Evaluation of Piezoresistivity Properties of Sputtered ZnO Thin Films

• Autor(a) principal: Cardoso, Guilherme Wellington Alves
• Data de Publicação: 2014
• Outros Autores: Leal, Gabriela, Silva Sobrinho, Argemiro Soares da, Fraga, Mariana Amorim, Massi, Marcos [UNIFESP]
• Tipo de documento: Artigo
• Idioma: eng
• Título da fonte: Repositório Institucional da UNIFESP
• Texto Completo: http://dx.doi.org/10.1590/S1516-14392014005000080; http://repositorio.unifesp.br/handle/11600/37700
• topic: ZnO; thin film; magnetron sputtering; piezoresistivity

Zinc oxide (ZnO) thin films were deposited by RF reactive magnetron sputtering on silicon (100) substrates under different experimental conditions. ZnO films were studied before and after annealing treatment at 600 degrees C. the crystallinity, electrical resistivity, stoichiometry, thickness, and elastic modulus of the films were investigated. ZnO piezoresistors were produced using microelectronics processes, such as photolithography, lift-off, and reactive ion etching (RIE). Cantilever method was used to determine the gauge factor, and measurements of Temperature Coefficient of Resistance (TCR) were performed on a hotplate. the optimization of the deposition conditions produced ZnO thin films with controlled stoichiometry (ZnO), crystalline microstructure (phase wurzite, 002), high elastic modulus (156 GPa), and low electrical resistivity (0.072 ohm.cm), which are good properties for application as piezoresistive pressure microsensor. in addition, the ZnO piezoresistors had a GF of 2.6 on the deformation in the plane (100) and TCR of -1610 ppm/K up to 250 degrees C.