Nitriding of titanium disks and industrial dental implants using hollow cathode discharge

Detalhes bibliográficos
Autor(a) principal: Alves Júnior, Clodomiro
Data de Publicação: 2005
Outros Autores: Guerra Neto, Custódio Leopoldino de Brito, Morais, Gustavo Henrique Silva de, Silva, Claudio Fernandes da, Hajek, Vaclav
Tipo de documento: Artigo
Idioma: eng
Título da fonte: Repositório Institucional da UFRN
Texto Completo: https://repositorio.ufrn.br/jspui/handle/123456789/29626
Resumo: Standard plasma nitriding of commercially pure Ti or various Ti alloys for human body implants (e.g., hip, knee, shoulder and ankle implants) has already proven useful. However, its use in dental implantology is rather limited due to high nitriding temperatures. The small dental implants of complex geometries are frequently distorted. To solve this problem and benefit from the ability of the plasma treatment to modify the implant surface properties (needed for faster osseointegration process), such as creating different surface topographies, increasing surface roughness, changing local chemical properties by formation of different phases, cleaning/sterilizing contaminated surface and increasing the surface wettability, the titanium disk samples and industrial dental implants were nitrided using a hollow cathode discharge (HCD) configuration of a plasma nitriding system in a 20% N2–H2 atmosphere at pressures of 150 or 250 Pa and temperatures ranging from 400 to 500 °C for 1 or 2 h. The topography of the samples was characterized by optical and electron microscopy. Phases were determined by X-ray diffraction. The surface roughness and wettability were also quantified. Nitrided layer formation having better stability, increased surface roughness and higher wettability has been observed for samples treated at 450 and 500 °C and at a pressure of 150 Pa. Industrially fabricated dental implants were then nitrided at 500 °C/150 Pa for 2 h. The results show capability of HCD in treating dental implants. A significant change in the surface texture and superior wettability of the plasma-treated dental implants, with no geometric distortions, have been observed
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spelling Alves Júnior, ClodomiroGuerra Neto, Custódio Leopoldino de BritoMorais, Gustavo Henrique Silva deSilva, Claudio Fernandes daHajek, Vaclav2020-07-14T23:20:56Z2020-07-14T23:20:56Z2005ALVES JUNIOR, C.; GUERRA NETO, C. L. B.; MORAIS, G.H.S.; SILVA, C.F.; HAJEK, V.. Nitriding of titanium disks and industrial dental implants using hollow cathode discharge. Surface and Coatings Technology, v. 194, p. 196-202, 2005. Disponível em: https://www.sciencedirect.com/science/article/abs/pii/S0257897204009843. Acesso em: 13 jul. 2020. https://doi.org/10.1016/j.surfcoat.2004.10.009https://repositorio.ufrn.br/jspui/handle/123456789/2962610.1016/j.surfcoat.2004.10.009ElsevierAttribution 3.0 Brazilhttp://creativecommons.org/licenses/by/3.0/br/info:eu-repo/semantics/openAccessDental implantsPlasma nitridingOsseointegrationBiomaterialsNitriding of titanium disks and industrial dental implants using hollow cathode dischargeinfo:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/articleStandard plasma nitriding of commercially pure Ti or various Ti alloys for human body implants (e.g., hip, knee, shoulder and ankle implants) has already proven useful. However, its use in dental implantology is rather limited due to high nitriding temperatures. The small dental implants of complex geometries are frequently distorted. To solve this problem and benefit from the ability of the plasma treatment to modify the implant surface properties (needed for faster osseointegration process), such as creating different surface topographies, increasing surface roughness, changing local chemical properties by formation of different phases, cleaning/sterilizing contaminated surface and increasing the surface wettability, the titanium disk samples and industrial dental implants were nitrided using a hollow cathode discharge (HCD) configuration of a plasma nitriding system in a 20% N2–H2 atmosphere at pressures of 150 or 250 Pa and temperatures ranging from 400 to 500 °C for 1 or 2 h. The topography of the samples was characterized by optical and electron microscopy. Phases were determined by X-ray diffraction. The surface roughness and wettability were also quantified. Nitrided layer formation having better stability, increased surface roughness and higher wettability has been observed for samples treated at 450 and 500 °C and at a pressure of 150 Pa. Industrially fabricated dental implants were then nitrided at 500 °C/150 Pa for 2 h. The results show capability of HCD in treating dental implants. A significant change in the surface texture and superior wettability of the plasma-treated dental implants, with no geometric distortions, have been observedengreponame:Repositório Institucional da UFRNinstname:Universidade Federal do Rio Grande do Norte (UFRN)instacron:UFRNORIGINALNitridingOfTitaniumDisks_GuerraNeto_2005.pdfNitridingOfTitaniumDisks_GuerraNeto_2005.pdfapplication/pdf350711https://repositorio.ufrn.br/bitstream/123456789/29626/1/NitridingOfTitaniumDisks_GuerraNeto_2005.pdfb3a2f9e51961fdd44af4db7fce6a5d15MD51TEXTNitridingOfTitaniumDisks_GuerraNeto_2005.pdf.txtNitridingOfTitaniumDisks_GuerraNeto_2005.pdf.txtExtracted texttext/plain25638https://repositorio.ufrn.br/bitstream/123456789/29626/4/NitridingOfTitaniumDisks_GuerraNeto_2005.pdf.txt55bf6aba039723beedcca3c875961d9eMD54THUMBNAILNitridingOfTitaniumDisks_GuerraNeto_2005.pdf.jpgNitridingOfTitaniumDisks_GuerraNeto_2005.pdf.jpgGenerated Thumbnailimage/jpeg1710https://repositorio.ufrn.br/bitstream/123456789/29626/5/NitridingOfTitaniumDisks_GuerraNeto_2005.pdf.jpgafced561bb8855d307e3ccd7e7685e3eMD55CC-LICENSElicense_rdflicense_rdfapplication/rdf+xml; charset=utf-8914https://repositorio.ufrn.br/bitstream/123456789/29626/2/license_rdf4d2950bda3d176f570a9f8b328dfbbefMD52LICENSElicense.txtlicense.txttext/plain; charset=utf-81484https://repositorio.ufrn.br/bitstream/123456789/29626/3/license.txte9597aa2854d128fd968be5edc8a28d9MD53123456789/296262020-07-19 04:45:35.853oai:https://repositorio.ufrn.br:123456789/29626Tk9OLUVYQ0xVU0lWRSBESVNUUklCVVRJT04gTElDRU5TRQoKCkJ5IHNpZ25pbmcgYW5kIGRlbGl2ZXJpbmcgdGhpcyBsaWNlbnNlLCBNci4gKGF1dGhvciBvciBjb3B5cmlnaHQgaG9sZGVyKToKCgphKSBHcmFudHMgdGhlIFVuaXZlcnNpZGFkZSBGZWRlcmFsIFJpbyBHcmFuZGUgZG8gTm9ydGUgdGhlIG5vbi1leGNsdXNpdmUgcmlnaHQgb2YKcmVwcm9kdWNlLCBjb252ZXJ0IChhcyBkZWZpbmVkIGJlbG93KSwgY29tbXVuaWNhdGUgYW5kIC8gb3IKZGlzdHJpYnV0ZSB0aGUgZGVsaXZlcmVkIGRvY3VtZW50IChpbmNsdWRpbmcgYWJzdHJhY3QgLyBhYnN0cmFjdCkgaW4KZGlnaXRhbCBvciBwcmludGVkIGZvcm1hdCBhbmQgaW4gYW55IG1lZGl1bS4KCmIpIERlY2xhcmVzIHRoYXQgdGhlIGRvY3VtZW50IHN1Ym1pdHRlZCBpcyBpdHMgb3JpZ2luYWwgd29yaywgYW5kIHRoYXQKeW91IGhhdmUgdGhlIHJpZ2h0IHRvIGdyYW50IHRoZSByaWdodHMgY29udGFpbmVkIGluIHRoaXMgbGljZW5zZS4gRGVjbGFyZXMKdGhhdCB0aGUgZGVsaXZlcnkgb2YgdGhlIGRvY3VtZW50IGRvZXMgbm90IGluZnJpbmdlLCBhcyBmYXIgYXMgaXQgaXMKdGhlIHJpZ2h0cyBvZiBhbnkgb3RoZXIgcGVyc29uIG9yIGVudGl0eS4KCmMpIElmIHRoZSBkb2N1bWVudCBkZWxpdmVyZWQgY29udGFpbnMgbWF0ZXJpYWwgd2hpY2ggZG9lcyBub3QKcmlnaHRzLCBkZWNsYXJlcyB0aGF0IGl0IGhhcyBvYnRhaW5lZCBhdXRob3JpemF0aW9uIGZyb20gdGhlIGhvbGRlciBvZiB0aGUKY29weXJpZ2h0IHRvIGdyYW50IHRoZSBVbml2ZXJzaWRhZGUgRmVkZXJhbCBkbyBSaW8gR3JhbmRlIGRvIE5vcnRlIHRoZSByaWdodHMgcmVxdWlyZWQgYnkgdGhpcyBsaWNlbnNlLCBhbmQgdGhhdCB0aGlzIG1hdGVyaWFsIHdob3NlIHJpZ2h0cyBhcmUgb2YKdGhpcmQgcGFydGllcyBpcyBjbGVhcmx5IGlkZW50aWZpZWQgYW5kIHJlY29nbml6ZWQgaW4gdGhlIHRleHQgb3IKY29udGVudCBvZiB0aGUgZG9jdW1lbnQgZGVsaXZlcmVkLgoKSWYgdGhlIGRvY3VtZW50IHN1Ym1pdHRlZCBpcyBiYXNlZCBvbiBmdW5kZWQgb3Igc3VwcG9ydGVkIHdvcmsKYnkgYW5vdGhlciBpbnN0aXR1dGlvbiBvdGhlciB0aGFuIHRoZSBVbml2ZXJzaWRhZGUgRmVkZXJhbCBkbyBSaW8gR3JhbmRlIGRvIE5vcnRlLCBkZWNsYXJlcyB0aGF0IGl0IGhhcyBmdWxmaWxsZWQgYW55IG9ibGlnYXRpb25zIHJlcXVpcmVkIGJ5IHRoZSByZXNwZWN0aXZlIGFncmVlbWVudCBvciBhZ3JlZW1lbnQuCgpUaGUgVW5pdmVyc2lkYWRlIEZlZGVyYWwgZG8gUmlvIEdyYW5kZSBkbyBOb3J0ZSB3aWxsIGNsZWFybHkgaWRlbnRpZnkgaXRzIG5hbWUgKHMpIGFzIHRoZSBhdXRob3IgKHMpIG9yIGhvbGRlciAocykgb2YgdGhlIGRvY3VtZW50J3MgcmlnaHRzCmRlbGl2ZXJlZCwgYW5kIHdpbGwgbm90IG1ha2UgYW55IGNoYW5nZXMsIG90aGVyIHRoYW4gdGhvc2UgcGVybWl0dGVkIGJ5CnRoaXMgbGljZW5zZQo=Repositório de PublicaçõesPUBhttp://repositorio.ufrn.br/oai/opendoar:2020-07-19T07:45:35Repositório Institucional da UFRN - Universidade Federal do Rio Grande do Norte (UFRN)false
dc.title.pt_BR.fl_str_mv Nitriding of titanium disks and industrial dental implants using hollow cathode discharge
title Nitriding of titanium disks and industrial dental implants using hollow cathode discharge
spellingShingle Nitriding of titanium disks and industrial dental implants using hollow cathode discharge
Alves Júnior, Clodomiro
Dental implants
Plasma nitriding
Osseointegration
Biomaterials
title_short Nitriding of titanium disks and industrial dental implants using hollow cathode discharge
title_full Nitriding of titanium disks and industrial dental implants using hollow cathode discharge
title_fullStr Nitriding of titanium disks and industrial dental implants using hollow cathode discharge
title_full_unstemmed Nitriding of titanium disks and industrial dental implants using hollow cathode discharge
title_sort Nitriding of titanium disks and industrial dental implants using hollow cathode discharge
author Alves Júnior, Clodomiro
author_facet Alves Júnior, Clodomiro
Guerra Neto, Custódio Leopoldino de Brito
Morais, Gustavo Henrique Silva de
Silva, Claudio Fernandes da
Hajek, Vaclav
author_role author
author2 Guerra Neto, Custódio Leopoldino de Brito
Morais, Gustavo Henrique Silva de
Silva, Claudio Fernandes da
Hajek, Vaclav
author2_role author
author
author
author
dc.contributor.author.fl_str_mv Alves Júnior, Clodomiro
Guerra Neto, Custódio Leopoldino de Brito
Morais, Gustavo Henrique Silva de
Silva, Claudio Fernandes da
Hajek, Vaclav
dc.subject.por.fl_str_mv Dental implants
Plasma nitriding
Osseointegration
Biomaterials
topic Dental implants
Plasma nitriding
Osseointegration
Biomaterials
description Standard plasma nitriding of commercially pure Ti or various Ti alloys for human body implants (e.g., hip, knee, shoulder and ankle implants) has already proven useful. However, its use in dental implantology is rather limited due to high nitriding temperatures. The small dental implants of complex geometries are frequently distorted. To solve this problem and benefit from the ability of the plasma treatment to modify the implant surface properties (needed for faster osseointegration process), such as creating different surface topographies, increasing surface roughness, changing local chemical properties by formation of different phases, cleaning/sterilizing contaminated surface and increasing the surface wettability, the titanium disk samples and industrial dental implants were nitrided using a hollow cathode discharge (HCD) configuration of a plasma nitriding system in a 20% N2–H2 atmosphere at pressures of 150 or 250 Pa and temperatures ranging from 400 to 500 °C for 1 or 2 h. The topography of the samples was characterized by optical and electron microscopy. Phases were determined by X-ray diffraction. The surface roughness and wettability were also quantified. Nitrided layer formation having better stability, increased surface roughness and higher wettability has been observed for samples treated at 450 and 500 °C and at a pressure of 150 Pa. Industrially fabricated dental implants were then nitrided at 500 °C/150 Pa for 2 h. The results show capability of HCD in treating dental implants. A significant change in the surface texture and superior wettability of the plasma-treated dental implants, with no geometric distortions, have been observed
publishDate 2005
dc.date.issued.fl_str_mv 2005
dc.date.accessioned.fl_str_mv 2020-07-14T23:20:56Z
dc.date.available.fl_str_mv 2020-07-14T23:20:56Z
dc.type.status.fl_str_mv info:eu-repo/semantics/publishedVersion
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dc.identifier.citation.fl_str_mv ALVES JUNIOR, C.; GUERRA NETO, C. L. B.; MORAIS, G.H.S.; SILVA, C.F.; HAJEK, V.. Nitriding of titanium disks and industrial dental implants using hollow cathode discharge. Surface and Coatings Technology, v. 194, p. 196-202, 2005. Disponível em: https://www.sciencedirect.com/science/article/abs/pii/S0257897204009843. Acesso em: 13 jul. 2020. https://doi.org/10.1016/j.surfcoat.2004.10.009
dc.identifier.uri.fl_str_mv https://repositorio.ufrn.br/jspui/handle/123456789/29626
dc.identifier.doi.none.fl_str_mv 10.1016/j.surfcoat.2004.10.009
identifier_str_mv ALVES JUNIOR, C.; GUERRA NETO, C. L. B.; MORAIS, G.H.S.; SILVA, C.F.; HAJEK, V.. Nitriding of titanium disks and industrial dental implants using hollow cathode discharge. Surface and Coatings Technology, v. 194, p. 196-202, 2005. Disponível em: https://www.sciencedirect.com/science/article/abs/pii/S0257897204009843. Acesso em: 13 jul. 2020. https://doi.org/10.1016/j.surfcoat.2004.10.009
10.1016/j.surfcoat.2004.10.009
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