Estudo da rugosidade de filmes finos de telureto de cádmio crescidos por epitaxia de paredes quentes

• Autor(a) principal: Ribeiro, Igor Renato Bueno
• Data de Publicação: 2008
• Tipo de documento: Dissertação
• Idioma: por
• Título da fonte: LOCUS Repositório Institucional da UFV
• Texto Completo: http://locus.ufv.br/handle/123456789/4226
• topic: Rugosidade; Telureto de cádmio; Epitaxia de paredes quentes; Roughness; Cadmium telluride; Hot wall epitaxy; CNPQ::CIENCIAS EXATAS E DA TERRA::FISICA::FISICA DA MATERIA CONDENSADA

In this work, we have studied the effect of growth temperature on Hurst (H) and growth exponents (β) for cadmium telluride polycrystalline layers grown on glass substrate covered by fluorine doped tin oxide. In order to measure the exponents and their temperature dependence, we have grown samples with growth times between 30 and 660 minutes at substrate temperatures between 150 and 300 ºC, in order to determine H e β. The samples height profiles were measured in scan lengths of 300 μm with stylus profiler (XP1 - AMBIOS) with a vertical resolution of 1.5 Å at 10 mm setting and lateral resolution of 100 nm. The Hurst exponent increases linearly from 0.72 to 0.80, and the growth exponent increases exponentially from 0.14 to 0.62, with temperature. The global roughness also increases with growth temperature, which turns to be a very good parameter for roughness control.