion of electrical energy. Ion implantation is a traditional technological method used in these fields, and its well-known advantages can contribute greatly to the rapid development of physics and technology of Ga2O3-based materials and devices. Here, the status of ion implantation in β-Ga2O3 nowadays is reviewed. Attention is mainly paid to the results of experimental study of damage under ion irradiation and the properties of Ga2O3 layers doped by ion implantation. The results of ab initio theoretical calculations of the impurities and defect parameters are briefly presented, and the physical principles of a number of analytical methods used to study implanted gallium oxide layers are highlighted. The use of ion implantation in the development of Ga2O3-based devices, such as metal oxide field-effect transistors, Schottky barrier diodes, and solar-blind UV detectors, is described together with systematical analysis of the achieved values of their characteristics. Finally, the most important challenges to be overcome in this field of science and technology are discussed. |
publishDate |
2021 |
dc.date.issued.fl_str_mv |
2021 |
dc.date.accessioned.fl_str_mv |
2022-06-25T05:06:34Z |
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http://hdl.handle.net/10183/241125 |
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0734-2101 |
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001143314 |
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http://hdl.handle.net/10183/241125 |
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dc.relation.ispartof.pt_BR.fl_str_mv |
Journal of Vacuum Science & Technology a : Vacuum, Surfaces and Films. New York. Vol. 39, no. 3 (May 2021), 030802, 39 p. |
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