Nonlinear response of antiferromagnetic films to radiation at oblique incidence
Autor(a) principal: | |
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Data de Publicação: | 1993 |
Outros Autores: | |
Tipo de documento: | Artigo |
Idioma: | eng |
Título da fonte: | Repositório Institucional da UFRN |
Texto Completo: | https://repositorio.ufrn.br/jspui/handle/123456789/28854 https://doi.org/10.1103/PhysRevB.48.9835 |
Resumo: | The response of an antiferromagnetic film to incident radiation at oblique incidence is studied in the nonlinear regime. For given values of the frequency and incidence angle, the reflectivity of a film of arbitrary thickness is obtained as an implicit function of the incident field amplitude. The compound effect of the incidence angle and field strength on the reflected radiation is studied by means of the analysis of the reflection coefficient calculated for different values of these external variables. We use the physical parameters of the uniaxial Heisenberg antiferromagnet FeF2 to obtain numerical results. It is found that the threshold for nonlinear optical behavior is strongly dependent on the incidence angle. |
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Carriço, Artur da SilvaAlmeida, N. S.2020-04-29T23:17:03Z2020-04-29T23:17:03Z1993-10-01CARRIÇO, Artur da Silva; ALMEIDA, N. S. Nonlinear response of antiferromagnetic films to radiation at oblique incidence. Physical Review B: Condensed Matter and Materials Physics, [s. l.], v. 48, p. 9, 1993. ISSN 2469-9969 versão online. DOI https://doi.org/10.1103/PhysRevB.48.9835. Disponível em: https://journals.aps.org/prb/abstract/10.1103/PhysRevB.48.9835. Acesso em: 29 abr. 2020.2469-9969 (online), 2469-9950 (print)https://repositorio.ufrn.br/jspui/handle/123456789/28854https://doi.org/10.1103/PhysRevB.48.9835The response of an antiferromagnetic film to incident radiation at oblique incidence is studied in the nonlinear regime. For given values of the frequency and incidence angle, the reflectivity of a film of arbitrary thickness is obtained as an implicit function of the incident field amplitude. The compound effect of the incidence angle and field strength on the reflected radiation is studied by means of the analysis of the reflection coefficient calculated for different values of these external variables. We use the physical parameters of the uniaxial Heisenberg antiferromagnet FeF2 to obtain numerical results. It is found that the threshold for nonlinear optical behavior is strongly dependent on the incidence angle.The response of an antiferromagnetic film to incident radiation at oblique incidence is studied in the nonlinear regime. For given values of the frequency and incidence angle, the reflectivity of a film of arbitrary thickness is obtained as an implicit function of the incident field amplitude. The compound effect of the incidence angle and field strength on the reflected radiation is studied by means of the analysis of the reflection coefficient calculated for different values of these external variables. We use the physical parameters of the uniaxial Heisenberg antiferromagnet FeF2 to obtain numerical results. It is found that the threshold for nonlinear optical behavior is strongly dependent on the incidence angle.American Physical SocietyNonlinear responseAntiferromagnetic filmsRadiationOblique incidenceNonlinear response of antiferromagnetic films to radiation at oblique incidenceinfo:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/articleengreponame:Repositório Institucional da UFRNinstname:Universidade Federal do Rio Grande do Norte (UFRN)instacron:UFRNinfo:eu-repo/semantics/openAccessORIGINALNonlinearResponseOfAntiferromagneticFilmsToRadiationAtObliqueIncidence_1993_Carrico.pdfNonlinearResponseOfAntiferromagneticFilmsToRadiationAtObliqueIncidence_1993_Carrico.pdfapplication/pdf168452https://repositorio.ufrn.br/bitstream/123456789/28854/1/NonlinearResponseOfAntiferromagneticFilmsToRadiationAtObliqueIncidence_1993_Carrico.pdf75fe46eab15c6c5061d6307320053b9aMD51LICENSElicense.txtlicense.txttext/plain; charset=utf-81484https://repositorio.ufrn.br/bitstream/123456789/28854/2/license.txte9597aa2854d128fd968be5edc8a28d9MD52TEXTNonlinearResponseOfAntiferromagneticFilmsToRadiationAtObliqueIncidence_1993_Carrico.pdf.txtNonlinearResponseOfAntiferromagneticFilmsToRadiationAtObliqueIncidence_1993_Carrico.pdf.txtExtracted texttext/plain15528https://repositorio.ufrn.br/bitstream/123456789/28854/3/NonlinearResponseOfAntiferromagneticFilmsToRadiationAtObliqueIncidence_1993_Carrico.pdf.txt6863048570c84d0b3446bfc739a48f16MD53THUMBNAILNonlinearResponseOfAntiferromagneticFilmsToRadiationAtObliqueIncidence_1993_Carrico.pdf.jpgNonlinearResponseOfAntiferromagneticFilmsToRadiationAtObliqueIncidence_1993_Carrico.pdf.jpgGenerated Thumbnailimage/jpeg979https://repositorio.ufrn.br/bitstream/123456789/28854/4/NonlinearResponseOfAntiferromagneticFilmsToRadiationAtObliqueIncidence_1993_Carrico.pdf.jpgbc177e95802689fad4ac7de54e0c6e27MD54123456789/288542020-05-05 01:18:01.02oai:https://repositorio.ufrn.br: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Repositório de PublicaçõesPUBhttp://repositorio.ufrn.br/oai/opendoar:2020-05-05T04:18:01Repositório Institucional da UFRN - Universidade Federal do Rio Grande do Norte (UFRN)false |
dc.title.pt_BR.fl_str_mv |
Nonlinear response of antiferromagnetic films to radiation at oblique incidence |
title |
Nonlinear response of antiferromagnetic films to radiation at oblique incidence |
spellingShingle |
Nonlinear response of antiferromagnetic films to radiation at oblique incidence Carriço, Artur da Silva Nonlinear response Antiferromagnetic films Radiation Oblique incidence |
title_short |
Nonlinear response of antiferromagnetic films to radiation at oblique incidence |
title_full |
Nonlinear response of antiferromagnetic films to radiation at oblique incidence |
title_fullStr |
Nonlinear response of antiferromagnetic films to radiation at oblique incidence |
title_full_unstemmed |
Nonlinear response of antiferromagnetic films to radiation at oblique incidence |
title_sort |
Nonlinear response of antiferromagnetic films to radiation at oblique incidence |
author |
Carriço, Artur da Silva |
author_facet |
Carriço, Artur da Silva Almeida, N. S. |
author_role |
author |
author2 |
Almeida, N. S. |
author2_role |
author |
dc.contributor.author.fl_str_mv |
Carriço, Artur da Silva Almeida, N. S. |
dc.subject.por.fl_str_mv |
Nonlinear response Antiferromagnetic films Radiation Oblique incidence |
topic |
Nonlinear response Antiferromagnetic films Radiation Oblique incidence |
description |
The response of an antiferromagnetic film to incident radiation at oblique incidence is studied in the nonlinear regime. For given values of the frequency and incidence angle, the reflectivity of a film of arbitrary thickness is obtained as an implicit function of the incident field amplitude. The compound effect of the incidence angle and field strength on the reflected radiation is studied by means of the analysis of the reflection coefficient calculated for different values of these external variables. We use the physical parameters of the uniaxial Heisenberg antiferromagnet FeF2 to obtain numerical results. It is found that the threshold for nonlinear optical behavior is strongly dependent on the incidence angle. |
publishDate |
1993 |
dc.date.issued.fl_str_mv |
1993-10-01 |
dc.date.accessioned.fl_str_mv |
2020-04-29T23:17:03Z |
dc.date.available.fl_str_mv |
2020-04-29T23:17:03Z |
dc.type.status.fl_str_mv |
info:eu-repo/semantics/publishedVersion |
dc.type.driver.fl_str_mv |
info:eu-repo/semantics/article |
format |
article |
status_str |
publishedVersion |
dc.identifier.citation.fl_str_mv |
CARRIÇO, Artur da Silva; ALMEIDA, N. S. Nonlinear response of antiferromagnetic films to radiation at oblique incidence. Physical Review B: Condensed Matter and Materials Physics, [s. l.], v. 48, p. 9, 1993. ISSN 2469-9969 versão online. DOI https://doi.org/10.1103/PhysRevB.48.9835. Disponível em: https://journals.aps.org/prb/abstract/10.1103/PhysRevB.48.9835. Acesso em: 29 abr. 2020. |
dc.identifier.uri.fl_str_mv |
https://repositorio.ufrn.br/jspui/handle/123456789/28854 |
dc.identifier.issn.none.fl_str_mv |
2469-9969 (online), 2469-9950 (print) |
dc.identifier.doi.none.fl_str_mv |
https://doi.org/10.1103/PhysRevB.48.9835 |
identifier_str_mv |
CARRIÇO, Artur da Silva; ALMEIDA, N. S. Nonlinear response of antiferromagnetic films to radiation at oblique incidence. Physical Review B: Condensed Matter and Materials Physics, [s. l.], v. 48, p. 9, 1993. ISSN 2469-9969 versão online. DOI https://doi.org/10.1103/PhysRevB.48.9835. Disponível em: https://journals.aps.org/prb/abstract/10.1103/PhysRevB.48.9835. Acesso em: 29 abr. 2020. 2469-9969 (online), 2469-9950 (print) |
url |
https://repositorio.ufrn.br/jspui/handle/123456789/28854 https://doi.org/10.1103/PhysRevB.48.9835 |
dc.language.iso.fl_str_mv |
eng |
language |
eng |
dc.rights.driver.fl_str_mv |
info:eu-repo/semantics/openAccess |
eu_rights_str_mv |
openAccess |
dc.publisher.none.fl_str_mv |
American Physical Society |
publisher.none.fl_str_mv |
American Physical Society |
dc.source.none.fl_str_mv |
reponame:Repositório Institucional da UFRN instname:Universidade Federal do Rio Grande do Norte (UFRN) instacron:UFRN |
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UFRN |
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UFRN |
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Repositório Institucional da UFRN |
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Repositório Institucional da UFRN |
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