Investigation of photoinduced electrical properties in the heterojunction TiO2/SnO2
Autor(a) principal: | |
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Data de Publicação: | 2014 |
Outros Autores: | , , |
Tipo de documento: | Artigo de conferência |
Idioma: | eng |
Título da fonte: | Repositório Institucional da UNESP |
Texto Completo: | http://www.scientific.net/AMR.975.201 http://hdl.handle.net/11449/130184 |
Resumo: | TiO2/SnO2 thin films heterostructures were grown by the sol-gel dip-coating technique. It was found that the crystalline structure of TiO2 depends on the annealing temperature and the substrate type. TiO2 films deposited on glass substrate, submitted to thermal annealing until 550 degrees C, present anatase structure, whereas films deposited on quartz substrate transform to rutile structure when thermally annealed at 1100 degrees C. When structured as rutile, this oxide semiconductor has very close lattice parameters to those of SnO2, making easier the heterostructure assembling. The electrical properties of TiO2/SnO2 heterostructure were evaluated as function of temperature and excitation with different light sources. The temperature dependence of conductivity is dominated by a deep level with energy coincident with the second ionization level of oxygen vacancies in SnO2, suggesting the dominant role of the most external layer material (SnO2) to the electrical transport properties. The fourth harmonic of a Nd:YAG laser line (4.65 eV) seems to excite the most external layer whereas a InGaN LED (2.75 eV) seems to excite electrons from the ground state of a quantized interfacial channel as well as intrabandgap states of the TiO2 layer. |
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Repositório Institucional da UNESP |
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Investigation of photoinduced electrical properties in the heterojunction TiO2/SnO2Tin dioxideTitanium dioxideHeterostructureGas sensorsElectrical propertiesTiO2/SnO2 thin films heterostructures were grown by the sol-gel dip-coating technique. It was found that the crystalline structure of TiO2 depends on the annealing temperature and the substrate type. TiO2 films deposited on glass substrate, submitted to thermal annealing until 550 degrees C, present anatase structure, whereas films deposited on quartz substrate transform to rutile structure when thermally annealed at 1100 degrees C. When structured as rutile, this oxide semiconductor has very close lattice parameters to those of SnO2, making easier the heterostructure assembling. The electrical properties of TiO2/SnO2 heterostructure were evaluated as function of temperature and excitation with different light sources. The temperature dependence of conductivity is dominated by a deep level with energy coincident with the second ionization level of oxygen vacancies in SnO2, suggesting the dominant role of the most external layer material (SnO2) to the electrical transport properties. The fourth harmonic of a Nd:YAG laser line (4.65 eV) seems to excite the most external layer whereas a InGaN LED (2.75 eV) seems to excite electrons from the ground state of a quantized interfacial channel as well as intrabandgap states of the TiO2 layer.Universidade Estadual Paulista, Departamento de Física, Faculdade de Ciências de BauruUniversidade Estadual Paulista, Departamento de Química e Bioquímica, Instituto de Biociências de BotucatuTrans Tech Publications LtdUniversidade Estadual Paulista (Unesp)Machado, Diego Henrique de Oliveira [UNESP]Floriano, Emerson Aparecido [UNESP]Scalvi, Luis Vicente de Andrade [UNESP]Saeki, Margarida Juri [UNESP]2015-11-03T15:30:01Z2015-11-03T15:30:01Z2014-01-01info:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/conferenceObject201-206http://www.scientific.net/AMR.975.201Electroceramics Vi. Stafa-zurich: Trans Tech Publications Ltd, v. 975, p. 201-206, 2014.1022-6680http://hdl.handle.net/11449/13018410.4028/www.scientific.net/AMR.975.201WOS:000348023200033773071947645123218029828064368940000-0001-5762-6424Web of Sciencereponame:Repositório Institucional da UNESPinstname:Universidade Estadual Paulista (UNESP)instacron:UNESPengElectroceramics Vi0,121info:eu-repo/semantics/openAccess2024-04-25T17:40:55Zoai:repositorio.unesp.br:11449/130184Repositório InstitucionalPUBhttp://repositorio.unesp.br/oai/requestopendoar:29462024-08-05T19:23:13.144675Repositório Institucional da UNESP - Universidade Estadual Paulista (UNESP)false |
dc.title.none.fl_str_mv |
Investigation of photoinduced electrical properties in the heterojunction TiO2/SnO2 |
title |
Investigation of photoinduced electrical properties in the heterojunction TiO2/SnO2 |
spellingShingle |
Investigation of photoinduced electrical properties in the heterojunction TiO2/SnO2 Machado, Diego Henrique de Oliveira [UNESP] Tin dioxide Titanium dioxide Heterostructure Gas sensors Electrical properties |
title_short |
Investigation of photoinduced electrical properties in the heterojunction TiO2/SnO2 |
title_full |
Investigation of photoinduced electrical properties in the heterojunction TiO2/SnO2 |
title_fullStr |
Investigation of photoinduced electrical properties in the heterojunction TiO2/SnO2 |
title_full_unstemmed |
Investigation of photoinduced electrical properties in the heterojunction TiO2/SnO2 |
title_sort |
Investigation of photoinduced electrical properties in the heterojunction TiO2/SnO2 |
author |
Machado, Diego Henrique de Oliveira [UNESP] |
author_facet |
Machado, Diego Henrique de Oliveira [UNESP] Floriano, Emerson Aparecido [UNESP] Scalvi, Luis Vicente de Andrade [UNESP] Saeki, Margarida Juri [UNESP] |
author_role |
author |
author2 |
Floriano, Emerson Aparecido [UNESP] Scalvi, Luis Vicente de Andrade [UNESP] Saeki, Margarida Juri [UNESP] |
author2_role |
author author author |
dc.contributor.none.fl_str_mv |
Universidade Estadual Paulista (Unesp) |
dc.contributor.author.fl_str_mv |
Machado, Diego Henrique de Oliveira [UNESP] Floriano, Emerson Aparecido [UNESP] Scalvi, Luis Vicente de Andrade [UNESP] Saeki, Margarida Juri [UNESP] |
dc.subject.por.fl_str_mv |
Tin dioxide Titanium dioxide Heterostructure Gas sensors Electrical properties |
topic |
Tin dioxide Titanium dioxide Heterostructure Gas sensors Electrical properties |
description |
TiO2/SnO2 thin films heterostructures were grown by the sol-gel dip-coating technique. It was found that the crystalline structure of TiO2 depends on the annealing temperature and the substrate type. TiO2 films deposited on glass substrate, submitted to thermal annealing until 550 degrees C, present anatase structure, whereas films deposited on quartz substrate transform to rutile structure when thermally annealed at 1100 degrees C. When structured as rutile, this oxide semiconductor has very close lattice parameters to those of SnO2, making easier the heterostructure assembling. The electrical properties of TiO2/SnO2 heterostructure were evaluated as function of temperature and excitation with different light sources. The temperature dependence of conductivity is dominated by a deep level with energy coincident with the second ionization level of oxygen vacancies in SnO2, suggesting the dominant role of the most external layer material (SnO2) to the electrical transport properties. The fourth harmonic of a Nd:YAG laser line (4.65 eV) seems to excite the most external layer whereas a InGaN LED (2.75 eV) seems to excite electrons from the ground state of a quantized interfacial channel as well as intrabandgap states of the TiO2 layer. |
publishDate |
2014 |
dc.date.none.fl_str_mv |
2014-01-01 2015-11-03T15:30:01Z 2015-11-03T15:30:01Z |
dc.type.status.fl_str_mv |
info:eu-repo/semantics/publishedVersion |
dc.type.driver.fl_str_mv |
info:eu-repo/semantics/conferenceObject |
format |
conferenceObject |
status_str |
publishedVersion |
dc.identifier.uri.fl_str_mv |
http://www.scientific.net/AMR.975.201 Electroceramics Vi. Stafa-zurich: Trans Tech Publications Ltd, v. 975, p. 201-206, 2014. 1022-6680 http://hdl.handle.net/11449/130184 10.4028/www.scientific.net/AMR.975.201 WOS:000348023200033 7730719476451232 1802982806436894 0000-0001-5762-6424 |
url |
http://www.scientific.net/AMR.975.201 http://hdl.handle.net/11449/130184 |
identifier_str_mv |
Electroceramics Vi. Stafa-zurich: Trans Tech Publications Ltd, v. 975, p. 201-206, 2014. 1022-6680 10.4028/www.scientific.net/AMR.975.201 WOS:000348023200033 7730719476451232 1802982806436894 0000-0001-5762-6424 |
dc.language.iso.fl_str_mv |
eng |
language |
eng |
dc.relation.none.fl_str_mv |
Electroceramics Vi 0,121 |
dc.rights.driver.fl_str_mv |
info:eu-repo/semantics/openAccess |
eu_rights_str_mv |
openAccess |
dc.format.none.fl_str_mv |
201-206 |
dc.publisher.none.fl_str_mv |
Trans Tech Publications Ltd |
publisher.none.fl_str_mv |
Trans Tech Publications Ltd |
dc.source.none.fl_str_mv |
Web of Science reponame:Repositório Institucional da UNESP instname:Universidade Estadual Paulista (UNESP) instacron:UNESP |
instname_str |
Universidade Estadual Paulista (UNESP) |
instacron_str |
UNESP |
institution |
UNESP |
reponame_str |
Repositório Institucional da UNESP |
collection |
Repositório Institucional da UNESP |
repository.name.fl_str_mv |
Repositório Institucional da UNESP - Universidade Estadual Paulista (UNESP) |
repository.mail.fl_str_mv |
|
_version_ |
1808129061232312320 |