Thin tin and tio2 film deposition in glass samples by cathodic cage

• Autor(a) principal: Feitor, Michelle Cequeira
• Data de Publicação: 2015
• Outros Autores: Sousa, Rômulo Ribeiro Magalhães de, Araújo, Francisco Odolberto de, Costa, Thercio Henrique de Carvalho, Nascimento, Igor Oliveira, Santos, Francisco Eroni Paes, Alves Júnior, Clodomiro
• Tipo de documento: Artigo
• Idioma: eng
• Título da fonte: Repositório Institucional da UFRN
• Texto Completo: https://repositorio.ufrn.br/handle/123456789/46187; http://dx.doi.org/10.1590/1516-1439.313914
• topic: titanium nitride; cathodic cage; titanium dioxide; thin films and hollow cathode

Thin nitride and titanium dioxide films were produced using an innovative technique called cathodic cage depositon. Uniformity, three-dimensionality and high rate deposition are some of the advantages of this technique. In this study we discuss the influences of temperature, treatment time and gaseous atmosphere on the characteristics of the deposited films. The TiN (titanium nitride) and TiO2 (titanium dioxide) films were produced using a high deposition rate of 2,5 μm/h at a work temperature and pressure of 400°C and 150 Pa respectively. EDS technique was used to identify the chemical composition of the thin film deposited, whilst Raman spectroscopy indicated the phases present confirmed by DRX analysis. The thickness of the deposited films was studied using electron microscopy scanning. The results based on the deposition parameters confirm the great efficiency and versatility of this technique, which allows a uniform three-dimensional film deposition on any material without the appearance of stress. Compared to other techniques, cathodic cage deposition enables deposition at lower temperatures