The effect of pulse width on the microstructure of d.c.-plasma-nitrided layers

Detalhes bibliográficos
Autor(a) principal: Alves Júnior, Clodomiro
Data de Publicação: 1999
Outros Autores: Rodrigues, José de Anchieta, Martinelli, Antonio Eduardo
Tipo de documento: Artigo
Idioma: eng
Título da fonte: Repositório Institucional da UFRN
Texto Completo: https://repositorio.ufrn.br/handle/123456789/31472
Resumo: Modern ion nitriding equipment are powered by pulsed sources in order to prevent arcing and overheating. In industrial applications, the pulse frequency is usually adjusted to set the working temperature. However, frequency variations may drastically affect the plasma species population, and consequently, the microstructure of the final nitrided layer. In this study, AISI-409 steel was nitrided in a mixture of 20% N2–80% H2 using a d.c power source. The depth and microstructure of the nitrided layer were assessed as a function of the time that the voltage was off, toff, in the range of 1–4 ms during a 10 ms pulse cycle. The results suggested that both the microstructure and mechanical behavior of the nitrided layer were affected by toff. Long toff values imply a deleterious effect on the mechanical properties of the nitrided layers
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spelling Alves Júnior, ClodomiroRodrigues, José de AnchietaMartinelli, Antonio Eduardo2021-02-10T20:33:15Z2021-02-10T20:33:15Z1999-12-15ALVES, C; RODRIGUES, J.A; MARTINELLI, A.E. The effect of pulse width on the microstructure of d.c.-plasma-nitrided layers. Surface And Coatings Technology, [S.L.], v. 122, n. 2-3, p. 112-117, dez. 1999. Disponível em: https://www.sciencedirect.com/science/article/abs/pii/S0257897299003266?via%3Dihub. Acesso em: 26 nov. 2020. http://dx.doi.org/10.1016/s0257-8972(99)00326-6.0257-8972https://repositorio.ufrn.br/handle/123456789/3147210.1016/S0257-8972(99)00326-6ElsevierAttribution 3.0 Brazilhttp://creativecommons.org/licenses/by/3.0/br/info:eu-repo/semantics/openAccessIon bombardmentPulsed plasmaPlasma nitridingThe effect of pulse width on the microstructure of d.c.-plasma-nitrided layersinfo:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/articleModern ion nitriding equipment are powered by pulsed sources in order to prevent arcing and overheating. In industrial applications, the pulse frequency is usually adjusted to set the working temperature. However, frequency variations may drastically affect the plasma species population, and consequently, the microstructure of the final nitrided layer. In this study, AISI-409 steel was nitrided in a mixture of 20% N2–80% H2 using a d.c power source. The depth and microstructure of the nitrided layer were assessed as a function of the time that the voltage was off, toff, in the range of 1–4 ms during a 10 ms pulse cycle. The results suggested that both the microstructure and mechanical behavior of the nitrided layer were affected by toff. 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dc.title.pt_BR.fl_str_mv The effect of pulse width on the microstructure of d.c.-plasma-nitrided layers
title The effect of pulse width on the microstructure of d.c.-plasma-nitrided layers
spellingShingle The effect of pulse width on the microstructure of d.c.-plasma-nitrided layers
Alves Júnior, Clodomiro
Ion bombardment
Pulsed plasma
Plasma nitriding
title_short The effect of pulse width on the microstructure of d.c.-plasma-nitrided layers
title_full The effect of pulse width on the microstructure of d.c.-plasma-nitrided layers
title_fullStr The effect of pulse width on the microstructure of d.c.-plasma-nitrided layers
title_full_unstemmed The effect of pulse width on the microstructure of d.c.-plasma-nitrided layers
title_sort The effect of pulse width on the microstructure of d.c.-plasma-nitrided layers
author Alves Júnior, Clodomiro
author_facet Alves Júnior, Clodomiro
Rodrigues, José de Anchieta
Martinelli, Antonio Eduardo
author_role author
author2 Rodrigues, José de Anchieta
Martinelli, Antonio Eduardo
author2_role author
author
dc.contributor.author.fl_str_mv Alves Júnior, Clodomiro
Rodrigues, José de Anchieta
Martinelli, Antonio Eduardo
dc.subject.por.fl_str_mv Ion bombardment
Pulsed plasma
Plasma nitriding
topic Ion bombardment
Pulsed plasma
Plasma nitriding
description Modern ion nitriding equipment are powered by pulsed sources in order to prevent arcing and overheating. In industrial applications, the pulse frequency is usually adjusted to set the working temperature. However, frequency variations may drastically affect the plasma species population, and consequently, the microstructure of the final nitrided layer. In this study, AISI-409 steel was nitrided in a mixture of 20% N2–80% H2 using a d.c power source. The depth and microstructure of the nitrided layer were assessed as a function of the time that the voltage was off, toff, in the range of 1–4 ms during a 10 ms pulse cycle. The results suggested that both the microstructure and mechanical behavior of the nitrided layer were affected by toff. Long toff values imply a deleterious effect on the mechanical properties of the nitrided layers
publishDate 1999
dc.date.issued.fl_str_mv 1999-12-15
dc.date.accessioned.fl_str_mv 2021-02-10T20:33:15Z
dc.date.available.fl_str_mv 2021-02-10T20:33:15Z
dc.type.status.fl_str_mv info:eu-repo/semantics/publishedVersion
dc.type.driver.fl_str_mv info:eu-repo/semantics/article
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status_str publishedVersion
dc.identifier.citation.fl_str_mv ALVES, C; RODRIGUES, J.A; MARTINELLI, A.E. The effect of pulse width on the microstructure of d.c.-plasma-nitrided layers. Surface And Coatings Technology, [S.L.], v. 122, n. 2-3, p. 112-117, dez. 1999. Disponível em: https://www.sciencedirect.com/science/article/abs/pii/S0257897299003266?via%3Dihub. Acesso em: 26 nov. 2020. http://dx.doi.org/10.1016/s0257-8972(99)00326-6.
dc.identifier.uri.fl_str_mv https://repositorio.ufrn.br/handle/123456789/31472
dc.identifier.issn.none.fl_str_mv 0257-8972
dc.identifier.doi.none.fl_str_mv 10.1016/S0257-8972(99)00326-6
identifier_str_mv ALVES, C; RODRIGUES, J.A; MARTINELLI, A.E. The effect of pulse width on the microstructure of d.c.-plasma-nitrided layers. Surface And Coatings Technology, [S.L.], v. 122, n. 2-3, p. 112-117, dez. 1999. Disponível em: https://www.sciencedirect.com/science/article/abs/pii/S0257897299003266?via%3Dihub. Acesso em: 26 nov. 2020. http://dx.doi.org/10.1016/s0257-8972(99)00326-6.
0257-8972
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url https://repositorio.ufrn.br/handle/123456789/31472
dc.language.iso.fl_str_mv eng
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dc.rights.driver.fl_str_mv Attribution 3.0 Brazil
http://creativecommons.org/licenses/by/3.0/br/
info:eu-repo/semantics/openAccess
rights_invalid_str_mv Attribution 3.0 Brazil
http://creativecommons.org/licenses/by/3.0/br/
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dc.publisher.none.fl_str_mv Elsevier
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