Electrical transport properties and complex impedance investigation of Fe 3+ and La 3+ co-doping (Pb,Sr)TiO 3 thin films
Autor(a) principal: | |
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Data de Publicação: | 2018 |
Outros Autores: | , , , , |
Tipo de documento: | Artigo |
Idioma: | eng |
Título da fonte: | Repositório Institucional da UNESP |
Texto Completo: | http://dx.doi.org/10.1016/j.mseb.2018.11.013 http://hdl.handle.net/11449/189928 |
Resumo: | This work investigates the impact of Fe 3+ and La 3+ co-doping on the structural, electrical transport and dielectric relaxation properties of PST thin films. XRD and Raman spectroscopy data show that the Fe 3+ and La 3+ doping induce a pseudocubic to tetragonal structural phase transformation. Schottky barrier heights calculated from temperature-dependent current–voltage plots for the PST, PSTF and PSLTF films decreased to 1.20, 0.59, and 0.36 eV, respectively. This behavior was directly assigned to the increase in oxygen vacancies. The frequency dependence of sample's impedance revealed the presence of the typical electrical relaxation phenomenon in all films. Activation energies calculated from the imaginary part of the impedance are 1.73 and 0.57 eV: the high value (1.73 eV, PST films) suggests the presence of long-range oxygen vacancy diffusion, while the lower one (0.57 eV PSLTF films) should be associated to the short-range oxygen vacancy diffusion. |
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Repositório Institucional da UNESP |
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Electrical transport properties and complex impedance investigation of Fe 3+ and La 3+ co-doping (Pb,Sr)TiO 3 thin filmsDielectric relaxationElectrical transportImpedance spectroscopyThin filmsThis work investigates the impact of Fe 3+ and La 3+ co-doping on the structural, electrical transport and dielectric relaxation properties of PST thin films. XRD and Raman spectroscopy data show that the Fe 3+ and La 3+ doping induce a pseudocubic to tetragonal structural phase transformation. Schottky barrier heights calculated from temperature-dependent current–voltage plots for the PST, PSTF and PSLTF films decreased to 1.20, 0.59, and 0.36 eV, respectively. This behavior was directly assigned to the increase in oxygen vacancies. The frequency dependence of sample's impedance revealed the presence of the typical electrical relaxation phenomenon in all films. Activation energies calculated from the imaginary part of the impedance are 1.73 and 0.57 eV: the high value (1.73 eV, PST films) suggests the presence of long-range oxygen vacancy diffusion, while the lower one (0.57 eV PSLTF films) should be associated to the short-range oxygen vacancy diffusion.Conselho Nacional de Desenvolvimento Científico e Tecnológico (CNPq)Fundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP)Department of Chemistry Universidade Estadual Paulista – Unesp, P.O. Box 473NanO LaB – Department of Physics Universidade Federal de São Carlos, Via Washington Luiz, Km 235, P.O. Box 676Physics Institute of São Carlos (IFSC) Universidade de São PauloLIEC – CDMF – Department of Chemistry Universidade Federal de São Carlos, Via Washington Luiz, Km 235, P.O. Box 676Department of Chemistry Universidade Estadual Paulista – Unesp, P.O. Box 473Universidade Estadual Paulista (Unesp)Universidade Federal de São Carlos (UFSCar)Universidade de São Paulo (USP)Pontes, F. M. [UNESP]Pontes, D. S.L. [UNESP]Chiquito, A. J.Colmenares, Y. N.Mastelaro, V. R.Longo, E. [UNESP]2019-10-06T16:56:47Z2019-10-06T16:56:47Z2018-10-01info:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/article179-188http://dx.doi.org/10.1016/j.mseb.2018.11.013Materials Science and Engineering B: Solid-State Materials for Advanced Technology, v. 236-237, p. 179-188.0921-5107http://hdl.handle.net/11449/18992810.1016/j.mseb.2018.11.0132-s2.0-85057418221Scopusreponame:Repositório Institucional da UNESPinstname:Universidade Estadual Paulista (UNESP)instacron:UNESPengMaterials Science and Engineering B: Solid-State Materials for Advanced Technologyinfo:eu-repo/semantics/openAccess2021-10-23T01:35:28Zoai:repositorio.unesp.br:11449/189928Repositório InstitucionalPUBhttp://repositorio.unesp.br/oai/requestopendoar:29462021-10-23T01:35:28Repositório Institucional da UNESP - Universidade Estadual Paulista (UNESP)false |
dc.title.none.fl_str_mv |
Electrical transport properties and complex impedance investigation of Fe 3+ and La 3+ co-doping (Pb,Sr)TiO 3 thin films |
title |
Electrical transport properties and complex impedance investigation of Fe 3+ and La 3+ co-doping (Pb,Sr)TiO 3 thin films |
spellingShingle |
Electrical transport properties and complex impedance investigation of Fe 3+ and La 3+ co-doping (Pb,Sr)TiO 3 thin films Pontes, F. M. [UNESP] Dielectric relaxation Electrical transport Impedance spectroscopy Thin films |
title_short |
Electrical transport properties and complex impedance investigation of Fe 3+ and La 3+ co-doping (Pb,Sr)TiO 3 thin films |
title_full |
Electrical transport properties and complex impedance investigation of Fe 3+ and La 3+ co-doping (Pb,Sr)TiO 3 thin films |
title_fullStr |
Electrical transport properties and complex impedance investigation of Fe 3+ and La 3+ co-doping (Pb,Sr)TiO 3 thin films |
title_full_unstemmed |
Electrical transport properties and complex impedance investigation of Fe 3+ and La 3+ co-doping (Pb,Sr)TiO 3 thin films |
title_sort |
Electrical transport properties and complex impedance investigation of Fe 3+ and La 3+ co-doping (Pb,Sr)TiO 3 thin films |
author |
Pontes, F. M. [UNESP] |
author_facet |
Pontes, F. M. [UNESP] Pontes, D. S.L. [UNESP] Chiquito, A. J. Colmenares, Y. N. Mastelaro, V. R. Longo, E. [UNESP] |
author_role |
author |
author2 |
Pontes, D. S.L. [UNESP] Chiquito, A. J. Colmenares, Y. N. Mastelaro, V. R. Longo, E. [UNESP] |
author2_role |
author author author author author |
dc.contributor.none.fl_str_mv |
Universidade Estadual Paulista (Unesp) Universidade Federal de São Carlos (UFSCar) Universidade de São Paulo (USP) |
dc.contributor.author.fl_str_mv |
Pontes, F. M. [UNESP] Pontes, D. S.L. [UNESP] Chiquito, A. J. Colmenares, Y. N. Mastelaro, V. R. Longo, E. [UNESP] |
dc.subject.por.fl_str_mv |
Dielectric relaxation Electrical transport Impedance spectroscopy Thin films |
topic |
Dielectric relaxation Electrical transport Impedance spectroscopy Thin films |
description |
This work investigates the impact of Fe 3+ and La 3+ co-doping on the structural, electrical transport and dielectric relaxation properties of PST thin films. XRD and Raman spectroscopy data show that the Fe 3+ and La 3+ doping induce a pseudocubic to tetragonal structural phase transformation. Schottky barrier heights calculated from temperature-dependent current–voltage plots for the PST, PSTF and PSLTF films decreased to 1.20, 0.59, and 0.36 eV, respectively. This behavior was directly assigned to the increase in oxygen vacancies. The frequency dependence of sample's impedance revealed the presence of the typical electrical relaxation phenomenon in all films. Activation energies calculated from the imaginary part of the impedance are 1.73 and 0.57 eV: the high value (1.73 eV, PST films) suggests the presence of long-range oxygen vacancy diffusion, while the lower one (0.57 eV PSLTF films) should be associated to the short-range oxygen vacancy diffusion. |
publishDate |
2018 |
dc.date.none.fl_str_mv |
2018-10-01 2019-10-06T16:56:47Z 2019-10-06T16:56:47Z |
dc.type.status.fl_str_mv |
info:eu-repo/semantics/publishedVersion |
dc.type.driver.fl_str_mv |
info:eu-repo/semantics/article |
format |
article |
status_str |
publishedVersion |
dc.identifier.uri.fl_str_mv |
http://dx.doi.org/10.1016/j.mseb.2018.11.013 Materials Science and Engineering B: Solid-State Materials for Advanced Technology, v. 236-237, p. 179-188. 0921-5107 http://hdl.handle.net/11449/189928 10.1016/j.mseb.2018.11.013 2-s2.0-85057418221 |
url |
http://dx.doi.org/10.1016/j.mseb.2018.11.013 http://hdl.handle.net/11449/189928 |
identifier_str_mv |
Materials Science and Engineering B: Solid-State Materials for Advanced Technology, v. 236-237, p. 179-188. 0921-5107 10.1016/j.mseb.2018.11.013 2-s2.0-85057418221 |
dc.language.iso.fl_str_mv |
eng |
language |
eng |
dc.relation.none.fl_str_mv |
Materials Science and Engineering B: Solid-State Materials for Advanced Technology |
dc.rights.driver.fl_str_mv |
info:eu-repo/semantics/openAccess |
eu_rights_str_mv |
openAccess |
dc.format.none.fl_str_mv |
179-188 |
dc.source.none.fl_str_mv |
Scopus reponame:Repositório Institucional da UNESP instname:Universidade Estadual Paulista (UNESP) instacron:UNESP |
instname_str |
Universidade Estadual Paulista (UNESP) |
instacron_str |
UNESP |
institution |
UNESP |
reponame_str |
Repositório Institucional da UNESP |
collection |
Repositório Institucional da UNESP |
repository.name.fl_str_mv |
Repositório Institucional da UNESP - Universidade Estadual Paulista (UNESP) |
repository.mail.fl_str_mv |
|
_version_ |
1797789569330970624 |