Erbium-activated silica-titania planar waveguides prepared by rf-sputtering
Autor(a) principal: | |
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Data de Publicação: | 2001 |
Outros Autores: | , , , , , , , , , , , , |
Tipo de documento: | Artigo |
Idioma: | eng |
Título da fonte: | Repositório Institucional da UNESP |
Texto Completo: | http://dx.doi.org/10.1117/12.424788 http://hdl.handle.net/11449/219327 |
Resumo: | Erbium-activated silica-titania planar waveguides were prepared by rf-sputtering technique. The films were deposited both on v-SiO2 and silica-on-silicon substrates obtained by plasma-enhanced chemical vapor deposition. The refractive index, the thickness and the total attenuation coefficient of the waveguides were measured by prism coupling technique. Scanning electron microscopy was used to analyze the morphology of both substrates and waveguiding film. Energy Dispersive Spectrometry was performed in order to obtain a compositional analysis. Roughness measurements were carried out by means of a stylus profilometer. After thermal annealing at 600°C for 6 hours the waveguides exhibited several well confined TE and TM propagating modes at 633 nm and one mode at 1550 nm. The attenuation coefficient at 1550 nm was 0.9 and 0.7 dB/cm for the films deposited on silica-on-silicon and the v-SiO2 substrates, respectively. Structural information about the deposited films were obtained by waveguide Raman spectroscopy. Waveguide luminescence spectroscopy was used to study the 4I13/2 → 4I15/2 transition of Er3+ ion. The emission at 1530 nm was observed at room temperature upon continuous wave excitation at 514.5 nm. A lifetime of 3.7 ms for the metastable 4I13/2 level was measured. |
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Erbium-activated silica-titania planar waveguides prepared by rf-sputteringErbiumOptical propertiesPhotoluminescencePlanar waveguidesRaman spectroscopyRf-sputteringSiO2-TiO2Erbium-activated silica-titania planar waveguides were prepared by rf-sputtering technique. The films were deposited both on v-SiO2 and silica-on-silicon substrates obtained by plasma-enhanced chemical vapor deposition. The refractive index, the thickness and the total attenuation coefficient of the waveguides were measured by prism coupling technique. Scanning electron microscopy was used to analyze the morphology of both substrates and waveguiding film. Energy Dispersive Spectrometry was performed in order to obtain a compositional analysis. Roughness measurements were carried out by means of a stylus profilometer. After thermal annealing at 600°C for 6 hours the waveguides exhibited several well confined TE and TM propagating modes at 633 nm and one mode at 1550 nm. The attenuation coefficient at 1550 nm was 0.9 and 0.7 dB/cm for the films deposited on silica-on-silicon and the v-SiO2 substrates, respectively. Structural information about the deposited films were obtained by waveguide Raman spectroscopy. Waveguide luminescence spectroscopy was used to study the 4I13/2 → 4I15/2 transition of Er3+ ion. The emission at 1530 nm was observed at room temperature upon continuous wave excitation at 514.5 nm. A lifetime of 3.7 ms for the metastable 4I13/2 level was measured.INFM Dip. Di Fisica Università di Trento, via Sommarive 14, I-38050 Povo, TrentoOptoelectronics and Photonics Dept. IROE-CNR, via Panciatichi 64, 1-50127 FirenzeInstitute of Chemistry UNESP C. P. 355 CEP, 14801-970, Araraquara-SPAgilent Technologies Torino Technology Centre, via G. Reiss Romoli 274, 10148 TorinoLab. Des Fluorures UPRES A 6010 CNRS Université du Maine, Av. Messiaen, 72017 Le Mans CedexDip. Di Ingegneria Meccanica e Strutturale Università di Trento, via Mesiano 44, 1-38050 Povo, TrentoCNR-CeFSA Centro Fisica Stati Aggregati, via Sommarive, 14, I-38050 Povo, TrentoInstitute of Chemistry UNESP C. P. 355 CEP, 14801-970, Araraquara-SPUniversità di TrentoDept. IROE-CNRUniversidade Estadual Paulista (UNESP)Agilent Technologies Torino Technology CentreUniversité du MaineCentro Fisica Stati AggregatiRonchin, SabinaChiasera, AlessandroMontagna, MaurizioRolli, RaffaellaTosello, CristianaPelli, StefanoRighini, Giancarlo C.Gonçalves, Rogeria R. [UNESP]Ribeiro, Sidney [UNESP]De Bernardi, CarloPozzi, FabioDuverger, ClaireBelli, RominaFerrari, Maurizio2022-04-28T18:55:01Z2022-04-28T18:55:01Z2001-01-01info:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/article31-39http://dx.doi.org/10.1117/12.424788Proceedings of SPIE - The International Society for Optical Engineering, v. 4282, p. 31-39.0277-786Xhttp://hdl.handle.net/11449/21932710.1117/12.4247882-s2.0-10744224253Scopusreponame:Repositório Institucional da UNESPinstname:Universidade Estadual Paulista (UNESP)instacron:UNESPengProceedings of SPIE - The International Society for Optical Engineeringinfo:eu-repo/semantics/openAccess2022-04-28T18:55:01Zoai:repositorio.unesp.br:11449/219327Repositório InstitucionalPUBhttp://repositorio.unesp.br/oai/requestopendoar:29462024-08-05T14:11:24.045143Repositório Institucional da UNESP - Universidade Estadual Paulista (UNESP)false |
dc.title.none.fl_str_mv |
Erbium-activated silica-titania planar waveguides prepared by rf-sputtering |
title |
Erbium-activated silica-titania planar waveguides prepared by rf-sputtering |
spellingShingle |
Erbium-activated silica-titania planar waveguides prepared by rf-sputtering Ronchin, Sabina Erbium Optical properties Photoluminescence Planar waveguides Raman spectroscopy Rf-sputtering SiO2-TiO2 |
title_short |
Erbium-activated silica-titania planar waveguides prepared by rf-sputtering |
title_full |
Erbium-activated silica-titania planar waveguides prepared by rf-sputtering |
title_fullStr |
Erbium-activated silica-titania planar waveguides prepared by rf-sputtering |
title_full_unstemmed |
Erbium-activated silica-titania planar waveguides prepared by rf-sputtering |
title_sort |
Erbium-activated silica-titania planar waveguides prepared by rf-sputtering |
author |
Ronchin, Sabina |
author_facet |
Ronchin, Sabina Chiasera, Alessandro Montagna, Maurizio Rolli, Raffaella Tosello, Cristiana Pelli, Stefano Righini, Giancarlo C. Gonçalves, Rogeria R. [UNESP] Ribeiro, Sidney [UNESP] De Bernardi, Carlo Pozzi, Fabio Duverger, Claire Belli, Romina Ferrari, Maurizio |
author_role |
author |
author2 |
Chiasera, Alessandro Montagna, Maurizio Rolli, Raffaella Tosello, Cristiana Pelli, Stefano Righini, Giancarlo C. Gonçalves, Rogeria R. [UNESP] Ribeiro, Sidney [UNESP] De Bernardi, Carlo Pozzi, Fabio Duverger, Claire Belli, Romina Ferrari, Maurizio |
author2_role |
author author author author author author author author author author author author author |
dc.contributor.none.fl_str_mv |
Università di Trento Dept. IROE-CNR Universidade Estadual Paulista (UNESP) Agilent Technologies Torino Technology Centre Université du Maine Centro Fisica Stati Aggregati |
dc.contributor.author.fl_str_mv |
Ronchin, Sabina Chiasera, Alessandro Montagna, Maurizio Rolli, Raffaella Tosello, Cristiana Pelli, Stefano Righini, Giancarlo C. Gonçalves, Rogeria R. [UNESP] Ribeiro, Sidney [UNESP] De Bernardi, Carlo Pozzi, Fabio Duverger, Claire Belli, Romina Ferrari, Maurizio |
dc.subject.por.fl_str_mv |
Erbium Optical properties Photoluminescence Planar waveguides Raman spectroscopy Rf-sputtering SiO2-TiO2 |
topic |
Erbium Optical properties Photoluminescence Planar waveguides Raman spectroscopy Rf-sputtering SiO2-TiO2 |
description |
Erbium-activated silica-titania planar waveguides were prepared by rf-sputtering technique. The films were deposited both on v-SiO2 and silica-on-silicon substrates obtained by plasma-enhanced chemical vapor deposition. The refractive index, the thickness and the total attenuation coefficient of the waveguides were measured by prism coupling technique. Scanning electron microscopy was used to analyze the morphology of both substrates and waveguiding film. Energy Dispersive Spectrometry was performed in order to obtain a compositional analysis. Roughness measurements were carried out by means of a stylus profilometer. After thermal annealing at 600°C for 6 hours the waveguides exhibited several well confined TE and TM propagating modes at 633 nm and one mode at 1550 nm. The attenuation coefficient at 1550 nm was 0.9 and 0.7 dB/cm for the films deposited on silica-on-silicon and the v-SiO2 substrates, respectively. Structural information about the deposited films were obtained by waveguide Raman spectroscopy. Waveguide luminescence spectroscopy was used to study the 4I13/2 → 4I15/2 transition of Er3+ ion. The emission at 1530 nm was observed at room temperature upon continuous wave excitation at 514.5 nm. A lifetime of 3.7 ms for the metastable 4I13/2 level was measured. |
publishDate |
2001 |
dc.date.none.fl_str_mv |
2001-01-01 2022-04-28T18:55:01Z 2022-04-28T18:55:01Z |
dc.type.status.fl_str_mv |
info:eu-repo/semantics/publishedVersion |
dc.type.driver.fl_str_mv |
info:eu-repo/semantics/article |
format |
article |
status_str |
publishedVersion |
dc.identifier.uri.fl_str_mv |
http://dx.doi.org/10.1117/12.424788 Proceedings of SPIE - The International Society for Optical Engineering, v. 4282, p. 31-39. 0277-786X http://hdl.handle.net/11449/219327 10.1117/12.424788 2-s2.0-10744224253 |
url |
http://dx.doi.org/10.1117/12.424788 http://hdl.handle.net/11449/219327 |
identifier_str_mv |
Proceedings of SPIE - The International Society for Optical Engineering, v. 4282, p. 31-39. 0277-786X 10.1117/12.424788 2-s2.0-10744224253 |
dc.language.iso.fl_str_mv |
eng |
language |
eng |
dc.relation.none.fl_str_mv |
Proceedings of SPIE - The International Society for Optical Engineering |
dc.rights.driver.fl_str_mv |
info:eu-repo/semantics/openAccess |
eu_rights_str_mv |
openAccess |
dc.format.none.fl_str_mv |
31-39 |
dc.source.none.fl_str_mv |
Scopus reponame:Repositório Institucional da UNESP instname:Universidade Estadual Paulista (UNESP) instacron:UNESP |
instname_str |
Universidade Estadual Paulista (UNESP) |
instacron_str |
UNESP |
institution |
UNESP |
reponame_str |
Repositório Institucional da UNESP |
collection |
Repositório Institucional da UNESP |
repository.name.fl_str_mv |
Repositório Institucional da UNESP - Universidade Estadual Paulista (UNESP) |
repository.mail.fl_str_mv |
|
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1808128329967992832 |