Investigation of photoinduced electrical properties in the heterojunction TiO2/SnO2

Detalhes bibliográficos
Autor(a) principal: Machado, Diego Henrique de Oliveira [UNESP]
Data de Publicação: 2014
Outros Autores: Floriano, Emerson Aparecido [UNESP], Scalvi, Luis Vicente de Andrade [UNESP], Saeki, Margarida Juri [UNESP]
Tipo de documento: Artigo de conferência
Idioma: eng
Título da fonte: Repositório Institucional da UNESP
Texto Completo: http://www.scientific.net/AMR.975.201
http://hdl.handle.net/11449/130184
Resumo: TiO2/SnO2 thin films heterostructures were grown by the sol-gel dip-coating technique. It was found that the crystalline structure of TiO2 depends on the annealing temperature and the substrate type. TiO2 films deposited on glass substrate, submitted to thermal annealing until 550 degrees C, present anatase structure, whereas films deposited on quartz substrate transform to rutile structure when thermally annealed at 1100 degrees C. When structured as rutile, this oxide semiconductor has very close lattice parameters to those of SnO2, making easier the heterostructure assembling. The electrical properties of TiO2/SnO2 heterostructure were evaluated as function of temperature and excitation with different light sources. The temperature dependence of conductivity is dominated by a deep level with energy coincident with the second ionization level of oxygen vacancies in SnO2, suggesting the dominant role of the most external layer material (SnO2) to the electrical transport properties. The fourth harmonic of a Nd:YAG laser line (4.65 eV) seems to excite the most external layer whereas a InGaN LED (2.75 eV) seems to excite electrons from the ground state of a quantized interfacial channel as well as intrabandgap states of the TiO2 layer.
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spelling Investigation of photoinduced electrical properties in the heterojunction TiO2/SnO2Tin dioxideTitanium dioxideHeterostructureGas sensorsElectrical propertiesTiO2/SnO2 thin films heterostructures were grown by the sol-gel dip-coating technique. It was found that the crystalline structure of TiO2 depends on the annealing temperature and the substrate type. TiO2 films deposited on glass substrate, submitted to thermal annealing until 550 degrees C, present anatase structure, whereas films deposited on quartz substrate transform to rutile structure when thermally annealed at 1100 degrees C. When structured as rutile, this oxide semiconductor has very close lattice parameters to those of SnO2, making easier the heterostructure assembling. The electrical properties of TiO2/SnO2 heterostructure were evaluated as function of temperature and excitation with different light sources. The temperature dependence of conductivity is dominated by a deep level with energy coincident with the second ionization level of oxygen vacancies in SnO2, suggesting the dominant role of the most external layer material (SnO2) to the electrical transport properties. The fourth harmonic of a Nd:YAG laser line (4.65 eV) seems to excite the most external layer whereas a InGaN LED (2.75 eV) seems to excite electrons from the ground state of a quantized interfacial channel as well as intrabandgap states of the TiO2 layer.Universidade Estadual Paulista, Departamento de Física, Faculdade de Ciências de BauruUniversidade Estadual Paulista, Departamento de Química e Bioquímica, Instituto de Biociências de BotucatuTrans Tech Publications LtdUniversidade Estadual Paulista (Unesp)Machado, Diego Henrique de Oliveira [UNESP]Floriano, Emerson Aparecido [UNESP]Scalvi, Luis Vicente de Andrade [UNESP]Saeki, Margarida Juri [UNESP]2015-11-03T15:30:01Z2015-11-03T15:30:01Z2014-01-01info:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/conferenceObject201-206http://www.scientific.net/AMR.975.201Electroceramics Vi. Stafa-zurich: Trans Tech Publications Ltd, v. 975, p. 201-206, 2014.1022-6680http://hdl.handle.net/11449/13018410.4028/www.scientific.net/AMR.975.201WOS:000348023200033773071947645123218029828064368940000-0001-5762-6424Web of Sciencereponame:Repositório Institucional da UNESPinstname:Universidade Estadual Paulista (UNESP)instacron:UNESPengElectroceramics Vi0,121info:eu-repo/semantics/openAccess2024-04-25T17:40:55Zoai:repositorio.unesp.br:11449/130184Repositório InstitucionalPUBhttp://repositorio.unesp.br/oai/requestopendoar:29462024-08-05T19:23:13.144675Repositório Institucional da UNESP - Universidade Estadual Paulista (UNESP)false
dc.title.none.fl_str_mv Investigation of photoinduced electrical properties in the heterojunction TiO2/SnO2
title Investigation of photoinduced electrical properties in the heterojunction TiO2/SnO2
spellingShingle Investigation of photoinduced electrical properties in the heterojunction TiO2/SnO2
Machado, Diego Henrique de Oliveira [UNESP]
Tin dioxide
Titanium dioxide
Heterostructure
Gas sensors
Electrical properties
title_short Investigation of photoinduced electrical properties in the heterojunction TiO2/SnO2
title_full Investigation of photoinduced electrical properties in the heterojunction TiO2/SnO2
title_fullStr Investigation of photoinduced electrical properties in the heterojunction TiO2/SnO2
title_full_unstemmed Investigation of photoinduced electrical properties in the heterojunction TiO2/SnO2
title_sort Investigation of photoinduced electrical properties in the heterojunction TiO2/SnO2
author Machado, Diego Henrique de Oliveira [UNESP]
author_facet Machado, Diego Henrique de Oliveira [UNESP]
Floriano, Emerson Aparecido [UNESP]
Scalvi, Luis Vicente de Andrade [UNESP]
Saeki, Margarida Juri [UNESP]
author_role author
author2 Floriano, Emerson Aparecido [UNESP]
Scalvi, Luis Vicente de Andrade [UNESP]
Saeki, Margarida Juri [UNESP]
author2_role author
author
author
dc.contributor.none.fl_str_mv Universidade Estadual Paulista (Unesp)
dc.contributor.author.fl_str_mv Machado, Diego Henrique de Oliveira [UNESP]
Floriano, Emerson Aparecido [UNESP]
Scalvi, Luis Vicente de Andrade [UNESP]
Saeki, Margarida Juri [UNESP]
dc.subject.por.fl_str_mv Tin dioxide
Titanium dioxide
Heterostructure
Gas sensors
Electrical properties
topic Tin dioxide
Titanium dioxide
Heterostructure
Gas sensors
Electrical properties
description TiO2/SnO2 thin films heterostructures were grown by the sol-gel dip-coating technique. It was found that the crystalline structure of TiO2 depends on the annealing temperature and the substrate type. TiO2 films deposited on glass substrate, submitted to thermal annealing until 550 degrees C, present anatase structure, whereas films deposited on quartz substrate transform to rutile structure when thermally annealed at 1100 degrees C. When structured as rutile, this oxide semiconductor has very close lattice parameters to those of SnO2, making easier the heterostructure assembling. The electrical properties of TiO2/SnO2 heterostructure were evaluated as function of temperature and excitation with different light sources. The temperature dependence of conductivity is dominated by a deep level with energy coincident with the second ionization level of oxygen vacancies in SnO2, suggesting the dominant role of the most external layer material (SnO2) to the electrical transport properties. The fourth harmonic of a Nd:YAG laser line (4.65 eV) seems to excite the most external layer whereas a InGaN LED (2.75 eV) seems to excite electrons from the ground state of a quantized interfacial channel as well as intrabandgap states of the TiO2 layer.
publishDate 2014
dc.date.none.fl_str_mv 2014-01-01
2015-11-03T15:30:01Z
2015-11-03T15:30:01Z
dc.type.status.fl_str_mv info:eu-repo/semantics/publishedVersion
dc.type.driver.fl_str_mv info:eu-repo/semantics/conferenceObject
format conferenceObject
status_str publishedVersion
dc.identifier.uri.fl_str_mv http://www.scientific.net/AMR.975.201
Electroceramics Vi. Stafa-zurich: Trans Tech Publications Ltd, v. 975, p. 201-206, 2014.
1022-6680
http://hdl.handle.net/11449/130184
10.4028/www.scientific.net/AMR.975.201
WOS:000348023200033
7730719476451232
1802982806436894
0000-0001-5762-6424
url http://www.scientific.net/AMR.975.201
http://hdl.handle.net/11449/130184
identifier_str_mv Electroceramics Vi. Stafa-zurich: Trans Tech Publications Ltd, v. 975, p. 201-206, 2014.
1022-6680
10.4028/www.scientific.net/AMR.975.201
WOS:000348023200033
7730719476451232
1802982806436894
0000-0001-5762-6424
dc.language.iso.fl_str_mv eng
language eng
dc.relation.none.fl_str_mv Electroceramics Vi
0,121
dc.rights.driver.fl_str_mv info:eu-repo/semantics/openAccess
eu_rights_str_mv openAccess
dc.format.none.fl_str_mv 201-206
dc.publisher.none.fl_str_mv Trans Tech Publications Ltd
publisher.none.fl_str_mv Trans Tech Publications Ltd
dc.source.none.fl_str_mv Web of Science
reponame:Repositório Institucional da UNESP
instname:Universidade Estadual Paulista (UNESP)
instacron:UNESP
instname_str Universidade Estadual Paulista (UNESP)
instacron_str UNESP
institution UNESP
reponame_str Repositório Institucional da UNESP
collection Repositório Institucional da UNESP
repository.name.fl_str_mv Repositório Institucional da UNESP - Universidade Estadual Paulista (UNESP)
repository.mail.fl_str_mv
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