Nonlinear response of antiferromagnetic films to radiation at oblique incidence

Detalhes bibliográficos
Autor(a) principal: Carriço, Artur da Silva
Data de Publicação: 1993
Outros Autores: Almeida, N. S.
Tipo de documento: Artigo
Idioma: eng
Título da fonte: Repositório Institucional da UFRN
Texto Completo: https://repositorio.ufrn.br/jspui/handle/123456789/28854
https://doi.org/10.1103/PhysRevB.48.9835
Resumo: The response of an antiferromagnetic film to incident radiation at oblique incidence is studied in the nonlinear regime. For given values of the frequency and incidence angle, the reflectivity of a film of arbitrary thickness is obtained as an implicit function of the incident field amplitude. The compound effect of the incidence angle and field strength on the reflected radiation is studied by means of the analysis of the reflection coefficient calculated for different values of these external variables. We use the physical parameters of the uniaxial Heisenberg antiferromagnet FeF2 to obtain numerical results. It is found that the threshold for nonlinear optical behavior is strongly dependent on the incidence angle.
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spelling Carriço, Artur da SilvaAlmeida, N. S.2020-04-29T23:17:03Z2020-04-29T23:17:03Z1993-10-01CARRIÇO, Artur da Silva; ALMEIDA, N. S. Nonlinear response of antiferromagnetic films to radiation at oblique incidence. Physical Review B: Condensed Matter and Materials Physics, [s. l.], v. 48, p. 9, 1993. ISSN 2469-9969 versão online. DOI https://doi.org/10.1103/PhysRevB.48.9835. Disponível em: https://journals.aps.org/prb/abstract/10.1103/PhysRevB.48.9835. Acesso em: 29 abr. 2020.2469-9969 (online), 2469-9950 (print)https://repositorio.ufrn.br/jspui/handle/123456789/28854https://doi.org/10.1103/PhysRevB.48.9835The response of an antiferromagnetic film to incident radiation at oblique incidence is studied in the nonlinear regime. For given values of the frequency and incidence angle, the reflectivity of a film of arbitrary thickness is obtained as an implicit function of the incident field amplitude. The compound effect of the incidence angle and field strength on the reflected radiation is studied by means of the analysis of the reflection coefficient calculated for different values of these external variables. We use the physical parameters of the uniaxial Heisenberg antiferromagnet FeF2 to obtain numerical results. It is found that the threshold for nonlinear optical behavior is strongly dependent on the incidence angle.The response of an antiferromagnetic film to incident radiation at oblique incidence is studied in the nonlinear regime. For given values of the frequency and incidence angle, the reflectivity of a film of arbitrary thickness is obtained as an implicit function of the incident field amplitude. The compound effect of the incidence angle and field strength on the reflected radiation is studied by means of the analysis of the reflection coefficient calculated for different values of these external variables. We use the physical parameters of the uniaxial Heisenberg antiferromagnet FeF2 to obtain numerical results. It is found that the threshold for nonlinear optical behavior is strongly dependent on the incidence angle.American Physical SocietyNonlinear responseAntiferromagnetic filmsRadiationOblique incidenceNonlinear response of antiferromagnetic films to radiation at oblique incidenceinfo:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/articleengreponame:Repositório Institucional da UFRNinstname:Universidade Federal do Rio Grande do Norte (UFRN)instacron:UFRNinfo:eu-repo/semantics/openAccessORIGINALNonlinearResponseOfAntiferromagneticFilmsToRadiationAtObliqueIncidence_1993_Carrico.pdfNonlinearResponseOfAntiferromagneticFilmsToRadiationAtObliqueIncidence_1993_Carrico.pdfapplication/pdf168452https://repositorio.ufrn.br/bitstream/123456789/28854/1/NonlinearResponseOfAntiferromagneticFilmsToRadiationAtObliqueIncidence_1993_Carrico.pdf75fe46eab15c6c5061d6307320053b9aMD51LICENSElicense.txtlicense.txttext/plain; charset=utf-81484https://repositorio.ufrn.br/bitstream/123456789/28854/2/license.txte9597aa2854d128fd968be5edc8a28d9MD52TEXTNonlinearResponseOfAntiferromagneticFilmsToRadiationAtObliqueIncidence_1993_Carrico.pdf.txtNonlinearResponseOfAntiferromagneticFilmsToRadiationAtObliqueIncidence_1993_Carrico.pdf.txtExtracted texttext/plain15528https://repositorio.ufrn.br/bitstream/123456789/28854/3/NonlinearResponseOfAntiferromagneticFilmsToRadiationAtObliqueIncidence_1993_Carrico.pdf.txt6863048570c84d0b3446bfc739a48f16MD53THUMBNAILNonlinearResponseOfAntiferromagneticFilmsToRadiationAtObliqueIncidence_1993_Carrico.pdf.jpgNonlinearResponseOfAntiferromagneticFilmsToRadiationAtObliqueIncidence_1993_Carrico.pdf.jpgGenerated Thumbnailimage/jpeg979https://repositorio.ufrn.br/bitstream/123456789/28854/4/NonlinearResponseOfAntiferromagneticFilmsToRadiationAtObliqueIncidence_1993_Carrico.pdf.jpgbc177e95802689fad4ac7de54e0c6e27MD54123456789/288542020-05-05 01:18:01.02oai:https://repositorio.ufrn.br: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Repositório de PublicaçõesPUBhttp://repositorio.ufrn.br/oai/opendoar:2020-05-05T04:18:01Repositório Institucional da UFRN - Universidade Federal do Rio Grande do Norte (UFRN)false
dc.title.pt_BR.fl_str_mv Nonlinear response of antiferromagnetic films to radiation at oblique incidence
title Nonlinear response of antiferromagnetic films to radiation at oblique incidence
spellingShingle Nonlinear response of antiferromagnetic films to radiation at oblique incidence
Carriço, Artur da Silva
Nonlinear response
Antiferromagnetic films
Radiation
Oblique incidence
title_short Nonlinear response of antiferromagnetic films to radiation at oblique incidence
title_full Nonlinear response of antiferromagnetic films to radiation at oblique incidence
title_fullStr Nonlinear response of antiferromagnetic films to radiation at oblique incidence
title_full_unstemmed Nonlinear response of antiferromagnetic films to radiation at oblique incidence
title_sort Nonlinear response of antiferromagnetic films to radiation at oblique incidence
author Carriço, Artur da Silva
author_facet Carriço, Artur da Silva
Almeida, N. S.
author_role author
author2 Almeida, N. S.
author2_role author
dc.contributor.author.fl_str_mv Carriço, Artur da Silva
Almeida, N. S.
dc.subject.por.fl_str_mv Nonlinear response
Antiferromagnetic films
Radiation
Oblique incidence
topic Nonlinear response
Antiferromagnetic films
Radiation
Oblique incidence
description The response of an antiferromagnetic film to incident radiation at oblique incidence is studied in the nonlinear regime. For given values of the frequency and incidence angle, the reflectivity of a film of arbitrary thickness is obtained as an implicit function of the incident field amplitude. The compound effect of the incidence angle and field strength on the reflected radiation is studied by means of the analysis of the reflection coefficient calculated for different values of these external variables. We use the physical parameters of the uniaxial Heisenberg antiferromagnet FeF2 to obtain numerical results. It is found that the threshold for nonlinear optical behavior is strongly dependent on the incidence angle.
publishDate 1993
dc.date.issued.fl_str_mv 1993-10-01
dc.date.accessioned.fl_str_mv 2020-04-29T23:17:03Z
dc.date.available.fl_str_mv 2020-04-29T23:17:03Z
dc.type.status.fl_str_mv info:eu-repo/semantics/publishedVersion
dc.type.driver.fl_str_mv info:eu-repo/semantics/article
format article
status_str publishedVersion
dc.identifier.citation.fl_str_mv CARRIÇO, Artur da Silva; ALMEIDA, N. S. Nonlinear response of antiferromagnetic films to radiation at oblique incidence. Physical Review B: Condensed Matter and Materials Physics, [s. l.], v. 48, p. 9, 1993. ISSN 2469-9969 versão online. DOI https://doi.org/10.1103/PhysRevB.48.9835. Disponível em: https://journals.aps.org/prb/abstract/10.1103/PhysRevB.48.9835. Acesso em: 29 abr. 2020.
dc.identifier.uri.fl_str_mv https://repositorio.ufrn.br/jspui/handle/123456789/28854
dc.identifier.issn.none.fl_str_mv 2469-9969 (online), 2469-9950 (print)
dc.identifier.doi.none.fl_str_mv https://doi.org/10.1103/PhysRevB.48.9835
identifier_str_mv CARRIÇO, Artur da Silva; ALMEIDA, N. S. Nonlinear response of antiferromagnetic films to radiation at oblique incidence. Physical Review B: Condensed Matter and Materials Physics, [s. l.], v. 48, p. 9, 1993. ISSN 2469-9969 versão online. DOI https://doi.org/10.1103/PhysRevB.48.9835. Disponível em: https://journals.aps.org/prb/abstract/10.1103/PhysRevB.48.9835. Acesso em: 29 abr. 2020.
2469-9969 (online), 2469-9950 (print)
url https://repositorio.ufrn.br/jspui/handle/123456789/28854
https://doi.org/10.1103/PhysRevB.48.9835
dc.language.iso.fl_str_mv eng
language eng
dc.rights.driver.fl_str_mv info:eu-repo/semantics/openAccess
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dc.publisher.none.fl_str_mv American Physical Society
publisher.none.fl_str_mv American Physical Society
dc.source.none.fl_str_mv reponame:Repositório Institucional da UFRN
instname:Universidade Federal do Rio Grande do Norte (UFRN)
instacron:UFRN
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collection Repositório Institucional da UFRN
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