The effect of pulse width on the microstructure of d.c.-plasma-nitrided layers
Autor(a) principal: | |
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Data de Publicação: | 1999 |
Outros Autores: | , |
Tipo de documento: | Artigo |
Idioma: | eng |
Título da fonte: | Repositório Institucional da UFRN |
Texto Completo: | https://repositorio.ufrn.br/handle/123456789/31472 |
Resumo: | Modern ion nitriding equipment are powered by pulsed sources in order to prevent arcing and overheating. In industrial applications, the pulse frequency is usually adjusted to set the working temperature. However, frequency variations may drastically affect the plasma species population, and consequently, the microstructure of the final nitrided layer. In this study, AISI-409 steel was nitrided in a mixture of 20% N2–80% H2 using a d.c power source. The depth and microstructure of the nitrided layer were assessed as a function of the time that the voltage was off, toff, in the range of 1–4 ms during a 10 ms pulse cycle. The results suggested that both the microstructure and mechanical behavior of the nitrided layer were affected by toff. Long toff values imply a deleterious effect on the mechanical properties of the nitrided layers |
id |
UFRN_4e0e512a42004b4663266070676fbc37 |
---|---|
oai_identifier_str |
oai:https://repositorio.ufrn.br:123456789/31472 |
network_acronym_str |
UFRN |
network_name_str |
Repositório Institucional da UFRN |
repository_id_str |
|
spelling |
Alves Júnior, ClodomiroRodrigues, José de AnchietaMartinelli, Antonio Eduardo2021-02-10T20:33:15Z2021-02-10T20:33:15Z1999-12-15ALVES, C; RODRIGUES, J.A; MARTINELLI, A.E. The effect of pulse width on the microstructure of d.c.-plasma-nitrided layers. Surface And Coatings Technology, [S.L.], v. 122, n. 2-3, p. 112-117, dez. 1999. Disponível em: https://www.sciencedirect.com/science/article/abs/pii/S0257897299003266?via%3Dihub. Acesso em: 26 nov. 2020. http://dx.doi.org/10.1016/s0257-8972(99)00326-6.0257-8972https://repositorio.ufrn.br/handle/123456789/3147210.1016/S0257-8972(99)00326-6ElsevierAttribution 3.0 Brazilhttp://creativecommons.org/licenses/by/3.0/br/info:eu-repo/semantics/openAccessIon bombardmentPulsed plasmaPlasma nitridingThe effect of pulse width on the microstructure of d.c.-plasma-nitrided layersinfo:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/articleModern ion nitriding equipment are powered by pulsed sources in order to prevent arcing and overheating. In industrial applications, the pulse frequency is usually adjusted to set the working temperature. However, frequency variations may drastically affect the plasma species population, and consequently, the microstructure of the final nitrided layer. In this study, AISI-409 steel was nitrided in a mixture of 20% N2–80% H2 using a d.c power source. The depth and microstructure of the nitrided layer were assessed as a function of the time that the voltage was off, toff, in the range of 1–4 ms during a 10 ms pulse cycle. The results suggested that both the microstructure and mechanical behavior of the nitrided layer were affected by toff. Long toff values imply a deleterious effect on the mechanical properties of the nitrided layersengreponame:Repositório Institucional da UFRNinstname:Universidade Federal do Rio Grande do Norte (UFRN)instacron:UFRNORIGINALEffectPulseWidth_MARTINELLI_1999.pdfEffectPulseWidth_MARTINELLI_1999.pdfapplication/pdf349826https://repositorio.ufrn.br/bitstream/123456789/31472/1/EffectPulseWidth_MARTINELLI_1999.pdf9626f782da85631ce7479d4f84f1af43MD51CC-LICENSElicense_rdflicense_rdfapplication/rdf+xml; charset=utf-8914https://repositorio.ufrn.br/bitstream/123456789/31472/2/license_rdf4d2950bda3d176f570a9f8b328dfbbefMD52LICENSElicense.txtlicense.txttext/plain; charset=utf-81484https://repositorio.ufrn.br/bitstream/123456789/31472/3/license.txte9597aa2854d128fd968be5edc8a28d9MD53TEXTEffectPulseWidth_MARTINELLI_1999.pdf.txtEffectPulseWidth_MARTINELLI_1999.pdf.txtExtracted texttext/plain20059https://repositorio.ufrn.br/bitstream/123456789/31472/4/EffectPulseWidth_MARTINELLI_1999.pdf.txte342b059ae2e7c2ad761a860e8b832a0MD54THUMBNAILEffectPulseWidth_MARTINELLI_1999.pdf.jpgEffectPulseWidth_MARTINELLI_1999.pdf.jpgGenerated Thumbnailimage/jpeg1829https://repositorio.ufrn.br/bitstream/123456789/31472/5/EffectPulseWidth_MARTINELLI_1999.pdf.jpgea5e7ffac8197d89a2329d2b8a09fc75MD55123456789/314722021-02-14 05:47:58.946oai:https://repositorio.ufrn.br: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Repositório de PublicaçõesPUBhttp://repositorio.ufrn.br/oai/opendoar:2021-02-14T08:47:58Repositório Institucional da UFRN - Universidade Federal do Rio Grande do Norte (UFRN)false |
dc.title.pt_BR.fl_str_mv |
The effect of pulse width on the microstructure of d.c.-plasma-nitrided layers |
title |
The effect of pulse width on the microstructure of d.c.-plasma-nitrided layers |
spellingShingle |
The effect of pulse width on the microstructure of d.c.-plasma-nitrided layers Alves Júnior, Clodomiro Ion bombardment Pulsed plasma Plasma nitriding |
title_short |
The effect of pulse width on the microstructure of d.c.-plasma-nitrided layers |
title_full |
The effect of pulse width on the microstructure of d.c.-plasma-nitrided layers |
title_fullStr |
The effect of pulse width on the microstructure of d.c.-plasma-nitrided layers |
title_full_unstemmed |
The effect of pulse width on the microstructure of d.c.-plasma-nitrided layers |
title_sort |
The effect of pulse width on the microstructure of d.c.-plasma-nitrided layers |
author |
Alves Júnior, Clodomiro |
author_facet |
Alves Júnior, Clodomiro Rodrigues, José de Anchieta Martinelli, Antonio Eduardo |
author_role |
author |
author2 |
Rodrigues, José de Anchieta Martinelli, Antonio Eduardo |
author2_role |
author author |
dc.contributor.author.fl_str_mv |
Alves Júnior, Clodomiro Rodrigues, José de Anchieta Martinelli, Antonio Eduardo |
dc.subject.por.fl_str_mv |
Ion bombardment Pulsed plasma Plasma nitriding |
topic |
Ion bombardment Pulsed plasma Plasma nitriding |
description |
Modern ion nitriding equipment are powered by pulsed sources in order to prevent arcing and overheating. In industrial applications, the pulse frequency is usually adjusted to set the working temperature. However, frequency variations may drastically affect the plasma species population, and consequently, the microstructure of the final nitrided layer. In this study, AISI-409 steel was nitrided in a mixture of 20% N2–80% H2 using a d.c power source. The depth and microstructure of the nitrided layer were assessed as a function of the time that the voltage was off, toff, in the range of 1–4 ms during a 10 ms pulse cycle. The results suggested that both the microstructure and mechanical behavior of the nitrided layer were affected by toff. Long toff values imply a deleterious effect on the mechanical properties of the nitrided layers |
publishDate |
1999 |
dc.date.issued.fl_str_mv |
1999-12-15 |
dc.date.accessioned.fl_str_mv |
2021-02-10T20:33:15Z |
dc.date.available.fl_str_mv |
2021-02-10T20:33:15Z |
dc.type.status.fl_str_mv |
info:eu-repo/semantics/publishedVersion |
dc.type.driver.fl_str_mv |
info:eu-repo/semantics/article |
format |
article |
status_str |
publishedVersion |
dc.identifier.citation.fl_str_mv |
ALVES, C; RODRIGUES, J.A; MARTINELLI, A.E. The effect of pulse width on the microstructure of d.c.-plasma-nitrided layers. Surface And Coatings Technology, [S.L.], v. 122, n. 2-3, p. 112-117, dez. 1999. Disponível em: https://www.sciencedirect.com/science/article/abs/pii/S0257897299003266?via%3Dihub. Acesso em: 26 nov. 2020. http://dx.doi.org/10.1016/s0257-8972(99)00326-6. |
dc.identifier.uri.fl_str_mv |
https://repositorio.ufrn.br/handle/123456789/31472 |
dc.identifier.issn.none.fl_str_mv |
0257-8972 |
dc.identifier.doi.none.fl_str_mv |
10.1016/S0257-8972(99)00326-6 |
identifier_str_mv |
ALVES, C; RODRIGUES, J.A; MARTINELLI, A.E. The effect of pulse width on the microstructure of d.c.-plasma-nitrided layers. Surface And Coatings Technology, [S.L.], v. 122, n. 2-3, p. 112-117, dez. 1999. Disponível em: https://www.sciencedirect.com/science/article/abs/pii/S0257897299003266?via%3Dihub. Acesso em: 26 nov. 2020. http://dx.doi.org/10.1016/s0257-8972(99)00326-6. 0257-8972 10.1016/S0257-8972(99)00326-6 |
url |
https://repositorio.ufrn.br/handle/123456789/31472 |
dc.language.iso.fl_str_mv |
eng |
language |
eng |
dc.rights.driver.fl_str_mv |
Attribution 3.0 Brazil http://creativecommons.org/licenses/by/3.0/br/ info:eu-repo/semantics/openAccess |
rights_invalid_str_mv |
Attribution 3.0 Brazil http://creativecommons.org/licenses/by/3.0/br/ |
eu_rights_str_mv |
openAccess |
dc.publisher.none.fl_str_mv |
Elsevier |
publisher.none.fl_str_mv |
Elsevier |
dc.source.none.fl_str_mv |
reponame:Repositório Institucional da UFRN instname:Universidade Federal do Rio Grande do Norte (UFRN) instacron:UFRN |
instname_str |
Universidade Federal do Rio Grande do Norte (UFRN) |
instacron_str |
UFRN |
institution |
UFRN |
reponame_str |
Repositório Institucional da UFRN |
collection |
Repositório Institucional da UFRN |
bitstream.url.fl_str_mv |
https://repositorio.ufrn.br/bitstream/123456789/31472/1/EffectPulseWidth_MARTINELLI_1999.pdf https://repositorio.ufrn.br/bitstream/123456789/31472/2/license_rdf https://repositorio.ufrn.br/bitstream/123456789/31472/3/license.txt https://repositorio.ufrn.br/bitstream/123456789/31472/4/EffectPulseWidth_MARTINELLI_1999.pdf.txt https://repositorio.ufrn.br/bitstream/123456789/31472/5/EffectPulseWidth_MARTINELLI_1999.pdf.jpg |
bitstream.checksum.fl_str_mv |
9626f782da85631ce7479d4f84f1af43 4d2950bda3d176f570a9f8b328dfbbef e9597aa2854d128fd968be5edc8a28d9 e342b059ae2e7c2ad761a860e8b832a0 ea5e7ffac8197d89a2329d2b8a09fc75 |
bitstream.checksumAlgorithm.fl_str_mv |
MD5 MD5 MD5 MD5 MD5 |
repository.name.fl_str_mv |
Repositório Institucional da UFRN - Universidade Federal do Rio Grande do Norte (UFRN) |
repository.mail.fl_str_mv |
|
_version_ |
1814833028842651648 |